JP6088534B2 - 情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法、および、円盤状のガラス基板 - Google Patents
情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法、および、円盤状のガラス基板 Download PDFInfo
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- JP6088534B2 JP6088534B2 JP2014538343A JP2014538343A JP6088534B2 JP 6088534 B2 JP6088534 B2 JP 6088534B2 JP 2014538343 A JP2014538343 A JP 2014538343A JP 2014538343 A JP2014538343 A JP 2014538343A JP 6088534 B2 JP6088534 B2 JP 6088534B2
- Authority
- JP
- Japan
- Prior art keywords
- glass substrate
- information recording
- recording medium
- main surface
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910003460 diamond Inorganic materials 0.000 claims description 15
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- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 12
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- 238000003426 chemical strengthening reaction Methods 0.000 description 10
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- 238000003754 machining Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
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- 238000010586 diagram Methods 0.000 description 5
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- 239000000126 substance Substances 0.000 description 5
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- 229910052804 chromium Inorganic materials 0.000 description 4
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- 238000004544 sputter deposition Methods 0.000 description 4
- 229910000943 NiAl Inorganic materials 0.000 description 3
- NPXOKRUENSOPAO-UHFFFAOYSA-N Raney nickel Chemical compound [Al].[Ni] NPXOKRUENSOPAO-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 238000007496 glass forming Methods 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910001928 zirconium oxide Inorganic materials 0.000 description 3
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 3
- 229910001149 41xx steel Inorganic materials 0.000 description 2
- 229910000599 Cr alloy Inorganic materials 0.000 description 2
- 238000006124 Pilkington process Methods 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000005357 flat glass Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 238000005339 levitation Methods 0.000 description 2
- 239000000314 lubricant Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010702 perfluoropolyether Substances 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910001415 sodium ion Inorganic materials 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910019222 CoCrPt Inorganic materials 0.000 description 1
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000005456 alcohol based solvent Substances 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 150000001721 carbon Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000003280 down draw process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 239000010922 glass waste Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910001416 lithium ion Inorganic materials 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 239000010687 lubricating oil Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
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- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
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- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 238000007500 overflow downdraw method Methods 0.000 description 1
- 238000002559 palpation Methods 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 238000004439 roughness measurement Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Optical Record Carriers And Manufacture Thereof (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012214509 | 2012-09-27 | ||
| JP2012214509 | 2012-09-27 | ||
| PCT/JP2013/074088 WO2014050507A1 (ja) | 2012-09-27 | 2013-09-06 | 情報記録媒体用ガラス基板の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2014050507A1 JPWO2014050507A1 (ja) | 2016-08-22 |
| JP6088534B2 true JP6088534B2 (ja) | 2017-03-01 |
Family
ID=50387915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014538343A Active JP6088534B2 (ja) | 2012-09-27 | 2013-09-06 | 情報記録媒体用ガラス基板の製造方法、情報記録媒体の製造方法、および、円盤状のガラス基板 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6088534B2 (zh) |
| CN (1) | CN104603876B (zh) |
| MY (2) | MY196751A (zh) |
| SG (2) | SG10201710603UA (zh) |
| WO (1) | WO2014050507A1 (zh) |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004303280A (ja) * | 2003-03-28 | 2004-10-28 | Hoya Corp | 情報記録媒体用ガラス基板の製造方法 |
| JP4707311B2 (ja) * | 2003-08-08 | 2011-06-22 | 花王株式会社 | 磁気ディスク用基板 |
| JPWO2008062657A1 (ja) * | 2006-11-22 | 2010-03-04 | コニカミノルタオプト株式会社 | 情報記録媒体用ガラス基板の製造方法、情報記録媒体用ガラス基板及び情報記録媒体 |
| JP5029952B2 (ja) * | 2007-09-06 | 2012-09-19 | 富士電機株式会社 | ガラス基板およびその製造方法、ならびに当該ガラス基板を用いた磁気ディスク |
| JP5005645B2 (ja) * | 2007-09-27 | 2012-08-22 | Ｈｏｙａ株式会社 | 磁気ディスク用ガラス基板の製造方法及び磁気ディスクの製造方法 |
| JP2009129486A (ja) * | 2007-11-21 | 2009-06-11 | Sony Corp | 情報記録媒体基板製造方法 |
| JP5297321B2 (ja) * | 2008-10-07 | 2013-09-25 | Ｈｏｙａ株式会社 | 磁気ディスク用ガラス基板の製造方法 |
| US8603350B2 (en) * | 2009-07-17 | 2013-12-10 | Ohara Inc. | Method of manufacturing substrate for information storage media |
| JP2011040145A (ja) * | 2009-07-17 | 2011-02-24 | Ohara Inc | 情報記録媒体用基板の製造方法 |
| JP5690540B2 (ja) * | 2010-09-30 | 2015-03-25 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法 |
| JP2012216255A (ja) * | 2011-03-31 | 2012-11-08 | Hoya Corp | 磁気ディスク用ガラス基板の製造方法 |
-
2013
- 2013-09-06 MY MYPI2021001706A patent/MY196751A/en unknown
- 2013-09-06 WO PCT/JP2013/074088 patent/WO2014050507A1/ja active Application Filing
- 2013-09-06 CN CN201380044617.7A patent/CN104603876B/zh active Active
- 2013-09-06 SG SG10201710603UA patent/SG10201710603UA/en unknown
- 2013-09-06 JP JP2014538343A patent/JP6088534B2/ja active Active
- 2013-09-06 SG SG11201501506QA patent/SG11201501506QA/en unknown
- 2013-09-06 MY MYPI2015700625A patent/MY181660A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| MY181660A (en) | 2020-12-31 |
| WO2014050507A1 (ja) | 2014-04-03 |
| CN104603876A (zh) | 2015-05-06 |
| SG10201710603UA (en) | 2018-02-27 |
| CN104603876B (zh) | 2018-06-12 |
| JPWO2014050507A1 (ja) | 2016-08-22 |
| MY196751A (en) | 2023-05-03 |
| SG11201501506QA (en) | 2015-05-28 |
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