JP6250067B2 - 極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法 - Google Patents

極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法 Download PDF

Info

Publication number
JP6250067B2
JP6250067B2 JP2015553734A JP2015553734A JP6250067B2 JP 6250067 B2 JP6250067 B2 JP 6250067B2 JP 2015553734 A JP2015553734 A JP 2015553734A JP 2015553734 A JP2015553734 A JP 2015553734A JP 6250067 B2 JP6250067 B2 JP 6250067B2
Authority
JP
Japan
Prior art keywords
temperature
light beam
optical element
amplified light
lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2015553734A
Other languages
English (en)
Japanese (ja)
Other versions
JP2016509343A5 (enExample
JP2016509343A (ja
Inventor
フルーロフ，ウラジミール
フォメンコフ，イゴール，ブイ．
スリヴァスタヴァ，シャイレンドラ，エヌ．
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Netherlands BV
Original Assignee
ASML Netherlands BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Netherlands BV filed Critical ASML Netherlands BV
Publication of JP2016509343A publication Critical patent/JP2016509343A/ja
Publication of JP2016509343A5 publication Critical patent/JP2016509343A5/ja
Application granted granted Critical
Publication of JP6250067B2 publication Critical patent/JP6250067B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • X-Ray Techniques (AREA)
JP2015553734A 2013-01-22 2013-12-17 極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法 Active JP6250067B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/747,263 US9148941B2 (en) 2013-01-22 2013-01-22 Thermal monitor for an extreme ultraviolet light source
US13/747,263 2013-01-22
PCT/US2013/075871 WO2014116371A1 (en) 2013-01-22 2013-12-17 Thermal monitor for an extreme ultraviolet light source

Publications (3)

Publication Number Publication Date
JP2016509343A JP2016509343A (ja) 2016-03-24
JP2016509343A5 JP2016509343A5 (enExample) 2016-12-22
JP6250067B2 true JP6250067B2 (ja) 2017-12-20

Family

ID=51207012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2015553734A Active JP6250067B2 (ja) 2013-01-22 2013-12-17 極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法

Country Status (5)

Country Link
US (1) US9148941B2 (enExample)
JP (1) JP6250067B2 (enExample)
KR (2) KR102100789B1 (enExample)
TW (1) TWI611427B (enExample)
WO (1) WO2014116371A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3142823B1 (de) * 2014-05-13 2020-07-29 Trumpf Laser- und Systemtechnik GmbH Einrichtung zur überwachung der ausrichtung eines laserstrahls und euv-strahlungserzeugungsvorrichtung damit
US9927292B2 (en) 2015-04-23 2018-03-27 Asml Netherlands B.V. Beam position sensor
US10021773B2 (en) * 2015-11-16 2018-07-10 Kla-Tencor Corporation Laser produced plasma light source having a target material coated on a cylindrically-symmetric element
US10109451B2 (en) * 2017-02-13 2018-10-23 Applied Materials, Inc. Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral radiant flux and system having the apparatus
US10128017B1 (en) 2017-05-12 2018-11-13 Asml Netherlands B.V. Apparatus for and method of controlling debris in an EUV light source
US10824083B2 (en) 2017-09-28 2020-11-03 Taiwan Semiconductor Manufacturing Co., Ltd. Light source, EUV lithography system, and method for generating EUV radiation
CN111742454A (zh) * 2018-02-20 2020-10-02 Asml荷兰有限公司 传感器系统
WO2019186754A1 (ja) * 2018-03-28 2019-10-03 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
US20200057376A1 (en) * 2018-08-14 2020-02-20 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography system and lithography method
WO2020126387A2 (en) 2018-12-18 2020-06-25 Asml Netherlands B.V. Sacrifical device for protecting an optical element in a path of a high-power laser beam
BE1031741B1 (nl) * 2023-06-27 2025-02-04 Newson Nv Lichtrichtapparaat met verbeterd temperatuurbeheer

Family Cites Families (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61123492A (ja) * 1984-11-19 1986-06-11 Toshiba Corp レ−ザ加工装置
US4749122A (en) * 1986-05-19 1988-06-07 The Foxboro Company Combustion control system
JPS6348509A (ja) * 1986-08-18 1988-03-01 Komatsu Ltd レ−ザスキヤナ装置
DE19622671A1 (de) * 1995-06-30 1997-01-02 Basf Magnetics Gmbh Temperatur-Indikator für gekühlte Produkte oder ähnliches
US6559424B2 (en) * 2001-01-02 2003-05-06 Mattson Technology, Inc. Windows used in thermal processing chambers
WO2002067390A1 (fr) * 2001-02-22 2002-08-29 Mitsubishi Denki Kabushiki Kaisha Dispositif laser
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7554662B1 (en) * 2002-06-24 2009-06-30 J.A. Woollam Co., Inc. Spatial filter means comprising an aperture with a non-unity aspect ratio in a system for investigating samples with electromagnetic radiation
US6825681B2 (en) * 2002-07-19 2004-11-30 Delta Design, Inc. Thermal control of a DUT using a thermal control substrate
US6992306B2 (en) * 2003-04-15 2006-01-31 Canon Kabushiki Kaisha Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
DE102004038310A1 (de) 2004-08-05 2006-02-23 Kuka Schweissanlagen Gmbh Lasereinrichtung und Betriebsverfahren
US7891075B2 (en) * 2005-01-19 2011-02-22 Gm Global Technology Operations, Inc. Reconfigurable fixture device and method for controlling
JP4710406B2 (ja) * 2005-04-28 2011-06-29 ウシオ電機株式会社 極端紫外光露光装置および極端紫外光光源装置
US7333904B2 (en) * 2005-08-26 2008-02-19 Delphi Technologies, Inc. Method of determining FET junction temperature
US8290753B2 (en) * 2006-01-24 2012-10-16 Vextec Corporation Materials-based failure analysis in design of electronic devices, and prediction of operating life
US8766212B2 (en) * 2006-07-19 2014-07-01 Asml Netherlands B.V. Correction of spatial instability of an EUV source by laser beam steering
JP5076087B2 (ja) * 2006-10-19 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びノズル保護装置
KR100841478B1 (ko) * 2007-08-28 2008-06-25 주식회사 브이엠티 다중 모세관의 장착이 가능한 액체 타겟 공급 장치 및 이를구비한 ｘ선 및 극자외선 광원 발생 장치
US8115900B2 (en) * 2007-09-17 2012-02-14 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN103299249B (zh) * 2007-10-09 2015-08-26 卡尔蔡司Smt有限责任公司 用于控制光学元件的温度的装置
JP2009099390A (ja) * 2007-10-17 2009-05-07 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
US20090275815A1 (en) * 2008-03-21 2009-11-05 Nova Biomedical Corporation Temperature-compensated in-vivo sensor
JP5833806B2 (ja) * 2008-09-19 2015-12-16 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置用レーザ光源装置及び極端紫外光源装置用レーザ光源の調整方法
US7641349B1 (en) * 2008-09-22 2010-01-05 Cymer, Inc. Systems and methods for collector mirror temperature control using direct contact heat transfer
JP5587578B2 (ja) * 2008-09-26 2014-09-10 ギガフォトン株式会社 極端紫外光源装置およびパルスレーザ装置
JP5314433B2 (ja) * 2009-01-06 2013-10-16 ギガフォトン株式会社 極端紫外光源装置
JP5312959B2 (ja) 2009-01-09 2013-10-09 ギガフォトン株式会社 極端紫外光源装置
JP5559562B2 (ja) * 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
US8306774B2 (en) * 2009-11-02 2012-11-06 Quinn David E Thermometer for determining the temperature of an animal's ear drum and method of using same
US8373758B2 (en) * 2009-11-11 2013-02-12 International Business Machines Corporation Techniques for analyzing performance of solar panels and solar cells using infrared diagnostics
US8173985B2 (en) 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source
JP5705592B2 (ja) * 2010-03-18 2015-04-22 ギガフォトン株式会社 極端紫外光生成装置
JP5726546B2 (ja) * 2010-03-29 2015-06-03 ギガフォトン株式会社 チャンバ装置
US8686381B2 (en) * 2010-06-28 2014-04-01 Media Lario S.R.L. Source-collector module with GIC mirror and tin vapor LPP target system
JP2012129345A (ja) * 2010-12-15 2012-07-05 Renesas Electronics Corp 半導体装置の製造方法、露光方法および露光装置
US20120210999A1 (en) * 2011-02-21 2012-08-23 Straeter James E Solar heating system for a hot water heater
US8993976B2 (en) * 2011-08-19 2015-03-31 Asml Netherlands B.V. Energy sensors for light beam alignment

Also Published As

Publication number Publication date
KR20200003271A (ko) 2020-01-08
WO2014116371A1 (en) 2014-07-31
US20140203195A1 (en) 2014-07-24
KR102100789B1 (ko) 2020-04-16
US9148941B2 (en) 2015-09-29
TWI611427B (zh) 2018-01-11
KR20150108820A (ko) 2015-09-30
TW201435912A (zh) 2014-09-16
KR102062296B1 (ko) 2020-01-03
JP2016509343A (ja) 2016-03-24

Similar Documents

Publication Publication Date Title
JP6250067B2 (ja) 極端紫外線光源内の光学素子に対する増幅光ビームの位置調整方法
US9167679B2 (en) Beam position control for an extreme ultraviolet light source
KR101885748B1 (ko) 광원 초점의 정렬
JP5312959B2 (ja) 極端紫外光源装置
JP5695636B2 (ja) 最適な極紫外線出力のためにターゲット材料を位置合わせ及び同期させるシステム、方法及び装置
JP5314433B2 (ja) 極端紫外光源装置
TWI580320B (zh) 控制雷射光束的裝置及產生極端紫外線的設備
JP6374481B2 (ja) 極端紫外線光源のビーム位置制御を行うシステム又は方法
CN110431391B (zh) 针对极紫外光源的量测系统
KR102631831B1 (ko) 극자외 광원 내에서의 타겟 팽창 속도 제어 방법
TWI821839B (zh) 量測目標之移動屬性的方法及光學設備
US20150264792A1 (en) Laser beam controlling device and extreme ultraviolet light generating apparatus
US10194515B2 (en) Beam delivery system and control method therefor
JP2006045598A (ja) 配管の残留応力改善装置
TWI907420B (zh) 光學裝置、極紫外光光源、用於光學系統之方法及裝置、及用於檢測極紫外光光源之容器中之光學元件的方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20161028

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20161028

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20170712

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20170802

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20171017

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20171030

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20171121

R150 Certificate of patent or registration of utility model

Ref document number: 6250067

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250