JP6386896B2 - 投影光学系、露光装置、および、デバイス製造方法 - Google Patents

投影光学系、露光装置、および、デバイス製造方法 Download PDF

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Publication number
JP6386896B2
JP6386896B2 JP2014244333A JP2014244333A JP6386896B2 JP 6386896 B2 JP6386896 B2 JP 6386896B2 JP 2014244333 A JP2014244333 A JP 2014244333A JP 2014244333 A JP2014244333 A JP 2014244333A JP 6386896 B2 JP6386896 B2 JP 6386896B2
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JP
Japan
Prior art keywords
optical system
projection optical
convex mirror
support member
concave
Prior art date
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Active
Application number
JP2014244333A
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English (en)
Japanese (ja)
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JP2016109741A5 (OSRAM
JP2016109741A (ja
Inventor
佐々木　康人
康人 佐々木
美津留 関
美津留 関
猛 中嶋
猛 中嶋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2014244333A priority Critical patent/JP6386896B2/ja
Application filed by Canon Inc filed Critical Canon Inc
Priority to KR1020177017295A priority patent/KR101968432B1/ko
Priority to CN201580064782.8A priority patent/CN107003615B/zh
Priority to PCT/JP2015/005744 priority patent/WO2016088314A1/en
Priority to US15/526,277 priority patent/US10495978B2/en
Priority to TW104138518A priority patent/TWI588623B/zh
Priority to TW106111174A priority patent/TWI609251B/zh
Publication of JP2016109741A publication Critical patent/JP2016109741A/ja
Publication of JP2016109741A5 publication Critical patent/JP2016109741A5/ja
Application granted granted Critical
Publication of JP6386896B2 publication Critical patent/JP6386896B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0605—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors
    • G02B17/0615—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using two curved mirrors off-axis or unobscured systems in wich all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B21/00—Projectors or projection-type viewers; Accessories therefor
    • G03B21/14—Details
    • G03B21/28—Reflectors in projection beam
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)
JP2014244333A 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法 Active JP6386896B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法
CN201580064782.8A CN107003615B (zh) 2014-12-02 2015-11-17 投影光学系统、曝光装置和器件制造方法
PCT/JP2015/005744 WO2016088314A1 (en) 2014-12-02 2015-11-17 Projection optical system, exposure apparatus, and device manufacturing method
US15/526,277 US10495978B2 (en) 2014-12-02 2015-11-17 Projection optical system, exposure apparatus, and device manufacturing method
KR1020177017295A KR101968432B1 (ko) 2014-12-02 2015-11-17 투영 광학계, 노광 장치, 및 디바이스 제조 방법
TW104138518A TWI588623B (zh) 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法
TW106111174A TWI609251B (zh) 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法

Publications (3)

Publication Number Publication Date
JP2016109741A JP2016109741A (ja) 2016-06-20
JP2016109741A5 JP2016109741A5 (OSRAM) 2017-07-06
JP6386896B2 true JP6386896B2 (ja) 2018-09-05

Family

ID=56091280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014244333A Active JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法

Country Status (6)

Country Link
US (1) US10495978B2 (OSRAM)
JP (1) JP6386896B2 (OSRAM)
KR (1) KR101968432B1 (OSRAM)
CN (1) CN107003615B (OSRAM)
TW (2) TWI609251B (OSRAM)
WO (1) WO2016088314A1 (OSRAM)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7075302B2 (ja) 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689844A (ja) * 1992-09-09 1994-03-29 Toshiba Corp 露光装置
JP2001326160A (ja) * 2000-05-16 2001-11-22 Seiko Epson Corp 反射投影露光装置の歪み検出機構
JP2005345582A (ja) 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
TW200841134A (en) * 2007-04-13 2008-10-16 Orc Mfg Co Ltd Projection exposure apparatus
JP2008263092A (ja) * 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
JP5201979B2 (ja) 2007-12-26 2013-06-05 キヤノン株式会社 露光装置およびデバイス製造方法
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5116726B2 (ja) 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法

Also Published As

Publication number Publication date
TW201734668A (zh) 2017-10-01
CN107003615A (zh) 2017-08-01
KR101968432B1 (ko) 2019-04-11
WO2016088314A1 (en) 2016-06-09
TWI609251B (zh) 2017-12-21
US20170315448A1 (en) 2017-11-02
US10495978B2 (en) 2019-12-03
TWI588623B (zh) 2017-06-21
CN107003615B (zh) 2019-01-25
KR20170088938A (ko) 2017-08-02
JP2016109741A (ja) 2016-06-20
TW201621476A (zh) 2016-06-16

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