TWI611427B - 用於調整放大光束之位置的方法與系統 - Google Patents
用於調整放大光束之位置的方法與系統 Download PDFInfo
- Publication number
- TWI611427B TWI611427B TW103100977A TW103100977A TWI611427B TW I611427 B TWI611427 B TW I611427B TW 103100977 A TW103100977 A TW 103100977A TW 103100977 A TW103100977 A TW 103100977A TW I611427 B TWI611427 B TW I611427B
- Authority
- TW
- Taiwan
- Prior art keywords
- temperature
- optical element
- monitored
- light beam
- amplified
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 34
- 230000003287 optical effect Effects 0.000 claims abstract description 160
- 238000009826 distribution Methods 0.000 claims abstract description 68
- 230000008859 change Effects 0.000 claims description 24
- 230000008878 coupling Effects 0.000 claims description 12
- 238000010168 coupling process Methods 0.000 claims description 12
- 238000005859 coupling reaction Methods 0.000 claims description 12
- 238000009529 body temperature measurement Methods 0.000 claims description 11
- 238000005259 measurement Methods 0.000 claims description 10
- 230000033001 locomotion Effects 0.000 claims description 8
- 230000009471 action Effects 0.000 claims description 7
- 238000003860 storage Methods 0.000 claims description 4
- 239000000835 fiber Substances 0.000 claims description 3
- 238000013459 approach Methods 0.000 claims 1
- 230000005540 biological transmission Effects 0.000 description 26
- 239000000203 mixture Substances 0.000 description 19
- 230000007246 mechanism Effects 0.000 description 14
- 238000012544 monitoring process Methods 0.000 description 12
- 238000001514 detection method Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 230000005855 radiation Effects 0.000 description 5
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 3
- 239000013077 target material Substances 0.000 description 3
- 229910000807 Ga alloy Inorganic materials 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 2
- -1 SnBr 4 Chemical compound 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000001427 coherent effect Effects 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000004590 computer program Methods 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000005284 excitation Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910001868 water Inorganic materials 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000036278 prepulse Effects 0.000 description 1
- 238000009420 retrofitting Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 150000003606 tin compounds Chemical class 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
- H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
- H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- X-Ray Techniques (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US13/747,263 US9148941B2 (en) | 2013-01-22 | 2013-01-22 | Thermal monitor for an extreme ultraviolet light source |
| US13/747,263 | 2013-01-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201435912A TW201435912A (zh) | 2014-09-16 |
| TWI611427B true TWI611427B (zh) | 2018-01-11 |
Family
ID=51207012
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103100977A TWI611427B (zh) | 2013-01-22 | 2014-01-10 | 用於調整放大光束之位置的方法與系統 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US9148941B2 (enExample) |
| JP (1) | JP6250067B2 (enExample) |
| KR (2) | KR102062296B1 (enExample) |
| TW (1) | TWI611427B (enExample) |
| WO (1) | WO2014116371A1 (enExample) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3142823B1 (de) * | 2014-05-13 | 2020-07-29 | Trumpf Laser- und Systemtechnik GmbH | Einrichtung zur überwachung der ausrichtung eines laserstrahls und euv-strahlungserzeugungsvorrichtung damit |
| US9927292B2 (en) | 2015-04-23 | 2018-03-27 | Asml Netherlands B.V. | Beam position sensor |
| US10021773B2 (en) * | 2015-11-16 | 2018-07-10 | Kla-Tencor Corporation | Laser produced plasma light source having a target material coated on a cylindrically-symmetric element |
| US10109451B2 (en) * | 2017-02-13 | 2018-10-23 | Applied Materials, Inc. | Apparatus configured for enhanced vacuum ultraviolet (VUV) spectral radiant flux and system having the apparatus |
| US10128017B1 (en) * | 2017-05-12 | 2018-11-13 | Asml Netherlands B.V. | Apparatus for and method of controlling debris in an EUV light source |
| US10824083B2 (en) | 2017-09-28 | 2020-11-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Light source, EUV lithography system, and method for generating EUV radiation |
| NL2022443A (en) * | 2018-02-20 | 2019-08-27 | Asml Netherlands Bv | Sensor System |
| WO2019186754A1 (ja) * | 2018-03-28 | 2019-10-03 | ギガフォトン株式会社 | 極端紫外光生成システム及び電子デバイスの製造方法 |
| US20200057376A1 (en) * | 2018-08-14 | 2020-02-20 | Taiwan Semiconductor Manufacturing Co., Ltd. | Lithography system and lithography method |
| NL2024323A (en) | 2018-12-18 | 2020-07-07 | Asml Netherlands Bv | Sacrifical device for protecting an optical element in a path of a high-power laser beam |
| BE1031741B1 (nl) * | 2023-06-27 | 2025-02-04 | Newson Nv | Lichtrichtapparaat met verbeterd temperatuurbeheer |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060151724A1 (en) * | 2003-04-15 | 2006-07-13 | Canon Kabushiki Kaisha | Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method |
| US7554662B1 (en) * | 2002-06-24 | 2009-06-30 | J.A. Woollam Co., Inc. | Spatial filter means comprising an aperture with a non-unity aspect ratio in a system for investigating samples with electromagnetic radiation |
| US20100171049A1 (en) * | 2009-01-06 | 2010-07-08 | Masato Moriya | Extreme ultraviolet light source apparatus |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61123492A (ja) * | 1984-11-19 | 1986-06-11 | Toshiba Corp | レ−ザ加工装置 |
| US4749122A (en) * | 1986-05-19 | 1988-06-07 | The Foxboro Company | Combustion control system |
| JPS6348509A (ja) * | 1986-08-18 | 1988-03-01 | Komatsu Ltd | レ−ザスキヤナ装置 |
| DE19622671A1 (de) * | 1995-06-30 | 1997-01-02 | Basf Magnetics Gmbh | Temperatur-Indikator für gekühlte Produkte oder ähnliches |
| US6559424B2 (en) * | 2001-01-02 | 2003-05-06 | Mattson Technology, Inc. | Windows used in thermal processing chambers |
| JPWO2002067390A1 (ja) * | 2001-02-22 | 2004-06-24 | 三菱電機株式会社 | レーザ装置 |
| US7598509B2 (en) * | 2004-11-01 | 2009-10-06 | Cymer, Inc. | Laser produced plasma EUV light source |
| US6825681B2 (en) * | 2002-07-19 | 2004-11-30 | Delta Design, Inc. | Thermal control of a DUT using a thermal control substrate |
| US7164144B2 (en) * | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
| DE102004038310A1 (de) * | 2004-08-05 | 2006-02-23 | Kuka Schweissanlagen Gmbh | Lasereinrichtung und Betriebsverfahren |
| US7891075B2 (en) * | 2005-01-19 | 2011-02-22 | Gm Global Technology Operations, Inc. | Reconfigurable fixture device and method for controlling |
| JP4710406B2 (ja) * | 2005-04-28 | 2011-06-29 | ウシオ電機株式会社 | 極端紫外光露光装置および極端紫外光光源装置 |
| US7333904B2 (en) * | 2005-08-26 | 2008-02-19 | Delphi Technologies, Inc. | Method of determining FET junction temperature |
| US8290753B2 (en) * | 2006-01-24 | 2012-10-16 | Vextec Corporation | Materials-based failure analysis in design of electronic devices, and prediction of operating life |
| US8766212B2 (en) * | 2006-07-19 | 2014-07-01 | Asml Netherlands B.V. | Correction of spatial instability of an EUV source by laser beam steering |
| JP5076087B2 (ja) * | 2006-10-19 | 2012-11-21 | ギガフォトン株式会社 | 極端紫外光源装置及びノズル保護装置 |
| KR100841478B1 (ko) * | 2007-08-28 | 2008-06-25 | 주식회사 브이엠티 | 다중 모세관의 장착이 가능한 액체 타겟 공급 장치 및 이를구비한 ｘ선 및 극자외선 광원 발생 장치 |
| US8115900B2 (en) * | 2007-09-17 | 2012-02-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| EP2201435B1 (en) * | 2007-10-09 | 2013-02-13 | Carl Zeiss SMT GmbH | Device for controlling temperature of an optical element |
| JP2009099390A (ja) * | 2007-10-17 | 2009-05-07 | Tokyo Institute Of Technology | 極端紫外光光源装置および極端紫外光発生方法 |
| US20090275815A1 (en) * | 2008-03-21 | 2009-11-05 | Nova Biomedical Corporation | Temperature-compensated in-vivo sensor |
| JP5833806B2 (ja) * | 2008-09-19 | 2015-12-16 | ギガフォトン株式会社 | 極端紫外光源装置、極端紫外光源装置用レーザ光源装置及び極端紫外光源装置用レーザ光源の調整方法 |
| US7641349B1 (en) * | 2008-09-22 | 2010-01-05 | Cymer, Inc. | Systems and methods for collector mirror temperature control using direct contact heat transfer |
| JP5587578B2 (ja) * | 2008-09-26 | 2014-09-10 | ギガフォトン株式会社 | 極端紫外光源装置およびパルスレーザ装置 |
| JP5312959B2 (ja) | 2009-01-09 | 2013-10-09 | ギガフォトン株式会社 | 極端紫外光源装置 |
| JP5559562B2 (ja) * | 2009-02-12 | 2014-07-23 | ギガフォトン株式会社 | 極端紫外光光源装置 |
| US8306774B2 (en) * | 2009-11-02 | 2012-11-06 | Quinn David E | Thermometer for determining the temperature of an animal's ear drum and method of using same |
| US8373758B2 (en) * | 2009-11-11 | 2013-02-12 | International Business Machines Corporation | Techniques for analyzing performance of solar panels and solar cells using infrared diagnostics |
| US8000212B2 (en) * | 2009-12-15 | 2011-08-16 | Cymer, Inc. | Metrology for extreme ultraviolet light source |
| US8173985B2 (en) | 2009-12-15 | 2012-05-08 | Cymer, Inc. | Beam transport system for extreme ultraviolet light source |
| JP5705592B2 (ja) * | 2010-03-18 | 2015-04-22 | ギガフォトン株式会社 | 極端紫外光生成装置 |
| JP5726546B2 (ja) * | 2010-03-29 | 2015-06-03 | ギガフォトン株式会社 | チャンバ装置 |
| US8686381B2 (en) * | 2010-06-28 | 2014-04-01 | Media Lario S.R.L. | Source-collector module with GIC mirror and tin vapor LPP target system |
| JP2012129345A (ja) * | 2010-12-15 | 2012-07-05 | Renesas Electronics Corp | 半導体装置の製造方法、露光方法および露光装置 |
| US20120210999A1 (en) * | 2011-02-21 | 2012-08-23 | Straeter James E | Solar heating system for a hot water heater |
| US8993976B2 (en) * | 2011-08-19 | 2015-03-31 | Asml Netherlands B.V. | Energy sensors for light beam alignment |
-
2013
- 2013-01-22 US US13/747,263 patent/US9148941B2/en active Active
- 2013-12-17 KR KR1020157017347A patent/KR102062296B1/ko not_active Expired - Fee Related
- 2013-12-17 WO PCT/US2013/075871 patent/WO2014116371A1/en not_active Ceased
- 2013-12-17 KR KR1020197038651A patent/KR102100789B1/ko active Active
- 2013-12-17 JP JP2015553734A patent/JP6250067B2/ja active Active
-
2014
- 2014-01-10 TW TW103100977A patent/TWI611427B/zh active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7554662B1 (en) * | 2002-06-24 | 2009-06-30 | J.A. Woollam Co., Inc. | Spatial filter means comprising an aperture with a non-unity aspect ratio in a system for investigating samples with electromagnetic radiation |
| US20060151724A1 (en) * | 2003-04-15 | 2006-07-13 | Canon Kabushiki Kaisha | Temperature adjustment apparatus, exposure apparatus having the same, and device fabricating method |
| US20100171049A1 (en) * | 2009-01-06 | 2010-07-08 | Masato Moriya | Extreme ultraviolet light source apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102062296B1 (ko) | 2020-01-03 |
| KR102100789B1 (ko) | 2020-04-16 |
| TW201435912A (zh) | 2014-09-16 |
| WO2014116371A1 (en) | 2014-07-31 |
| JP2016509343A (ja) | 2016-03-24 |
| JP6250067B2 (ja) | 2017-12-20 |
| US20140203195A1 (en) | 2014-07-24 |
| KR20200003271A (ko) | 2020-01-08 |
| US9148941B2 (en) | 2015-09-29 |
| KR20150108820A (ko) | 2015-09-30 |
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