JP2012526190A5 - - Google Patents

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Publication number
JP2012526190A5
JP2012526190A5 JP2012508520A JP2012508520A JP2012526190A5 JP 2012526190 A5 JP2012526190 A5 JP 2012526190A5 JP 2012508520 A JP2012508520 A JP 2012508520A JP 2012508520 A JP2012508520 A JP 2012508520A JP 2012526190 A5 JP2012526190 A5 JP 2012526190A5
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JP
Japan
Prior art keywords
atmospheric pressure
pressure plasma
plasma
substrate
precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012508520A
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English (en)
Japanese (ja)
Other versions
JP2012526190A (ja
JP5728469B2 (ja
Filing date
Publication date
Priority claimed from US12/435,110 external-priority patent/US8206794B2/en
Application filed filed Critical
Publication of JP2012526190A publication Critical patent/JP2012526190A/ja
Publication of JP2012526190A5 publication Critical patent/JP2012526190A5/ja
Application granted granted Critical
Publication of JP5728469B2 publication Critical patent/JP5728469B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012508520A 2009-05-04 2010-04-14 コーティング方法 Active JP5728469B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/435,110 2009-05-04
US12/435,110 US8206794B2 (en) 2009-05-04 2009-05-04 System and method for applying abrasion-resistant coatings
PCT/US2010/031095 WO2010129149A1 (en) 2009-05-04 2010-04-14 Coating method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015075082A Division JP6022629B2 (ja) 2009-05-04 2015-04-01 コーティング方法

Publications (3)

Publication Number Publication Date
JP2012526190A JP2012526190A (ja) 2012-10-25
JP2012526190A5 true JP2012526190A5 (enExample) 2013-05-30
JP5728469B2 JP5728469B2 (ja) 2015-06-03

Family

ID=42269774

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2012508520A Active JP5728469B2 (ja) 2009-05-04 2010-04-14 コーティング方法
JP2015075082A Active JP6022629B2 (ja) 2009-05-04 2015-04-01 コーティング方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015075082A Active JP6022629B2 (ja) 2009-05-04 2015-04-01 コーティング方法

Country Status (6)

Country Link
US (1) US8206794B2 (enExample)
EP (1) EP2430211A1 (enExample)
JP (2) JP5728469B2 (enExample)
KR (3) KR20190122273A (enExample)
CN (1) CN102414341A (enExample)
WO (1) WO2010129149A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2747921B1 (en) * 2011-08-26 2017-11-01 Exatec, LLC. Organic resin laminate, methods of making and using the same, and articles comprising the same
US20130115867A1 (en) * 2011-11-08 2013-05-09 General Electric Company Enclosure system and method for applying coating
US10787591B2 (en) * 2012-04-30 2020-09-29 The Boeing Company Composites including silicon-oxy-carbide layers and methods of making the same
AU2013309311B2 (en) 2012-08-29 2015-06-25 Cardiac Pacemakers, Inc. Enhanced low friction coating for medical leads and methods of making
US9139908B2 (en) * 2013-12-12 2015-09-22 The Boeing Company Gradient thin films
EP3992330A1 (en) * 2020-10-29 2022-05-04 PartiX Powder coating method

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4770940A (en) * 1984-09-10 1988-09-13 Ovonic Synthetic Materials Company Glow discharge method of applying a carbon coating onto a substrate and coating applied thereby
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5344712A (en) 1990-06-29 1994-09-06 Ppg Industries, Inc. Abrasion resistant siloxane coatings containing ceria
US5433786A (en) * 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
FR2711556B1 (fr) 1993-10-29 1995-12-15 Atohaas Holding Cv Procédé de dépôt d'une couche mince sur la surface d'un substrat en matière plastique.
US5508368A (en) 1994-03-03 1996-04-16 Diamonex, Incorporated Ion beam process for deposition of highly abrasion-resistant coatings
JPH10119336A (ja) * 1996-10-23 1998-05-12 Alps Electric Co Ltd サーマルヘッド及びその製造方法
US6010967A (en) * 1998-05-22 2000-01-04 Micron Technology, Inc. Plasma etching methods
EP1077479A1 (en) * 1999-08-17 2001-02-21 Applied Materials, Inc. Post-deposition treatment to enchance properties of Si-O-C low K film
US6495208B1 (en) * 1999-09-09 2002-12-17 Virginia Tech Intellectual Properties, Inc. Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites
DE10131156A1 (de) 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
FR2843408B1 (fr) * 2002-08-06 2005-04-08 Saint Gobain Procede de formation d'un revetement sur un vitrage en matiere plastique
AU2003260000A1 (en) * 2002-08-26 2004-03-11 Sigma Technologies International, Inc. Barrier coatings produced by atmospheric glow discharge
US7468311B2 (en) * 2003-09-30 2008-12-23 Tokyo Electron Limited Deposition of silicon-containing films from hexachlorodisilane
EP1702010A4 (en) * 2003-12-16 2008-12-31 Sun Chemical Corp METHOD FOR FORMING A RADIATION-RESISTABLE COATING AND A COATED ARTICLE
EP1725698A1 (en) * 2004-03-09 2006-11-29 Exatec, LLC. Expanding thermal plasma deposition system
US7030041B2 (en) * 2004-03-15 2006-04-18 Applied Materials Inc. Adhesion improvement for low k dielectrics
GB0410749D0 (en) * 2004-05-14 2004-06-16 Dow Corning Ireland Ltd Coating apparatus
US20060063015A1 (en) * 2004-09-23 2006-03-23 3M Innovative Properties Company Protected polymeric film
MX2007005122A (es) * 2004-10-29 2007-06-22 Dow Global Technologies Inc Procedimiento de vapor quimico mejorado de plasma de velocidad de deposicion mejorada.
MX2007005123A (es) * 2004-10-29 2007-06-25 Dow Global Technologies Inc Revestimientos resistentes a la abrasion a traves de deposicion de vapor quimica mejorada de plasma.
JP2006175583A (ja) 2004-11-29 2006-07-06 Chemitoronics Co Ltd マイクロ構造体の製造方法
US8216679B2 (en) * 2005-07-27 2012-07-10 Exatec Llc Glazing system for vehicle tops and windows
US8313812B2 (en) 2005-11-30 2012-11-20 The Boeing Company Durable transparent coatings for aircraft passenger windows
US20070196633A1 (en) 2005-11-30 2007-08-23 Coak Craig E Durable transparent coatings for polymeric substrates
JP2007216435A (ja) * 2006-02-14 2007-08-30 Tomoegawa Paper Co Ltd ガスバリアフィルム基板、電極付きガスバリアフィルム基板、及びそれらを用いた表示素子
JP4968883B2 (ja) * 2006-03-30 2012-07-04 日本碍子株式会社 リモート式プラズマ処理装置
KR100914354B1 (ko) * 2006-06-05 2009-08-28 어플라이드 머티어리얼스, 인코포레이티드 Pecvd막에 대한 1차 웨이퍼 효과 제거
JPWO2008047549A1 (ja) * 2006-10-12 2010-02-25 コニカミノルタホールディングス株式会社 透明導電膜基板及びこれに用いる酸化チタン系透明導電膜の形成方法
US7410916B2 (en) * 2006-11-21 2008-08-12 Applied Materials, Inc. Method of improving initiation layer for low-k dielectric film by digital liquid flow meter
KR101498748B1 (ko) * 2007-05-01 2015-03-09 엑사테크 엘.엘.씨. 플라즈마 코팅의 엣지 힐링 및 필드 보수
CN101688306B (zh) * 2007-05-17 2011-08-17 埃克阿泰克有限责任公司 用于在共用等离子涂覆区沉积多种涂覆材料的装置与方法
GB0717430D0 (en) * 2007-09-10 2007-10-24 Dow Corning Ireland Ltd Atmospheric pressure plasma

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