JP5746352B2 - 集積化された受動素子と電力増幅器 - Google Patents

集積化された受動素子と電力増幅器 Download PDF

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Publication number
JP5746352B2
JP5746352B2 JP2013530204A JP2013530204A JP5746352B2 JP 5746352 B2 JP5746352 B2 JP 5746352B2 JP 2013530204 A JP2013530204 A JP 2013530204A JP 2013530204 A JP2013530204 A JP 2013530204A JP 5746352 B2 JP5746352 B2 JP 5746352B2
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Japan
Prior art keywords
power
power amplifier
glass substrate
vias
implementations
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Expired - Fee Related
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JP2013530204A
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Japanese (ja)
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JP2013538010A5 (enExample
JP2013538010A (ja
Inventor
ブラック、ジャスティン・フェルプス
シノイ、ラビンドラ・ブイ.
ゴーセブ、エブゲニ・ペトロビッチ
ハドジクリストス、アリストテレ
マイヤーズ、トーマス・アンドリュー
キム、ジョンヘ
ベレズ、マリオ・フランシスコ
ラン、ジェ−シウン・ジェフリー
ロ、チ・シュン
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Qualcomm MEMS Technologies Inc
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Qualcomm MEMS Technologies Inc
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    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/14Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
    • H01L23/15Ceramic or glass substrates
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/58Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
    • H01L23/64Impedance arrangements
    • H01L23/66High-frequency adaptations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/16Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/189High-frequency amplifiers, e.g. radio frequency amplifiers
    • H03F3/19High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
    • H03F3/195High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only in integrated circuits
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/20Power amplifiers, e.g. Class B amplifiers, Class C amplifiers
    • H03F3/21Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only
    • H03F3/211Power amplifiers, e.g. Class B amplifiers, Class C amplifiers with semiconductor devices only using a combination of several amplifiers
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03FAMPLIFIERS
    • H03F3/00Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
    • H03F3/45Differential amplifiers
    • H03F3/45071Differential amplifiers with semiconductor devices only
    • H03F3/45076Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier
    • H03F3/45475Differential amplifiers with semiconductor devices only characterised by the way of implementation of the active amplifying circuit in the differential amplifier using IC blocks as the active amplifying circuit
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/20Inductors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/60Capacitors
    • H10D1/62Capacitors having potential barriers
    • H10D1/64Variable-capacitance diodes, e.g. varactors 
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the groups H01L21/18 - H01L21/326 or H10D48/04 - H10D48/07 e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/565Moulds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2223/00Details relating to semiconductor or other solid state devices covered by the group H01L23/00
    • H01L2223/58Structural electrical arrangements for semiconductor devices not otherwise provided for
    • H01L2223/64Impedance arrangements
    • H01L2223/66High-frequency adaptations
    • H01L2223/6644Packaging aspects of high-frequency amplifiers
    • H01L2223/6655Matching arrangements, e.g. arrangement of inductive and capacitive components
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • H01L23/3128Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/095Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
    • H01L2924/097Glass-ceramics, e.g. devitrified glass
    • H01L2924/09701Low temperature co-fired ceramic [LTCC]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12044OLED
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/146Mixed devices
    • H01L2924/1461MEMS
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/162Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/16Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
    • H05K1/165Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed inductors
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4602Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
    • H05K3/4605Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated made from inorganic insulating material

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Micromachines (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)
JP2013530204A 2010-09-23 2011-09-16 集積化された受動素子と電力増幅器 Expired - Fee Related JP5746352B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US38591310P 2010-09-23 2010-09-23
US61/385,913 2010-09-23
PCT/US2011/052017 WO2012040063A1 (en) 2010-09-23 2011-09-16 Integrated passives and power amplifier

Publications (3)

Publication Number Publication Date
JP2013538010A JP2013538010A (ja) 2013-10-07
JP2013538010A5 JP2013538010A5 (enExample) 2014-02-27
JP5746352B2 true JP5746352B2 (ja) 2015-07-08

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US (1) US8970516B2 (enExample)
EP (1) EP2619791B1 (enExample)
JP (1) JP5746352B2 (enExample)
CN (1) CN103119703B (enExample)
TW (1) TW201222768A (enExample)
WO (1) WO2012040063A1 (enExample)

Families Citing this family (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8941607B2 (en) * 2010-12-16 2015-01-27 Hung-Ta LIU MEMS display with touch control function
US9069421B2 (en) 2010-12-16 2015-06-30 Hung-Ta LIU Touch sensor and touch display apparatus and driving method thereof
US8519506B2 (en) * 2011-06-28 2013-08-27 National Semiconductor Corporation Thermally conductive substrate for galvanic isolation
US9046976B2 (en) * 2011-09-28 2015-06-02 Hung-Ta LIU Method for transmitting and detecting touch sensing signals and touch device using the same
US20140035935A1 (en) * 2012-08-03 2014-02-06 Qualcomm Mems Technologies, Inc. Passives via bar
US10115671B2 (en) 2012-08-03 2018-10-30 Snaptrack, Inc. Incorporation of passives and fine pitch through via for package on package
US20140063022A1 (en) * 2012-08-31 2014-03-06 Qualcomm Mems Technologies, Inc. Electromechanical systems device
US9035194B2 (en) * 2012-10-30 2015-05-19 Intel Corporation Circuit board with integrated passive devices
US9431473B2 (en) 2012-11-21 2016-08-30 Qualcomm Incorporated Hybrid transformer structure on semiconductor devices
US20140144681A1 (en) * 2012-11-27 2014-05-29 Qualcomm Mems Technologies, Inc. Adhesive metal nitride on glass and related methods
US20140167900A1 (en) 2012-12-14 2014-06-19 Gregorio R. Murtagian Surface-mount inductor structures for forming one or more inductors with substrate traces
US9059269B2 (en) 2013-01-10 2015-06-16 International Business Machines Corporation Silicon-on-insulator heat sink
US9203373B2 (en) 2013-01-11 2015-12-01 Qualcomm Incorporated Diplexer design using through glass via technology
US10002700B2 (en) 2013-02-27 2018-06-19 Qualcomm Incorporated Vertical-coupling transformer with an air-gap structure
US9634645B2 (en) 2013-03-14 2017-04-25 Qualcomm Incorporated Integration of a replica circuit and a transformer above a dielectric substrate
US9935166B2 (en) * 2013-03-15 2018-04-03 Qualcomm Incorporated Capacitor with a dielectric between a via and a plate of the capacitor
US9634640B2 (en) * 2013-05-06 2017-04-25 Qualcomm Incorporated Tunable diplexers in three-dimensional (3D) integrated circuits (IC) (3DIC) and related components and methods
US9264013B2 (en) 2013-06-04 2016-02-16 Qualcomm Incorporated Systems for reducing magnetic coupling in integrated circuits (ICS), and related components and methods
US20150035162A1 (en) * 2013-08-02 2015-02-05 Qualcomm Incorporated Inductive device that includes conductive via and metal layer
US9449753B2 (en) 2013-08-30 2016-09-20 Qualcomm Incorporated Varying thickness inductor
US10317767B2 (en) * 2014-02-07 2019-06-11 E Ink Corporation Electro-optic display backplane structure with drive components and pixel electrodes on opposed surfaces
US20150237732A1 (en) * 2014-02-18 2015-08-20 Qualcomm Incorporated Low-profile package with passive device
CN103904039B (zh) * 2014-03-31 2016-07-06 华进半导体封装先导技术研发中心有限公司 超薄凹式玻璃基板的封装结构及方法
US9906318B2 (en) 2014-04-18 2018-02-27 Qualcomm Incorporated Frequency multiplexer
CN104009014B (zh) * 2014-04-26 2017-04-12 华进半导体封装先导技术研发中心有限公司 集成无源器件晶圆级封装三维堆叠结构及制作方法
KR101712928B1 (ko) 2014-11-12 2017-03-09 삼성전자주식회사 반도체 패키지
CN107658288B (zh) * 2014-11-21 2020-02-07 威锋电子股份有限公司 集成电路装置
US9741691B2 (en) * 2015-04-29 2017-08-22 Qualcomm Incorporated Power delivery network (PDN) design for monolithic three-dimensional (3-D) integrated circuit (IC)
JP2016219683A (ja) 2015-05-25 2016-12-22 ソニー株式会社 配線基板、および製造方法
JP6657609B2 (ja) * 2015-06-12 2020-03-04 凸版印刷株式会社 配線回路基板、半導体装置、配線回路基板の製造方法および半導体装置の製造方法
US9939596B2 (en) * 2015-10-29 2018-04-10 Samsung Electronics Co., Ltd. Optical integrated circuit package
US9654060B1 (en) 2015-11-13 2017-05-16 International Business Machines Corporation Signal amplification using a reference plane with alternating impedance
CN108369939B (zh) * 2015-12-22 2022-07-01 英特尔公司 具有电磁干扰屏蔽的半导体封装
US9780755B1 (en) * 2016-09-16 2017-10-03 Apple Inc. On flex circuit desense filter for wireless communications
CN106298704B (zh) * 2016-10-11 2018-05-29 中国科学院地质与地球物理研究所 一种带热沉和磁屏蔽的mems封装及其制备方法
US10411658B2 (en) 2016-12-14 2019-09-10 Kabushiki Kaisha Toshiba Semiconductor device
CN107799360A (zh) * 2017-09-27 2018-03-13 东南大学 一种集成式无源无线微机械开关及其制备方法
KR102487611B1 (ko) 2017-10-27 2023-01-11 코닝 인코포레이티드 보호 물질을 사용한 관통 유리 비아 제조방법
CN107959109A (zh) * 2017-11-05 2018-04-24 中国电子科技集团公司第五十五研究所 硅基一体化集成高增益天线及天线阵列
CN108336042A (zh) * 2017-12-26 2018-07-27 上海矽润科技有限公司 一种三维叠层芯片SiP封装
TWI659839B (zh) * 2018-03-30 2019-05-21 Uniflex Technology Inc. 用於顯示器的封裝結構
CN108566248B (zh) * 2018-05-02 2021-01-26 京东方科技集团股份有限公司 一种光信息影像化组件、制作方法及显示装置
US11196394B2 (en) 2018-08-10 2021-12-07 Murata Manufacturing Co., Ltd. Power amplifier module
JP2020028108A (ja) 2018-08-10 2020-02-20 株式会社村田製作所 電力増幅モジュール
US10969416B2 (en) * 2018-12-13 2021-04-06 Silicon Laboratories Inc. System and method of duplicate circuit block swapping for noise reduction
KR20210011279A (ko) 2019-07-22 2021-02-01 삼성전자주식회사 반도체 패키지
TWI742935B (zh) * 2019-12-20 2021-10-11 日商村田製作所股份有限公司 功率放大模組
US11177065B2 (en) * 2020-03-30 2021-11-16 Qualcomm Incorporated Thermal paths for glass substrates
JP7372574B2 (ja) * 2020-04-17 2023-11-01 日本電信電話株式会社 光半導体チップ
CN112000151B (zh) * 2020-09-11 2022-01-28 山特电子(深圳)有限公司 用于滤波器电容组的温度保护装置
KR20230056086A (ko) 2021-10-19 2023-04-27 삼성전자주식회사 반도체 패키지
CN114006598B (zh) * 2021-10-29 2025-08-26 北京航天微电科技有限公司 一种薄膜体声波谐振器、制备方法和薄膜体声波滤波器
US11955417B2 (en) 2021-12-14 2024-04-09 Industrial Technology Research Institute Electronic device having substrate with electrically floating vias
JP2024545810A (ja) * 2021-12-22 2024-12-12 テレフオンアクチーボラゲット エルエム エリクソン(パブル) 集積回路のための熱相互接続
WO2023225905A1 (zh) * 2022-05-25 2023-11-30 京东方科技集团股份有限公司 滤波器及其制作方法、电子设备
US20240006347A1 (en) * 2022-06-29 2024-01-04 Intel Corporation Passive circuit on a back-end-of-line of a package
US20250105169A1 (en) * 2023-09-26 2025-03-27 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor package and manufacturing method thereof
US20250226365A1 (en) * 2024-01-08 2025-07-10 Qualcomm Incorporated Integrated circuit device including impedance adapter

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW424321B (en) 1996-10-31 2001-03-01 Sharp Kk Integrated electronic circuit
JPH11186432A (ja) * 1997-12-25 1999-07-09 Canon Inc 半導体パッケージ及びその製造方法
US6462950B1 (en) 2000-11-29 2002-10-08 Nokia Mobile Phones Ltd. Stacked power amplifier module
US7061102B2 (en) * 2001-06-11 2006-06-13 Xilinx, Inc. High performance flipchip package that incorporates heat removal with minimal thermal mismatch
JPWO2003007370A1 (ja) 2001-07-12 2004-11-04 株式会社日立製作所 配線ガラス基板およびその製造方法ならびに配線ガラス基板に用いられる導電性ペーストおよび半導体モジュールならびに配線基板および導体形成方法
US6873529B2 (en) 2002-02-26 2005-03-29 Kyocera Corporation High frequency module
US7668415B2 (en) 2004-09-27 2010-02-23 Qualcomm Mems Technologies, Inc. Method and device for providing electronic circuitry on a backplate
JP2006179564A (ja) * 2004-12-21 2006-07-06 Nec Corp 半導体接続基板、半導体装置、半導体デバイス及び半導体基板並びに半導体接続基板の製造方法
JP4891235B2 (ja) * 2005-06-01 2012-03-07 パナソニック株式会社 回路基板とその製造方法及びこれを用いた電子部品
US7288995B2 (en) 2005-06-15 2007-10-30 Nokia Corporation Power amplifier of a transmitter
JP2007073849A (ja) 2005-09-08 2007-03-22 Sharp Corp 電子回路モジュールとその製造方法
JP2008098285A (ja) 2006-10-10 2008-04-24 Rohm Co Ltd 半導体装置
JP4906496B2 (ja) 2006-12-25 2012-03-28 新光電気工業株式会社 半導体パッケージ
EP2109888A2 (en) 2007-01-17 2009-10-21 Nxp B.V. A system-in-package with through substrate via holes
JP2009135204A (ja) * 2007-11-29 2009-06-18 Nec Electronics Corp システムインパッケージ
US8068710B2 (en) * 2007-12-07 2011-11-29 Qualcomm Mems Technologies, Inc. Decoupled holographic film and diffuser
US7746174B2 (en) * 2008-06-12 2010-06-29 Samsung Electro-Mechanics Company, Ltd. Systems and methods for power amplifier with integrated passive device

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EP2619791B1 (en) 2015-10-21
TW201222768A (en) 2012-06-01
JP2013538010A (ja) 2013-10-07
US20120075216A1 (en) 2012-03-29
WO2012040063A1 (en) 2012-03-29
CN103119703B (zh) 2016-01-20

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