JP2016109741A5 - - Google Patents

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Publication number
JP2016109741A5
JP2016109741A5 JP2014244333A JP2014244333A JP2016109741A5 JP 2016109741 A5 JP2016109741 A5 JP 2016109741A5 JP 2014244333 A JP2014244333 A JP 2014244333A JP 2014244333 A JP2014244333 A JP 2014244333A JP 2016109741 A5 JP2016109741 A5 JP 2016109741A5
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JP
Japan
Prior art keywords
optical system
projection optical
convex mirror
support member
concave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2014244333A
Other languages
English (en)
Japanese (ja)
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JP6386896B2 (ja
JP2016109741A (ja
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Publication date
Application filed filed Critical
Priority claimed from JP2014244333A external-priority patent/JP6386896B2/ja
Priority to JP2014244333A priority Critical patent/JP6386896B2/ja
Priority to CN201580064782.8A priority patent/CN107003615B/zh
Priority to US15/526,277 priority patent/US10495978B2/en
Priority to PCT/JP2015/005744 priority patent/WO2016088314A1/en
Priority to KR1020177017295A priority patent/KR101968432B1/ko
Priority to TW106111174A priority patent/TWI609251B/zh
Priority to TW104138518A priority patent/TWI588623B/zh
Publication of JP2016109741A publication Critical patent/JP2016109741A/ja
Publication of JP2016109741A5 publication Critical patent/JP2016109741A5/ja
Publication of JP6386896B2 publication Critical patent/JP6386896B2/ja
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2014244333A 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法 Active JP6386896B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法
KR1020177017295A KR101968432B1 (ko) 2014-12-02 2015-11-17 투영 광학계, 노광 장치, 및 디바이스 제조 방법
US15/526,277 US10495978B2 (en) 2014-12-02 2015-11-17 Projection optical system, exposure apparatus, and device manufacturing method
PCT/JP2015/005744 WO2016088314A1 (en) 2014-12-02 2015-11-17 Projection optical system, exposure apparatus, and device manufacturing method
CN201580064782.8A CN107003615B (zh) 2014-12-02 2015-11-17 投影光学系统、曝光装置和器件制造方法
TW106111174A TWI609251B (zh) 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法
TW104138518A TWI588623B (zh) 2014-12-02 2015-11-20 投影光學系統、曝光設備及裝置製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2014244333A JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法

Publications (3)

Publication Number Publication Date
JP2016109741A JP2016109741A (ja) 2016-06-20
JP2016109741A5 true JP2016109741A5 (OSRAM) 2017-07-06
JP6386896B2 JP6386896B2 (ja) 2018-09-05

Family

ID=56091280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2014244333A Active JP6386896B2 (ja) 2014-12-02 2014-12-02 投影光学系、露光装置、および、デバイス製造方法

Country Status (6)

Country Link
US (1) US10495978B2 (OSRAM)
JP (1) JP6386896B2 (OSRAM)
KR (1) KR101968432B1 (OSRAM)
CN (1) CN107003615B (OSRAM)
TW (2) TWI609251B (OSRAM)
WO (1) WO2016088314A1 (OSRAM)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7075302B2 (ja) 2018-07-23 2022-05-25 キヤノン株式会社 光学装置、投影光学系、露光装置、および物品の製造方法
JP7204400B2 (ja) * 2018-09-28 2023-01-16 キヤノン株式会社 露光装置及び物品の製造方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0689844A (ja) * 1992-09-09 1994-03-29 Toshiba Corp 露光装置
JP2001326160A (ja) * 2000-05-16 2001-11-22 Seiko Epson Corp 反射投影露光装置の歪み検出機構
JP2005345582A (ja) 2004-06-01 2005-12-15 Dainippon Screen Mfg Co Ltd 投影光学系およびパターン描画装置
US7184124B2 (en) 2004-10-28 2007-02-27 Asml Holding N.V. Lithographic apparatus having an adjustable projection system and device manufacturing method
JP2008311498A (ja) * 2007-06-15 2008-12-25 Orc Mfg Co Ltd 反射型露光装置
TW200841134A (en) 2007-04-13 2008-10-16 Orc Mfg Co Ltd Projection exposure apparatus
JP2008263092A (ja) * 2007-04-13 2008-10-30 Orc Mfg Co Ltd 投影露光装置
JP5201979B2 (ja) 2007-12-26 2013-06-05 キヤノン株式会社 露光装置およびデバイス製造方法
JP5398185B2 (ja) * 2008-07-09 2014-01-29 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
US8508735B2 (en) 2008-09-22 2013-08-13 Nikon Corporation Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
US8773635B2 (en) 2008-12-19 2014-07-08 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5116726B2 (ja) 2009-06-01 2013-01-09 キヤノン株式会社 露光装置およびデバイス製造方法
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP6410406B2 (ja) 2012-11-16 2018-10-24 キヤノン株式会社 投影光学系、露光装置および物品の製造方法

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