JP5852763B2 - 導電性ガラス基板及びその製造方法 - Google Patents
導電性ガラス基板及びその製造方法 Download PDFInfo
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- 239000011521 glass Substances 0.000 title claims description 141
- 239000000758 substrate Substances 0.000 title claims description 141
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 44
- 239000010410 layer Substances 0.000 claims description 36
- 238000002347 injection Methods 0.000 claims description 27
- 239000007924 injection Substances 0.000 claims description 27
- 238000005530 etching Methods 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 25
- 235000012239 silicon dioxide Nutrition 0.000 claims description 22
- 239000000377 silicon dioxide Substances 0.000 claims description 22
- 229920002120 photoresistant polymer Polymers 0.000 claims description 15
- 239000002245 particle Substances 0.000 claims description 13
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 239000011241 protective layer Substances 0.000 claims description 11
- 239000000243 solution Substances 0.000 claims description 9
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 7
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical group F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 6
- 239000002041 carbon nanotube Substances 0.000 claims description 6
- 229910021393 carbon nanotube Inorganic materials 0.000 claims description 6
- 229920001940 conductive polymer Polymers 0.000 claims description 6
- 229910021389 graphene Inorganic materials 0.000 claims description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 claims description 6
- 239000004417 polycarbonate Substances 0.000 claims description 6
- 229920000515 polycarbonate Polymers 0.000 claims description 6
- 239000004926 polymethyl methacrylate Substances 0.000 claims description 6
- 239000006060 molten glass Substances 0.000 claims description 4
- 238000007639 printing Methods 0.000 claims description 3
- 238000001816 cooling Methods 0.000 claims description 2
- 239000002923 metal particle Substances 0.000 claims description 2
- 238000005406 washing Methods 0.000 claims 1
- 229910052909 inorganic silicate Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 2
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 2
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/465—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits by applying an insulating layer having channels for the next circuit layer
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/13439—Electrodes characterised by their electrical, optical, physical properties; materials therefor; method of making
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04112—Electrode mesh in capacitive digitiser: electrode for touch sensing is formed of a mesh of very fine, normally metallic, interconnected lines that are almost invisible to see. This provides a quite large but transparent electrode surface, without need for ITO or similar transparent conductive material
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- General Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Human Computer Interaction (AREA)
- Manufacturing & Machinery (AREA)
- Nonlinear Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Mathematical Physics (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
- Micromachines (AREA)
Description
ガラス基板であって、その表面上にメッシュ状溝を定めるガラス基板と、
溝を定めるガラス基板の表面に取り付けられた二酸化シリコン層と、
溝の形状に適合され、溝内に堆積され、かつ、二酸化シリコン層を介してガラス基板に取り付けられた導電性メッシュ線と、
を含む。
ガラス基板であって、その表面上にメッシュ状溝を定めるガラス基板を準備するステップと、
溝を定めるガラス基板の表面上に二酸化シリコン層を塗布するステップと、
二酸化シリコン層を有するガラス基板の表面上に導電性インクを印刷し、導電性インクは溝内に受けられるステップと、
導電性インクを硬化させて、ガラス基板の表面上に導電性メッシュ線を形成し、次いで導電性ガラス基板を得るステップと、
を含む。
表面が平坦である未処理ガラス基板を準備するステップと、
未処理ガラス基板の表面上にフォトレジストを塗布し、フォトレジストが未処理ガラス基板の表面上にエッチング保護層を形成するステップと、
エッチング保護層を露光及び現像して、溝が定められた未処理ガラス基板の表面上のエッチング保護層を除去するステップと、
エッチング液を用いて未処理ガラス基板の表面をエッチングして、未処理ガラス基板の表面上に溝を形成するステップと、
エッチング保護層を洗浄及び除去して、その表面上に溝を定めるガラス基板を得るステップと、
によって作成される。
金型であって、その内面が溝を定める射出チャンバを有し、その側壁上に射出ポートを定め、射出ポートと射出チャンバが連通している金型を準備するステップと、
溶融ガラスを、射出ポートを介して射出チャンバに射出し、冷却してガラス基板を得るステップと、
によって作成される。
110:ガラス基板
112:メッシュ状溝
130:二酸化シリコン層
150:導電性メッシュ線
510:未処理ガラス基板
520:エッチング保護層
800:金型
810:上部金型コア
830:下部金型コア
850:環状キャビティ壁
852:射出ポート
Claims (10)
- ガラス基板であって、その表面上にメッシュ状溝を定めるガラス基板と、
前記溝を定める前記ガラス基板の表面に取り付けられた二酸化シリコン層と、
前記溝の形状に適合され、前記溝内に堆積され、かつ、前記二酸化シリコン層を介して前記ガラス基板に取り付けられた導電性メッシュ線と、
を含み、
前記ガラス基板は、ポリカーボネート及びポリメチルメタクリレートから成る群から選択される少なくとも1つの材料で作成され、前記二酸化シリコン層は前記導電性メッシュ線と前記ガラス基板との間の接着力を高めることを特徴とする導電性ガラス基板。 - 前記導電性メッシュ線は、金属、導電性ポリマー、グラフェン、カーボンナノチューブ及び酸化インジウムスズから成る群から選択される少なくとも1つの材料で作成されることを特徴とする、請求項1に記載の導電性ガラス基板。
- 前記導電性メッシュ線の前記材料は、ガラス粉末をさらに含むことを特徴とする、請求項2に記載の導電性ガラス基板。
- 導電性ガラス基板を製造する方法であって、
ガラス基板であって、その表面上にメッシュ状溝を定めるガラス基板を準備するステップと、
前記溝を定める前記ガラス基板の表面上に二酸化シリコン層を塗布するステップと、
二酸化シリコン層を有する前記ガラス基板の表面上に導電性インクを印刷し、前記導電性インクは前記溝内に収容されるステップと、
前記導電性インクを硬化させて、前記ガラス基板の表面上に導電性メッシュ線を形成し、次いで前記導電性ガラス基板を得るステップと、
を含み、
前記ガラス基板は、ポリカーボネート及びポリメチルメタクリレートから成る群から選択される少なくとも1つの材料で作成され、前記二酸化シリコン層は前記導電性メッシュ線と前記ガラス基板との間の接着力を高めることを特徴とする方法。 - 前記導電性インクは、金属粒子、導電性ポリマー粒子、グラフェン粒子、カーボンナノチューブ及び酸化インジウムスズの粒子から成る群から選択される少なくとも1つの粒子を含むことを特徴とする、請求項4に記載の方法。
- 前記導電性インクは、ガラス粉末をさらに含むことを特徴とする、請求項5に記載の方法。
- 前記ガラス基板は、
表面が平坦である未処理ガラス基板を準備するステップと、
前記未処理ガラス基板の表面上にフォトレジストを塗布し、前記フォトレジストは前記未処理ガラス基板の表面上にエッチング保護層を形成するステップと、
前記エッチング保護層を露光及び現像して、前記溝が定められた前記未処理ガラス基板の表面上の前記エッチング保護層を除去するステップと、
エッチング液を用いて前記未処理ガラス基板の表面をエッチングして、前記未処理ガラス基板の表面上に前記溝を形成するステップと、
前記エッチング保護層を洗浄及び除去して、その前記表面上に前記溝を定める前記ガラス基板を得るステップと、
によって作成されることを特徴とする、請求項4に記載の方法。 - 前記エッチング液は、フッ化水素酸溶液であることを特徴とする、請求項7に記載の方法。
- 前記ガラス基板は、
金型であって、その内面が溝を定める射出チャンバを有し、その側壁上に射出ポートを定め、前記射出ポートと前記射出チャンバが連通している金型を準備するステップと、
溶融ガラスを、前記射出ポートを介して前記射出チャンバに射出し、冷却して前記ガラス基板を得るステップと、
によって作成されることを特徴とする、請求項4に記載の方法。 - 前記金型は、上部金型コア、下部金型コア及び環状キャビティ壁を含み、前記上部金型コア及び前記下部金型コアは、それぞれ前記環状キャビティ壁の2つの側に配置されるので、前記上部金型コア、前記下部金型コア及び前記環状キャビティ壁が協働して前記射出チャンバを形成することを特徴とする、請求項9に記載の方法。
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CN201310066646.5A CN103176650B (zh) | 2013-03-01 | 2013-03-01 | 导电玻璃基板及其制作方法 |
PCT/CN2013/078891 WO2014131259A1 (zh) | 2013-03-01 | 2013-07-05 | 导电玻璃基板及其制作方法 |
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US9671542B2 (en) * | 2013-06-04 | 2017-06-06 | Inktec Co., Ltd. | Method for manufacturing polarizing film |
DE102014100770A1 (de) * | 2014-01-23 | 2015-07-23 | Osram Opto Semiconductors Gmbh | Licht emittierendes Bauelement und Verfahren zur Herstellung eines Licht emittierenden Bauelements |
KR20150103977A (ko) * | 2014-03-04 | 2015-09-14 | 엘지이노텍 주식회사 | 터치 윈도우 및 이를 포함하는 디스플레이 장치 |
CN104407729B (zh) * | 2014-10-14 | 2018-01-09 | 业成光电(深圳)有限公司 | 电子装置、触控屏、透明导电膜及透明导电膜的制备方法 |
KR101626518B1 (ko) * | 2014-11-17 | 2016-06-02 | (주)뉴옵틱스 | 터치 패널, 터치 패널의 제조 장치 및 방법 |
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CN103176650B (zh) | 2016-09-28 |
JP2015514664A (ja) | 2015-05-21 |
KR20140131479A (ko) | 2014-11-13 |
CN103176650A (zh) | 2013-06-26 |
US20140318836A1 (en) | 2014-10-30 |
US9089081B2 (en) | 2015-07-21 |
TWI494954B (zh) | 2015-08-01 |
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