JP6223327B2 - 触媒活性金属反応発泡材料の製造及びその応用 - Google Patents
触媒活性金属反応発泡材料の製造及びその応用 Download PDFInfo
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- JP6223327B2 JP6223327B2 JP2014513142A JP2014513142A JP6223327B2 JP 6223327 B2 JP6223327 B2 JP 6223327B2 JP 2014513142 A JP2014513142 A JP 2014513142A JP 2014513142 A JP2014513142 A JP 2014513142A JP 6223327 B2 JP6223327 B2 JP 6223327B2
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- metal
- nickel
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- foam
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- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
- C23C18/1216—Metal oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1241—Metallic substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/125—Process of deposition of the inorganic material
- C23C18/1254—Sol or sol-gel processing
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/10—Electroplating with more than one layer of the same or of different metals
- C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
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- E—FIXED CONSTRUCTIONS
- E04—BUILDING
- E04C—STRUCTURAL ELEMENTS; BUILDING MATERIALS
- E04C2/00—Building elements of relatively thin form for the construction of parts of buildings, e.g. sheet materials, slabs, or panels
- E04C2/02—Building elements of relatively thin form for the construction of parts of buildings, e.g. sheet materials, slabs, or panels characterised by specified materials
- E04C2/26—Building elements of relatively thin form for the construction of parts of buildings, e.g. sheet materials, slabs, or panels characterised by specified materials composed of materials covered by two or more of groups E04C2/04, E04C2/08, E04C2/10 or of materials covered by one of these groups with a material not specified in one of the groups
- E04C2/284—Building elements of relatively thin form for the construction of parts of buildings, e.g. sheet materials, slabs, or panels characterised by specified materials composed of materials covered by two or more of groups E04C2/04, E04C2/08, E04C2/10 or of materials covered by one of these groups with a material not specified in one of the groups at least one of the materials being insulating
- E04C2/292—Building elements of relatively thin form for the construction of parts of buildings, e.g. sheet materials, slabs, or panels characterised by specified materials composed of materials covered by two or more of groups E04C2/04, E04C2/08, E04C2/10 or of materials covered by one of these groups with a material not specified in one of the groups at least one of the materials being insulating composed of insulating material and sheet metal
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61L—METHODS OR APPARATUS FOR STERILISING MATERIALS OR OBJECTS IN GENERAL; DISINFECTION, STERILISATION OR DEODORISATION OF AIR; CHEMICAL ASPECTS OF BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES; MATERIALS FOR BANDAGES, DRESSINGS, ABSORBENT PADS OR SURGICAL ARTICLES
- A61L2209/00—Aspects relating to disinfection, sterilisation or deodorisation of air
- A61L2209/10—Apparatus features
- A61L2209/14—Filtering means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
- B01J23/76—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36
- B01J23/835—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper combined with metals, oxides or hydroxides provided for in groups B01J23/02 - B01J23/36 with germanium, tin or lead
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
- B01J27/14—Phosphorus; Compounds thereof
- B01J27/186—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J27/188—Phosphorus; Compounds thereof with arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium with chromium, molybdenum, tungsten or polonium
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0225—Coating of metal substrates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0238—Impregnation, coating or precipitation via the gaseous phase-sublimation
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- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
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- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
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Description
a)一方で、光触媒と流体流動とを結び付ける触媒材料の製造によって達成され、
b)他方で、触媒的に作用する金属又は金属酸化物を有する金属マトリクスが表面に形成されたコーティングを提供することによって達成される。
NiSO4.6H2O 350g/l
NiCl2.6H2O 45g/l
H3BO3 45g/l
T 55℃
pH 4
TiO2 20−150g/l、粒子サイズ0−3μm
カソード電流密度 5A/dm2
カチオン活性フルオロ界面活性剤 0.2g/l FT248(BASF社)
Claims (8)
- 汚染物質を除去するための触媒材料を製造する方法であって、
a)少なくとも10mmの厚さを有する網状プラスチック発泡体で作られたパネルを提供するステップと、
b)前記パネルの表面に2つの金属層を適用するステップであって、前記金属は銅である、ステップと、
c)浸漬、フローコーティング、又はスプレーによって、ゾルゲル法において溶液から光触媒TiO2物質を適用するステップと、
を含み、ステップb)の後であってステップc)の前に、アルミニウム、ニッケル、錫、亜鉛、銀、パラジウム、プラチナ、又はその合金のさらなる金属層が適用されることを特徴とする、方法。 - 前記さらなる金属層の前記金属は、ニッケル、錫、銀、又はその合金から選択されることを特徴とする、請求項1に記載の方法。
- 汚染物質を除去するための触媒材料であって、
a)少なくとも10mmの厚さを有する網状プラスチック発泡体で作られたパネルと、
b)前記パネルの表面上の2つの金属層であって、前記金属は銅である、金属層と、
c)光触媒TiO2物質と、
を含み、b)2つの銅層とc)光触媒TiO2物質との間に、アルミニウム、ニッケル、錫、亜鉛、銀、パラジウム、プラチナ、又はその合金で作られたさらなる金属層が適用されることを特徴とする、触媒材料。 - 前記さらなる金属層の前記金属は、ニッケル、錫、銀、又はその合金から選択されることを特徴とする、請求項3に記載の触媒材料。
- 請求項3または4に記載の触媒材料のパネルを含み、且つその間にUVランプが埋め込まれている、バクテリア、ウイルス、真菌胞子、及び微ダストを流体から除去するためのリアクタ。
- 前記流体は洗浄される空気であることを特徴とする、請求項5に記載のリアクタ。
- 前記リアクタは換気ユニットをさらに含むことを特徴とする、請求項6に記載のリアクタ。
- 前記流体は純化される水であることを特徴とする、請求項5に記載のリアクタ。
Applications Claiming Priority (3)
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DE102011050758A DE102011050758A1 (de) | 2011-05-31 | 2011-05-31 | Optofluidik-Reaktor |
DE102011050758.2 | 2011-05-31 | ||
PCT/EP2012/059897 WO2012163853A2 (de) | 2011-05-31 | 2012-05-25 | Herstellung eines katalytisch wirksamen, metallisierten reaktiven schaumwerkstoffes und anwendung für diesen |
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JP2017075783A Pending JP2017127873A (ja) | 2011-05-31 | 2017-04-06 | 触媒活性金属反応発泡材料の製造及びその応用 |
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US (1) | US9346041B2 (ja) |
EP (1) | EP2726204A2 (ja) |
JP (2) | JP6223327B2 (ja) |
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Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6078336B2 (ja) * | 2012-12-27 | 2017-02-08 | 日本ピラー工業株式会社 | 光触媒担持体およびその製造方法 |
CN106794450B (zh) * | 2014-08-29 | 2020-12-25 | 日东电工株式会社 | 光催化涂层及其制备方法 |
CN106574791A (zh) * | 2015-06-29 | 2017-04-19 | 株式公司轻呼吸 | 包含改良触媒性能的除烟净化杀菌组件的除烟净化杀菌装置 |
DE102016209952A1 (de) | 2016-06-07 | 2017-12-07 | Robert Bosch Gmbh | Filtervorrichtung |
JP7130198B2 (ja) | 2017-06-29 | 2022-09-05 | 日本光電工業株式会社 | 積層化細胞シートの製造方法、及びそれにより作製される積層化細胞シート |
EP4351780A1 (en) * | 2021-06-08 | 2024-04-17 | Photio SPA | A high-efficient decontaminant additive comprising metal oxide nanoparticles in a metallic or semi-metallic nanoparticle matrix, useful to be added in paints, formulations or the like for protecting, coating or decorating, soft or hard, surfaces |
CN115814746A (zh) * | 2021-09-16 | 2023-03-21 | 中国科学院大连化学物理研究所 | 一种整体式吸附灭活材料及其制备方法和应用 |
DE102022113128A1 (de) | 2022-05-24 | 2023-11-30 | Zahnen Technik Gmbh | Wasseraufbereitungsanlage zum Zerstören von organischen Schadstoffen im Wasser und Verwendung einer Wasseraufbereitungsanlage |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3522287A1 (de) | 1985-06-21 | 1987-01-02 | Moc Danner Gmbh | Offenporiger koerper zum filtern und/oder katalytischen behandeln von gasen oder fluessigkeiten und verfahren zu seiner herstellung |
DE3916713A1 (de) | 1989-05-23 | 1990-11-29 | Hoechst Ag | Dreidimensional verformter, metallisierter netzwerkstoff, verfahren zu seiner herstellung und seine verwendung |
DE3920428A1 (de) | 1989-06-22 | 1991-01-03 | Gutec Gmbh | Traegerkatalysator zur zersetzung von ozon |
JP2630575B2 (ja) * | 1995-02-17 | 1997-07-16 | 株式会社鈴寅 | シート状の消臭用光触媒 |
US6830785B1 (en) * | 1995-03-20 | 2004-12-14 | Toto Ltd. | Method for photocatalytically rendering a surface of a substrate superhydrophilic, a substrate with a superhydrophilic photocatalytic surface, and method of making thereof |
DE69729513T2 (de) | 1996-02-28 | 2005-05-25 | Hoya Corp. | Filtervorrichtung mit photokatalysator |
JPH1072664A (ja) * | 1996-08-29 | 1998-03-17 | Bridgestone Corp | 光触媒被覆体 |
JP3781065B2 (ja) * | 1996-08-29 | 2006-05-31 | 株式会社ブリヂストン | 光触媒体 |
US6051117A (en) * | 1996-12-12 | 2000-04-18 | Eltech Systems, Corp. | Reticulated metal article combining small pores with large apertures |
JP3275032B2 (ja) * | 1997-03-03 | 2002-04-15 | 独立行政法人産業技術総合研究所 | 環境浄化材料及びその製造方法 |
JPH10329261A (ja) * | 1997-06-03 | 1998-12-15 | Asahi Chem Ind Co Ltd | 高分子材料無機薄膜積層品 |
EP0911078A1 (en) * | 1997-10-20 | 1999-04-28 | Hitachi Metals, Ltd. | Photocatalyst-supporting body and photocatalytic apparatus |
JPH11158694A (ja) * | 1997-11-27 | 1999-06-15 | Toto Ltd | 親水性メッキを施した物品及びメッキ方法 |
US6154311A (en) * | 1998-04-20 | 2000-11-28 | Simtek Hardcoatings, Inc. | UV reflective photocatalytic dielectric combiner having indices of refraction greater than 2.0 |
JP3018034B2 (ja) * | 1998-05-28 | 2000-03-13 | ライザー工業株式会社 | 紫外線殺菌浄化方法とその装置 |
JP2000084415A (ja) * | 1998-09-11 | 2000-03-28 | Nobuyuki Koura | 光触媒作用を有する複合材およびその製造方法 |
JP2000192368A (ja) * | 1998-12-24 | 2000-07-11 | Toray Ind Inc | 繊維構造物 |
JP2000210534A (ja) * | 1999-01-25 | 2000-08-02 | Mitsubishi Paper Mills Ltd | 光触媒脱臭フィルタ― |
US6537379B1 (en) * | 2000-01-13 | 2003-03-25 | Hrl Laboratories, Llc | Photocatalytic coating and method for cleaning spacecraft surfaces |
DE10013237A1 (de) | 2000-03-10 | 2002-04-25 | Dieter Meissner | Schaum, Verfahren zur Herstellung von Schaum und Verwendung von Schaum |
US6815052B2 (en) * | 2000-12-01 | 2004-11-09 | P1 Diamond, Inc. | Filled diamond foam material and method for forming same |
JP3945255B2 (ja) * | 2001-01-29 | 2007-07-18 | 住友チタニウム株式会社 | 光触媒複合材とその製造方法 |
JP3791901B2 (ja) * | 2001-07-16 | 2006-06-28 | 株式会社ノリタケカンパニーリミテド | 光触媒保持体およびその製造方法 |
DE10210465A1 (de) | 2002-03-04 | 2003-10-09 | Fraunhofer Ges Forschung | Photokatalytisches Element zur Aufspaltung von Wasserstoff enthaltenden Verbindungen |
WO2004043691A1 (en) * | 2002-11-12 | 2004-05-27 | University Of Virginia Patent Foundation | Extremely strain tolerant thermal protection coating and related method and apparatus thereof |
US7354650B2 (en) * | 2004-05-28 | 2008-04-08 | Ppg Industries Ohio, Inc. | Multi-layer coatings with an inorganic oxide network containing layer and methods for their application |
US7354624B2 (en) * | 2004-05-28 | 2008-04-08 | Ppg Industries Ohio, Inc. | Multi-layer coatings and related methods |
JP2007275292A (ja) * | 2006-04-06 | 2007-10-25 | Bridgestone Corp | 消臭フィルタ及び消臭装置 |
EP2007694B2 (de) * | 2006-04-07 | 2024-02-14 | INTERPANE Entwicklungs-und Beratungsgesellschaft mbH | Witterungsbeständiges schichtsystem |
US8017247B2 (en) * | 2007-03-30 | 2011-09-13 | Alcoa Inc. | Self cleaning aluminum alloy substrates |
JP5565602B2 (ja) * | 2008-07-02 | 2014-08-06 | 住友電気工業株式会社 | 多孔質光触媒素子 |
CN102164653B (zh) * | 2008-09-29 | 2015-05-27 | 开利公司 | 用于室内空气品质应用的催化基板和形成催化涂层的方法 |
US8372477B2 (en) * | 2009-06-11 | 2013-02-12 | Basf Corporation | Polymeric trap with adsorbent |
US8673157B2 (en) | 2009-09-15 | 2014-03-18 | Basf Se | Photoreactor |
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2011
- 2011-05-31 DE DE102011050758A patent/DE102011050758A1/de not_active Ceased
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2012
- 2012-05-25 CN CN201610105862.XA patent/CN105749989A/zh active Pending
- 2012-05-25 EP EP12729903.0A patent/EP2726204A2/de not_active Withdrawn
- 2012-05-25 US US14/122,449 patent/US9346041B2/en not_active Expired - Fee Related
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- 2012-05-25 WO PCT/EP2012/059897 patent/WO2012163853A2/de active Application Filing
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2014
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- 2014-08-15 HK HK16114610A patent/HK1227353A1/zh unknown
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Also Published As
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EP2726204A2 (de) | 2014-05-07 |
US9346041B2 (en) | 2016-05-24 |
JP2017127873A (ja) | 2017-07-27 |
DE102011050758A1 (de) | 2012-12-06 |
WO2012163853A2 (de) | 2012-12-06 |
CN105749989A (zh) | 2016-07-13 |
US20140179513A1 (en) | 2014-06-26 |
CN103635259A (zh) | 2014-03-12 |
CN103635259B (zh) | 2016-03-16 |
HK1195027A1 (zh) | 2014-10-31 |
HK1227353A1 (zh) | 2017-10-20 |
WO2012163853A3 (de) | 2013-01-24 |
JP2014523335A (ja) | 2014-09-11 |
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