JP5783670B2 - 液体材料の塗布方法、塗布装置およびプログラム - Google Patents

液体材料の塗布方法、塗布装置およびプログラム Download PDF

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Publication number
JP5783670B2
JP5783670B2 JP2009186349A JP2009186349A JP5783670B2 JP 5783670 B2 JP5783670 B2 JP 5783670B2 JP 2009186349 A JP2009186349 A JP 2009186349A JP 2009186349 A JP2009186349 A JP 2009186349A JP 5783670 B2 JP5783670 B2 JP 5783670B2
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JP
Japan
Prior art keywords
coating
liquid material
discharge
application
nozzle
Prior art date
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Active
Application number
JP2009186349A
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English (en)
Japanese (ja)
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JP2011036800A (ja
JP2011036800A5 (enExample
Inventor
生島　和正
和正 生島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Musashi Engineering Inc
Original Assignee
Musashi Engineering Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2009186349A priority Critical patent/JP5783670B2/ja
Application filed by Musashi Engineering Inc filed Critical Musashi Engineering Inc
Priority to HK12112373.8A priority patent/HK1171573B/xx
Priority to US13/389,895 priority patent/US8703601B2/en
Priority to EP10808171.2A priority patent/EP2466630B1/en
Priority to CN201080045483.7A priority patent/CN102714165B/zh
Priority to KR1020127006243A priority patent/KR101700255B1/ko
Priority to PCT/JP2010/063346 priority patent/WO2011018988A1/ja
Priority to TW099126593A priority patent/TWI497613B/zh
Publication of JP2011036800A publication Critical patent/JP2011036800A/ja
Publication of JP2011036800A5 publication Critical patent/JP2011036800A5/ja
Application granted granted Critical
Publication of JP5783670B2 publication Critical patent/JP5783670B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/01—Manufacture or treatment
    • H10W74/012—Manufacture or treatment of encapsulations on active surfaces of flip-chip devices, e.g. forming underfills
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/011—Apparatus therefor
    • H10W72/0113—Apparatus for manufacturing die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/10—Encapsulations, e.g. protective coatings characterised by their shape or disposition
    • H10W74/15—Encapsulations, e.g. protective coatings characterised by their shape or disposition on active surfaces of flip-chip devices, e.g. underfills
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/851—Dispositions of multiple connectors or interconnections
    • H10W72/853—On the same surface
    • H10W72/856—Bump connectors and die-attach connectors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/721—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors
    • H10W90/724—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bump connectors between a chip and a stacked insulating package substrate, interposer or RDL
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/731—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors
    • H10W90/734—Package configurations characterised by the relative positions of pads or connectors relative to package parts of die-attach connectors between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Coating Apparatus (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Spray Control Apparatus (AREA)
JP2009186349A 2009-08-11 2009-08-11 液体材料の塗布方法、塗布装置およびプログラム Active JP5783670B2 (ja)

Priority Applications (8)

Application Number Priority Date Filing Date Title
JP2009186349A JP5783670B2 (ja) 2009-08-11 2009-08-11 液体材料の塗布方法、塗布装置およびプログラム
US13/389,895 US8703601B2 (en) 2009-08-11 2010-08-06 Method for applying liquid material, application device and program
EP10808171.2A EP2466630B1 (en) 2009-08-11 2010-08-06 Method for applying liquid material, application device and programme
CN201080045483.7A CN102714165B (zh) 2009-08-11 2010-08-06 液体材料的涂布方法以及涂布装置
HK12112373.8A HK1171573B (en) 2009-08-11 2010-08-06 Method for applying liquid material and application device
KR1020127006243A KR101700255B1 (ko) 2009-08-11 2010-08-06 액체 재료의 도포 방법, 도포 장치 및 프로그램을 기억한 기억 매체
PCT/JP2010/063346 WO2011018988A1 (ja) 2009-08-11 2010-08-06 液体材料の塗布方法、塗布装置およびプログラム
TW099126593A TWI497613B (zh) 2009-08-11 2010-08-10 A coating method for a liquid material, a coating apparatus, and a memory medium having a memory program

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009186349A JP5783670B2 (ja) 2009-08-11 2009-08-11 液体材料の塗布方法、塗布装置およびプログラム

Publications (3)

Publication Number Publication Date
JP2011036800A JP2011036800A (ja) 2011-02-24
JP2011036800A5 JP2011036800A5 (enExample) 2012-09-13
JP5783670B2 true JP5783670B2 (ja) 2015-09-24

Family

ID=43586165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009186349A Active JP5783670B2 (ja) 2009-08-11 2009-08-11 液体材料の塗布方法、塗布装置およびプログラム

Country Status (7)

Country Link
US (1) US8703601B2 (enExample)
EP (1) EP2466630B1 (enExample)
JP (1) JP5783670B2 (enExample)
KR (1) KR101700255B1 (enExample)
CN (1) CN102714165B (enExample)
TW (1) TWI497613B (enExample)
WO (1) WO2011018988A1 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5280702B2 (ja) * 2008-02-18 2013-09-04 武蔵エンジニアリング株式会社 液体材料の塗布方法、その装置およびそのプログラム
EP2444164B1 (en) * 2009-06-15 2016-07-13 Musashi Engineering, Inc. Method for applying liquid material, and apparatus and program for same
JP6452147B2 (ja) * 2015-01-19 2019-01-16 武蔵エンジニアリング株式会社 液体材料吐出装置
JP2016131947A (ja) * 2015-01-21 2016-07-25 三菱電機株式会社 液剤塗布方法および電子装置の製造方法ならびに液剤塗布装置
US9653325B2 (en) * 2015-02-17 2017-05-16 Powertech Technology Inc. Underfill process and processing machine thereof
JP6684397B2 (ja) * 2015-04-02 2020-04-22 エムテックスマート株式会社 流体の噴出方法および流体の成膜方法
CN106094271A (zh) * 2016-06-22 2016-11-09 深圳市华星光电技术有限公司 一种显示面板切割方法
JP6778426B2 (ja) * 2016-09-20 2020-11-04 武蔵エンジニアリング株式会社 液体材料吐出装置
JP6991475B2 (ja) * 2017-05-24 2022-01-12 協立化学産業株式会社 加工対象物切断方法
CN110678270B (zh) 2017-05-25 2022-06-17 武藏工业株式会社 液体材料涂布装置及液体材料涂布方法
JP6471258B2 (ja) * 2018-06-04 2019-02-13 武蔵エンジニアリング株式会社 液体材料塗布装置および液体材料塗布方法
CN108906508B (zh) * 2018-08-06 2020-11-27 Oppo（重庆）智能科技有限公司 胶量控制方法及胶量控制装置
JP7426198B2 (ja) * 2019-04-17 2024-02-01 株式会社ジャノメ 塗布装置
TW202430278A (zh) * 2023-01-18 2024-08-01 萬潤科技股份有限公司 液材施作方法及液材施作設備
CN121892355B (zh) * 2026-03-24 2026-07-21 宁波顺凯新材料科技有限公司 一种pi间隔胶粘带的生产系统

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2571024B2 (ja) 1994-09-28 1997-01-16 日本電気株式会社 マルチチップモジュール
US6066509A (en) 1998-03-12 2000-05-23 Micron Technology, Inc. Method and apparatus for underfill of bumped or raised die
JP3431406B2 (ja) * 1996-07-30 2003-07-28 株式会社東芝 半導体パッケージ装置
JPH1050769A (ja) * 1996-07-30 1998-02-20 Toshiba Corp 半導体パッケージの製造装置および製造方法
US7015592B2 (en) * 2004-03-19 2006-03-21 Intel Corporation Marking on underfill
CN1976761B (zh) * 2005-04-28 2011-04-13 芝浦机械电子株式会社 溶液的涂敷装置及涂敷方法
JP2007173621A (ja) * 2005-12-22 2007-07-05 Sharp Corp 基板に対する液膜材料の塗布方法
JP2007194403A (ja) * 2006-01-19 2007-08-02 Sony Corp 電子デバイスの製造装置及び電子デバイスの製造方法、並びに、アンダーフィル材充填状態の検査装置及びアンダーフィル材充填状態の検査方法
JP4366611B2 (ja) 2006-09-13 2009-11-18 セイコーエプソン株式会社 半導体装置の製造方法
JP4868515B2 (ja) 2006-11-01 2012-02-01 武蔵エンジニアリング株式会社 液体材料の充填方法、装置およびプログラム
JP4871093B2 (ja) 2006-11-01 2012-02-08 武蔵エンジニアリング株式会社 液体材料の充填方法、装置およびプログラム
JP5019900B2 (ja) * 2007-02-08 2012-09-05 武蔵エンジニアリング株式会社 液体材料の充填方法、装置およびプログラム
JP4962413B2 (ja) * 2008-05-28 2012-06-27 セイコーエプソン株式会社 液状体吐出装置、及び液状体吐出方法

Also Published As

Publication number Publication date
TW201119752A (en) 2011-06-16
EP2466630A4 (en) 2014-02-26
US20120313276A1 (en) 2012-12-13
JP2011036800A (ja) 2011-02-24
EP2466630B1 (en) 2019-10-02
CN102714165B (zh) 2015-04-15
KR101700255B1 (ko) 2017-02-13
EP2466630A1 (en) 2012-06-20
KR20120054629A (ko) 2012-05-30
CN102714165A (zh) 2012-10-03
TWI497613B (zh) 2015-08-21
HK1171573A1 (en) 2013-03-28
WO2011018988A1 (ja) 2011-02-17
US8703601B2 (en) 2014-04-22

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