JP6381649B2 - 傾斜薄膜 - Google Patents

傾斜薄膜 Download PDF

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Publication number
JP6381649B2
JP6381649B2 JP2016538729A JP2016538729A JP6381649B2 JP 6381649 B2 JP6381649 B2 JP 6381649B2 JP 2016538729 A JP2016538729 A JP 2016538729A JP 2016538729 A JP2016538729 A JP 2016538729A JP 6381649 B2 JP6381649 B2 JP 6381649B2
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Japan
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film
article
plasma
chemical
deposition
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Japanese (ja)
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JP2017500448A5 (enExample
JP2017500448A (ja
Inventor
アルポナ ラーナデー，
アルポナ ラーナデー，
マーヴィ エー． マトス，
マーヴィ エー． マトス，
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Boeing Co
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Boeing Co
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
JP2016538729A 2013-12-12 2014-09-19 傾斜薄膜 Active JP6381649B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/104,796 2013-12-12
US14/104,796 US9139908B2 (en) 2013-12-12 2013-12-12 Gradient thin films
PCT/US2014/056467 WO2015088613A1 (en) 2013-12-12 2014-09-19 Gradient thin films

Publications (3)

Publication Number Publication Date
JP2017500448A JP2017500448A (ja) 2017-01-05
JP2017500448A5 JP2017500448A5 (enExample) 2017-11-02
JP6381649B2 true JP6381649B2 (ja) 2018-08-29

Family

ID=51660657

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2016538729A Active JP6381649B2 (ja) 2013-12-12 2014-09-19 傾斜薄膜

Country Status (8)

Country Link
US (1) US9139908B2 (enExample)
EP (1) EP3080331B1 (enExample)
JP (1) JP6381649B2 (enExample)
KR (1) KR102374881B1 (enExample)
CN (1) CN105723013B (enExample)
AU (1) AU2014360781B2 (enExample)
RU (1) RU2666198C1 (enExample)
WO (1) WO2015088613A1 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
WO2018130289A1 (en) * 2017-01-12 2018-07-19 Applied Materials, Inc. Hardcoat layer system and method for manufacturing a hardcoat layer system in a continuous roll-to-roll process
US10985344B2 (en) 2017-10-27 2021-04-20 Applied Materials, Inc. Flexible cover lens films
JP7716853B2 (ja) 2018-05-10 2025-08-01 アプライド マテリアルズ インコーポレイテッド フレキシブルディスプレイ用の交換可能なカバーレンズ
WO2020036693A1 (en) 2018-08-14 2020-02-20 Applied Materials, Inc. Multi-layer wet-dry hardcoats for flexible cover lens
RU2702881C1 (ru) * 2018-09-28 2019-10-11 Общество с ограниченной ответственностью "Научно-производственное объединение "Защитные покрытия", ООО "НПО "Защитные покрытия" Градиентное металлополимерное покрытие
CN113227909B (zh) 2018-12-20 2025-07-04 朗姆研究公司 抗蚀剂的干式显影
KR102780681B1 (ko) 2019-06-26 2025-03-11 어플라이드 머티어리얼스, 인코포레이티드 폴더블 디스플레이들을 위한 플렉서블 다층 커버 렌즈 스택들
TWI869221B (zh) 2019-06-26 2025-01-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
JP7618601B2 (ja) * 2019-06-28 2025-01-21 ラム リサーチ コーポレーション 複数のパターニング放射吸収元素および／または垂直組成勾配を備えたフォトレジスト
US20240117495A1 (en) * 2019-10-14 2024-04-11 Silcotek Corp. Cold thermal chemical vapor deposition
KR20250007037A (ko) 2020-01-15 2025-01-13 램 리써치 코포레이션 포토레지스트 부착 및 선량 감소를 위한 하부층
CN116626993A (zh) 2020-07-07 2023-08-22 朗姆研究公司 用于图案化辐射光致抗蚀剂图案化的集成干燥工艺
JP7562696B2 (ja) 2020-11-13 2024-10-07 ラム リサーチ コーポレーション フォトレジストのドライ除去用プロセスツール
DE102022105041A1 (de) * 2022-03-03 2023-09-07 IonKraft GmbH Beschichtungstechnik für Kunststoffbehälter
BR102022012045A2 (pt) * 2022-06-17 2024-01-02 Autocoat Equipamentos E Processos De Deposição Ltda Dispositivo para deposição de filmes finos por lâmina e processo derivado
CN117004920A (zh) * 2023-07-28 2023-11-07 上海大学 一种梯度h-BNC纳米自清洁薄膜设计方法

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1051393A (enExample) 1964-08-28 1900-01-01
US4414085A (en) * 1981-10-08 1983-11-08 Wickersham Charles E Method of depositing a high-emissivity layer
DE3706340A1 (de) * 1987-02-27 1988-09-08 Winter & Sohn Ernst Verfahren zum auftragen einer verschleissschutzschicht und danach hergestelltes erzeugnis
US5482602A (en) * 1993-11-04 1996-01-09 United Technologies Corporation Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
DE4445427C2 (de) * 1994-12-20 1997-04-30 Schott Glaswerke Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht
RU2189663C2 (ru) * 1997-06-30 2002-09-20 Мацушита Электрик Индастриал Ко., Лтд. Способ и устройство для изготовления тонкой полупроводниковой пленки
US5926740A (en) * 1997-10-27 1999-07-20 Micron Technology, Inc. Graded anti-reflective coating for IC lithography
JPH11124693A (ja) 1997-10-20 1999-05-11 Nippon Steel Corp 精密機器用部材
JP3782608B2 (ja) 1998-05-22 2006-06-07 キヤノン株式会社 薄膜材料および薄膜作成法
JP2000256850A (ja) * 1999-03-04 2000-09-19 Riken Corp ダイヤモンドライクカーボン薄膜及びその製造方法
US6221737B1 (en) 1999-09-30 2001-04-24 Philips Electronics North America Corporation Method of making semiconductor devices with graded top oxide and graded drift region
AU4901201A (en) 1999-10-25 2001-07-03 Rolls-Royce Corporation Erosion-resistant coatings for organic matric composites
US20050268962A1 (en) 2000-04-27 2005-12-08 Russell Gaudiana Flexible Photovoltaic cells, systems and methods
US20050257827A1 (en) 2000-04-27 2005-11-24 Russell Gaudiana Rotational photovoltaic cells, systems and methods
US6962751B2 (en) * 2001-06-13 2005-11-08 Sumitomo Electric Industries, Ltd. Amorphous carbon coated tools and method of producing the same
US6881475B2 (en) * 2001-06-13 2005-04-19 Sumitomo Electric Industries, Ltd Amorphous carbon coated tool and fabrication method thereof
JP4151000B2 (ja) * 2002-06-13 2008-09-17 株式会社オンワード技研 ワークの表面処理方法と、その装置
US6852920B2 (en) 2002-06-22 2005-02-08 Nanosolar, Inc. Nano-architected/assembled solar electricity cell
US7713592B2 (en) * 2003-02-04 2010-05-11 Tegal Corporation Nanolayer deposition process
US20050118502A1 (en) 2003-11-27 2005-06-02 Matsushita Electric Industrial Co., Ltd. Energy device and method for producing the same
US20090026587A1 (en) * 2004-01-14 2009-01-29 International Business Machines Corporation Gradient deposition of low-k cvd materials
KR20070037492A (ko) * 2004-06-15 2007-04-04 에비자 테크놀로지, 인크. 다성분 유전체 필름을 형성하기 위한 시스템 및 방법
US20060210783A1 (en) * 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
US7637967B2 (en) 2005-12-08 2009-12-29 Siemens Energy, Inc. Stepped gradient fuel electrode and method for making the same
US7700167B2 (en) 2006-08-31 2010-04-20 Honeywell International Inc. Erosion-protective coatings on polymer-matrix composites and components incorporating such coated composites
WO2008114627A1 (ja) * 2007-03-16 2008-09-25 Konica Minolta Holdings, Inc. 防汚性積層体及びディスプレイ用前面板
US7615482B2 (en) * 2007-03-23 2009-11-10 International Business Machines Corporation Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength
JP5407869B2 (ja) * 2007-11-19 2014-02-05 コニカミノルタ株式会社 撥水または防汚性物品、それを用いて構成された建築用窓ガラス、車両用窓ガラス、ディスプレイ部材、光学部品
US20090301550A1 (en) 2007-12-07 2009-12-10 Sunprint Inc. Focused acoustic printing of patterned photovoltaic materials
US8099792B1 (en) 2008-01-07 2012-01-17 Northwestern University Methods and apparatus for spatially resolved photocurrent mapping of operating photovoltaic devices using atomic force photovoltaic microscopy
WO2009094663A2 (en) 2008-01-25 2009-07-30 University Of Washington Photovoltaic devices having metal oxide electron-transport layers
US20090229667A1 (en) 2008-03-14 2009-09-17 Solarmer Energy, Inc. Translucent solar cell
FR2931844B1 (fr) 2008-06-02 2013-11-01 Alex Hr Roustaei Systemes pour la production de l'energie a la demande comme une source seule ou en assistance avec autres sources d'energie dans le domaine du transport ou de l'habitat.
DE102008028540A1 (de) * 2008-06-16 2009-12-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden einer Gradientenschicht auf einem Kunststoffsubstrat sowie Kunststoffsubstrat mit einer Gradientenschicht
DE102008033938B4 (de) 2008-07-18 2012-04-19 Innovent E.V. Verfahren zur Abscheidung von Schichten auf einem Substrat
US20110253217A1 (en) 2008-09-30 2011-10-20 The Regents Of The University Of California Controlled Alignment in Polymeric Solar Cells
US8269100B2 (en) 2008-09-30 2012-09-18 Uchicago Argonne, Llc Hybrid solar cells via UV-polymerization of polymer precursor
KR20110094279A (ko) 2008-10-31 2011-08-23 바스프 에스이 유기 태양 전지용 및 유기 광검출기용 광활성 층 제조를 위한 메로시아닌
DE102008060923B4 (de) 2008-12-06 2012-09-27 Innovent E.V. Verwendung einer Schicht
FR2956869B1 (fr) 2010-03-01 2014-05-16 Alex Hr Roustaei Systeme de production de film flexible a haute capacite destine a des cellules photovoltaiques et oled par deposition cyclique des couches
JP2012519965A (ja) 2009-03-06 2012-08-30 ユニバーシティ オブ フロリダ リサーチ ファウンデーション，インク． 空気安定性有機−無機ナノ粒子ハイブリッド太陽電池
JP5222764B2 (ja) * 2009-03-24 2013-06-26 株式会社神戸製鋼所 積層皮膜および積層皮膜被覆部材
US8206794B2 (en) * 2009-05-04 2012-06-26 The Boeing Company System and method for applying abrasion-resistant coatings
CN101560653A (zh) * 2009-05-14 2009-10-21 浙江大学 梯度折射率薄膜的制备方法
US20110030770A1 (en) 2009-08-04 2011-02-10 Molecular Imprints, Inc. Nanostructured organic solar cells
EP2462254A1 (en) * 2009-08-07 2012-06-13 Oerlikon Trading AG, Trübbach Tribology combined with corrosion resistance: a new family of pvd- and pacvd coatings
WO2011045253A1 (de) 2009-10-13 2011-04-21 Basf Se Mischungen zur herstellung von photoaktiven schichten für organische solarzellen und organische photodetektoren
US8871884B2 (en) 2009-10-28 2014-10-28 University Of Washington Copolymer semiconductors comprising thiazolothiazole or benzobisthiazole, or benzobisoxazole electron acceptor subunits, and electron donor subunits, and their uses in transistors and solar cells
WO2012031083A2 (en) 2010-09-01 2012-03-08 Iowa State University Research Foundation, Inc. Textured micrometer scale templates as light managing fabrication platform for organic solar cells
US20120024380A1 (en) 2010-10-27 2012-02-02 Primestar Solar, Inc. Intermixing of cadmium sulfide layers and cadmium telluride layers for thin film photovoltaic devices and methods of their manufacture
EP2647050B1 (en) 2010-12-03 2018-04-11 Novaled GmbH Method for forming an electrical interconnection in an organic photovoltaic device and an organic photovoltaic device made by the same
JP5595897B2 (ja) * 2010-12-24 2014-09-24 小島プレス工業株式会社 樹脂製品の製造方法
CA2872274C (en) * 2012-06-23 2016-11-29 Frito-Lay North America, Inc. Deposition of ultra-thin inorganic oxide coatings on packaging

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RU2666198C1 (ru) 2018-09-06
JP2017500448A (ja) 2017-01-05
KR102374881B1 (ko) 2022-03-15
EP3080331A1 (en) 2016-10-19
EP3080331B1 (en) 2024-12-18
AU2014360781A1 (en) 2016-04-21
US20150167170A1 (en) 2015-06-18
AU2014360781B2 (en) 2018-04-12
US9139908B2 (en) 2015-09-22

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