JP5775518B2 - 可変照明設定を有するマスク検査顕微鏡 - Google Patents

可変照明設定を有するマスク検査顕微鏡 Download PDF

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Publication number
JP5775518B2
JP5775518B2 JP2012528247A JP2012528247A JP5775518B2 JP 5775518 B2 JP5775518 B2 JP 5775518B2 JP 2012528247 A JP2012528247 A JP 2012528247A JP 2012528247 A JP2012528247 A JP 2012528247A JP 5775518 B2 JP5775518 B2 JP 5775518B2
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Prior art keywords
mask inspection
inspection microscope
illumination beam
light
beam path
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Japanese (ja)
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JP2013504774A (ja
JP2013504774A5 (enExample
Inventor
ウルリッヒ マテイカ
ウルリッヒ マテイカ
ホルガー ザイツ
ホルガー ザイツ
ノルベルト ローゼンクランツ
ノルベルト ローゼンクランツ
マリオ レングル
マリオ レングル
Original Assignee
カール ツァイス エスエムエス ゲーエムベーハー
カール ツァイス エスエムエス ゲーエムベーハー
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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/086—Condensers for transillumination only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Microscoopes, Condenser (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2012528247A 2009-09-11 2010-08-28 可変照明設定を有するマスク検査顕微鏡 Active JP5775518B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US24156509P 2009-09-11 2009-09-11
US61/241,565 2009-09-11
DE102009041405.3A DE102009041405B4 (de) 2009-09-14 2009-09-14 Maskeninspektionsmikroskop mit variabler Beleuchtungseinstellung
DE102009041405.3 2009-09-14
PCT/EP2010/005293 WO2011029535A2 (en) 2009-09-11 2010-08-28 Mask inspection microscope with variable illumination setting

Publications (3)

Publication Number Publication Date
JP2013504774A JP2013504774A (ja) 2013-02-07
JP2013504774A5 JP2013504774A5 (enExample) 2013-09-26
JP5775518B2 true JP5775518B2 (ja) 2015-09-09

Family

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Family Applications (1)

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JP2012528247A Active JP5775518B2 (ja) 2009-09-11 2010-08-28 可変照明設定を有するマスク検査顕微鏡

Country Status (4)

Country Link
US (1) US8970951B2 (enExample)
JP (1) JP5775518B2 (enExample)
DE (1) DE102009041405B4 (enExample)
WO (1) WO2011029535A2 (enExample)

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US9213003B2 (en) 2010-12-23 2015-12-15 Carl Zeiss Sms Gmbh Method for characterizing a structure on a mask and device for carrying out said method
DE102011104357B4 (de) * 2011-06-14 2024-05-23 Carl Zeiss Smt Gmbh Verfahren zur Simulation eines Luftbildes
US9207544B2 (en) 2011-06-14 2015-12-08 Carl Zeiss Sms Gmbh Method for simulating an aerial image
JP5373228B2 (ja) * 2011-09-21 2013-12-18 オリンパスメディカルシステムズ株式会社 撮像装置および内視鏡
US8928973B2 (en) * 2011-12-16 2015-01-06 Taiwan Semiconductor Manufacturing Company, Ltd. Microscope apparatus for phase image acquisition
US8984453B2 (en) * 2012-06-28 2015-03-17 Applied Materials Israel, Ltd. Method and system for creation of binary spatial filters
US8755114B1 (en) 2013-06-14 2014-06-17 Computer Power Supply, Inc. Apparatus for aiding manual, mechanical alignment of optical equipment
DE102014219755A1 (de) 2013-10-30 2015-04-30 Carl Zeiss Smt Gmbh Reflektives optisches Element
DE102013223808A1 (de) * 2013-11-21 2014-12-11 Carl Zeiss Smt Gmbh Optische Spiegeleinrichtung zur Reflexion eines Bündels von EUV-Licht
NL2015160A (en) 2014-07-28 2016-07-07 Asml Netherlands Bv Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method.
DE102014114468A1 (de) * 2014-10-06 2016-04-07 Leica Microsystems (Schweiz) Ag Mikroskop
CN107430352B (zh) 2015-03-25 2020-01-21 Asml荷兰有限公司 量测方法、量测设备和器件制造方法
US9909972B2 (en) * 2016-02-08 2018-03-06 MANTA Instruments, Inc. Multi-camera apparatus for observation of microscopic movements and counting of particles in colloids and its calibration
DE102016204535A1 (de) * 2016-03-18 2017-09-21 Carl Zeiss Smt Gmbh Messmikroskop zur Vermessung von Masken für lithographische Verfahren sowie Messverfahren und Kalibrierverfahren hierfür
DE102017115262B9 (de) * 2017-07-07 2021-05-27 Carl Zeiss Smt Gmbh Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
DE102017118499A1 (de) * 2017-08-14 2019-02-14 Endress+Hauser Conducta Gmbh+Co. Kg Kalibriereinsatz und Halterung desselben
DE102018107112B9 (de) * 2018-03-26 2020-02-27 Carl Zeiss Smt Gmbh Verfahren zur Inspektion einer Maske
DE102018210603B4 (de) * 2018-06-28 2025-10-09 Carl Zeiss Microscopy Gmbh Verfahren zum Erzeugen eines Übersichtsbilds unter Verwendung eines hochaperturigen Objektivs
US10816483B2 (en) 2018-12-27 2020-10-27 Globalfoundries Inc. Double pass diluted ultraviolet reticle inspection
DE102019114272A1 (de) * 2019-05-28 2020-12-03 Carl Zeiss Smt Gmbh Verfahren zur Bestimmung einer Abbildungsfunktion eines Maskeninspektionsmikroskops und Maskeninspektionsmikroskop
DE102019215972A1 (de) * 2019-10-17 2021-04-22 Carl Zeiss Smt Gmbh Verfahren zur Messung einer Reflektivität eines Objekts für Messlicht sowie Metrologiesystem zur Durchführung des Verfahrens
DE102020208045A1 (de) * 2020-06-29 2021-12-30 Carl Zeiss Smt Gmbh Verfahren zur Ermittlung eines Bildes eines Objekts
DE102020123615B9 (de) 2020-09-10 2022-04-28 Carl Zeiss Smt Gmbh Verfahren zur Charakterisierung einer Maske für die Mikrolithographie
DE102021210671A1 (de) 2021-09-24 2022-12-01 Carl Zeiss Smt Gmbh Intensitätsanpassungsfilter für eine optische anordnung und optische anordnung mit einem entsprechenden intensitätsanpassungsfilter sowie verfahren zu dessen herstellung
DE102022200372A1 (de) * 2022-01-14 2023-07-20 Carl Zeiss Smt Gmbh Verfahren zum Nachbilden von Beleuchtungs- und Abbildungseigenschaften eines optischen Produktionssystems bei der Beleuchtung und Abbildung eines Objekts mittels eines optischen Messsystems
US20240003827A1 (en) * 2022-06-30 2024-01-04 Taiwan Semiconductor Manufacturing Company Systems and methods for actinic mask inspection and review in vacuum
JP2024104699A (ja) * 2023-01-24 2024-08-05 ギガフォトン株式会社 チルトステージ、極端紫外光生成装置、及び電子デバイスの製造方法
DE102023101902B4 (de) * 2023-01-26 2025-10-23 Carl Zeiss Smt Gmbh Messvorrichtung, Verfahren zum Betreiben einer maskenmetrologischen Messvorrichtung und Computerprogrammprodukt

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JPH11219891A (ja) * 1998-02-04 1999-08-10 Hitachi Ltd マスクの検査方法および装置
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JP2003506881A (ja) * 1999-07-30 2003-02-18 カール ツァイス シュティフトゥング トレイディング アズ カール ツァイス Ｅｕｖ照明光学系の射出瞳における照明分布の制御
JP3631094B2 (ja) * 2000-03-30 2005-03-23 キヤノン株式会社 投影露光装置及びデバイス製造方法
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JP4572821B2 (ja) * 2005-11-30 2010-11-04 セイコーエプソン株式会社 グレイスケールマスク、マイクロレンズの製造方法
DE102008049365A1 (de) 2008-09-26 2010-04-01 Carl Zeiss Sms Gmbh Maskeninspektionsmikroskop mit variabler Beleuchtungseinstellung

Also Published As

Publication number Publication date
US8970951B2 (en) 2015-03-03
DE102009041405A1 (de) 2011-03-24
DE102009041405B4 (de) 2020-08-20
WO2011029535A2 (en) 2011-03-17
JP2013504774A (ja) 2013-02-07
WO2011029535A3 (en) 2011-05-05
US20120162755A1 (en) 2012-06-28

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