JP6254259B2 - 静電放電ダイオード - Google Patents

静電放電ダイオード Download PDF

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JP6254259B2
JP6254259B2 JP2016512918A JP2016512918A JP6254259B2 JP 6254259 B2 JP6254259 B2 JP 6254259B2 JP 2016512918 A JP2016512918 A JP 2016512918A JP 2016512918 A JP2016512918 A JP 2016512918A JP 6254259 B2 JP6254259 B2 JP 6254259B2
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substrate
diode
layer
semiconductor material
tsv wafer
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JP2016526285A (ja
JP2016526285A5 (enExample
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ヴィディヤ・ラマチャンドラン
ブライアン・エム・ヘンダーソン
シーチュン・グ
チュウ−グアン・タン
ジュン・ピル・キム
テヒュン・キム
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クアルコム,インコーポレイテッド
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    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP2016512918A 2013-05-06 2014-04-23 静電放電ダイオード Expired - Fee Related JP6254259B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/887,723 2013-05-06
US13/887,723 US9093462B2 (en) 2013-05-06 2013-05-06 Electrostatic discharge diode
PCT/US2014/035076 WO2014182449A1 (en) 2013-05-06 2014-04-23 Electrostatic discharge diode

Publications (3)

Publication Number Publication Date
JP2016526285A JP2016526285A (ja) 2016-09-01
JP2016526285A5 JP2016526285A5 (enExample) 2017-03-23
JP6254259B2 true JP6254259B2 (ja) 2017-12-27

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JP2016512918A Expired - Fee Related JP6254259B2 (ja) 2013-05-06 2014-04-23 静電放電ダイオード

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US (2) US9093462B2 (enExample)
EP (1) EP2994937B1 (enExample)
JP (1) JP6254259B2 (enExample)
KR (1) KR101755555B1 (enExample)
CN (1) CN105190888B (enExample)
WO (1) WO2014182449A1 (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9093462B2 (en) 2013-05-06 2015-07-28 Qualcomm Incorporated Electrostatic discharge diode
US9443764B2 (en) * 2013-10-11 2016-09-13 GlobalFoundries, Inc. Method of eliminating poor reveal of through silicon vias
US9786580B2 (en) * 2013-11-15 2017-10-10 Taiwan Semiconductor Manufacturing Company, Ltd. Self-alignment for redistribution layer
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US20140327105A1 (en) 2014-11-06
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