JP6121051B2 - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法 Download PDFInfo
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- JP6121051B2 JP6121051B2 JP2016514668A JP2016514668A JP6121051B2 JP 6121051 B2 JP6121051 B2 JP 6121051B2 JP 2016514668 A JP2016514668 A JP 2016514668A JP 2016514668 A JP2016514668 A JP 2016514668A JP 6121051 B2 JP6121051 B2 JP 6121051B2
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- resist layer
- film
- semiconductor device
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- wet etching
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- 239000004065 semiconductor Substances 0.000 title claims description 40
- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000000758 substrate Substances 0.000 claims description 38
- 238000001039 wet etching Methods 0.000 claims description 23
- 238000005530 etching Methods 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 20
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims description 18
- 229920002120 photoresistant polymer Polymers 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 16
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims description 14
- 229910010271 silicon carbide Inorganic materials 0.000 claims description 14
- 206010034972 Photosensitivity reaction Diseases 0.000 claims description 11
- 230000036211 photosensitivity Effects 0.000 claims description 11
- 239000000463 material Substances 0.000 claims description 7
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 229920003986 novolac Polymers 0.000 claims description 5
- 239000010410 layer Substances 0.000 description 59
- 239000011229 interlayer Substances 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- 238000000059 patterning Methods 0.000 description 9
- 239000000243 solution Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 6
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- SCKXCAADGDQQCS-UHFFFAOYSA-N Performic acid Chemical compound OOC=O SCKXCAADGDQQCS-UHFFFAOYSA-N 0.000 description 5
- 239000013078 crystal Substances 0.000 description 5
- 238000005286 illumination Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 206010047571 Visual impairment Diseases 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000011342 resin composition Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
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- 238000004321 preservation Methods 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
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- Electrodes Of Semiconductors (AREA)
Description
図1は、本実施の形態のパワーデバイス100(半導体装置)の一部(図中、右端部)の構成を概略的に示す。パワーデバイス100はショットキーバリアダイオードであり、炭化珪素基板10(半導体基板)と層間絶縁膜30とアノード電極40とカソード電極51と保護膜52とを有する。
図2を参照して、炭化珪素基板10のエピタキシャル層20にガードリング21および22が形成される。次にエピタキシャル層20上に層間絶縁膜30が形成される。すなわち、TEOS膜の成膜と、そのパターニングとが行われる。次に、層間絶縁膜30が設けられたエピタキシャル層20上にTi膜41が堆積される。
Claims (3)
- 半導体基板上に配置された金属膜上に、少なくとも一の波長に対して感光性を有するポジ型フォトレジストを用いてレジスト層を塗布する工程と、
前記一の波長領域を含む光によって前記レジスト層を露光する工程と、
露光された前記レジスト層を現像する工程と、
前記レジスト層を現像する工程の後、エッチング装置において、前記レジスト層をマスクとして用いて前記金属膜に対してウェットエッチングを行なう工程を備え、前記エッチング装置は、前記一の波長以下の波長がカットされた光を発する照明装置によって照明された環境下に設置されており、
前記金属膜はTi膜を含み、前記ポジ型フォトレジストはノボラック系の材料を含み、前記ウェットエッチングを行なう工程は、エッチング液として過酸化水素を含む水溶液を用いて行なわれる、半導体装置の製造方法。 - 前記レジスト層を現像する工程の後かつ前記ウェットエッチングを行なう工程の前に、遮光性を有する容器内に前記半導体基板を保管する工程をさらに備える、請求項1に記載の半導体装置の製造方法。
- 前記半導体基板は炭化珪素基板であり、前記炭化珪素基板および前記Ti膜がショットキー接合をなしている、請求項1に記載の半導体装置の製造方法。
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JPH08203809A (ja) * | 1995-01-30 | 1996-08-09 | Fuji Electric Co Ltd | 半導体素子の製造方法 |
US20010038972A1 (en) | 1998-11-20 | 2001-11-08 | Christopher F. Lyons | Ultra-thin resist shallow trench process using metal hard mask |
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