JP5775201B2 - 製作方法 - Google Patents
製作方法 Download PDFInfo
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- JP5775201B2 JP5775201B2 JP2014163307A JP2014163307A JP5775201B2 JP 5775201 B2 JP5775201 B2 JP 5775201B2 JP 2014163307 A JP2014163307 A JP 2014163307A JP 2014163307 A JP2014163307 A JP 2014163307A JP 5775201 B2 JP5775201 B2 JP 5775201B2
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1809—Diffraction gratings with pitch less than or comparable to the wavelength
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/18—Longitudinally sectional layer of three or more sections
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Polarising Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Liquid Crystal (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Description
本出願は2006年8月15日出願の「模様化された構造を形成するための方法」と題した米国仮出願番号第60/837,829号、及び2007年1月3日出願の「偏光子薄膜及びこの製作方法」と題した米国仮出願番号第60/883,194号の優先権を主張するものである。上記参照仮出願の両方の内容の全てを本明細書に援用する。
Claims (12)
- 第1の方向に沿って延在する、酸化チタンの複数の離間分離した細長い部分を含む層を透明性の基板の上に含み、前記細長い部分の幅が10nm〜50nm、深さが100nm以上、かつ150nm以下の間隔で分離された矩形状の自立構造であり、200nmから280nmまでの範囲内である波長λの光を偏光する直線偏光子の製作方法において、
前記基板に、選択的にエッチング除去可能な初期回折格子を形成し、
前記基板、及び前記初期回折格子の上に、単分子層の厚さが3nm以下の原子層堆積を用いて酸化チタンの等角層を堆積し、
前記初期回折格子のそれぞれの側壁上を残して前記等角層を異方的にエッチング除去し、KOH中のウェットエッチング、或いはCl2/BCl3を使用する反応性イオンエッチングによって前記初期回折格子をエッチング除去し、前記細長い部分を形成する、
ことを特徴とする製作方法。 - 前記初期回折格子の材料は、金属、有機材料、又は前記基板と同じ材料である
ことを特徴とする請求項1に記載の製作方法。 - 前記層は、
第1の偏光状態を有する前記波長λの光の20%以上を透過させ、
第2の偏光状態を有する前記波長λの光の2%以下を透過させる、
ことを特徴とする請求項1または2に記載の製作方法。 - λが260nm以下である、ことを特徴とする請求項1に記載の製作方法。
- λが230nmから260nmまでの範囲内である、ことを特徴とする請求項1に記載の製作方法。
- 前記層は、入射する前記第1の偏光状態を有する波長λの光の30%以上を透過させる、ことを特徴とする請求項3に記載の製作方法。
- 前記層は、入射する前記第2の偏光状態を有する波長λの光の1%以下を透過させる、ことを特徴とする請求項3に記載の製作方法。
- 前記層はλにおいて30以上の減衰比を有する、ことを特徴とする請求項1に記載の製作方法。
- 前記層は、入射する前記第2の偏光状態を有する波長λの光の20%以下を反射する、ことを特徴とする請求項3に記載の製作方法。
- 前記第1の方向に沿って延在する、第2の材料の複数の離間分離した部分を含む第2の層をさらに含み、前記第2の材料が酸化チタンとは異なり、
前記第2の層は、入射する前記第1の偏光状態を有する波長λ’の光の20%以上を透過させ、
前記層は、入射する前記第2の偏光状態を有する波長λ’の光の2%以下を透過させ、前記第1と第2の偏光状態は直交し、λ<λ’である、
ことを特徴とする請求項3に記載の製作方法。 - λ’が400nmから700nmまでの範囲内である、ことを特徴とする請求項10に記載の製作方法。
- 前記第2の材料が金属である、ことを特徴とする請求項11に記載の製作方法。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US83782906P | 2006-08-15 | 2006-08-15 | |
US60/837,829 | 2006-08-15 | ||
US88319407P | 2007-01-03 | 2007-01-03 | |
US60/883,194 | 2007-01-03 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009524759A Division JP5933910B2 (ja) | 2006-08-15 | 2007-08-14 | 偏光子薄膜及びこの製作方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014219697A JP2014219697A (ja) | 2014-11-20 |
JP5775201B2 true JP5775201B2 (ja) | 2015-09-09 |
Family
ID=39083042
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009524759A Active JP5933910B2 (ja) | 2006-08-15 | 2007-08-14 | 偏光子薄膜及びこの製作方法 |
JP2012280552A Active JP5934085B2 (ja) | 2006-08-15 | 2012-12-25 | Uv露光システム |
JP2014163307A Active JP5775201B2 (ja) | 2006-08-15 | 2014-08-11 | 製作方法 |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009524759A Active JP5933910B2 (ja) | 2006-08-15 | 2007-08-14 | 偏光子薄膜及びこの製作方法 |
JP2012280552A Active JP5934085B2 (ja) | 2006-08-15 | 2012-12-25 | Uv露光システム |
Country Status (3)
Country | Link |
---|---|
US (1) | US20090041971A1 (ja) |
JP (3) | JP5933910B2 (ja) |
WO (1) | WO2008022099A2 (ja) |
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-
2007
- 2007-08-14 WO PCT/US2007/075859 patent/WO2008022099A2/en active Application Filing
- 2007-08-14 JP JP2009524759A patent/JP5933910B2/ja active Active
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2008
- 2008-08-14 US US12/191,965 patent/US20090041971A1/en not_active Abandoned
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2012
- 2012-12-25 JP JP2012280552A patent/JP5934085B2/ja active Active
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2014
- 2014-08-11 JP JP2014163307A patent/JP5775201B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP5933910B2 (ja) | 2016-06-15 |
JP2014219697A (ja) | 2014-11-20 |
US20090041971A1 (en) | 2009-02-12 |
WO2008022099A2 (en) | 2008-02-21 |
JP2010501085A (ja) | 2010-01-14 |
JP5934085B2 (ja) | 2016-06-15 |
WO2008022099A3 (en) | 2008-08-21 |
JP2013117727A (ja) | 2013-06-13 |
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