JP5974813B2 - 光硬化性インクジェットインクおよび該インクから得られる撥液性硬化膜 - Google Patents

光硬化性インクジェットインクおよび該インクから得られる撥液性硬化膜 Download PDF

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Publication number
JP5974813B2
JP5974813B2 JP2012231905A JP2012231905A JP5974813B2 JP 5974813 B2 JP5974813 B2 JP 5974813B2 JP 2012231905 A JP2012231905 A JP 2012231905A JP 2012231905 A JP2012231905 A JP 2012231905A JP 5974813 B2 JP5974813 B2 JP 5974813B2
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JP
Japan
Prior art keywords
meth
acrylate
ink
cured film
liquid repellent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2012231905A
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English (en)
Japanese (ja)
Other versions
JP2014084339A (ja
Inventor
克幸 杉原
克幸 杉原
伊丹　節男
節男 伊丹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JNC Corp
Original Assignee
JNC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JNC Corp filed Critical JNC Corp
Priority to JP2012231905A priority Critical patent/JP5974813B2/ja
Priority to TW102136901A priority patent/TWI585167B/zh
Priority to KR1020130123354A priority patent/KR102068506B1/ko
Publication of JP2014084339A publication Critical patent/JP2014084339A/ja
Application granted granted Critical
Publication of JP5974813B2 publication Critical patent/JP5974813B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/40—Ink-sets specially adapted for multi-colour inkjet printing
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ink Jet Recording Methods And Recording Media Thereof (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Ink Jet (AREA)
  • Laminated Bodies (AREA)
JP2012231905A 2012-10-19 2012-10-19 光硬化性インクジェットインクおよび該インクから得られる撥液性硬化膜 Expired - Fee Related JP5974813B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2012231905A JP5974813B2 (ja) 2012-10-19 2012-10-19 光硬化性インクジェットインクおよび該インクから得られる撥液性硬化膜
TW102136901A TWI585167B (zh) 2012-10-19 2013-10-14 光硬化性噴墨墨水、撥液性硬化膜、積層體、光學零件以及影像顯示裝置
KR1020130123354A KR102068506B1 (ko) 2012-10-19 2013-10-16 광경화성 잉크젯, 발액성 경화막, 적층체, 광학 부품 및 영상 표시 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012231905A JP5974813B2 (ja) 2012-10-19 2012-10-19 光硬化性インクジェットインクおよび該インクから得られる撥液性硬化膜

Publications (2)

Publication Number Publication Date
JP2014084339A JP2014084339A (ja) 2014-05-12
JP5974813B2 true JP5974813B2 (ja) 2016-08-23

Family

ID=50655945

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012231905A Expired - Fee Related JP5974813B2 (ja) 2012-10-19 2012-10-19 光硬化性インクジェットインクおよび該インクから得られる撥液性硬化膜

Country Status (3)

Country Link
JP (1) JP5974813B2 (ko)
KR (1) KR102068506B1 (ko)
TW (1) TWI585167B (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9835769B2 (en) 2015-05-04 2017-12-05 Microsoft Technology Licensing Llc Optical effect coating
WO2017002961A1 (ja) * 2015-07-02 2017-01-05 東亞合成株式会社 硬化型組成物
JP6583414B2 (ja) * 2015-07-02 2019-10-02 東亞合成株式会社 硬化型組成物
CN107922555B (zh) * 2015-08-21 2020-08-28 东亚合成株式会社 固化型组合物
CN105301902B (zh) * 2015-11-10 2020-01-10 杭州福斯特应用材料股份有限公司 一种具有酯键相连芴单元及硅氧烷的正型感光性聚酰亚胺树脂组合物
JP6811038B2 (ja) 2016-06-29 2021-01-13 サカタインクス株式会社 非水性インクジェットマゼンタ色インク組成物
EP3591014B1 (en) 2017-02-28 2023-08-16 FUJIFILM Corporation Liquid composition for inkjet and inkjet recording method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61275837A (ja) * 1985-05-31 1986-12-05 Konishiroku Photo Ind Co Ltd 直接ポジカラ−画像の形成方法
JP2001323192A (ja) * 2000-05-17 2001-11-20 Konica Corp インクジェット用水性顔料インクおよびインクジェット記録方法
JP2007133120A (ja) * 2005-11-10 2007-05-31 Nippon Steel Chem Co Ltd カラーフィルター用インキ組成物、並びにこのインキ組成物を用いて得たカラーフィルター硬化膜及びカラーフィルター
JP5399013B2 (ja) * 2008-06-30 2014-01-29 新日鉄住金化学株式会社 インクジェット吐出安定性に優れたインクジェットカラーフィルター用インキ組成物、並びにこのインキ組成物を用いて得たカラーフィルター硬化膜及びカラーフィルター
JP5576622B2 (ja) * 2008-07-01 2014-08-20 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP2010032893A (ja) * 2008-07-30 2010-02-12 Hitachi Maxell Ltd 反射防止フィルム及びそれを用いたディスプレイ用前面フィルター
KR101216817B1 (ko) * 2009-03-30 2012-12-28 쇼와 덴코 가부시키가이샤 경화성 조성물 및 그의 경화물
KR20130097180A (ko) * 2010-08-09 2013-09-02 가부시끼가이샤 다이셀 경화성 조성물 및 그의 경화물

Also Published As

Publication number Publication date
TW201416403A (zh) 2014-05-01
KR102068506B1 (ko) 2020-01-21
KR20140051076A (ko) 2014-04-30
TWI585167B (zh) 2017-06-01
JP2014084339A (ja) 2014-05-12

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