JP5940283B2 - ペリクル - Google Patents

ペリクル Download PDF

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Publication number
JP5940283B2
JP5940283B2 JP2011242344A JP2011242344A JP5940283B2 JP 5940283 B2 JP5940283 B2 JP 5940283B2 JP 2011242344 A JP2011242344 A JP 2011242344A JP 2011242344 A JP2011242344 A JP 2011242344A JP 5940283 B2 JP5940283 B2 JP 5940283B2
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JP
Japan
Prior art keywords
pellicle
frame
pellicle frame
resin
frame body
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011242344A
Other languages
English (en)
Japanese (ja)
Other versions
JP2013097308A (ja
Inventor
一敏 関原
一敏 関原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Priority to JP2011242344A priority Critical patent/JP5940283B2/ja
Priority to KR1020120110013A priority patent/KR102028374B1/ko
Priority to TW101140616A priority patent/TWI452422B/zh
Priority to CN2012104361743A priority patent/CN103091975A/zh
Publication of JP2013097308A publication Critical patent/JP2013097308A/ja
Application granted granted Critical
Publication of JP5940283B2 publication Critical patent/JP5940283B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
  • Laminated Bodies (AREA)
JP2011242344A 2011-11-04 2011-11-04 ペリクル Active JP5940283B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011242344A JP5940283B2 (ja) 2011-11-04 2011-11-04 ペリクル
KR1020120110013A KR102028374B1 (ko) 2011-11-04 2012-10-04 펠리클
TW101140616A TWI452422B (zh) 2011-11-04 2012-11-01 防塵薄膜組件
CN2012104361743A CN103091975A (zh) 2011-11-04 2012-11-05 防尘薄膜组件

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011242344A JP5940283B2 (ja) 2011-11-04 2011-11-04 ペリクル

Publications (2)

Publication Number Publication Date
JP2013097308A JP2013097308A (ja) 2013-05-20
JP5940283B2 true JP5940283B2 (ja) 2016-06-29

Family

ID=48204723

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011242344A Active JP5940283B2 (ja) 2011-11-04 2011-11-04 ペリクル

Country Status (4)

Country Link
JP (1) JP5940283B2 (ko)
KR (1) KR102028374B1 (ko)
CN (1) CN103091975A (ko)
TW (1) TWI452422B (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5746662B2 (ja) * 2012-05-11 2015-07-08 信越化学工業株式会社 ペリクルフレーム
CN103279008A (zh) * 2013-05-23 2013-09-04 上海华力微电子有限公司 掩膜板覆盖膜设计方法
JP6293041B2 (ja) * 2014-12-01 2018-03-14 信越化学工業株式会社 ペリクルフレームおよびこれを用いたペリクル
KR102254103B1 (ko) * 2015-01-07 2021-05-20 삼성전자주식회사 지지 층을 이용한 펠리클 제조 방법
JP6519190B2 (ja) * 2015-01-16 2019-05-29 日本軽金属株式会社 ペリクル用支持枠
JP2016139103A (ja) * 2015-01-29 2016-08-04 日本軽金属株式会社 ペリクル用支持枠
CN107615739A (zh) * 2015-12-30 2018-01-19 深圳市大富科技股份有限公司 手机、手机框架及其制造方法
KR102237878B1 (ko) * 2017-02-17 2021-04-07 미쯔이가가꾸가부시끼가이샤 펠리클, 노광 원판, 노광 장치 및 반도체 장치의 제조 방법
TWM622366U (zh) * 2020-06-04 2022-01-21 日商信越化學工業股份有限公司 防護薄膜框架、防護薄膜、帶防護薄膜的曝光原版、曝光裝置、曝光系統、半導體的製造系統及液晶顯示板的製造系統

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6380257A (ja) * 1986-09-24 1988-04-11 Hitachi Micro Comput Eng Ltd ホトマスク
JP3027073B2 (ja) * 1993-07-28 2000-03-27 信越化学工業株式会社 ペリクル
JPH10209340A (ja) * 1997-01-16 1998-08-07 Toray Ind Inc Ｉｃ封止枠体およびその製造方法
JP2001291757A (ja) * 2000-02-03 2001-10-19 Nippon Mitsubishi Oil Corp 加工面を被覆処理したｃｆｒｐ製搬送用部材およびその処理方法
JP4458315B2 (ja) * 2000-06-02 2010-04-28 旭化成イーマテリアルズ株式会社 ペリクル
JP4286194B2 (ja) 2004-08-18 2009-06-24 信越化学工業株式会社 ペリクルフレーム、および該フレームを用いたフォトリソグラフィー用ペリクル
JP4459824B2 (ja) * 2005-01-26 2010-04-28 中西金属工業株式会社 転がり軸受用保持器
JP4577069B2 (ja) 2005-03-31 2010-11-10 日本軽金属株式会社 ペリクル用支持枠、ペリクル用枠体およびペリクル用枠体の製造方法
CN101208397B (zh) * 2005-06-24 2012-01-11 日本化成株式会社 涂布用组合物及其制造方法和树脂成型体及其制造方法
JP2008183626A (ja) * 2005-11-25 2008-08-14 Hamamatsu Kagaku Gijutsu Kenkyu Shinkokai 超音波振動切削方法及びそれにより得られる繊維強化樹脂
JP2007333910A (ja) * 2006-06-14 2007-12-27 Shin Etsu Chem Co Ltd ペリクル
CN102681334B (zh) * 2007-07-06 2015-09-30 旭化成电子材料株式会社 从容纳容器取出大型表膜构件的取出方法
JP2009139879A (ja) * 2007-12-11 2009-06-25 Toppan Printing Co Ltd ペリクル
JP5515238B2 (ja) * 2008-06-05 2014-06-11 凸版印刷株式会社 フォトマスクの曇り防止方法及び装置
CN101352928B (zh) * 2008-09-05 2010-12-01 沈阳航空工业学院 聚芳醚砜酮树脂基复合材料的在线浸渍缠绕成型方法
JP5141485B2 (ja) * 2008-10-03 2013-02-13 日本精工株式会社 高速回転用転がり軸受用保持器の製造方法
JP5133229B2 (ja) * 2008-12-05 2013-01-30 信越ポリマー株式会社 ペリクル収納容器
JP2011059446A (ja) * 2009-09-10 2011-03-24 Asahi Kasei E-Materials Corp ペリクル枠体、ペリクル及びペリクル枠体の使用方法
JP4974389B2 (ja) * 2009-10-30 2012-07-11 信越化学工業株式会社 リソグラフィ用ペリクルフレーム及びリソグラフィ用ペリクル
JP2011158585A (ja) * 2010-01-29 2011-08-18 Shin-Etsu Chemical Co Ltd ペリクルおよびペリクルの製造方法
JP2012093595A (ja) * 2010-10-28 2012-05-17 Shin Etsu Chem Co Ltd ペリクルフレームおよびペリクル
JP5663376B2 (ja) * 2011-04-04 2015-02-04 信越化学工業株式会社 ペリクルフレーム、その製造方法、及びペリクル

Also Published As

Publication number Publication date
KR20130049719A (ko) 2013-05-14
KR102028374B1 (ko) 2019-10-04
CN103091975A (zh) 2013-05-08
JP2013097308A (ja) 2013-05-20
TW201339740A (zh) 2013-10-01
TWI452422B (zh) 2014-09-11

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