JP2012526190A5 - - Google Patents

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Publication number
JP2012526190A5
JP2012526190A5 JP2012508520A JP2012508520A JP2012526190A5 JP 2012526190 A5 JP2012526190 A5 JP 2012526190A5 JP 2012508520 A JP2012508520 A JP 2012508520A JP 2012508520 A JP2012508520 A JP 2012508520A JP 2012526190 A5 JP2012526190 A5 JP 2012526190A5
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JP
Japan
Prior art keywords
atmospheric pressure
pressure plasma
plasma
substrate
precursor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2012508520A
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English (en)
Japanese (ja)
Other versions
JP5728469B2 (ja
JP2012526190A (ja
Filing date
Publication date
Priority claimed from US12/435,110 external-priority patent/US8206794B2/en
Application filed filed Critical
Publication of JP2012526190A publication Critical patent/JP2012526190A/ja
Publication of JP2012526190A5 publication Critical patent/JP2012526190A5/ja
Application granted granted Critical
Publication of JP5728469B2 publication Critical patent/JP5728469B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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JP2012508520A 2009-05-04 2010-04-14 コーティング方法 Active JP5728469B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/435,110 2009-05-04
US12/435,110 US8206794B2 (en) 2009-05-04 2009-05-04 System and method for applying abrasion-resistant coatings
PCT/US2010/031095 WO2010129149A1 (en) 2009-05-04 2010-04-14 Coating method

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015075082A Division JP6022629B2 (ja) 2009-05-04 2015-04-01 コーティング方法

Publications (3)

Publication Number Publication Date
JP2012526190A JP2012526190A (ja) 2012-10-25
JP2012526190A5 true JP2012526190A5 (enExample) 2013-05-30
JP5728469B2 JP5728469B2 (ja) 2015-06-03

Family

ID=42269774

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2012508520A Active JP5728469B2 (ja) 2009-05-04 2010-04-14 コーティング方法
JP2015075082A Active JP6022629B2 (ja) 2009-05-04 2015-04-01 コーティング方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2015075082A Active JP6022629B2 (ja) 2009-05-04 2015-04-01 コーティング方法

Country Status (6)

Country Link
US (1) US8206794B2 (enExample)
EP (1) EP2430211A1 (enExample)
JP (2) JP5728469B2 (enExample)
KR (3) KR20190122273A (enExample)
CN (1) CN102414341A (enExample)
WO (1) WO2010129149A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101702471B1 (ko) * 2011-08-26 2017-02-03 엑사테크 엘.엘.씨. 유기 수지 라미네이트, 이의 제조 및 이용 방법, 및 이를 포함하는 제품
US20130115867A1 (en) * 2011-11-08 2013-05-09 General Electric Company Enclosure system and method for applying coating
US10787591B2 (en) 2012-04-30 2020-09-29 The Boeing Company Composites including silicon-oxy-carbide layers and methods of making the same
US9180289B2 (en) 2012-08-29 2015-11-10 Cardiac Pacemakers, Inc. Enhanced low friction coating for medical leads and methods of making
US9139908B2 (en) 2013-12-12 2015-09-22 The Boeing Company Gradient thin films
EP3992330A1 (en) * 2020-10-29 2022-05-04 PartiX Powder coating method

Family Cites Families (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4770940A (en) * 1984-09-10 1988-09-13 Ovonic Synthetic Materials Company Glow discharge method of applying a carbon coating onto a substrate and coating applied thereby
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5344712A (en) * 1990-06-29 1994-09-06 Ppg Industries, Inc. Abrasion resistant siloxane coatings containing ceria
US5433786A (en) * 1993-08-27 1995-07-18 The Dow Chemical Company Apparatus for plasma enhanced chemical vapor deposition comprising shower head electrode with magnet disposed therein
FR2711556B1 (fr) * 1993-10-29 1995-12-15 Atohaas Holding Cv Procédé de dépôt d'une couche mince sur la surface d'un substrat en matière plastique.
US5508368A (en) * 1994-03-03 1996-04-16 Diamonex, Incorporated Ion beam process for deposition of highly abrasion-resistant coatings
JPH10119336A (ja) * 1996-10-23 1998-05-12 Alps Electric Co Ltd サーマルヘッド及びその製造方法
US6010967A (en) * 1998-05-22 2000-01-04 Micron Technology, Inc. Plasma etching methods
EP1077479A1 (en) * 1999-08-17 2001-02-21 Applied Materials, Inc. Post-deposition treatment to enchance properties of Si-O-C low K film
US6495208B1 (en) * 1999-09-09 2002-12-17 Virginia Tech Intellectual Properties, Inc. Near-room temperature CVD synthesis of organic polymer/oxide dielectric nanocomposites
DE10131156A1 (de) * 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
TW200409669A (en) * 2002-04-10 2004-06-16 Dow Corning Ireland Ltd Protective coating composition
FR2843408B1 (fr) * 2002-08-06 2005-04-08 Saint Gobain Procede de formation d'un revetement sur un vitrage en matiere plastique
AU2003260000A1 (en) * 2002-08-26 2004-03-11 Sigma Technologies International, Inc. Barrier coatings produced by atmospheric glow discharge
US7468311B2 (en) * 2003-09-30 2008-12-23 Tokyo Electron Limited Deposition of silicon-containing films from hexachlorodisilane
EP1702010A4 (en) * 2003-12-16 2008-12-31 Sun Chemical Corp METHOD FOR FORMING A RADIATION-RESISTABLE COATING AND A COATED ARTICLE
WO2005087977A1 (en) * 2004-03-09 2005-09-22 Exatec, Llc Expanding thermal plasma deposition system
US7030041B2 (en) * 2004-03-15 2006-04-18 Applied Materials Inc. Adhesion improvement for low k dielectrics
GB0410749D0 (en) * 2004-05-14 2004-06-16 Dow Corning Ireland Ltd Coating apparatus
US20060063015A1 (en) * 2004-09-23 2006-03-23 3M Innovative Properties Company Protected polymeric film
CA2582302A1 (en) * 2004-10-29 2006-05-11 Dow Global Technologies Inc. Improved deposition rate plasma enhanced chemical vapor process
EP1807548A2 (en) * 2004-10-29 2007-07-18 Dow Gloval Technologies Inc. Abrasion resistant coatings by plasma enhanced chemical vapor deposition
JP2006175583A (ja) 2004-11-29 2006-07-06 Chemitoronics Co Ltd マイクロ構造体の製造方法
US8216679B2 (en) * 2005-07-27 2012-07-10 Exatec Llc Glazing system for vehicle tops and windows
US20070196633A1 (en) * 2005-11-30 2007-08-23 Coak Craig E Durable transparent coatings for polymeric substrates
US8313812B2 (en) * 2005-11-30 2012-11-20 The Boeing Company Durable transparent coatings for aircraft passenger windows
JP2007216435A (ja) * 2006-02-14 2007-08-30 Tomoegawa Paper Co Ltd ガスバリアフィルム基板、電極付きガスバリアフィルム基板、及びそれらを用いた表示素子
JP4968883B2 (ja) * 2006-03-30 2012-07-04 日本碍子株式会社 リモート式プラズマ処理装置
KR100914354B1 (ko) * 2006-06-05 2009-08-28 어플라이드 머티어리얼스, 인코포레이티드 Ｐｅｃｖｄ막에 대한 1차 웨이퍼 효과 제거
WO2008047549A1 (fr) * 2006-10-12 2008-04-24 Konica Minolta Holdings, Inc. Substrat de film conducteur transparent et procédé de formation d'un film conducteur transparent à base d'oxyde de titane destiné à être utilisé avec celui-ci
US7410916B2 (en) * 2006-11-21 2008-08-12 Applied Materials, Inc. Method of improving initiation layer for low-k dielectric film by digital liquid flow meter
ATE547236T1 (de) * 2007-05-01 2012-03-15 Exatec Llc Kantensanierung und in-situ-reparatur einer plasmabeschichtung
KR101588174B1 (ko) * 2007-05-17 2016-01-27 엑사테크 엘.엘.씨. 공통 플라즈마 코팅 구역에서 복수의 코팅 재료를 침착시키기 위한 장치 및 방법
GB0717430D0 (en) * 2007-09-10 2007-10-24 Dow Corning Ireland Ltd Atmospheric pressure plasma

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