JP6236145B2 - ガラス基板洗浄方法 - Google Patents

ガラス基板洗浄方法 Download PDF

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Publication number
JP6236145B2
JP6236145B2 JP2016511790A JP2016511790A JP6236145B2 JP 6236145 B2 JP6236145 B2 JP 6236145B2 JP 2016511790 A JP2016511790 A JP 2016511790A JP 2016511790 A JP2016511790 A JP 2016511790A JP 6236145 B2 JP6236145 B2 JP 6236145B2
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Prior art keywords
glass substrate
alkaline solution
solution
range
glass
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Expired - Fee Related
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Japanese (ja)
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JP2016523792A5 (cg-RX-API-DMAC10.html
JP2016523792A (ja
Inventor
ジーン エニックス,ダーウィン
ジーン エニックス,ダーウィン
中村,好寛
ヴェンカタチャラム,シヴァ
ジャニナ ワルチャク,ワンダ
ジャニナ ワルチャク,ワンダ
ワン,リーミン
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Corning Inc
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Corning Inc
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
    • C03C23/0075—Cleaning of glass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Liquid Crystal (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2016511790A 2013-04-30 2014-04-29 ガラス基板洗浄方法 Expired - Fee Related JP6236145B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201361817532P 2013-04-30 2013-04-30
US61/817,532 2013-04-30
PCT/US2014/035771 WO2014179251A1 (en) 2013-04-30 2014-04-29 Method of cleaning glass substrates

Publications (3)

Publication Number Publication Date
JP2016523792A JP2016523792A (ja) 2016-08-12
JP2016523792A5 JP2016523792A5 (cg-RX-API-DMAC10.html) 2017-06-15
JP6236145B2 true JP6236145B2 (ja) 2017-11-22

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US (1) US9561982B2 (cg-RX-API-DMAC10.html)
JP (1) JP6236145B2 (cg-RX-API-DMAC10.html)
KR (1) KR20160002911A (cg-RX-API-DMAC10.html)
CN (1) CN105340057B (cg-RX-API-DMAC10.html)
TW (1) TWI603790B (cg-RX-API-DMAC10.html)
WO (1) WO2014179251A1 (cg-RX-API-DMAC10.html)

Families Citing this family (133)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5891848B2 (ja) * 2012-02-27 2016-03-23 ウシオ電機株式会社 ガラス基板もしくは水晶基板からなるワークの貼り合わせ方法および装置
US11871901B2 (en) 2012-05-20 2024-01-16 Cilag Gmbh International Method for situational awareness for surgical network or surgical network connected device capable of adjusting function based on a sensed situation or usage
US10358382B2 (en) * 2014-06-27 2019-07-23 Vidrio Plano De Mexico, S.A. De C.V. Production method for sheets of glass with a diffuse finish, and resulting sheet of glass
US11504192B2 (en) 2014-10-30 2022-11-22 Cilag Gmbh International Method of hub communication with surgical instrument systems
JP6875285B2 (ja) * 2015-03-13 2021-05-19 コーニング インコーポレイテッド エッジ強度試験方法および装置
US9280998B1 (en) 2015-03-30 2016-03-08 WD Media, LLC Acidic post-sputter wash for magnetic recording media
TW201704177A (zh) * 2015-06-10 2017-02-01 康寧公司 蝕刻玻璃基板的方法及玻璃基板
JP6424183B2 (ja) * 2016-03-18 2018-11-14 信越半導体株式会社 半導体ウェーハの洗浄方法
US20200039871A1 (en) * 2017-01-31 2020-02-06 Corning Incorporated Methods for reducing glass sheet edge particles
WO2018232213A1 (en) * 2017-06-16 2018-12-20 Corning Incorporated Method of treating glass substrate surfaces
CN111051256A (zh) 2017-07-31 2020-04-21 康宁股份有限公司 具有非玻璃芯体和玻璃包封物的层压制品及其方法
US11801098B2 (en) 2017-10-30 2023-10-31 Cilag Gmbh International Method of hub communication with surgical instrument systems
US11564756B2 (en) 2017-10-30 2023-01-31 Cilag Gmbh International Method of hub communication with surgical instrument systems
US11311342B2 (en) 2017-10-30 2022-04-26 Cilag Gmbh International Method for communicating with surgical instrument systems
US11510741B2 (en) 2017-10-30 2022-11-29 Cilag Gmbh International Method for producing a surgical instrument comprising a smart electrical system
US11291510B2 (en) 2017-10-30 2022-04-05 Cilag Gmbh International Method of hub communication with surgical instrument systems
US11911045B2 (en) 2017-10-30 2024-02-27 Cllag GmbH International Method for operating a powered articulating multi-clip applier
US11317919B2 (en) 2017-10-30 2022-05-03 Cilag Gmbh International Clip applier comprising a clip crimping system
US11123070B2 (en) 2017-10-30 2021-09-21 Cilag Gmbh International Clip applier comprising a rotatable clip magazine
US10959744B2 (en) 2017-10-30 2021-03-30 Ethicon Llc Surgical dissectors and manufacturing techniques
CN108176640A (zh) * 2017-11-17 2018-06-19 天津津航技术物理研究所 一种提高激光陀螺腔体清洗洁净度的干燥方法
CN108122813A (zh) * 2017-12-14 2018-06-05 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) 晶圆背面清洗干燥装置、晶圆背面清洗干燥系统及方法
US11389164B2 (en) 2017-12-28 2022-07-19 Cilag Gmbh International Method of using reinforced flexible circuits with multiple sensors to optimize performance of radio frequency devices
US11304720B2 (en) 2017-12-28 2022-04-19 Cilag Gmbh International Activation of energy devices
US11818052B2 (en) 2017-12-28 2023-11-14 Cilag Gmbh International Surgical network determination of prioritization of communication, interaction, or processing based on system or device needs
US20190201112A1 (en) 2017-12-28 2019-07-04 Ethicon Llc Computer implemented interactive surgical systems
US11202570B2 (en) 2017-12-28 2021-12-21 Cilag Gmbh International Communication hub and storage device for storing parameters and status of a surgical device to be shared with cloud based analytics systems
US11903601B2 (en) 2017-12-28 2024-02-20 Cilag Gmbh International Surgical instrument comprising a plurality of drive systems
US11109866B2 (en) 2017-12-28 2021-09-07 Cilag Gmbh International Method for circular stapler control algorithm adjustment based on situational awareness
US11896322B2 (en) 2017-12-28 2024-02-13 Cilag Gmbh International Sensing the patient position and contact utilizing the mono-polar return pad electrode to provide situational awareness to the hub
US10892995B2 (en) 2017-12-28 2021-01-12 Ethicon Llc Surgical network determination of prioritization of communication, interaction, or processing based on system or device needs
US11696760B2 (en) 2017-12-28 2023-07-11 Cilag Gmbh International Safety systems for smart powered surgical stapling
US20190201113A1 (en) 2017-12-28 2019-07-04 Ethicon Llc Controls for robot-assisted surgical platforms
US11896443B2 (en) 2017-12-28 2024-02-13 Cilag Gmbh International Control of a surgical system through a surgical barrier
US11464559B2 (en) 2017-12-28 2022-10-11 Cilag Gmbh International Estimating state of ultrasonic end effector and control system therefor
US11147607B2 (en) 2017-12-28 2021-10-19 Cilag Gmbh International Bipolar combination device that automatically adjusts pressure based on energy modality
US12458351B2 (en) 2017-12-28 2025-11-04 Cilag Gmbh International Variable output cartridge sensor assembly
US10758310B2 (en) 2017-12-28 2020-09-01 Ethicon Llc Wireless pairing of a surgical device with another device within a sterile surgical field based on the usage and situational awareness of devices
US11253315B2 (en) 2017-12-28 2022-02-22 Cilag Gmbh International Increasing radio frequency to create pad-less monopolar loop
US11937769B2 (en) 2017-12-28 2024-03-26 Cilag Gmbh International Method of hub communication, processing, storage and display
US11423007B2 (en) 2017-12-28 2022-08-23 Cilag Gmbh International Adjustment of device control programs based on stratified contextual data in addition to the data
US11857152B2 (en) 2017-12-28 2024-01-02 Cilag Gmbh International Surgical hub spatial awareness to determine devices in operating theater
US11969216B2 (en) 2017-12-28 2024-04-30 Cilag Gmbh International Surgical network recommendations from real time analysis of procedure variables against a baseline highlighting differences from the optimal solution
US11364075B2 (en) 2017-12-28 2022-06-21 Cilag Gmbh International Radio frequency energy device for delivering combined electrical signals
US11308075B2 (en) 2017-12-28 2022-04-19 Cilag Gmbh International Surgical network, instrument, and cloud responses based on validation of received dataset and authentication of its source and integrity
US11317937B2 (en) 2018-03-08 2022-05-03 Cilag Gmbh International Determining the state of an ultrasonic end effector
US20190206569A1 (en) 2017-12-28 2019-07-04 Ethicon Llc Method of cloud based data analytics for use with the hub
US11666331B2 (en) 2017-12-28 2023-06-06 Cilag Gmbh International Systems for detecting proximity of surgical end effector to cancerous tissue
US11419630B2 (en) 2017-12-28 2022-08-23 Cilag Gmbh International Surgical system distributed processing
US11304699B2 (en) 2017-12-28 2022-04-19 Cilag Gmbh International Method for adaptive control schemes for surgical network control and interaction
US11284936B2 (en) 2017-12-28 2022-03-29 Cilag Gmbh International Surgical instrument having a flexible electrode
US11998193B2 (en) 2017-12-28 2024-06-04 Cilag Gmbh International Method for usage of the shroud as an aspect of sensing or controlling a powered surgical device, and a control algorithm to adjust its default operation
US11026751B2 (en) 2017-12-28 2021-06-08 Cilag Gmbh International Display of alignment of staple cartridge to prior linear staple line
US11602393B2 (en) 2017-12-28 2023-03-14 Cilag Gmbh International Surgical evacuation sensing and generator control
US11969142B2 (en) 2017-12-28 2024-04-30 Cilag Gmbh International Method of compressing tissue within a stapling device and simultaneously displaying the location of the tissue within the jaws
US20190201090A1 (en) 2017-12-28 2019-07-04 Ethicon Llc Capacitive coupled return path pad with separable array elements
US11559307B2 (en) 2017-12-28 2023-01-24 Cilag Gmbh International Method of robotic hub communication, detection, and control
US11166772B2 (en) 2017-12-28 2021-11-09 Cilag Gmbh International Surgical hub coordination of control and communication of operating room devices
US11304763B2 (en) 2017-12-28 2022-04-19 Cilag Gmbh International Image capturing of the areas outside the abdomen to improve placement and control of a surgical device in use
US11589888B2 (en) 2017-12-28 2023-02-28 Cilag Gmbh International Method for controlling smart energy devices
US11832840B2 (en) 2017-12-28 2023-12-05 Cilag Gmbh International Surgical instrument having a flexible circuit
US11744604B2 (en) 2017-12-28 2023-09-05 Cilag Gmbh International Surgical instrument with a hardware-only control circuit
US11659023B2 (en) 2017-12-28 2023-05-23 Cilag Gmbh International Method of hub communication
US11786251B2 (en) 2017-12-28 2023-10-17 Cilag Gmbh International Method for adaptive control schemes for surgical network control and interaction
US11446052B2 (en) 2017-12-28 2022-09-20 Cilag Gmbh International Variation of radio frequency and ultrasonic power level in cooperation with varying clamp arm pressure to achieve predefined heat flux or power applied to tissue
US11132462B2 (en) 2017-12-28 2021-09-28 Cilag Gmbh International Data stripping method to interrogate patient records and create anonymized record
US11324557B2 (en) 2017-12-28 2022-05-10 Cilag Gmbh International Surgical instrument with a sensing array
US11464535B2 (en) 2017-12-28 2022-10-11 Cilag Gmbh International Detection of end effector emersion in liquid
US12062442B2 (en) 2017-12-28 2024-08-13 Cilag Gmbh International Method for operating surgical instrument systems
US11864728B2 (en) 2017-12-28 2024-01-09 Cilag Gmbh International Characterization of tissue irregularities through the use of mono-chromatic light refractivity
US12396806B2 (en) 2017-12-28 2025-08-26 Cilag Gmbh International Adjustment of a surgical device function based on situational awareness
BR112020013021A2 (pt) 2017-12-28 2020-11-24 Ethicon Llc ajuste de uma função do dispositivo cirúrgico com base em reconhecimento situacional
US11304745B2 (en) 2017-12-28 2022-04-19 Cilag Gmbh International Surgical evacuation sensing and display
US11266468B2 (en) 2017-12-28 2022-03-08 Cilag Gmbh International Cooperative utilization of data derived from secondary sources by intelligent surgical hubs
US11571234B2 (en) 2017-12-28 2023-02-07 Cilag Gmbh International Temperature control of ultrasonic end effector and control system therefor
US11633237B2 (en) 2017-12-28 2023-04-25 Cilag Gmbh International Usage and technique analysis of surgeon / staff performance against a baseline to optimize device utilization and performance for both current and future procedures
US11278281B2 (en) 2017-12-28 2022-03-22 Cilag Gmbh International Interactive surgical system
US11257589B2 (en) 2017-12-28 2022-02-22 Cilag Gmbh International Real-time analysis of comprehensive cost of all instrumentation used in surgery utilizing data fluidity to track instruments through stocking and in-house processes
US11576677B2 (en) 2017-12-28 2023-02-14 Cilag Gmbh International Method of hub communication, processing, display, and cloud analytics
US11832899B2 (en) 2017-12-28 2023-12-05 Cilag Gmbh International Surgical systems with autonomously adjustable control programs
US11424027B2 (en) 2017-12-28 2022-08-23 Cilag Gmbh International Method for operating surgical instrument systems
US11786245B2 (en) 2017-12-28 2023-10-17 Cilag Gmbh International Surgical systems with prioritized data transmission capabilities
US11678881B2 (en) 2017-12-28 2023-06-20 Cilag Gmbh International Spatial awareness of surgical hubs in operating rooms
US11559308B2 (en) 2017-12-28 2023-01-24 Cilag Gmbh International Method for smart energy device infrastructure
US20190201039A1 (en) 2017-12-28 2019-07-04 Ethicon Llc Situational awareness of electrosurgical systems
US11234756B2 (en) 2017-12-28 2022-02-01 Cilag Gmbh International Powered surgical tool with predefined adjustable control algorithm for controlling end effector parameter
US11612408B2 (en) 2017-12-28 2023-03-28 Cilag Gmbh International Determining tissue composition via an ultrasonic system
US11419667B2 (en) 2017-12-28 2022-08-23 Cilag Gmbh International Ultrasonic energy device which varies pressure applied by clamp arm to provide threshold control pressure at a cut progression location
US11058498B2 (en) 2017-12-28 2021-07-13 Cilag Gmbh International Cooperative surgical actions for robot-assisted surgical platforms
US11311306B2 (en) 2017-12-28 2022-04-26 Cilag Gmbh International Surgical systems for detecting end effector tissue distribution irregularities
US11076921B2 (en) 2017-12-28 2021-08-03 Cilag Gmbh International Adaptive control program updates for surgical hubs
US11432885B2 (en) 2017-12-28 2022-09-06 Cilag Gmbh International Sensing arrangements for robot-assisted surgical platforms
US11529187B2 (en) 2017-12-28 2022-12-20 Cilag Gmbh International Surgical evacuation sensor arrangements
US11612444B2 (en) 2017-12-28 2023-03-28 Cilag Gmbh International Adjustment of a surgical device function based on situational awareness
US12096916B2 (en) 2017-12-28 2024-09-24 Cilag Gmbh International Method of sensing particulate from smoke evacuated from a patient, adjusting the pump speed based on the sensed information, and communicating the functional parameters of the system to the hub
US12127729B2 (en) 2017-12-28 2024-10-29 Cilag Gmbh International Method for smoke evacuation for surgical hub
US11410259B2 (en) 2017-12-28 2022-08-09 Cilag Gmbh International Adaptive control program updates for surgical devices
US11376002B2 (en) 2017-12-28 2022-07-05 Cilag Gmbh International Surgical instrument cartridge sensor assemblies
WO2019133144A1 (en) 2017-12-28 2019-07-04 Ethicon Llc Detection and escalation of security responses of surgical instruments to increasing severity threats
US11540855B2 (en) 2017-12-28 2023-01-03 Cilag Gmbh International Controlling activation of an ultrasonic surgical instrument according to the presence of tissue
US11291495B2 (en) 2017-12-28 2022-04-05 Cilag Gmbh International Interruption of energy due to inadvertent capacitive coupling
US10918310B2 (en) 2018-01-03 2021-02-16 Biosense Webster (Israel) Ltd. Fast anatomical mapping (FAM) using volume filling
US12376855B2 (en) 2017-12-28 2025-08-05 Cilag Gmbh International Safety systems for smart powered surgical stapling
JP7405757B2 (ja) * 2018-03-07 2023-12-26 コーニング インコーポレイテッド 静電帯電の低減のための起伏加工済みガラス表面
US11707293B2 (en) 2018-03-08 2023-07-25 Cilag Gmbh International Ultrasonic sealing algorithm with temperature control
US12303159B2 (en) 2018-03-08 2025-05-20 Cilag Gmbh International Methods for estimating and controlling state of ultrasonic end effector
US11701162B2 (en) 2018-03-08 2023-07-18 Cilag Gmbh International Smart blade application for reusable and disposable devices
US11259830B2 (en) 2018-03-08 2022-03-01 Cilag Gmbh International Methods for controlling temperature in ultrasonic device
US20200399173A1 (en) * 2018-03-09 2020-12-24 Corning Incorporated Method for minimizing dent defects in chemically strengthened glass
US11166716B2 (en) 2018-03-28 2021-11-09 Cilag Gmbh International Stapling instrument comprising a deactivatable lockout
US11090047B2 (en) 2018-03-28 2021-08-17 Cilag Gmbh International Surgical instrument comprising an adaptive control system
US11278280B2 (en) 2018-03-28 2022-03-22 Cilag Gmbh International Surgical instrument comprising a jaw closure lockout
US11589865B2 (en) 2018-03-28 2023-02-28 Cilag Gmbh International Methods for controlling a powered surgical stapler that has separate rotary closure and firing systems
US11471156B2 (en) 2018-03-28 2022-10-18 Cilag Gmbh International Surgical stapling devices with improved rotary driven closure systems
KR102159244B1 (ko) * 2018-11-12 2020-09-23 (주)합동하이텍그라스 폐태양전지 유리기판 세정용 세정액 조성물 및 이를 이용한 폐태양전지 유리기판 세정 방법
US11357503B2 (en) 2019-02-19 2022-06-14 Cilag Gmbh International Staple cartridge retainers with frangible retention features and methods of using same
US11751872B2 (en) 2019-02-19 2023-09-12 Cilag Gmbh International Insertable deactivator element for surgical stapler lockouts
US11298129B2 (en) 2019-02-19 2022-04-12 Cilag Gmbh International Method for providing an authentication lockout in a surgical stapler with a replaceable cartridge
US11369377B2 (en) 2019-02-19 2022-06-28 Cilag Gmbh International Surgical stapling assembly with cartridge based retainer configured to unlock a firing lockout
US11317915B2 (en) 2019-02-19 2022-05-03 Cilag Gmbh International Universal cartridge based key feature that unlocks multiple lockout arrangements in different surgical staplers
TW202108536A (zh) * 2019-06-10 2021-03-01 美商康寧公司 以濕化學減少玻璃靜電電荷
USD950728S1 (en) 2019-06-25 2022-05-03 Cilag Gmbh International Surgical staple cartridge
USD964564S1 (en) 2019-06-25 2022-09-20 Cilag Gmbh International Surgical staple cartridge retainer with a closure system authentication key
USD952144S1 (en) 2019-06-25 2022-05-17 Cilag Gmbh International Surgical staple cartridge retainer with firing system authentication key
CN110665927B (zh) * 2019-09-16 2021-09-21 湖北久之洋红外系统股份有限公司 一种激光系统用光学玻璃的无损清洗工艺
CN111515179B (zh) * 2020-05-07 2021-10-26 福建智罗科技有限公司 一种冻干机用内部杂质清洗收集结构
JP7715379B2 (ja) * 2021-07-05 2025-07-30 株式会社Nsc 導電層を有する板状ガラスの処理装置
TWI783828B (zh) * 2021-12-15 2022-11-11 威光自動化科技股份有限公司 曲面玻璃的清潔裝置
CN114850127B (zh) * 2022-05-30 2024-03-15 福建晶安光电有限公司 一种滤波器基片的清洗工艺
CN115763636B (zh) * 2022-12-06 2026-02-13 中润光能科技(徐州)有限公司 一种减少电池片隐裂风险的玻璃清洁方法
WO2025006093A1 (en) * 2023-06-28 2025-01-02 Corning Incorporated Wet etching of high index glass for surface strength improvement
CN118595051A (zh) * 2024-05-23 2024-09-06 长喆电(苏州)半导体技术有限公司 一种晶圆兆声波清洗机构及其使用方法
CN119588675B (zh) * 2025-02-08 2025-05-23 山西创芯光电科技有限公司 一种提升大面阵红外探测器抛光后表面洁净度的清洗方法

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5985700A (en) 1996-11-26 1999-11-16 Corning Incorporated TFT fabrication on leached glass surface
KR100248113B1 (ko) * 1997-01-21 2000-03-15 이기원 전자 표시 장치 및 기판용 세정 및 식각 조성물
US6230720B1 (en) * 1999-08-16 2001-05-15 Memc Electronic Materials, Inc. Single-operation method of cleaning semiconductors after final polishing
AU1613701A (en) 1999-11-16 2001-05-30 Procter & Gamble Company, The Ultrasonic cleaning
JP4519234B2 (ja) 2000-01-19 2010-08-04 野村マイクロ・サイエンス株式会社 物品表面の清浄化方法およびそのための清浄化装置
JP4482844B2 (ja) 2000-05-31 2010-06-16 栗田工業株式会社 ウェハの洗浄方法
JP3351419B2 (ja) 2000-06-16 2002-11-25 日本板硝子株式会社 情報記録媒体用ガラス基板の製造方法
JP2002009035A (ja) * 2000-06-26 2002-01-11 Toshiba Corp 基板洗浄方法及び基板洗浄装置
JP4083978B2 (ja) 2000-12-27 2008-04-30 ユニ・チャーム株式会社 清掃用物品
US7415841B2 (en) 2002-03-27 2008-08-26 Hoya Corporation Method for producing chemically strengthened glass substrate for information recording medium
JP2005028327A (ja) * 2003-07-10 2005-02-03 Sharp Corp 洗浄装置
US7045072B2 (en) * 2003-07-24 2006-05-16 Tan Samantha S H Cleaning process and apparatus for silicate materials
KR20050065312A (ko) * 2003-12-25 2005-06-29 마츠시타 덴끼 산교 가부시키가이샤 반도체웨이퍼의 세정방법
FR2865420B1 (fr) 2004-01-28 2007-09-14 Saint Gobain Procede de nettoyage d'un substrat
KR101232249B1 (ko) 2004-08-10 2013-02-12 간또 가가꾸 가부시끼가이샤 반도체 기판 세정액 및 반도체 기판 세정방법
US20070012335A1 (en) 2005-07-18 2007-01-18 Chang Hsiao C Photomask cleaning using vacuum ultraviolet (VUV) light cleaning
EP2177487B1 (en) 2007-08-16 2011-12-28 Asahi Glass Company, Limited Method of removing contaminant from surface of glass substrate
US8809247B2 (en) * 2008-02-15 2014-08-19 Lion Corporation Cleaning composition and method for cleaning substrate for electronic device
CN102017176A (zh) * 2008-03-25 2011-04-13 应用材料股份有限公司 结晶太阳能电池的表面清洁与纹理化工艺
EP2417241A4 (en) 2009-04-08 2014-10-15 Sunsonix METHOD AND DEVICE FOR REMOVING CONTAMINATION MATERIAL FROM SUBSTRATES
US8317934B2 (en) 2009-05-13 2012-11-27 Lam Research Corporation Multi-stage substrate cleaning method and apparatus
US20120065116A1 (en) 2009-05-21 2012-03-15 Stella Chemifa Corporation Cleaning liquid and cleaning method
US9044794B2 (en) 2009-12-31 2015-06-02 Lam Research Ag Ultrasonic cleaning fluid, method and apparatus
US8821735B2 (en) * 2010-04-01 2014-09-02 Hoya Corporation Manufacturing method of a glass substrate for a magnetic disk
JP4993046B2 (ja) * 2010-06-29 2012-08-08 コニカミノルタアドバンストレイヤー株式会社 情報記録媒体用ガラス基板の製造方法
US20120058258A1 (en) 2010-09-07 2012-03-08 Molecular Imprints, Inc. Methods of cleaning hard drive disk substrates for nanoimprint lithography
JP2012079363A (ja) * 2010-09-30 2012-04-19 Konica Minolta Opto Inc 情報記録媒体用ガラス基板の製造方法、情報記録媒体、および磁気ディスク装置
JP5692849B2 (ja) * 2010-12-27 2015-04-01 Hoya株式会社 マスクブランク用ガラス基板の製造方法、マスクブランクの製造方法、及び転写用マスクの製造方法
WO2012133374A1 (ja) * 2011-03-30 2012-10-04 コニカミノルタアドバンストレイヤー株式会社 磁気ディスク用ガラス基板の製造方法
JP2012233063A (ja) * 2011-04-28 2012-11-29 Asahi Glass Co Ltd 光学ガラス用洗浄液及び光学ガラスの洗浄方法

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US20140318578A1 (en) 2014-10-30
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CN105340057A (zh) 2016-02-17
TWI603790B (zh) 2017-11-01
CN105340057B (zh) 2018-01-16
JP2016523792A (ja) 2016-08-12
WO2014179251A1 (en) 2014-11-06
KR20160002911A (ko) 2016-01-08

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