JP6094786B2 - フィラメント交換器及びフィラメント交換構造 - Google Patents
フィラメント交換器及びフィラメント交換構造 Download PDFInfo
- Publication number
- JP6094786B2 JP6094786B2 JP2012117041A JP2012117041A JP6094786B2 JP 6094786 B2 JP6094786 B2 JP 6094786B2 JP 2012117041 A JP2012117041 A JP 2012117041A JP 2012117041 A JP2012117041 A JP 2012117041A JP 6094786 B2 JP6094786 B2 JP 6094786B2
- Authority
- JP
- Japan
- Prior art keywords
- filament
- exchanger
- vacuum chamber
- auxiliary
- support structure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005468 ion implantation Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 239000004973 liquid crystal related substance Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010884 ion-beam technique Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000005192 partition Methods 0.000 description 3
- 239000000470 constituent Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 125000002066 L-histidyl group Chemical group [H]N1C([H])=NC(C([H])([H])[C@](C(=O)[*])([H])N([H])[H])=C1[H] 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000004568 cement Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/34—Double-wall vessels or containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J5/00—Details relating to vessels or to leading-in conductors common to two or more basic types of discharge tubes or lamps
- H01J5/02—Vessels; Containers; Shields associated therewith; Vacuum locks
- H01J5/14—Dismountable vessels or containers, e.g. for replacing cathode heater
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/186—Valves
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Packages (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012117041A JP6094786B2 (ja) | 2012-05-22 | 2012-05-22 | フィラメント交換器及びフィラメント交換構造 |
CN201310009476.7A CN103426705B (zh) | 2012-05-22 | 2013-01-10 | 灯丝更换器和灯丝更换结构 |
KR1020130008031A KR101341827B1 (ko) | 2012-05-22 | 2013-01-24 | 필라멘트 교환기 및 필라멘트 교환 구조 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012117041A JP6094786B2 (ja) | 2012-05-22 | 2012-05-22 | フィラメント交換器及びフィラメント交換構造 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013243098A JP2013243098A (ja) | 2013-12-05 |
JP6094786B2 true JP6094786B2 (ja) | 2017-03-15 |
Family
ID=49651295
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012117041A Active JP6094786B2 (ja) | 2012-05-22 | 2012-05-22 | フィラメント交換器及びフィラメント交換構造 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP6094786B2 (ko) |
KR (1) | KR101341827B1 (ko) |
CN (1) | CN103426705B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6474036B2 (ja) * | 2015-03-11 | 2019-02-27 | 日新イオン機器株式会社 | 部材交換器 |
JP6455494B2 (ja) * | 2016-09-15 | 2019-01-23 | 日新イオン機器株式会社 | イオン源 |
CN106653529B (zh) * | 2016-10-31 | 2018-07-24 | 中国电子科技集团公司第四十八研究所 | 一种宽束流的条形离子源 |
US20230375445A1 (en) * | 2022-05-19 | 2023-11-23 | Fei Company | Broad ion beam (bib) systems for more efficient processing of multiple samples |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5835851A (ja) * | 1981-08-28 | 1983-03-02 | Jeol Ltd | 電子線装置におけるフイラメント交換機構 |
JPS61104538A (ja) * | 1984-10-26 | 1986-05-22 | Hitachi Ltd | イオン源 |
JPH04292841A (ja) * | 1991-03-20 | 1992-10-16 | Ishikawajima Harima Heavy Ind Co Ltd | 電子銃カソードの真空内交換機構 |
JP3518320B2 (ja) * | 1998-02-27 | 2004-04-12 | 日新電機株式会社 | イオン源およびそのフィラメント交換方法 |
TWI274978B (en) * | 2004-02-25 | 2007-03-01 | Advanced Display Proc Eng Co | Apparatus for manufacturing flat-panel display |
JP2008234895A (ja) * | 2007-03-19 | 2008-10-02 | Ihi Corp | イオン源及びそのフィラメント交換方法 |
JP2008246380A (ja) * | 2007-03-30 | 2008-10-16 | Ihi Corp | 真空処理装置及びそのメンテナンス方法 |
JP4491795B2 (ja) | 2007-03-30 | 2010-06-30 | 株式会社Ihi | 物品交換機構および物品交換方法 |
JP2009245725A (ja) * | 2008-03-31 | 2009-10-22 | Jeol Ltd | 電子ビーム発生装置 |
JP2010015750A (ja) | 2008-07-02 | 2010-01-21 | Ihi Corp | 電気機能体の交換機構と交換方法 |
JP2013004272A (ja) | 2011-06-15 | 2013-01-07 | Nissin Ion Equipment Co Ltd | イオン源およびイオン注入装置 |
-
2012
- 2012-05-22 JP JP2012117041A patent/JP6094786B2/ja active Active
-
2013
- 2013-01-10 CN CN201310009476.7A patent/CN103426705B/zh active Active
- 2013-01-24 KR KR1020130008031A patent/KR101341827B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20130130619A (ko) | 2013-12-02 |
KR101341827B1 (ko) | 2013-12-17 |
CN103426705B (zh) | 2016-05-18 |
CN103426705A (zh) | 2013-12-04 |
JP2013243098A (ja) | 2013-12-05 |
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