JP5728469B2 - コーティング方法 - Google Patents
コーティング方法 Download PDFInfo
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- JP5728469B2 JP5728469B2 JP2012508520A JP2012508520A JP5728469B2 JP 5728469 B2 JP5728469 B2 JP 5728469B2 JP 2012508520 A JP2012508520 A JP 2012508520A JP 2012508520 A JP2012508520 A JP 2012508520A JP 5728469 B2 JP5728469 B2 JP 5728469B2
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- 238000000576 coating method Methods 0.000 title claims description 65
- 239000007789 gas Substances 0.000 claims description 90
- 239000011248 coating agent Substances 0.000 claims description 52
- 239000000758 substrate Substances 0.000 claims description 45
- 238000000034 method Methods 0.000 claims description 42
- 239000002243 precursor Substances 0.000 claims description 41
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 8
- 239000012159 carrier gas Substances 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 8
- 229910052760 oxygen Inorganic materials 0.000 claims description 8
- 229910052710 silicon Inorganic materials 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 238000000151 deposition Methods 0.000 claims description 4
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 3
- 229910001882 dioxygen Inorganic materials 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 229910001873 dinitrogen Inorganic materials 0.000 claims description 2
- 239000011737 fluorine Substances 0.000 claims description 2
- 229910052731 fluorine Inorganic materials 0.000 claims description 2
- 230000000704 physical effect Effects 0.000 claims description 2
- 230000005284 excitation Effects 0.000 claims 1
- 238000005299 abrasion Methods 0.000 description 20
- 239000001307 helium Substances 0.000 description 9
- 229910052734 helium Inorganic materials 0.000 description 9
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 9
- WZJUBBHODHNQPW-UHFFFAOYSA-N 2,4,6,8-tetramethyl-1,3,5,7,2$l^{3},4$l^{3},6$l^{3},8$l^{3}-tetraoxatetrasilocane Chemical group C[Si]1O[Si](C)O[Si](C)O[Si](C)O1 WZJUBBHODHNQPW-UHFFFAOYSA-N 0.000 description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 229920000307 polymer substrate Polymers 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- -1 antifreezes Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000008439 repair process Effects 0.000 description 3
- 239000004576 sand Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 239000002318 adhesion promoter Substances 0.000 description 2
- 150000004703 alkoxides Chemical class 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
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- 229910052751 metal Inorganic materials 0.000 description 2
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- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229920006397 acrylic thermoplastic Polymers 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000000809 air pollutant Substances 0.000 description 1
- 231100001243 air pollutant Toxicity 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000002528 anti-freeze Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 229920000592 inorganic polymer Polymers 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 125000005375 organosiloxane group Chemical group 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C23C16/325—Silicon carbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
また、本発明は以下に記載する態様を含む。
(態様1)
耐摩耗性コーティングを基板に施す方法であって:
大気圧プラズマを生成する工程と;
前記耐摩耗性コーティングを形成するために選択される前駆体を前記大気圧プラズマに導入する工程と;
前記基板を前記大気圧プラズマに対して位置決めして、前記大気圧プラズマにより前記耐摩耗性コーティングを前記基板に堆積させる工程と
を含む方法。
(態様2)
前記耐摩耗性コーティングがシリコンオキシカーバイドコーティングである、態様1に記載の方法。
(態様3)
前記基板が延伸アクリルである、態様1に記載の方法。
(態様4)
前記大気圧プラズマが大気圧酸素プラズマである、態様1に記載の方法。
(態様5)
前記生成する工程では、シールドガス流及びプラズマ源ガス流を大気圧プラズマ装置に導入する、態様1に記載の方法。
(態様6)
更に、前記前駆体に対する前記プラズマ源ガス流の容積比を変化させて前記耐摩耗性コーティングの物理特性を操作する工程を含む、態様5に記載の方法。
(態様7)
前記シールドガス流が、ヘリウムガス及びアルゴンガスのうちの少なくとも1つを含み、前記プラズマ源ガス流が分子ガスを含む、態様5に記載の方法。
(態様8)
前記前駆体を、キャリアガスによって前記大気圧プラズマに導入する、態様1に記載の方法。
(態様9)
前記前駆体が環状有機シロキサンを含む、態様1に記載の方法。
(態様10)
前記前駆体がテトラメチルシクロシクロテトラシロキサンを含む、態様1に記載の方法。
(態様11)
前記前駆体はオクトメチルシクロシクロテトラシロキサンを含む、態様1に記載の方法。
(態様12)
前記大気圧プラズマは、大気圧プラズマ装置によって生成され、前記位置決めする工程では、前記基板と前記大気圧プラズマ装置との間に一定間隔を維持する、態様1に記載の方法。
(態様13)
前記大気圧プラズマ装置がロボット装置に取り付けられ、前記一定間隔は前記ロボット装置により維持される、態様12に記載の方法。
(態様14)
更に、前記位置決めする工程の前に前記基板をクリーニングする工程を含む、態様1に記載の方法。
(態様15)
更に、前記位置決めする工程の前に、前記前駆体をほとんど含まない酸素プラズマで前記基板を処理する工程を含む、態様1に記載の方法。
Claims (6)
- シリコンオキシカーバイドコーティングを基板に施す方法であって:
シールドガス及びプラズマ源ガスを大気圧プラズマ装置に導入して大気圧プラズマを生成する工程であって、シールドガスは、前記大気圧プラズマ装置におけるプラズマ形成に大きく寄与することがないガスであり、不活性ガスからなり、プラズマ源ガスは、励起時に大気圧プラズマ装置によって大気圧プラズマを形成することができるガスであり、酸素ガス、窒素ガス、水素ガス、フッ素ガスのうちのすくなくとも1つを含む工程と;
環状有機シロキサン前駆体を該大気圧プラズマに導入する工程であって、該環状有機シロキサン前駆体がキャリアガスで運ばれる工程と;
該環状有機シロキサン前駆体が該大気圧プラズマに導入される間、該基板を該大気圧プラズマ装置に対して位置決めして、該大気圧プラズマにより該シリコンオキシカーバイドコーティングを該基板に堆積させる工程と、を含む方法。 - 前記大気圧プラズマが大気圧酸素プラズマである、請求項1に記載の方法。
- 更に、前記前駆体に対する前記プラズマ源ガス流の容積比を変化させて前記シリコンオキシカーバイドコーティングの物理特性を操作する工程を含む、請求項1に記載の方法。
- 前記位置決めする工程では、前記基板と前記大気圧プラズマ装置との間に一定間隔を維持する、請求項1に記載の方法。
- 前記大気圧プラズマ装置がロボット装置に取り付けられ、前記一定間隔は前記ロボット装置により維持される、請求項4に記載の方法。
- 前記基板が延伸アクリルである、請求項1から5のいずれか1項に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/435,110 US8206794B2 (en) | 2009-05-04 | 2009-05-04 | System and method for applying abrasion-resistant coatings |
US12/435,110 | 2009-05-04 | ||
PCT/US2010/031095 WO2010129149A1 (en) | 2009-05-04 | 2010-04-14 | Coating method |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015075082A Division JP6022629B2 (ja) | 2009-05-04 | 2015-04-01 | コーティング方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012526190A JP2012526190A (ja) | 2012-10-25 |
JP2012526190A5 JP2012526190A5 (ja) | 2013-05-30 |
JP5728469B2 true JP5728469B2 (ja) | 2015-06-03 |
Family
ID=42269774
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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JP2012508520A Active JP5728469B2 (ja) | 2009-05-04 | 2010-04-14 | コーティング方法 |
JP2015075082A Active JP6022629B2 (ja) | 2009-05-04 | 2015-04-01 | コーティング方法 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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JP2015075082A Active JP6022629B2 (ja) | 2009-05-04 | 2015-04-01 | コーティング方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US8206794B2 (ja) |
EP (1) | EP2430211A1 (ja) |
JP (2) | JP5728469B2 (ja) |
KR (3) | KR20190122273A (ja) |
CN (1) | CN102414341A (ja) |
WO (1) | WO2010129149A1 (ja) |
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US20130115867A1 (en) * | 2011-11-08 | 2013-05-09 | General Electric Company | Enclosure system and method for applying coating |
US10787591B2 (en) * | 2012-04-30 | 2020-09-29 | The Boeing Company | Composites including silicon-oxy-carbide layers and methods of making the same |
US9180289B2 (en) * | 2012-08-29 | 2015-11-10 | Cardiac Pacemakers, Inc. | Enhanced low friction coating for medical leads and methods of making |
US9139908B2 (en) * | 2013-12-12 | 2015-09-22 | The Boeing Company | Gradient thin films |
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JP2007216435A (ja) * | 2006-02-14 | 2007-08-30 | Tomoegawa Paper Co Ltd | ガスバリアフィルム基板、電極付きガスバリアフィルム基板、及びそれらを用いた表示素子 |
JP4968883B2 (ja) * | 2006-03-30 | 2012-07-04 | 日本碍子株式会社 | リモート式プラズマ処理装置 |
KR100914354B1 (ko) * | 2006-06-05 | 2009-08-28 | 어플라이드 머티어리얼스, 인코포레이티드 | Pecvd막에 대한 1차 웨이퍼 효과 제거 |
JPWO2008047549A1 (ja) * | 2006-10-12 | 2010-02-25 | コニカミノルタホールディングス株式会社 | 透明導電膜基板及びこれに用いる酸化チタン系透明導電膜の形成方法 |
US7410916B2 (en) * | 2006-11-21 | 2008-08-12 | Applied Materials, Inc. | Method of improving initiation layer for low-k dielectric film by digital liquid flow meter |
ATE547236T1 (de) | 2007-05-01 | 2012-03-15 | Exatec Llc | Kantensanierung und in-situ-reparatur einer plasmabeschichtung |
US9790584B2 (en) * | 2007-05-17 | 2017-10-17 | Sabic Global Technologies B.V. | Apparatus and method for depositing multiple coating materials in a common plasma coating zone |
GB0717430D0 (en) * | 2007-09-10 | 2007-10-24 | Dow Corning Ireland Ltd | Atmospheric pressure plasma |
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US8206794B2 (en) | 2012-06-26 |
JP2012526190A (ja) | 2012-10-25 |
EP2430211A1 (en) | 2012-03-21 |
KR20190122273A (ko) | 2019-10-29 |
JP2015163738A (ja) | 2015-09-10 |
KR20170064567A (ko) | 2017-06-09 |
JP6022629B2 (ja) | 2016-11-09 |
CN102414341A (zh) | 2012-04-11 |
US20100279027A1 (en) | 2010-11-04 |
WO2010129149A1 (en) | 2010-11-11 |
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