JP5804690B2 - 面発光レーザ - Google Patents
面発光レーザ Download PDFInfo
- Publication number
- JP5804690B2 JP5804690B2 JP2010249158A JP2010249158A JP5804690B2 JP 5804690 B2 JP5804690 B2 JP 5804690B2 JP 2010249158 A JP2010249158 A JP 2010249158A JP 2010249158 A JP2010249158 A JP 2010249158A JP 5804690 B2 JP5804690 B2 JP 5804690B2
- Authority
- JP
- Japan
- Prior art keywords
- emitting laser
- active layer
- surface emitting
- photonic crystal
- dimensional photonic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/18—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities
- H01S5/185—Surface-emitting [SE] lasers, e.g. having both horizontal and vertical cavities having only horizontal cavities, e.g. horizontal cavity surface-emitting lasers [HCSEL]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/14—Semiconductor lasers with special structural design for lasing in a specific polarisation mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S2301/00—Functional characteristics
- H01S2301/16—Semiconductor lasers with special structural design to influence the modes, e.g. specific multimode
- H01S2301/166—Single transverse or lateral mode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
- H01S5/125—Distributed Bragg reflector [DBR] lasers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/32308—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm
- H01S5/32341—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength less than 900 nm blue laser based on GaN or GaP
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010249158A JP5804690B2 (ja) | 2010-11-05 | 2010-11-05 | 面発光レーザ |
| US13/284,069 US8379685B2 (en) | 2010-11-05 | 2011-10-28 | Surface emitting laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010249158A JP5804690B2 (ja) | 2010-11-05 | 2010-11-05 | 面発光レーザ |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012104524A JP2012104524A (ja) | 2012-05-31 |
| JP2012104524A5 JP2012104524A5 (enExample) | 2013-12-19 |
| JP5804690B2 true JP5804690B2 (ja) | 2015-11-04 |
Family
ID=46019597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010249158A Expired - Fee Related JP5804690B2 (ja) | 2010-11-05 | 2010-11-05 | 面発光レーザ |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US8379685B2 (enExample) |
| JP (1) | JP5804690B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5627361B2 (ja) | 2010-09-16 | 2014-11-19 | キヤノン株式会社 | 2次元フォトニック結晶面発光レーザ |
| US8885683B2 (en) | 2011-12-21 | 2014-11-11 | Canon Kabushiki Kaisha | Process for forming microstructure of nitride semiconductor, surface emitting laser using two-dimensional photonic crystal and production process thereof |
| US9088133B2 (en) * | 2012-02-28 | 2015-07-21 | Kyoto University | Two-dimensional photonic crystal surface emitting laser |
| JP2015523726A (ja) * | 2012-06-18 | 2015-08-13 | マサチューセッツ インスティテュート オブ テクノロジー | 偶発的ディラック点によって有効化されるフォトニック結晶面発光レーザー |
| US11923655B2 (en) * | 2018-08-27 | 2024-03-05 | Hamamatsu Photonics K.K. | Light emission device |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3983933B2 (ja) * | 1999-05-21 | 2007-09-26 | 進 野田 | 半導体レーザ、および半導体レーザの製造方法 |
| CN1286228C (zh) * | 2002-02-08 | 2006-11-22 | 松下电器产业株式会社 | 半导体发光元件及其制造方法 |
| JP4484134B2 (ja) * | 2003-03-25 | 2010-06-16 | 独立行政法人科学技術振興機構 | 2次元フォトニック結晶面発光レーザ |
| US20070030873A1 (en) * | 2005-08-03 | 2007-02-08 | Finisar Corporation | Polarization control in VCSELs using photonics crystals |
| TWI279595B (en) * | 2005-11-14 | 2007-04-21 | Ind Tech Res Inst | Electromagnetic polarizing structure and polarized electromagnetic device |
| US7535946B2 (en) | 2006-11-16 | 2009-05-19 | Canon Kabushiki Kaisha | Structure using photonic crystal and surface emitting laser |
| US7499480B2 (en) | 2006-11-16 | 2009-03-03 | Canon Kabushiki Kaisha | Photonic crystal structure and surface-emitting laser using the same |
| JP5111161B2 (ja) | 2007-04-19 | 2012-12-26 | キヤノン株式会社 | フォトニック結晶層を有する構造体、それを用いた面発光レーザ |
| JP4338211B2 (ja) | 2007-08-08 | 2009-10-07 | キヤノン株式会社 | フォトニック結晶を有する構造体、面発光レーザ |
| JP5070161B2 (ja) * | 2007-08-31 | 2012-11-07 | 独立行政法人科学技術振興機構 | フォトニック結晶レーザ |
| JP4968959B2 (ja) | 2008-03-06 | 2012-07-04 | キヤノン株式会社 | フォトニック結晶および該フォトニック結晶を用いた面発光レーザ |
| JP5388666B2 (ja) | 2008-04-21 | 2014-01-15 | キヤノン株式会社 | 面発光レーザ |
| JP2010219307A (ja) * | 2009-03-17 | 2010-09-30 | Seiko Epson Corp | 光源装置、プロジェクター |
| JP5183555B2 (ja) | 2009-04-02 | 2013-04-17 | キヤノン株式会社 | 面発光レーザアレイ |
| JP4975130B2 (ja) | 2009-05-07 | 2012-07-11 | キヤノン株式会社 | フォトニック結晶面発光レーザ |
| JP5047258B2 (ja) | 2009-12-09 | 2012-10-10 | キヤノン株式会社 | 二次元フォトニック結晶面発光レーザ |
-
2010
- 2010-11-05 JP JP2010249158A patent/JP5804690B2/ja not_active Expired - Fee Related
-
2011
- 2011-10-28 US US13/284,069 patent/US8379685B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2012104524A (ja) | 2012-05-31 |
| US20120114006A1 (en) | 2012-05-10 |
| US8379685B2 (en) | 2013-02-19 |
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