JP2017500448A5 - - Google Patents

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JP2017500448A5
JP2017500448A5 JP2016538729A JP2016538729A JP2017500448A5 JP 2017500448 A5 JP2017500448 A5 JP 2017500448A5 JP 2016538729 A JP2016538729 A JP 2016538729A JP 2016538729 A JP2016538729 A JP 2016538729A JP 2017500448 A5 JP2017500448 A5 JP 2017500448A5
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Japan
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film
article
chemical
vertical
interface
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JP2016538729A
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Japanese (ja)
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JP2017500448A (ja
JP6381649B2 (ja
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Priority claimed from US14/104,796 external-priority patent/US9139908B2/en
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JP2016538729A 2013-12-12 2014-09-19 傾斜薄膜 Active JP6381649B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14/104,796 US9139908B2 (en) 2013-12-12 2013-12-12 Gradient thin films
US14/104,796 2013-12-12
PCT/US2014/056467 WO2015088613A1 (en) 2013-12-12 2014-09-19 Gradient thin films

Publications (3)

Publication Number Publication Date
JP2017500448A JP2017500448A (ja) 2017-01-05
JP2017500448A5 true JP2017500448A5 (enExample) 2017-11-02
JP6381649B2 JP6381649B2 (ja) 2018-08-29

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ID=51660657

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JP2016538729A Active JP6381649B2 (ja) 2013-12-12 2014-09-19 傾斜薄膜

Country Status (8)

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US (1) US9139908B2 (enExample)
EP (1) EP3080331B1 (enExample)
JP (1) JP6381649B2 (enExample)
KR (1) KR102374881B1 (enExample)
CN (1) CN105723013B (enExample)
AU (1) AU2014360781B2 (enExample)
RU (1) RU2666198C1 (enExample)
WO (1) WO2015088613A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9869013B2 (en) * 2014-04-25 2018-01-16 Applied Materials, Inc. Ion assisted deposition top coat of rare-earth oxide
WO2018130289A1 (en) * 2017-01-12 2018-07-19 Applied Materials, Inc. Hardcoat layer system and method for manufacturing a hardcoat layer system in a continuous roll-to-roll process
EP4614199A3 (en) 2017-10-27 2025-11-19 Applied Materials Inc; Flexible cover lens films
KR102691346B1 (ko) 2018-05-10 2024-08-05 어플라이드 머티어리얼스, 인코포레이티드 플렉서블 디스플레이를 위한 교체가능한 커버 렌즈
WO2020036693A1 (en) 2018-08-14 2020-02-20 Applied Materials, Inc. Multi-layer wet-dry hardcoats for flexible cover lens
RU2702881C1 (ru) * 2018-09-28 2019-10-11 Общество с ограниченной ответственностью "Научно-производственное объединение "Защитные покрытия", ООО "НПО "Защитные покрытия" Градиентное металлополимерное покрытие
CN120762258A (zh) 2018-12-20 2025-10-10 朗姆研究公司 抗蚀剂的干式显影
TWI910974B (zh) 2019-06-26 2026-01-01 美商蘭姆研究公司 利用鹵化物化學品的光阻顯影
WO2020263628A1 (en) 2019-06-26 2020-12-30 Applied Materials, Inc. Flexible multi-layered cover lens stacks for foldable displays
KR20250160237A (ko) * 2019-06-28 2025-11-11 램 리써치 코포레이션 복수의 패터닝 복사-흡수 엘리먼트들 및/또는 수직 조성 경사를 갖는 포토레지스트
TWI849159B (zh) 2019-06-28 2024-07-21 美商蘭姆研究公司 光阻膜的乾式腔室清潔
US20240117495A1 (en) * 2019-10-14 2024-04-11 Silcotek Corp. Cold thermal chemical vapor deposition
CN114200776A (zh) 2020-01-15 2022-03-18 朗姆研究公司 用于光刻胶粘附和剂量减少的底层
KR102601038B1 (ko) 2020-07-07 2023-11-09 램 리써치 코포레이션 방사선 포토레지스트 패터닝을 패터닝하기 위한 통합된 건식 프로세스
KR102673863B1 (ko) 2020-11-13 2024-06-11 램 리써치 코포레이션 포토레지스트의 건식 제거를 위한 프로세스 툴
DE102022105041A1 (de) * 2022-03-03 2023-09-07 IonKraft GmbH Beschichtungstechnik für Kunststoffbehälter
BR102022012045A2 (pt) * 2022-06-17 2024-01-02 Autocoat Equipamentos E Processos De Deposição Ltda Dispositivo para deposição de filmes finos por lâmina e processo derivado
AT526238B1 (de) * 2022-08-09 2024-01-15 Thermal Proc Solutions Gmbh Vorrichtung zur Bereitstellung eines Plasmas
CN117004920A (zh) * 2023-07-28 2023-11-07 上海大学 一种梯度h-BNC纳米自清洁薄膜设计方法

Family Cites Families (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1051393A (enExample) 1964-08-28 1900-01-01
US4414085A (en) * 1981-10-08 1983-11-08 Wickersham Charles E Method of depositing a high-emissivity layer
DE3706340A1 (de) * 1987-02-27 1988-09-08 Winter & Sohn Ernst Verfahren zum auftragen einer verschleissschutzschicht und danach hergestelltes erzeugnis
US5482602A (en) * 1993-11-04 1996-01-09 United Technologies Corporation Broad-beam ion deposition coating methods for depositing diamond-like-carbon coatings on dynamic surfaces
DE4445427C2 (de) * 1994-12-20 1997-04-30 Schott Glaswerke Plasma-CVD-Verfahren zur Herstellung einer Gradientenschicht
KR100325500B1 (ko) * 1997-06-30 2002-02-25 모리시타 요이찌 반도체 박막의 제조 방법 및 그 장치
US5926740A (en) * 1997-10-27 1999-07-20 Micron Technology, Inc. Graded anti-reflective coating for IC lithography
JPH11124693A (ja) 1997-10-20 1999-05-11 Nippon Steel Corp 精密機器用部材
JP3782608B2 (ja) 1998-05-22 2006-06-07 キヤノン株式会社 薄膜材料および薄膜作成法
JP2000256850A (ja) * 1999-03-04 2000-09-19 Riken Corp ダイヤモンドライクカーボン薄膜及びその製造方法
US6221737B1 (en) 1999-09-30 2001-04-24 Philips Electronics North America Corporation Method of making semiconductor devices with graded top oxide and graded drift region
AU4901201A (en) 1999-10-25 2001-07-03 Rolls-Royce Corporation Erosion-resistant coatings for organic matric composites
US20050257827A1 (en) 2000-04-27 2005-11-24 Russell Gaudiana Rotational photovoltaic cells, systems and methods
US20050268962A1 (en) 2000-04-27 2005-12-08 Russell Gaudiana Flexible Photovoltaic cells, systems and methods
US6881475B2 (en) * 2001-06-13 2005-04-19 Sumitomo Electric Industries, Ltd Amorphous carbon coated tool and fabrication method thereof
US6962751B2 (en) * 2001-06-13 2005-11-08 Sumitomo Electric Industries, Ltd. Amorphous carbon coated tools and method of producing the same
JP4151000B2 (ja) * 2002-06-13 2008-09-17 株式会社オンワード技研 ワークの表面処理方法と、その装置
US6852920B2 (en) 2002-06-22 2005-02-08 Nanosolar, Inc. Nano-architected/assembled solar electricity cell
US7713592B2 (en) * 2003-02-04 2010-05-11 Tegal Corporation Nanolayer deposition process
US20050118502A1 (en) 2003-11-27 2005-06-02 Matsushita Electric Industrial Co., Ltd. Energy device and method for producing the same
WO2005071752A1 (en) * 2004-01-14 2005-08-04 International Business Machines Corporation Gradient deposition of low-k cvd materials
CN101014730A (zh) * 2004-06-15 2007-08-08 阿维扎技术公司 用于形成多组分介电膜的系统和方法
US20060210783A1 (en) * 2005-03-18 2006-09-21 Seder Thomas A Coated article with anti-reflective coating and method of making same
US7637967B2 (en) * 2005-12-08 2009-12-29 Siemens Energy, Inc. Stepped gradient fuel electrode and method for making the same
US7700167B2 (en) 2006-08-31 2010-04-20 Honeywell International Inc. Erosion-protective coatings on polymer-matrix composites and components incorporating such coated composites
WO2008114627A1 (ja) * 2007-03-16 2008-09-25 Konica Minolta Holdings, Inc. 防汚性積層体及びディスプレイ用前面板
US7615482B2 (en) * 2007-03-23 2009-11-10 International Business Machines Corporation Structure and method for porous SiCOH dielectric layers and adhesion promoting or etch stop layers having increased interfacial and mechanical strength
WO2009066630A1 (ja) * 2007-11-19 2009-05-28 Konica Minolta Holdings, Inc. 撥水または防汚性物品、それを用いて構成された建築用窓ガラス、車両用窓ガラス、ディスプレイ部材、光学部品
WO2009073862A1 (en) 2007-12-07 2009-06-11 Sunprint Inc. Focused acoustic printing of patterned photovoltaic materials
US8099792B1 (en) 2008-01-07 2012-01-17 Northwestern University Methods and apparatus for spatially resolved photocurrent mapping of operating photovoltaic devices using atomic force photovoltaic microscopy
US20090188558A1 (en) 2008-01-25 2009-07-30 University Of Washington Photovoltaic devices having metal oxide electron-transport layers
US20090229667A1 (en) 2008-03-14 2009-09-17 Solarmer Energy, Inc. Translucent solar cell
FR2931844B1 (fr) 2008-06-02 2013-11-01 Alex Hr Roustaei Systemes pour la production de l'energie a la demande comme une source seule ou en assistance avec autres sources d'energie dans le domaine du transport ou de l'habitat.
DE102008028540A1 (de) * 2008-06-16 2009-12-17 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden einer Gradientenschicht auf einem Kunststoffsubstrat sowie Kunststoffsubstrat mit einer Gradientenschicht
DE102008033938B4 (de) 2008-07-18 2012-04-19 Innovent E.V. Verfahren zur Abscheidung von Schichten auf einem Substrat
US8269100B2 (en) 2008-09-30 2012-09-18 Uchicago Argonne, Llc Hybrid solar cells via UV-polymerization of polymer precursor
WO2010039634A1 (en) 2008-09-30 2010-04-08 The Regents Of The University Of California Controlled alignment in polymeric solar cells
KR20110094279A (ko) 2008-10-31 2011-08-23 바스프 에스이 유기 태양 전지용 및 유기 광검출기용 광활성 층 제조를 위한 메로시아닌
DE102008060923B4 (de) 2008-12-06 2012-09-27 Innovent E.V. Verwendung einer Schicht
FR2956869B1 (fr) 2010-03-01 2014-05-16 Alex Hr Roustaei Systeme de production de film flexible a haute capacite destine a des cellules photovoltaiques et oled par deposition cyclique des couches
KR20120002583A (ko) 2009-03-06 2012-01-06 유니버시티 오브 플로리다 리서치 파운데이션, 인크. 공기 중에 안정한 유-무기 나노입자 하이브리드 태양전지
JP5222764B2 (ja) * 2009-03-24 2013-06-26 株式会社神戸製鋼所 積層皮膜および積層皮膜被覆部材
US8206794B2 (en) * 2009-05-04 2012-06-26 The Boeing Company System and method for applying abrasion-resistant coatings
CN101560653A (zh) * 2009-05-14 2009-10-21 浙江大学 梯度折射率薄膜的制备方法
US20110030770A1 (en) 2009-08-04 2011-02-10 Molecular Imprints, Inc. Nanostructured organic solar cells
KR101707259B1 (ko) * 2009-08-07 2017-02-15 오를리콘 서피스 솔루션스 아크티엔게젤샤프트, 페피콘 내식성과 결합한 트라이볼로지: ｐｖｄ 및 ｐａｃｖｄ 코팅
US9368729B2 (en) 2009-10-13 2016-06-14 Basf Se Mixtures for producing photoactive layers for organic solar cells and organic photodetectors
KR20120101412A (ko) 2009-10-28 2012-09-13 유니버시티 오브 워싱톤 티아졸로티아졸 또는 벤조비스티아졸을 포함하는 공중합체 반도체, 또는 벤조비스옥사졸 전자수용체 소단위, 및 전자공여체 소단위, 그리고 트랜지스터와 태양전지에서 이들의 용도
US9401442B2 (en) 2010-09-01 2016-07-26 Iowa State University Research Foundation, Inc. Textured micrometer scale templates as light managing fabrication platform for organic solar cells
US20120024380A1 (en) 2010-10-27 2012-02-02 Primestar Solar, Inc. Intermixing of cadmium sulfide layers and cadmium telluride layers for thin film photovoltaic devices and methods of their manufacture
US20140000684A1 (en) 2010-12-03 2014-01-02 Jan Blochwitz-Nimoth Method for forming an electrical interconnection in an organic photovoltaic device and an organic photovoltaic device made by the same
JP5595897B2 (ja) * 2010-12-24 2014-09-24 小島プレス工業株式会社 樹脂製品の製造方法
US9284104B2 (en) * 2012-06-23 2016-03-15 Frito-Lay North America, Inc. Deposition of ultra-thin inorganic oxide coatings on packaging

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