JP6080354B2 - 圧電材料、圧電素子、液体吐出ヘッド、超音波モータおよび塵埃除去装置 - Google Patents

圧電材料、圧電素子、液体吐出ヘッド、超音波モータおよび塵埃除去装置 Download PDF

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Publication number
JP6080354B2
JP6080354B2 JP2011277566A JP2011277566A JP6080354B2 JP 6080354 B2 JP6080354 B2 JP 6080354B2 JP 2011277566 A JP2011277566 A JP 2011277566A JP 2011277566 A JP2011277566 A JP 2011277566A JP 6080354 B2 JP6080354 B2 JP 6080354B2
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Japan
Prior art keywords
piezoelectric
piezoelectric material
piezoelectric element
electrode
present
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Active
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JP2011277566A
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English (en)
Japanese (ja)
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JP2013128073A5 (enExample
JP2013128073A (ja
Inventor
三浦　薫
薫 三浦
久保田　純
純 久保田
潤平 林
潤平 林
隆之 渡邉
隆之 渡邉
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Canon Inc
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Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2011277566A priority Critical patent/JP6080354B2/ja
Priority to US13/715,510 priority patent/US8981626B2/en
Publication of JP2013128073A publication Critical patent/JP2013128073A/ja
Publication of JP2013128073A5 publication Critical patent/JP2013128073A5/ja
Application granted granted Critical
Publication of JP6080354B2 publication Critical patent/JP6080354B2/ja
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/02—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by distortion, beating, or vibration of the surface to be cleaned
    • B08B7/026—Using sound waves
    • B08B7/028—Using ultrasounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/14—Structure thereof only for on-demand ink jet heads
    • B41J2/14201—Structure of print heads with piezoelectric elements
    • B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/10—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors
    • H02N2/106—Langevin motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02N—ELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N2/00—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction
    • H02N2/10—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors
    • H02N2/16—Electric machines in general using piezoelectric effect, electrostriction or magnetostriction producing rotary motion, e.g. rotary motors using travelling waves, i.e. Rayleigh surface waves
    • H02N2/163—Motors with ring stator
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/80—Constructional details
    • H10N30/85—Piezoelectric or electrostrictive active materials
    • H10N30/853—Ceramic compositions
    • H10N30/8536—Alkaline earth metal based oxides, e.g. barium titanates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2202/00—Embodiments of or processes related to ink-jet or thermal heads
    • B41J2202/01—Embodiments of or processes related to ink-jet heads
    • B41J2202/03—Specific materials used
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Ceramic Products (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Apparatuses For Generation Of Mechanical Vibrations (AREA)
  • Physical Vapour Deposition (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
JP2011277566A 2011-12-19 2011-12-19 圧電材料、圧電素子、液体吐出ヘッド、超音波モータおよび塵埃除去装置 Active JP6080354B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2011277566A JP6080354B2 (ja) 2011-12-19 2011-12-19 圧電材料、圧電素子、液体吐出ヘッド、超音波モータおよび塵埃除去装置
US13/715,510 US8981626B2 (en) 2011-12-19 2012-12-14 Piezoelectric material, piezoelectric element, liquid ejection head, ultrasonic motor, and dust removing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011277566A JP6080354B2 (ja) 2011-12-19 2011-12-19 圧電材料、圧電素子、液体吐出ヘッド、超音波モータおよび塵埃除去装置

Publications (3)

Publication Number Publication Date
JP2013128073A JP2013128073A (ja) 2013-06-27
JP2013128073A5 JP2013128073A5 (enExample) 2015-02-19
JP6080354B2 true JP6080354B2 (ja) 2017-02-15

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JP2011277566A Active JP6080354B2 (ja) 2011-12-19 2011-12-19 圧電材料、圧電素子、液体吐出ヘッド、超音波モータおよび塵埃除去装置

Country Status (2)

Country Link
US (1) US8981626B2 (enExample)
JP (1) JP6080354B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6509194B2 (ja) 2014-03-13 2019-05-08 国立研究開発法人科学技術振興機構 ペロブスカイト型金属酸窒化物の製造方法
US10522288B2 (en) * 2017-03-31 2019-12-31 Tdk Corporation Polycrystalline dielectric thin film and capacitance element
US10329200B2 (en) 2015-10-02 2019-06-25 Tdk Corporation Dielectric thin film, capacitor element, and electronic component
JP6683476B2 (ja) * 2015-12-25 2020-04-22 日本特殊陶業株式会社 圧電素子およびその製造方法、異物除去ユニットならびに超音波センサ
JP6810427B2 (ja) * 2016-02-01 2021-01-06 Tdk株式会社 誘電体磁器組成物および電子部品
CN108603276B (zh) * 2016-02-01 2020-07-03 Tdk株式会社 多晶介电体薄膜及电容元件
US10475586B2 (en) * 2017-03-31 2019-11-12 Tdk Corporation Oxynitride thin film and capacitance element
JP7000882B2 (ja) * 2017-03-31 2022-01-19 Tdk株式会社 酸窒化物薄膜および容量素子
US10479732B2 (en) * 2017-03-31 2019-11-19 Tdk Corporation Oxynitride thin film and capacitance element
JP7000883B2 (ja) * 2017-03-31 2022-01-19 Tdk株式会社 酸窒化物薄膜および容量素子
CN108199619B (zh) * 2018-01-23 2019-06-21 南京邮电大学 互补型压电能量收集器及其制作方法
JP7569698B2 (ja) * 2020-01-31 2024-10-18 Tdk株式会社 金属酸窒化物薄膜および容量素子
CN112085939A (zh) * 2020-09-09 2020-12-15 广州伽年科技有限公司 一种便于互联网数据采集信息传输装置
CN113182157B (zh) * 2021-04-27 2023-04-18 之江实验室 一种柔性压电超声波换能器

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2573060B1 (fr) * 1984-11-13 1987-02-20 Centre Nat Rech Scient Composes azotes ou oxyazotes a structure perovskite, leur preparation et leur application a la fabrication de composants dielectriques
FR2769612A1 (fr) * 1997-10-13 1999-04-16 Rhodia Chimie Sa Composition oxynitruree a base d'un alcalino-terreux et de tantale ou d'un alcalino-terreux et de niobium, procedes de preparation et utilisation comme pigment colorant
US20020036282A1 (en) * 1998-10-19 2002-03-28 Yet-Ming Chiang Electromechanical actuators
EP1037244A3 (en) * 1999-03-12 2003-01-08 TDK Corporation Electron-emitting material and preparing process
JP3137960B2 (ja) * 1999-03-12 2001-02-26 ティーディーケイ株式会社 電子放出材料
JP2004292180A (ja) * 2003-03-25 2004-10-21 Hiroshi Irie 強誘電体材料及びその製造方法
JP2010143789A (ja) * 2008-12-18 2010-07-01 Canon Inc 圧電体材料
JP2010143788A (ja) * 2008-12-18 2010-07-01 Canon Inc 酸窒化物圧電材料及びその製造方法

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US8981626B2 (en) 2015-03-17
US20130154443A1 (en) 2013-06-20
JP2013128073A (ja) 2013-06-27

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