JP5875500B2 - 電子ビーム顕微装置 - Google Patents

電子ビーム顕微装置 Download PDF

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Publication number
JP5875500B2
JP5875500B2 JP2012240751A JP2012240751A JP5875500B2 JP 5875500 B2 JP5875500 B2 JP 5875500B2 JP 2012240751 A JP2012240751 A JP 2012240751A JP 2012240751 A JP2012240751 A JP 2012240751A JP 5875500 B2 JP5875500 B2 JP 5875500B2
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JP
Japan
Prior art keywords
sample
electron beam
stage
holder
beam microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2012240751A
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English (en)
Japanese (ja)
Other versions
JP2014089936A5 (enExample
JP2014089936A (ja
Inventor
秀樹 菊池
秀樹 菊池
圭司 田村
圭司 田村
浩大 上田
浩大 上田
浩一郎 齋藤
浩一郎 齋藤
亮史 滑川
亮史 滑川
博実 稲田
博実 稲田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2012240751A priority Critical patent/JP5875500B2/ja
Priority to PCT/JP2013/078807 priority patent/WO2014069325A1/ja
Publication of JP2014089936A publication Critical patent/JP2014089936A/ja
Publication of JP2014089936A5 publication Critical patent/JP2014089936A5/ja
Application granted granted Critical
Publication of JP5875500B2 publication Critical patent/JP5875500B2/ja
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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2012240751A 2012-10-31 2012-10-31 電子ビーム顕微装置 Active JP5875500B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2012240751A JP5875500B2 (ja) 2012-10-31 2012-10-31 電子ビーム顕微装置
PCT/JP2013/078807 WO2014069325A1 (ja) 2012-10-31 2013-10-24 電子ビーム顕微装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012240751A JP5875500B2 (ja) 2012-10-31 2012-10-31 電子ビーム顕微装置

Publications (3)

Publication Number Publication Date
JP2014089936A JP2014089936A (ja) 2014-05-15
JP2014089936A5 JP2014089936A5 (enExample) 2015-11-05
JP5875500B2 true JP5875500B2 (ja) 2016-03-02

Family

ID=50627234

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012240751A Active JP5875500B2 (ja) 2012-10-31 2012-10-31 電子ビーム顕微装置

Country Status (2)

Country Link
JP (1) JP5875500B2 (enExample)
WO (1) WO2014069325A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6421041B2 (ja) * 2015-01-13 2018-11-07 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US11152189B2 (en) * 2020-03-18 2021-10-19 Fei Company Method and system for plasma assisted low vacuum charged-particle microscopy
DE112021007286T5 (de) * 2021-05-17 2024-01-25 Hitachi High-Tech Corporation Probenhalter und analysesystem
JP2023051864A (ja) * 2021-09-30 2023-04-11 エフ イー アイ カンパニ モジュール式超高真空電子顕微鏡

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5420657A (en) * 1977-07-18 1979-02-16 Hitachi Ltd Sample processor for scanning electron microscope and its similar device
JPS5938701B2 (ja) * 1979-04-10 1984-09-18 株式会社国際精工 二段試料台を備えた走査型電子顕微鏡
JPS6237326Y2 (enExample) * 1980-11-06 1987-09-24
JPS60189854A (ja) * 1984-03-10 1985-09-27 Shimadzu Corp 試料交換装置
JPH0357000Y2 (enExample) * 1985-07-12 1991-12-25
JPH0614460B2 (ja) * 1987-05-22 1994-02-23 日本電子株式会社 電子顕微鏡等における試料装置
JPH04286843A (ja) * 1991-03-18 1992-10-12 Hitachi Ltd 走査形電子顕微鏡及びその類似装置の可動絞り装置
JPH04306547A (ja) * 1991-04-02 1992-10-29 Fujitsu Ltd 電子顕微鏡用試料ホルダおよび真空装置用ロードロック機構
JPH09167591A (ja) * 1995-12-15 1997-06-24 Hitachi Ltd 走査透過電子顕微鏡
JP4178741B2 (ja) * 2000-11-02 2008-11-12 株式会社日立製作所 荷電粒子線装置および試料作製装置
JP4769828B2 (ja) * 2008-02-28 2011-09-07 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
JP5147567B2 (ja) * 2008-06-27 2013-02-20 株式会社日立ハイテクノロジーズ 電子分光器を有する透過型電子顕微鏡装置，試料ホルダ，試料台及びスペクトル像の取得方法
EP2182544A1 (en) * 2008-10-31 2010-05-05 FEI Company Charged-particle optical system with dual specimen loading options
JP5244730B2 (ja) * 2009-07-31 2013-07-24 株式会社日立ハイテクノロジーズ 低真空走査電子顕微鏡

Also Published As

Publication number Publication date
WO2014069325A1 (ja) 2014-05-08
JP2014089936A (ja) 2014-05-15

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