RU2666198C1 - Градиентные тонкие пленки - Google Patents
Градиентные тонкие пленки Download PDFInfo
- Publication number
- RU2666198C1 RU2666198C1 RU2016111166A RU2016111166A RU2666198C1 RU 2666198 C1 RU2666198 C1 RU 2666198C1 RU 2016111166 A RU2016111166 A RU 2016111166A RU 2016111166 A RU2016111166 A RU 2016111166A RU 2666198 C1 RU2666198 C1 RU 2666198C1
- Authority
- RU
- Russia
- Prior art keywords
- film
- chemical
- product
- composition
- relative
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 41
- 239000000203 mixture Substances 0.000 claims abstract description 113
- 239000000126 substance Substances 0.000 claims abstract description 94
- 239000000758 substrate Substances 0.000 claims abstract description 87
- 238000000034 method Methods 0.000 claims abstract description 72
- 238000000576 coating method Methods 0.000 claims abstract description 56
- 239000011248 coating agent Substances 0.000 claims abstract description 38
- 239000012707 chemical precursor Substances 0.000 claims abstract description 24
- 230000008569 process Effects 0.000 claims abstract description 19
- 230000008021 deposition Effects 0.000 claims abstract description 7
- 239000010408 film Substances 0.000 claims description 321
- 239000002243 precursor Substances 0.000 claims description 82
- 238000007750 plasma spraying Methods 0.000 claims description 27
- 230000008859 change Effects 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 20
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 12
- 239000001301 oxygen Substances 0.000 claims description 12
- 229910052760 oxygen Inorganic materials 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- 239000012159 carrier gas Substances 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 4
- 229910052755 nonmetal Inorganic materials 0.000 claims description 4
- 238000010790 dilution Methods 0.000 claims description 3
- 239000012895 dilution Substances 0.000 claims description 3
- 150000002843 nonmetals Chemical class 0.000 claims description 2
- 230000003628 erosive effect Effects 0.000 abstract description 13
- 230000000694 effects Effects 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 67
- 239000010410 layer Substances 0.000 description 41
- 238000005299 abrasion Methods 0.000 description 16
- 238000005516 engineering process Methods 0.000 description 16
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical compound C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 15
- 230000001681 protective effect Effects 0.000 description 14
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 11
- 239000001307 helium Substances 0.000 description 11
- 229910052734 helium Inorganic materials 0.000 description 11
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 11
- 229920000642 polymer Polymers 0.000 description 10
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 7
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 7
- 229910052786 argon Inorganic materials 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 238000012545 processing Methods 0.000 description 6
- 239000002356 single layer Substances 0.000 description 6
- -1 for example Substances 0.000 description 5
- 238000009501 film coating Methods 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 229920000307 polymer substrate Polymers 0.000 description 4
- 229920002972 Acrylic fiber Polymers 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000007888 film coating Substances 0.000 description 3
- 229910052756 noble gas Inorganic materials 0.000 description 3
- 150000002835 noble gases Chemical class 0.000 description 3
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 230000007704 transition Effects 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- GKWLILHTTGWKLQ-UHFFFAOYSA-N 2,3-dihydrothieno[3,4-b][1,4]dioxine Chemical compound O1CCOC2=CSC=C21 GKWLILHTTGWKLQ-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 239000011147 inorganic material Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- VOPWNXZWBYDODV-UHFFFAOYSA-N Chlorodifluoromethane Chemical compound FC(F)Cl VOPWNXZWBYDODV-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- XURCIPRUUASYLR-UHFFFAOYSA-N Omeprazole sulfide Chemical compound N=1C2=CC(OC)=CC=C2NC=1SCC1=NC=C(C)C(OC)=C1C XURCIPRUUASYLR-UHFFFAOYSA-N 0.000 description 1
- 241001465382 Physalis alkekengi Species 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- CUJRVFIICFDLGR-UHFFFAOYSA-N acetylacetonate Chemical compound CC(=O)[CH-]C(C)=O CUJRVFIICFDLGR-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000002318 adhesion promoter Substances 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 125000004773 chlorofluoromethyl group Chemical group [H]C(F)(Cl)* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- HQWPLXHWEZZGKY-UHFFFAOYSA-N diethylzinc Chemical compound CC[Zn]CC HQWPLXHWEZZGKY-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000004146 energy storage Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000007943 implant Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229910052743 krypton Inorganic materials 0.000 description 1
- DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 239000011185 multilayer composite material Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002902 organometallic compounds Chemical class 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000006641 stabilisation Effects 0.000 description 1
- 238000011105 stabilization Methods 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 150000003609 titanium compounds Chemical class 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- FOQJQXVUMYLJSU-UHFFFAOYSA-N triethoxy(1-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)C(C)[Si](OCC)(OCC)OCC FOQJQXVUMYLJSU-UHFFFAOYSA-N 0.000 description 1
- IZRJPHXTEXTLHY-UHFFFAOYSA-N triethoxy(2-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CC[Si](OCC)(OCC)OCC IZRJPHXTEXTLHY-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using DC or AC discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14/104,796 | 2013-12-12 | ||
| US14/104,796 US9139908B2 (en) | 2013-12-12 | 2013-12-12 | Gradient thin films |
| PCT/US2014/056467 WO2015088613A1 (en) | 2013-12-12 | 2014-09-19 | Gradient thin films |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| RU2666198C1 true RU2666198C1 (ru) | 2018-09-06 |
Family
ID=51660657
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2016111166A RU2666198C1 (ru) | 2013-12-12 | 2014-09-19 | Градиентные тонкие пленки |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9139908B2 (enExample) |
| EP (1) | EP3080331B1 (enExample) |
| JP (1) | JP6381649B2 (enExample) |
| KR (1) | KR102374881B1 (enExample) |
| CN (1) | CN105723013B (enExample) |
| AU (1) | AU2014360781B2 (enExample) |
| RU (1) | RU2666198C1 (enExample) |
| WO (1) | WO2015088613A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2702881C1 (ru) * | 2018-09-28 | 2019-10-11 | Общество с ограниченной ответственностью "Научно-производственное объединение "Защитные покрытия", ООО "НПО "Защитные покрытия" | Градиентное металлополимерное покрытие |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9869013B2 (en) * | 2014-04-25 | 2018-01-16 | Applied Materials, Inc. | Ion assisted deposition top coat of rare-earth oxide |
| WO2018130289A1 (en) * | 2017-01-12 | 2018-07-19 | Applied Materials, Inc. | Hardcoat layer system and method for manufacturing a hardcoat layer system in a continuous roll-to-roll process |
| US10985344B2 (en) | 2017-10-27 | 2021-04-20 | Applied Materials, Inc. | Flexible cover lens films |
| JP7716853B2 (ja) | 2018-05-10 | 2025-08-01 | アプライド マテリアルズ インコーポレイテッド | フレキシブルディスプレイ用の交換可能なカバーレンズ |
| WO2020036693A1 (en) | 2018-08-14 | 2020-02-20 | Applied Materials, Inc. | Multi-layer wet-dry hardcoats for flexible cover lens |
| CN113227909B (zh) | 2018-12-20 | 2025-07-04 | 朗姆研究公司 | 抗蚀剂的干式显影 |
| KR102780681B1 (ko) | 2019-06-26 | 2025-03-11 | 어플라이드 머티어리얼스, 인코포레이티드 | 폴더블 디스플레이들을 위한 플렉서블 다층 커버 렌즈 스택들 |
| TWI869221B (zh) | 2019-06-26 | 2025-01-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| JP7618601B2 (ja) * | 2019-06-28 | 2025-01-21 | ラム リサーチ コーポレーション | 複数のパターニング放射吸収元素および／または垂直組成勾配を備えたフォトレジスト |
| US20240117495A1 (en) * | 2019-10-14 | 2024-04-11 | Silcotek Corp. | Cold thermal chemical vapor deposition |
| KR20250007037A (ko) | 2020-01-15 | 2025-01-13 | 램 리써치 코포레이션 | 포토레지스트 부착 및 선량 감소를 위한 하부층 |
| CN116626993A (zh) | 2020-07-07 | 2023-08-22 | 朗姆研究公司 | 用于图案化辐射光致抗蚀剂图案化的集成干燥工艺 |
| JP7562696B2 (ja) | 2020-11-13 | 2024-10-07 | ラム リサーチ コーポレーション | フォトレジストのドライ除去用プロセスツール |
| DE102022105041A1 (de) * | 2022-03-03 | 2023-09-07 | IonKraft GmbH | Beschichtungstechnik für Kunststoffbehälter |
| BR102022012045A2 (pt) * | 2022-06-17 | 2024-01-02 | Autocoat Equipamentos E Processos De Deposição Ltda | Dispositivo para deposição de filmes finos por lâmina e processo derivado |
| CN117004920A (zh) * | 2023-07-28 | 2023-11-07 | 上海大学 | 一种梯度h-BNC纳米自清洁薄膜设计方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2189663C2 (ru) * | 1997-06-30 | 2002-09-20 | Мацушита Электрик Индастриал Ко., Лтд. | Способ и устройство для изготовления тонкой полупроводниковой пленки |
| WO2007067242A1 (en) * | 2005-12-08 | 2007-06-14 | Siemens Power Generation, Inc. | Stepped gradient fuel electrode and method for making the same |
| EP2194162A2 (de) * | 2008-12-06 | 2010-06-09 | Innovent e.V. | Verwendung einer Schicht |
| US20100279027A1 (en) * | 2009-05-04 | 2010-11-04 | Pingree Liam S C | System And Method For Applying Abrasion-Resistant Coatings |
| WO2011014974A1 (en) * | 2009-08-07 | 2011-02-10 | Oerlikon Trading Ag, Trübbach | Tribology combined with corrosion resistance: a new family of pvd- and pacvd coatings |
Family Cites Families (48)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1051393A (enExample) | 1964-08-28 | 1900-01-01 | ||
| US4414085A (en) * | 1981-10-08 | 1983-11-08 | Wickersham Charles E | Method of depositing a high-emissivity layer |
| DE3706340A1 (de) * | 1987-02-27 | 1988-09-08 | Winter & Sohn Ernst | Verfahren zum auftragen einer verschleissschutzschicht und danach hergestelltes erzeugnis |
| US5482602A (en) * | 1993-11-04 | 1996-01-09 | United Technologies Corporation | Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces |
| DE4445427C2 (de) * | 1994-12-20 | 1997-04-30 | Schott Glaswerke | Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht |
| US5926740A (en) * | 1997-10-27 | 1999-07-20 | Micron Technology, Inc. | Graded anti-reflective coating for IC lithography |
| JPH11124693A (ja) | 1997-10-20 | 1999-05-11 | Nippon Steel Corp | 精密機器用部材 |
| JP3782608B2 (ja) | 1998-05-22 | 2006-06-07 | キヤノン株式会社 | 薄膜材料および薄膜作成法 |
| JP2000256850A (ja) * | 1999-03-04 | 2000-09-19 | Riken Corp | ダイヤモンドライクカーボン薄膜及びその製造方法 |
| US6221737B1 (en) | 1999-09-30 | 2001-04-24 | Philips Electronics North America Corporation | Method of making semiconductor devices with graded top oxide and graded drift region |
| AU4901201A (en) | 1999-10-25 | 2001-07-03 | Rolls-Royce Corporation | Erosion-resistant coatings for organic matric composites |
| US20050268962A1 (en) | 2000-04-27 | 2005-12-08 | Russell Gaudiana | Flexible Photovoltaic cells, systems and methods |
| US20050257827A1 (en) | 2000-04-27 | 2005-11-24 | Russell Gaudiana | Rotational photovoltaic cells, systems and methods |
| US6962751B2 (en) * | 2001-06-13 | 2005-11-08 | Sumitomo Electric Industries, Ltd. | Amorphous carbon coated tools and method of producing the same |
| US6881475B2 (en) * | 2001-06-13 | 2005-04-19 | Sumitomo Electric Industries, Ltd | Amorphous carbon coated tool and fabrication method thereof |
| JP4151000B2 (ja) * | 2002-06-13 | 2008-09-17 | 株式会社オンワード技研 | ワークの表面処理方法と、その装置 |
| US6852920B2 (en) | 2002-06-22 | 2005-02-08 | Nanosolar, Inc. | Nano-architected/assembled solar electricity cell |
| US7713592B2 (en) * | 2003-02-04 | 2010-05-11 | Tegal Corporation | Nanolayer deposition process |
| US20050118502A1 (en) | 2003-11-27 | 2005-06-02 | Matsushita Electric Industrial Co., Ltd. | Energy device and method for producing the same |
| US20090026587A1 (en) * | 2004-01-14 | 2009-01-29 | International Business Machines Corporation | Gradient deposition of low-k cvd materials |
| KR20070037492A (ko) * | 2004-06-15 | 2007-04-04 | 에비자 테크놀로지, 인크. | 다성분 유전체 필름을 형성하기 위한 시스템 및 방법 |
| US20060210783A1 (en) * | 2005-03-18 | 2006-09-21 | Seder Thomas A | Coated article with anti-reflective coating and method of making same |
| US7700167B2 (en) | 2006-08-31 | 2010-04-20 | Honeywell International Inc. | Erosion-protective coatings on polymer-matrix composites and components incorporating such coated composites |
| WO2008114627A1 (ja) * | 2007-03-16 | 2008-09-25 | Konica Minolta Holdings, Inc. | 防汚性積層体及びディスプレイ用前面板 |
| US7615482B2 (en) * | 2007-03-23 | 2009-11-10 | International Business Machines Corporation | Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength |
| JP5407869B2 (ja) * | 2007-11-19 | 2014-02-05 | コニカミノルタ株式会社 | 撥水または防汚性物品、それを用いて構成された建築用窓ガラス、車両用窓ガラス、ディスプレイ部材、光学部品 |
| US20090301550A1 (en) | 2007-12-07 | 2009-12-10 | Sunprint Inc. | Focused acoustic printing of patterned photovoltaic materials |
| US8099792B1 (en) | 2008-01-07 | 2012-01-17 | Northwestern University | Methods and apparatus for spatially resolved photocurrent mapping of operating photovoltaic devices using atomic force photovoltaic microscopy |
| WO2009094663A2 (en) | 2008-01-25 | 2009-07-30 | University Of Washington | Photovoltaic devices having metal oxide electron-transport layers |
| US20090229667A1 (en) | 2008-03-14 | 2009-09-17 | Solarmer Energy, Inc. | Translucent solar cell |
| FR2931844B1 (fr) | 2008-06-02 | 2013-11-01 | Alex Hr Roustaei | Systemes pour la production de l'energie a la demande comme une source seule ou en assistance avec autres sources d'energie dans le domaine du transport ou de l'habitat. |
| DE102008028540A1 (de) * | 2008-06-16 | 2009-12-17 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zum Abscheiden einer Gradientenschicht auf einem Kunststoffsubstrat sowie Kunststoffsubstrat mit einer Gradientenschicht |
| DE102008033938B4 (de) | 2008-07-18 | 2012-04-19 | Innovent E.V. | Verfahren zur Abscheidung von Schichten auf einem Substrat |
| US20110253217A1 (en) | 2008-09-30 | 2011-10-20 | The Regents Of The University Of California | Controlled Alignment in Polymeric Solar Cells |
| US8269100B2 (en) | 2008-09-30 | 2012-09-18 | Uchicago Argonne, Llc | Hybrid solar cells via UV-polymerization of polymer precursor |
| KR20110094279A (ko) | 2008-10-31 | 2011-08-23 | 바스프 에스이 | 유기 태양 전지용 및 유기 광검출기용 광활성 층 제조를 위한 메로시아닌 |
| FR2956869B1 (fr) | 2010-03-01 | 2014-05-16 | Alex Hr Roustaei | Systeme de production de film flexible a haute capacite destine a des cellules photovoltaiques et oled par deposition cyclique des couches |
| JP2012519965A (ja) | 2009-03-06 | 2012-08-30 | ユニバーシティ オブ フロリダ リサーチ ファウンデーション，インク． | 空気安定性有機−無機ナノ粒子ハイブリッド太陽電池 |
| JP5222764B2 (ja) * | 2009-03-24 | 2013-06-26 | 株式会社神戸製鋼所 | 積層皮膜および積層皮膜被覆部材 |
| CN101560653A (zh) * | 2009-05-14 | 2009-10-21 | 浙江大学 | 梯度折射率薄膜的制备方法 |
| US20110030770A1 (en) | 2009-08-04 | 2011-02-10 | Molecular Imprints, Inc. | Nanostructured organic solar cells |
| WO2011045253A1 (de) | 2009-10-13 | 2011-04-21 | Basf Se | Mischungen zur herstellung von photoaktiven schichten für organische solarzellen und organische photodetektoren |
| US8871884B2 (en) | 2009-10-28 | 2014-10-28 | University Of Washington | Copolymer semiconductors comprising thiazolothiazole or benzobisthiazole, or benzobisoxazole electron acceptor subunits, and electron donor subunits, and their uses in transistors and solar cells |
| WO2012031083A2 (en) | 2010-09-01 | 2012-03-08 | Iowa State University Research Foundation, Inc. | Textured micrometer scale templates as light managing fabrication platform for organic solar cells |
| US20120024380A1 (en) | 2010-10-27 | 2012-02-02 | Primestar Solar, Inc. | Intermixing of cadmium sulfide layers and cadmium telluride layers for thin film photovoltaic devices and methods of their manufacture |
| EP2647050B1 (en) | 2010-12-03 | 2018-04-11 | Novaled GmbH | Method for forming an electrical interconnection in an organic photovoltaic device and an organic photovoltaic device made by the same |
| JP5595897B2 (ja) * | 2010-12-24 | 2014-09-24 | 小島プレス工業株式会社 | 樹脂製品の製造方法 |
| CA2872274C (en) * | 2012-06-23 | 2016-11-29 | Frito-Lay North America, Inc. | Deposition of ultra-thin inorganic oxide coatings on packaging |
-
2013
- 2013-12-12 US US14/104,796 patent/US9139908B2/en active Active
-
2014
- 2014-09-19 KR KR1020167009588A patent/KR102374881B1/ko active Active
- 2014-09-19 AU AU2014360781A patent/AU2014360781B2/en active Active
- 2014-09-19 RU RU2016111166A patent/RU2666198C1/ru active
- 2014-09-19 JP JP2016538729A patent/JP6381649B2/ja active Active
- 2014-09-19 EP EP14780989.1A patent/EP3080331B1/en active Active
- 2014-09-19 CN CN201480062243.6A patent/CN105723013B/zh active Active
- 2014-09-19 WO PCT/US2014/056467 patent/WO2015088613A1/en not_active Ceased
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2189663C2 (ru) * | 1997-06-30 | 2002-09-20 | Мацушита Электрик Индастриал Ко., Лтд. | Способ и устройство для изготовления тонкой полупроводниковой пленки |
| WO2007067242A1 (en) * | 2005-12-08 | 2007-06-14 | Siemens Power Generation, Inc. | Stepped gradient fuel electrode and method for making the same |
| EP2194162A2 (de) * | 2008-12-06 | 2010-06-09 | Innovent e.V. | Verwendung einer Schicht |
| US20100279027A1 (en) * | 2009-05-04 | 2010-11-04 | Pingree Liam S C | System And Method For Applying Abrasion-Resistant Coatings |
| WO2011014974A1 (en) * | 2009-08-07 | 2011-02-10 | Oerlikon Trading Ag, Trübbach | Tribology combined with corrosion resistance: a new family of pvd- and pacvd coatings |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2702881C1 (ru) * | 2018-09-28 | 2019-10-11 | Общество с ограниченной ответственностью "Научно-производственное объединение "Защитные покрытия", ООО "НПО "Защитные покрытия" | Градиентное металлополимерное покрытие |
Also Published As
| Publication number | Publication date |
|---|---|
| CN105723013B (zh) | 2018-01-16 |
| KR20160098165A (ko) | 2016-08-18 |
| CN105723013A (zh) | 2016-06-29 |
| WO2015088613A1 (en) | 2015-06-18 |
| JP2017500448A (ja) | 2017-01-05 |
| KR102374881B1 (ko) | 2022-03-15 |
| EP3080331A1 (en) | 2016-10-19 |
| EP3080331B1 (en) | 2024-12-18 |
| AU2014360781A1 (en) | 2016-04-21 |
| US20150167170A1 (en) | 2015-06-18 |
| AU2014360781B2 (en) | 2018-04-12 |
| JP6381649B2 (ja) | 2018-08-29 |
| US9139908B2 (en) | 2015-09-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| RU2666198C1 (ru) | Градиентные тонкие пленки | |
| Teshima et al. | Transparent ultra water-repellent poly (ethylene terephthalate) substrates fabricated by oxygen plasma treatment and subsequent hydrophobic coating | |
| Cao et al. | Fabrication of highly antireflective silicon surfaces with superhydrophobicity | |
| US20130209780A1 (en) | Tunable nanoporous films on polymer substrates, and method for their manufacture | |
| CN105018928B (zh) | 用于异形金属上的纳米表面镀层的镀膜方法 | |
| AU2010219836A1 (en) | Slot die coating process | |
| WO2022007555A1 (zh) | 超疏水膜层及其制备方法和产品 | |
| TWI424185B (zh) | 抗反射板及其抗反射結構之製造方法 | |
| Tsuge et al. | Fabrication of transparent TiO2 film with high adhesion by using self-assembly methods: Application to super-hydrophilic film | |
| JP6022629B2 (ja) | コーティング方法 | |
| JPWO2010125964A1 (ja) | 撥水部材および車載用ガラス | |
| Psarski et al. | Hydrophobic and superhydrophobic surfaces fabricated by plasma polymerization of perfluorohexane, perfluoro (2-methylpent-2-ene), and perfluoro (4-methylpent-2-ene) | |
| US20090311539A1 (en) | Wear-resistant coating for polymeric transparencies | |
| Maula | Atomic layer deposition for industrial optical coatings | |
| Kleines et al. | Evaluation of the membrane performance of ultra-smooth silicon organic coatings depending on the process energy density | |
| TWI432595B (zh) | 基板塗層及其形成方法 | |
| CN110465203A (zh) | 提高抗污膜的附着力的方法 | |
| Schäfer et al. | Complex analysis of SiOxCyHz films deposited by an atmospheric pressure dielectric barrier discharge | |
| Choi et al. | Scratch-resistant hydrophobic and oleophobic coatings prepared by simple PECVD method | |
| GB2518358A (en) | Glass preforms for molding and a method of molding glass articles | |
| Jiang et al. | Development of durable nanostructured superhydrophobic self-cleaning surfaces on glass substrates | |
| Ye et al. | Influences of pulse frequency on structure and mechanical properties of DLC films synthesized by pulsed cathodic arc evaporation | |
| Dobrzanski et al. | The impact of atomic layer deposition technological parameters on optical properties and morphology of Al2O3 thin films | |
| Alcott | Plasma deposition of nanocomposite thin films: Process concept and realisation | |
| CN119980180A (zh) | 在玻璃表面制备类金刚石保护膜的制备方法、类金刚石保护膜及玻璃 |