JP5972486B1 - 銅箔、銅張積層板、および基板 - Google Patents
銅箔、銅張積層板、および基板 Download PDFInfo
- Publication number
- JP5972486B1 JP5972486B1 JP2015559749A JP2015559749A JP5972486B1 JP 5972486 B1 JP5972486 B1 JP 5972486B1 JP 2015559749 A JP2015559749 A JP 2015559749A JP 2015559749 A JP2015559749 A JP 2015559749A JP 5972486 B1 JP5972486 B1 JP 5972486B1
- Authority
- JP
- Japan
- Prior art keywords
- copper foil
- frequency
- protrusion
- height
- ghz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title claims description 125
- 239000011889 copper foil Substances 0.000 title claims description 101
- 239000000758 substrate Substances 0.000 title claims description 32
- 239000010949 copper Substances 0.000 title claims description 27
- 229910052802 copper Inorganic materials 0.000 title claims description 25
- 230000035699 permeability Effects 0.000 claims abstract description 7
- 229920005989 resin Polymers 0.000 claims description 61
- 239000011347 resin Substances 0.000 claims description 61
- 239000000463 material Substances 0.000 claims description 49
- 230000008054 signal transmission Effects 0.000 claims description 13
- 229920000106 Liquid crystal polymer Polymers 0.000 claims description 7
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 claims description 7
- 229920001955 polyphenylene ether Polymers 0.000 claims description 4
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 claims description 3
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 3
- 239000004697 Polyetherimide Substances 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 3
- 229920003192 poly(bis maleimide) Polymers 0.000 claims description 3
- 229920003050 poly-cycloolefin Polymers 0.000 claims description 3
- 229920002530 polyetherether ketone Polymers 0.000 claims description 3
- 229920001601 polyetherimide Polymers 0.000 claims description 3
- 229920001721 polyimide Polymers 0.000 claims description 3
- 230000005611 electricity Effects 0.000 claims 2
- 230000005540 biological transmission Effects 0.000 description 63
- 238000007747 plating Methods 0.000 description 18
- 230000000694 effects Effects 0.000 description 16
- 230000003746 surface roughness Effects 0.000 description 16
- 238000005530 etching Methods 0.000 description 13
- 239000002245 particle Substances 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 10
- 239000002775 capsule Substances 0.000 description 8
- 238000010586 diagram Methods 0.000 description 8
- 239000004020 conductor Substances 0.000 description 7
- 238000009826 distribution Methods 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- 238000007788 roughening Methods 0.000 description 7
- 230000007423 decrease Effects 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000004364 calculation method Methods 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 3
- 239000011362 coarse particle Substances 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 229910000881 Cu alloy Inorganic materials 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- 241000135309 Processus Species 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 229920002554 vinyl polymer Polymers 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- BXKDSDJJOVIHMX-UHFFFAOYSA-N edrophonium chloride Chemical compound [Cl-].CC[N+](C)(C)C1=CC=CC(O)=C1 BXKDSDJJOVIHMX-UHFFFAOYSA-N 0.000 description 1
- 230000002500 effect on skin Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000012886 linear function Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000003396 thiol group Chemical class [H]S* 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/025—Electric or magnetic properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/20—Layered products comprising a layer of metal comprising aluminium or copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/06—Wires; Strips; Foils
- C25D7/0614—Strips or foils
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0213—Electrical arrangements not otherwise provided for
- H05K1/0237—High frequency adaptations
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/08—PCBs, i.e. printed circuit boards
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Laminated Bodies (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014181180 | 2014-09-05 | ||
JP2014181180 | 2014-09-05 | ||
PCT/JP2015/075173 WO2016035876A1 (ja) | 2014-09-05 | 2015-09-04 | 銅箔、銅張積層板、および基板 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP5972486B1 true JP5972486B1 (ja) | 2016-08-17 |
JPWO2016035876A1 JPWO2016035876A1 (ja) | 2017-04-27 |
Family
ID=55439931
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2015559749A Active JP5972486B1 (ja) | 2014-09-05 | 2015-09-04 | 銅箔、銅張積層板、および基板 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5972486B1 (zh) |
KR (1) | KR101912765B1 (zh) |
CN (1) | CN106574389B (zh) |
TW (1) | TWI601835B (zh) |
WO (1) | WO2016035876A1 (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200033852A (ko) | 2017-07-24 | 2020-03-30 | 후루카와 덴키 고교 가부시키가이샤 | 표면 처리 동박, 그리고 이것을 이용한 동 클래드 적층판 및 프린트 배선판 |
KR20200094740A (ko) | 2017-12-05 | 2020-08-07 | 후루카와 덴키 고교 가부시키가이샤 | 표면 처리 동박, 그리고 이것을 이용한 동 클래드 적층판 및 프린트 배선판 |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7492807B2 (ja) * | 2016-12-06 | 2024-05-30 | Jx金属株式会社 | 表面処理銅箔、キャリア付銅箔、積層体、プリント配線板の製造方法及び電子機器の製造方法 |
CN110832120B (zh) * | 2017-03-30 | 2022-01-11 | 古河电气工业株式会社 | 表面处理铜箔、以及使用该表面处理铜箔的覆铜板及印刷电路布线板 |
CN110505753B (zh) * | 2019-08-12 | 2021-02-12 | 隽美经纬电路有限公司 | 一种应用于高频高速柔性线路板的cop材料及其制备方法和应用 |
CN113099605B (zh) * | 2021-06-08 | 2022-07-12 | 广州方邦电子股份有限公司 | 金属箔、带载体金属箔、覆铜层叠板及印刷线路板 |
CN116240601B (zh) * | 2022-12-28 | 2024-08-02 | 深圳惠科新材料股份有限公司 | 复合铜箔及其制备方法和电池 |
CN116612951B (zh) * | 2023-06-27 | 2024-02-27 | 广州方邦电子股份有限公司 | 一种薄膜电阻和电路板 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0555746A (ja) * | 1991-08-29 | 1993-03-05 | Hitachi Chem Co Ltd | 高周波用銅張り積層板及びプリント配線板 |
JP2005064110A (ja) * | 2003-08-08 | 2005-03-10 | Tdk Corp | 電子部品用部材並びにこれを用いた電子部品 |
JP2006210689A (ja) * | 2005-01-28 | 2006-08-10 | Fukuda Metal Foil & Powder Co Ltd | 高周波プリント配線板用銅箔及びその製造方法 |
JP2010013738A (ja) * | 2004-02-06 | 2010-01-21 | Furukawa Electric Co Ltd:The | 表面処理銅箔及びその製造方法 |
US20100156572A1 (en) * | 2008-12-19 | 2010-06-24 | Askey Computer Corp. | Carrier for transmitting high frequency signal and carrier layout method thereof |
WO2011090175A1 (ja) * | 2010-01-22 | 2011-07-28 | 古河電気工業株式会社 | 粗化処理銅箔、その製造方法、銅張積層板及びプリント配線板 |
WO2013047272A1 (ja) * | 2011-09-30 | 2013-04-04 | Jx日鉱日石金属株式会社 | 樹脂との密着性に優れた銅箔及びその製造方法並びに該電解銅箔を用いたプリント配線板又は電池用負極材 |
JP5204908B1 (ja) * | 2012-03-26 | 2013-06-05 | Jx日鉱日石金属株式会社 | キャリア付銅箔、キャリア付銅箔の製造方法、プリント配線板用キャリア付銅箔及びプリント配線板 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS524908A (en) | 1975-06-30 | 1977-01-14 | Nissan Motor Co Ltd | Torch ignition type internal combustion engine |
JP3476264B2 (ja) | 1993-12-24 | 2003-12-10 | 三井金属鉱業株式会社 | プリント回路内層用銅箔およびその製造方法 |
JP5864417B2 (ja) * | 2009-07-16 | 2016-02-17 | マリンクロッド エルエルシー | トール様受容体9のアンタゴニストとしての(+)−モルフィナンおよびその治療的使用 |
CN102238805A (zh) * | 2010-04-22 | 2011-11-09 | 富葵精密组件(深圳)有限公司 | 电路板及其制作方法 |
JP5871426B2 (ja) * | 2012-01-31 | 2016-03-01 | 古河電気工業株式会社 | 高周波伝送用表面処理銅箔、高周波伝送用積層板及び高周波伝送用プリント配線板 |
-
2015
- 2015-09-04 TW TW104129359A patent/TWI601835B/zh active
- 2015-09-04 CN CN201580032041.1A patent/CN106574389B/zh active Active
- 2015-09-04 KR KR1020167034815A patent/KR101912765B1/ko active IP Right Review Request
- 2015-09-04 JP JP2015559749A patent/JP5972486B1/ja active Active
- 2015-09-04 WO PCT/JP2015/075173 patent/WO2016035876A1/ja active Application Filing
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0555746A (ja) * | 1991-08-29 | 1993-03-05 | Hitachi Chem Co Ltd | 高周波用銅張り積層板及びプリント配線板 |
JP2005064110A (ja) * | 2003-08-08 | 2005-03-10 | Tdk Corp | 電子部品用部材並びにこれを用いた電子部品 |
JP2010013738A (ja) * | 2004-02-06 | 2010-01-21 | Furukawa Electric Co Ltd:The | 表面処理銅箔及びその製造方法 |
JP2006210689A (ja) * | 2005-01-28 | 2006-08-10 | Fukuda Metal Foil & Powder Co Ltd | 高周波プリント配線板用銅箔及びその製造方法 |
US20100156572A1 (en) * | 2008-12-19 | 2010-06-24 | Askey Computer Corp. | Carrier for transmitting high frequency signal and carrier layout method thereof |
WO2011090175A1 (ja) * | 2010-01-22 | 2011-07-28 | 古河電気工業株式会社 | 粗化処理銅箔、その製造方法、銅張積層板及びプリント配線板 |
WO2013047272A1 (ja) * | 2011-09-30 | 2013-04-04 | Jx日鉱日石金属株式会社 | 樹脂との密着性に優れた銅箔及びその製造方法並びに該電解銅箔を用いたプリント配線板又は電池用負極材 |
JP5204908B1 (ja) * | 2012-03-26 | 2013-06-05 | Jx日鉱日石金属株式会社 | キャリア付銅箔、キャリア付銅箔の製造方法、プリント配線板用キャリア付銅箔及びプリント配線板 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20200033852A (ko) | 2017-07-24 | 2020-03-30 | 후루카와 덴키 고교 가부시키가이샤 | 표면 처리 동박, 그리고 이것을 이용한 동 클래드 적층판 및 프린트 배선판 |
KR20200094740A (ko) | 2017-12-05 | 2020-08-07 | 후루카와 덴키 고교 가부시키가이샤 | 표면 처리 동박, 그리고 이것을 이용한 동 클래드 적층판 및 프린트 배선판 |
Also Published As
Publication number | Publication date |
---|---|
TWI601835B (zh) | 2017-10-11 |
JPWO2016035876A1 (ja) | 2017-04-27 |
WO2016035876A1 (ja) | 2016-03-10 |
CN106574389B (zh) | 2018-09-21 |
KR101912765B1 (ko) | 2018-10-29 |
CN106574389A (zh) | 2017-04-19 |
TW201615852A (zh) | 2016-05-01 |
KR20170039084A (ko) | 2017-04-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5972486B1 (ja) | 銅箔、銅張積層板、および基板 | |
JP6462961B2 (ja) | 表面処理銅箔および銅張積層板 | |
KR102340473B1 (ko) | 표면 처리 동박 | |
JP6089160B1 (ja) | 高周波回路用銅箔、銅張積層板、プリント配線基板 | |
KR101830994B1 (ko) | 조화처리된 동박, 그 제조방법, 동박 적층판 및 인쇄회로기판 | |
KR101998923B1 (ko) | 저유전성 수지 기재용 처리 동박 및 그 처리 동박을 사용한 구리 피복 적층판 그리고 프린트 배선판 | |
KR102230999B1 (ko) | 표면 처리 동박 및 이것을 이용하여 제조되는 동 클래드 적층판 | |
JP5764700B2 (ja) | 高周波基板用銅張り積層板及び表面処理銅箔 | |
JP6261037B2 (ja) | 高周波回路用銅箔、銅張積層板及びプリント配線板 | |
JP2004244656A (ja) | 高周波用途対応可能銅箔とその製造方法 | |
US11622445B2 (en) | Surface-treated copper foil, manufacturing method thereof, copper foil laminate including the same, and printed wiring board including the same | |
KR20230160367A (ko) | 금속박, 캐리어가 있는 금속박, 동 클래드 적층판 및 인쇄회로기판 | |
KR102118455B1 (ko) | 표면 처리 동박 및 이를 이용하여 제조되는 동 클래드 적층판 또는 프린트 배선판 | |
JP2019019414A (ja) | 表面処理銅箔、積層体及びプリント配線板 | |
KR20230161954A (ko) | 조화 처리 구리박, 동장 적층판 및 프린트 배선판 | |
JP6827083B2 (ja) | 表面処理銅箔、銅張積層板、及びプリント配線板 | |
WO2022244826A1 (ja) | 粗化処理銅箔、キャリア付銅箔、銅張積層板及びプリント配線板 | |
KR20240017841A (ko) | 조화 처리 동박, 동장 적층판 및 프린트 배선판 | |
KR20170037750A (ko) | 표면처리동박 및 그의 제조방법 | |
KR20240017842A (ko) | 조화 처리 동박, 동장 적층판 및 프린트 배선판 | |
KR20230141859A (ko) | 조화 처리 구리박, 동장 적층판 및 프린트 배선판 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160531 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20160621 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20160712 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 5972486 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
R157 | Certificate of patent or utility model (correction) |
Free format text: JAPANESE INTERMEDIATE CODE: R157 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |