JP6250691B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP6250691B2 JP6250691B2 JP2015543365A JP2015543365A JP6250691B2 JP 6250691 B2 JP6250691 B2 JP 6250691B2 JP 2015543365 A JP2015543365 A JP 2015543365A JP 2015543365 A JP2015543365 A JP 2015543365A JP 6250691 B2 JP6250691 B2 JP 6250691B2
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- semiconductor device
- carrier substrate
- heat sink
- thermistor sensor
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- 239000004065 semiconductor Substances 0.000 title claims description 151
- 239000000758 substrate Substances 0.000 claims description 90
- 239000000919 ceramic Substances 0.000 claims description 53
- 229910052751 metal Inorganic materials 0.000 claims description 27
- 239000002184 metal Substances 0.000 claims description 27
- 239000012212 insulator Substances 0.000 claims description 15
- 230000017525 heat dissipation Effects 0.000 claims description 11
- 239000010410 layer Substances 0.000 description 21
- 239000000463 material Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000009529 body temperature measurement Methods 0.000 description 4
- 229910010293 ceramic material Inorganic materials 0.000 description 4
- 238000010292 electrical insulation Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 230000001419 dependent effect Effects 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012876 carrier material Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000000295 emission spectrum Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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Description
2 : 接続パッド
3 : サーミスタセンサパターン
4 : セラミック体
5 : 絶縁体層
6 : 接続パターン
7 : 半導体デバイス
8 : 金属パターン
9 : 絶縁体層
10 : ディスクリートな保護デバイス
11 : 熱的ビア
12 : 金属シート
13 : ワイヤ接続
14 : 担体基板
15 : 熱放散路
Claims (15)
- 1つの半導体デバイス(7)と、
1つの担体基板(14)であって、当該担体基板上に前記半導体デバイス(7)が取り付けられており、当該担体基板(14)は、1つのセラミック体(4)と、当該セラミック体(4)と直に接続されている、前記担体基板に一体化された1つのサーミスタセンサパターン(3)とを備え、前記セラミック体(4)及び前記サーミスタセンサパターン(3)が、一緒に製造されており、かつモノリシックなセラミック部を形成している、担体基板と、
その上に前記担体基板が取り付けられている1つのヒートシンク(1)と、
を備えることを特徴とする半導体装置。 - 動作中においては前記半導体デバイス(7)と前記サーミスタセンサパターン(3)との間の温度差が3K/Wより小さいことを特徴とする、請求項1に記載の半導体装置。
- 前記サーミスタセンサパターン(3)は、前記半導体デバイス(7)と前記ヒートシンク(1)との間の熱放散路(15)に配設されていることを特徴とする、請求項1または2に記載の半導体装置。
- 前記セラミック体(4)は、50000Ω・cmより大きな比電気抵抗を有することを特徴とする、請求項1乃至3のいずれか1項に記載の半導体装置。
- 前記一体化されたサーミスタセンサパターン(3)は、5000Ω・cmより小さな比電気抵抗を有することを特徴とする、請求項1乃至4のいずれか1項に記載の半導体装置。
- 前記一体化されたサーミスタセンサパターン(3)は、NTCサーミスタとして形成されていることを特徴とする、請求項1乃至5のいずれか1項に記載の半導体装置。
- 前記ヒートシンク(1)は、金属ヒートシンクとして形成されていることを特徴とする、請求項1乃至6のいずれか1項に記載の半導体装置。
- 前記担体基板(14)は、前記ヒートシンク(1)上に直に取り付けられていることを特徴とする、請求項1乃至7のいずれか1項に記載の半導体装置。
- 前記担体基板(14)は、1つの接続パターン(6)を備え、当該接続パターンを介して前記半導体デバイス(7)が、前記担体基板(14)上に取り付けられていることを特徴とする、請求項1乃至8のいずれか1項に記載の半導体装置。
- 前記担体基板(14)は、ワイヤリングのためかつ前記半導体デバイス(7)の電気的接続のための金属パターン(8)を備えることを特徴とする、請求項1乃至9のいずれか1項に記載の半導体装置。
- 前記担体基板(14)は、前記サーミスタセンサパターン(3)と前記半導体デバイス(7)との間に1つの絶縁体層(5)を備えることを特徴とする、請求項1乃至10のいずれか1項に記載の半導体装置。
- 前記担体基板(14)は、熱的ビア(11)を備え、当該熱的ビアは、前記セラミック体(4)を貫通して、前記一体化されたサーミスタセンサパターンと接続していることを特徴とする、請求項1乃至11のいずれか1項に記載の半導体装置。
- 前記ヒートシンク(1)上に、それぞれその上に1つの半導体デバイス(7)が搭載されている複数の担体基板(14)が取り付けられていることを特徴とする、請求項1乃至12のいずれか1項に記載の半導体装置。
- 前記ヒートシンク(1)上には、さらに1つのディスクリートな保護デバイス(10)が配設されていることを特徴とする、請求項1乃至13のいずれか1項に記載の半導体装置。
- 前記半導体デバイス(7)は、発光ダイオード,グラフィックチップ,パワーチップ,およびトランジスタから選択された1つのパワー半導体デバイスであることを特徴とする、請求項1乃至14のいずれか1項に記載の半導体装置。
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DE102012111458.7A DE102012111458B4 (de) | 2012-11-27 | 2012-11-27 | Halbleitervorrichtung |
PCT/EP2013/072613 WO2014082809A1 (de) | 2012-11-27 | 2013-10-29 | Halbleitervorrichtung |
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CN104798198B (zh) | 2018-05-15 |
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