JP5837697B2 - 太径ワイヤ又はストリップに接するための金属成形体を備えたパワー半導体チップ及びその製造方法 - Google Patents

太径ワイヤ又はストリップに接するための金属成形体を備えたパワー半導体チップ及びその製造方法 Download PDF

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JP5837697B2
JP5837697B2 JP2014533780A JP2014533780A JP5837697B2 JP 5837697 B2 JP5837697 B2 JP 5837697B2 JP 2014533780 A JP2014533780 A JP 2014533780A JP 2014533780 A JP2014533780 A JP 2014533780A JP 5837697 B2 JP5837697 B2 JP 5837697B2
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power semiconductor
semiconductor chip
molded body
potential
bonding
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JP2014532308A (ja
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ベッカー，マルティン
アイゼレ，ロナルト
オステルヴァルト，フランク
ルヅキ，ヤーチェク
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ダンフォス・シリコン・パワー・ゲーエムベーハー
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    • A—HUMAN NECESSITIES
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Description

本発明は、少なくとも１つの上部側電位面を有するパワー半導体チップに関する。通常、パワーモジュールは、例えばダイオードなどの複数の半導体を含み、これらの半導体の多くでは、負荷電流がチップ面に向けて横方向に流れる。
長寿命かつ強固なモジュールを開発するには、特に半導体の上部及び下部接続部（上部側及び下部側）が高い熱的要件及び電気的要件を有する。通常、半導体の下部側は、はんだ付け接続によって接続され、或いは部分的に焼結接続又は拡散はんだ付け接続によっても接続される。
通常、半導体の上部側は、太径アルミワイヤのボンディング工程に合わせて最適化された金属化層又は金属層を含む。半導体は、上部側及び下部側にこのような非常に変形しやすい金属化層が存在するにも関わらず、電気損失を減少させるために薄くなり続けている。現在では、市販のパワー半導体は総厚が７０μｍである。研究機関は、わずか１０μｍという極端な厚みの最初のウェハを既に提示している。
上部側のチップ接続部は、パワーモジュールの寿命限界に非常に大きな影響を与える。半導体の上部側のアルミワイヤの不具合は制限要因であるため、チップ下部側の焼結接続を非常に強固にしても、モジュールの寿命はわずかしか延びない。
Ａｌボンディングは、長年にわたり、パワーエレクトロニクスの製造ラインにおける確立された技術である。この接続部の平均寿命は、ボンディング工程を絶えず最適化することによって延びてきた。しかしながら、この高レベルなアルミ溶接接続の応力性はほぼ物理的限界にあるので、平均寿命を大きく延ばすには、設計及びボンディング技術における新たな概念が必要である。この要件は、既に現在、半導体の下部側の焼結技術が（はんだ付け技術に比べて）平均寿命という因子の２桁成長に寄与しているという事実によっても裏付けられる。
さらに、工程中には、７０μｍの薄さの半導体の取り扱いに問題が生じる（そしてこれらの問題はさらに薄い半導体では大きく増えると予想される）。従って、製造及びテスト工程のパラメーター化、並びに概念構成の両方に関し、非常に薄いシリコン層では製造における収益リスクが増加する。破砕のリスクは、熱機械的応力によって生じるだけでなく、製造工程中の軽負荷（例えば、ウェハレベルでの高電流テストのために接触針を装着すること）によっても生じる。
そこで、本発明は、（単複の）上部側電位面上の接点を改善することにより、パワーモジュールの寿命、具体的にはパワー半導体チップの寿命を向上させることを目的とする。同時に、より安定した破砕リスクの少ない設計によって収益が伸びるようにする。
本発明によれば、この課題は主クレームの特徴により解決される。下位クレームには、有利な実施形態を示す。この上部側接続部のための新たな技術への変更を実現するために、まず必要なパワーモジュールの設計修正について説明する。
これらの修正により、太径銅ワイヤに接続する上部側のボンディング技術の変更が可能になり、これにより負荷サイクル耐久性が大幅に増加する。さらに、これらの修正により、半導体の熱機械的応力及び製造工程からの機械的応力によって生じる破砕のリスクも減少する。
この変更は、半導体の少なくとも上方に、及び好ましくは下方にも金属層又は成形体を配置して、半導体が熱機械的応力を対称的に受けるようにすることによってもたらされる。
さらに、これらの薄層又は成形体は、例えば摩擦接触テスト工程（ウェハレベルでの高電流テスト）により、表面の特に電位面にわたって機械的保護を形成する。これにより、半導体の上部側接続を完了させる前に半導体の安全な電気テストが可能になる。この電気テストでは、半導体の微細表面構造に損傷を与えるリスクを伴わずに、半導体に結合された金属層の表面に特殊なばね具を接触させる。
添付図面に基づく以下の好ましい実施形態の説明から、本発明のさらなる利点及び特徴が明らかになる。
本発明による、上部側接続部を有するパワー半導体チップの概略的な全体斜視図及び詳細図である。 キャリア層上に保持された成形体の上面図である。 図２の線ａ−ａの断面に沿って切り取った概略図である。
本発明によるパワー半導体チップ１０は上部側電位面を有し、この電位面を覆う少なくとも１つの導電性成形体２４、２５を含むことが好ましい。図２に、成形体２４を、別の成形体２５を取り囲む環状層として示している。この層の下には、例えば、角領域における４つの面、又は断面図に示すような向かい合って配置された２つの面などの複数の電位面を、層と接合するように配置することができる。また、パワー半導体チップ１０の電位面がほぼ円環形の層を有する場合も例外ではない。
パワー半導体チップ１０は、その上部側に電位面を有し、この電位面上には、好ましくは（Ｃｕ、Ａｇ、Ａｕ、Ａｌ、Ｍｏ、Ｗ、及びこれらの合金を用いて）導電性及び熱伝導性が高くなるように成形体が取り付けられる。成形体は、約３０μｍ〜３００μｍの厚みを有するようになる。３０μｍ前後の範囲内の薄い半導体では、３０μｍ〜４０μｍの範囲内の成形体が適しており、１５０μｍ〜２００μｍの範囲内の厚い半導体チップでは、１００μｍ〜１５０μｍの範囲内の若干厚めの成形体が適していると思われる。
このような成形体を、結合層１を介して半導体の金属化層１０ｂに低温焼結技術（或いは拡散溶接又は接着）で取り付ける。この接続では、成形体によってパワー半導体チップ１０の寸法が拡大することはない。
任意に、好ましい実施形態では、パワー半導体チップ１０の底部側にさらなる成形体３０を取り付けることができる。この成形体３０は、パワー半導体チップ１０の上部側の成形体２４、２５と同じ厚みを有する。底部側の成形体３０とパワー半導体チップ１０との間の結合部２は、チップと上部側の成形体２４、２５との間の結合技術と同じものである。
この接続では、表面に複数の電気的に異なる電位面を有するパワー半導体チップが、異なる電位数に対応する複数の成形体２４、２５を受け入れる。半導体の各電位面（例えば、エミッタ及びゲート）は、接合部を介して成形体の底部側と電気的に接合される。
しかしながら、半導体の複数の表面（例えばゲートフィンガーによりセグメント化されたエミッタ面）上に１つの電位が現れる場合には、対応する数の個々の成形体を設けることも１つの選択肢である。
成形体は、個々のアイランド２５（変形例１及び２）を部分的に形成することもできるので、組み立て中に小プレートの結合を確実にする搬送材２０ａを使用することが有利である。
この搬送材は、例えば、高温耐性があるとともに様々な成形体２４、２５間の電位差による電流の流れを防ぐ絶縁体でもあるポリアミド又はポリイミドなどの耐熱合成材料とすることができる。個々の成形体２４、２５の上面は、例えば、チップに面する側を酸化防止保護層２３（Ａｇ又はＡｕ）で被覆した薄い銅板（３０μｍ〜３００μｍ）で構成される。搬送材２０ａ及び成形体２４、２５は、構造化された導電面、すなわち図２に示すようなエッチングにより製造された環状導電面を有する共通搬送ホイルを形成する。
上部側搬送ホイル２０ａは、同電位の上部側電位面を同時に覆う複数の成形体面、又は半導体の電気的接触面１１、１２を反映し、これらの上に正確に適合するようにしっかりと焼結された成形体を含むこともできる。
これらの成形体は、個々の成形体２４、２５の上部側においてワイヤ、ストリップ、ワイヤ束、織りベルト又は繊維状ベルト５０の形の金属導体により電気的に接続されることが好ましい。この接続では、（例えば、最大直径６００μｍの）銅の太径ワイヤ結合が好ましい実施形態である。
図３では、金属の成形体２４、２５がチップ電位面１１、１２、１３の上方にどのように配置されているかが分かる。また、チップ１０の下方では、成形体のチップに面して搬送ホイルを含む側を半導体の底部側の全面に接合することもできる。この結合では、小プレートの上面が酸化防止層を含むことができる。最終的には、焼結又は拡散はんだ付け技術により、半導体の底部側における金属化層１０ｃとの材料結合が実現される。
半導体の底部側の成形体は、チップの上部側の成形体とともにバランスの取れた機械的応力を生じる層厚をさらに有することができる。このことは、底部側プレートと上部側成形体を接合しても、半導体はほんのわずかしか変形しないことを意味する。
好ましい解決策は、両方の層を同じ厚み及び同じ材料で形成することである。この材料は、端部まで全面を被覆する純銅、又は図２から分かるように円周方向に広がる非常に狭い（数百μｍ）ポリアミドホイルを有する広い囲まれた銅アイランドである。
一方、他の特性を有する異なる材料を配置することにより、ある材料の膨張特性と、所与の熱膨張係数及び弾性率とのバランスを取ることも可能である。例えば、上部側の比較的厚い銅層をモリブデンの薄い底部側層によって補償することができる。
底部側成形体と基板表面の間の結合部３（図１）の技術（焼結、拡散はんだ付け、接着）は、上述した他の結合層に関連して使用される技術に対応する。
上部側接触ホイルは、未切断のウェハアセンブリの全ての半導体要素に複数の接合を通じて接することができる。従って、接触ホイルの全ての導体面と半導体の電位面との重なりの許容差を特に低くすることができる。半導体要素と単一接触ホイルの連続組み立てに関連して、コスト効率の良い同等の方法が想定される。ウェハの接触ホイルを、低温焼結、はんだ付け又は接着によって半導体ウェハに接合した後には、例えば鋸切断による従来の分離が可能である。
ウェハ結合部における半導体要素の底部側のウェハの接触ホイルについても同等の工程が可能である。従って、上部側及び底部側のホイルを接触させた後に、例えば鋸切断などの通常の分離を使用して、両面被覆された個々の半導体要素を製造することができる。
少なくとも１つの上部側電位面と接続用太径ワイヤ又はストリップとを有し、電位面上の結合層と結合層上の少なくとも１つの金属成形体とを有し、該成形体の電位面に面する下部側平坦面が結合層の結合工程に適するように被覆され、前記成形体の材料組成及び厚みが、成形体の上部側における接続工程で使用される太径ワイヤ又はストリップの寸法に従って選択されるパワー半導体チップを使用する利点は以下の通りである。
・ 薄い半導体要素の場合にも、成形体が、太径銅ワイヤによる上部側の接続を可能にする。
・ 成形体が、太径銅ワイヤのボンディング中に半導体の薄く損傷を受けやすい金属化表面（通常はわずか約３μｍ〜４μｍ）を保護する。
・ 成形体が、チップ表面の断面全体にわたる電流密度分布の改善を保証する。
・ 成形体が、ばね式接点による摩擦接触中に半導体の損傷を受けやすい表面構造を保護する。これにより、製造ラインにおける非破壊的電気品質試験が単純化される。
・ 機械的応力の対称化により、底部側ホイル及び成形体がディッシング効果（半導体要素の変形）を防ぐ。
・ 上部側及び底部側の搬送ホイルが、ウェハ全体を被覆できる成形体領域を有し、従って成形体との全ての接触面をコスト効率の高い正確な方法で同時に提供できるようになる。
図１には、本発明によるパワー半導体チップ１０を示しており、上部側電位面１１、１２、１３（図３参照）は、たった２つの成形体２４、２５により結合層１を通じて電気的かつ物質的に接続されている。電位面１１及び１３は同じ電位を有し、従って中心凹部を有する略正方形である図２に示す成形体２４の導電性の外周導電面により共通して接続することができる。図２のような実施形態では、成形体の完全に拡張した上部側の下方でさらなる面を接続することができる。結合層を施した後に、成形体２４もこれに結合される。
例えばゲート電位などの異なる電位を有する電位面１２上には、別個の成形体２５が設けられる。成形体２４、２５の両方は、成形体２４、２５の領域内の底部側に通路を有する接触ホイル２０ａ上に保持される。
成形体２４、２５は、良好な電気的及び熱的伝導体である材料から作製され、例えば成形体２４、２５は、元素群Ｃｕ、Ａｇ、Ａｕ、Ａｌ、Ｍｏ、Ｗ、又はこれらの合金の材料を含み、この合金はこれらの元素群のうちの１つ又はそれ以上の金属を含む。
成形体２４、２５は、１５μｍ〜５００μｍの、好ましくは３０μｍ〜３００μｍの厚みを有するようになる。７５μｍ〜１５０μｍの厚みが有利である。薄い半導体（３０μｍの範囲内）では、３０μｍ〜４０μｍの範囲内の成形体が適しており、１５０μｍ〜２００μｍの厚い半導体チップでは、１００μｍ〜１５０μｍの成形体が適していると思われる。太径ワイヤのボンディングの場合には、ワイヤ径の４分の１に相当する厚みであれば、成形体がその安定機能を実行するのに十分である。従って、成形体の厚みは、ワイヤ径の４分の１〜２分の１であることを提案する。
上部側の構成要素と同様に、上部側成形体２４、２５に隣接してパワー半導体チップ１０の底部側に設けられるさらなる成形体３０も、低温焼結、はんだ付け又は接着によってパワー半導体チップ１０に取り付けられる。
異なる電位を有する上部側電位面１１、１３、１２の数に対応して、同数又はそれ以上の成形体２４、２５を使用することができる。理想的な例では、同じ電位を有する全ての電位面に１つの成形体を使用することができ、又は局所的に一致する少ない部分的な数の電位面が１つの共通成形体２４、２５に接触して接合される。
最も単純な変形例では、１つの電位面に１つの成形体を使用して、成形体の寸法を電位面の寸法に厳密に適合させる。この例は、各成形体２４、２５の下で行われる接続の投影面が成形体２４、２５よりも小さな場合に有利であり、これにより成形体の周縁が有機非導電性搬送ホイル２０ａに取り付けられたまま、正確な取り付け後に再びパワー半導体チップ１０に取り付けることができるようになる。
この接続では、搬送ホイル２０ａが、チップ表面の非結合領域に付着して覆うことができる。しかしながら、搬送ホイル２０ａは、チップの外縁にまで広がるべきではない。図３に、焼結材料の結合層１の寸法が成形体及び電位面の両方の寸法よりもわずかに小さく、搬送ホイル２０ａが電位面の周縁領域にまで広がった例を示す。これにより、接合中に周縁領域を開放することができる。別の変形例では、例えば制御接続部などのいくつかの電位面を直接接触させるために、これらの接続部が成形体を含まない状態にしておく。
最終的に、パワー半導体チップ１０の底部側のさらなる成形体３０の異なる材料又は異なる厚みを選択することによって上部側成形体２４、２５の熱膨張特性を補償し、総膨張がほとんど生じないようにすることができる。この接続では、成形体がパワー半導体チップの端部に達するべきではない。そうなければ、コストの高い絶縁が必要になる。
パワー半導体チップ上に成形体を取り付ける提案方法は、結合中の熱負荷に耐えることができる電気的絶縁搬送シート２０ａを使用し、複数の成形体２４、２５を含む。その後、これらの成形体を接合前にパワー半導体チップに同時に取り付け、すなわち複数のパワー半導体チップ１０に複数の成形体２４、２５を使用して上部側の重なりの許容差を低くし、下部側にもさらなる搬送シート又は導電性ホイルを使用することができる。
１ 結合層
１０ａ パワー半導体チップ
１０ｂ 金属化層
１０ｃ 金属化層
２０ａ 搬送ホイル
２４ 成形体
２５ 成形体
５０ ワイヤ

Claims (7)

  1. 少なくとも１つの上部側電位面と、接続用の太径ワイヤ（５０）又はストリップとを有するパワー半導体チップ（１０）であって、
    前記電位面上の結合層（１）と、
    前記（単複の）結合層上の少なくとも１つの金属成形体（２４、２５）と、
    を備え、前記電位面に面する前記金属成形体の下部側平坦面は、前記結合層（１）の結合工程に適するように被覆され、前記成形体の材料組成及び厚みは、前記金属成形体の上部側における前記接続工程で使用される前記太径ワイヤ（５０）又はストリップの寸法に従って選択され、さらに、
    各成形体（２４、２５）の下方の結合面は、前記成形体（２４、２５）よりも小さな投影面を有して、前記成形体（２４、２５）の周縁が非導電性搬送ホイル（２０ａ）上に取り付けられたままにしておく、
    ことを特徴とするパワー半導体チップ。
  2. 下部側平坦面が銀又はニッケル／金で被覆された成形体（２４、２５）は、Ｃｕ、Ａｇ、Ａｕ、Ａｌ、Ｍｏ、Ｗの元素群、又はこれらの合金から選択された材料で構成され、前記合金は、前記元素群の金属のうちの１つ又はそれ以上を含む、
    ことを特徴とする請求項１に記載のパワー半導体チップ。
  3. 前記非導電性搬送ホイル（２０ａ）が有機非導電性搬送ホイル（２０ａ）である、
    ことを特徴とする請求項１又は２に記載のパワー半導体チップ。
  4. 前記非導電性搬送ホイル（２０ａ）は、前記チップ表面の結合すべきでない領域に付着して被覆する、
    ことを特徴とする請求項１から３のいずれか１項に記載のパワー半導体チップ。
  5. 前記非導電性搬送ホイル（２０ａ）は、前記チップの外縁にまで広がらない、
    ことを特徴とする請求項１から４のいずれか１項に記載のパワー半導体チップ。
  6. 前記上部側成形体（２４、２５）に加え、前記パワー半導体（１０）の底部側にもさらなる成形体（３０）が設けられ、該さらなる成形体（３０）は、低温焼結、拡散はんだ付け又は接着によって結合するための結合層を通じて固定される、
    ことを特徴とする請求項１から５のいずれか１項に記載のパワー半導体チップ。
  7. 異なる電位を有する前記上部側電位面の数に対応する複数の成形体（２４、２５）が設けられる、
    ことを特徴とする請求項１から６のいずれか１項に記載のパワー半導体チップ。
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