JP5744693B2 - 光電変換装置 - Google Patents
光電変換装置 Download PDFInfo
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- JP5744693B2 JP5744693B2 JP2011221733A JP2011221733A JP5744693B2 JP 5744693 B2 JP5744693 B2 JP 5744693B2 JP 2011221733 A JP2011221733 A JP 2011221733A JP 2011221733 A JP2011221733 A JP 2011221733A JP 5744693 B2 JP5744693 B2 JP 5744693B2
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- Prior art keywords
- transistor
- photoelectric conversion
- conversion device
- photodiode
- gate
- Prior art date
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- 238000006243 chemical reaction Methods 0.000 title claims description 90
- 239000004065 semiconductor Substances 0.000 claims description 51
- 239000011701 zinc Substances 0.000 description 77
- 229910052751 metal Inorganic materials 0.000 description 30
- 125000004430 oxygen atom Chemical group O* 0.000 description 30
- 125000004429 atom Chemical group 0.000 description 28
- 239000002184 metal Substances 0.000 description 28
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 18
- 239000013078 crystal Substances 0.000 description 17
- VUFNLQXQSDUXKB-DOFZRALJSA-N 2-[4-[4-[bis(2-chloroethyl)amino]phenyl]butanoyloxy]ethyl (5z,8z,11z,14z)-icosa-5,8,11,14-tetraenoate Chemical compound CCCCC\C=C/C\C=C/C\C=C/C\C=C/CCCC(=O)OCCOC(=O)CCCC1=CC=C(N(CCCl)CCCl)C=C1 VUFNLQXQSDUXKB-DOFZRALJSA-N 0.000 description 14
- 238000010586 diagram Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- 239000000203 mixture Substances 0.000 description 12
- 238000004088 simulation Methods 0.000 description 11
- 229910052738 indium Inorganic materials 0.000 description 10
- 229910007541 Zn O Inorganic materials 0.000 description 9
- 229910052733 gallium Inorganic materials 0.000 description 9
- 239000011787 zinc oxide Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 229910020994 Sn-Zn Inorganic materials 0.000 description 7
- 229910009069 Sn—Zn Inorganic materials 0.000 description 7
- 230000002159 abnormal effect Effects 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 229910052725 zinc Inorganic materials 0.000 description 7
- 229910018137 Al-Zn Inorganic materials 0.000 description 6
- 229910018573 Al—Zn Inorganic materials 0.000 description 6
- 238000004364 calculation method Methods 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 239000001257 hydrogen Substances 0.000 description 5
- 229910052739 hydrogen Inorganic materials 0.000 description 5
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000003381 stabilizer Substances 0.000 description 5
- 229910020868 Sn-Ga-Zn Inorganic materials 0.000 description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 4
- 229910018120 Al-Ga-Zn Inorganic materials 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 238000007599 discharging Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000005669 field effect Effects 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 2
- 229910020833 Sn-Al-Zn Inorganic materials 0.000 description 2
- 229910020944 Sn-Mg Inorganic materials 0.000 description 2
- 229910005728 SnZn Inorganic materials 0.000 description 2
- 229910009369 Zn Mg Inorganic materials 0.000 description 2
- 229910007573 Zn-Mg Inorganic materials 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052693 Europium Inorganic materials 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 206010021143 Hypoxia Diseases 0.000 description 1
- -1 In—Zn oxide Chemical class 0.000 description 1
- 229910052765 Lutetium Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910052772 Samarium Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- UYAHIZSMUZPPFV-UHFFFAOYSA-N erbium Chemical compound [Er] UYAHIZSMUZPPFV-UHFFFAOYSA-N 0.000 description 1
- OGPBJKLSAFTDLK-UHFFFAOYSA-N europium atom Chemical compound [Eu] OGPBJKLSAFTDLK-UHFFFAOYSA-N 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 description 1
- KJZYNXUDTRRSPN-UHFFFAOYSA-N holmium atom Chemical compound [Ho] KJZYNXUDTRRSPN-UHFFFAOYSA-N 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229910052747 lanthanoid Inorganic materials 0.000 description 1
- 150000002602 lanthanoids Chemical class 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- OHSVLFRHMCKCQY-UHFFFAOYSA-N lutetium atom Chemical compound [Lu] OHSVLFRHMCKCQY-UHFFFAOYSA-N 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- PUDIUYLPXJFUGB-UHFFFAOYSA-N praseodymium atom Chemical compound [Pr] PUDIUYLPXJFUGB-UHFFFAOYSA-N 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000001004 secondary ion mass spectrometry Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- FRNOGLGSGLTDKL-UHFFFAOYSA-N thulium atom Chemical compound [Tm] FRNOGLGSGLTDKL-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/02016—Circuit arrangements of general character for the devices
- H01L31/02019—Circuit arrangements of general character for the devices for devices characterised by at least one potential jump barrier or surface barrier
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/44—Electric circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
- H01L31/101—Devices sensitive to infrared, visible or ultraviolet radiation
- H01L31/102—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier
- H01L31/105—Devices sensitive to infrared, visible or ultraviolet radiation characterised by only one potential barrier the potential barrier being of the PIN type
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/04—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only
- H03F3/08—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only controlled by light
- H03F3/082—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements with semiconductor devices only controlled by light with FET's
Landscapes
- Power Engineering (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Crystallography & Structural Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Thin Film Transistor (AREA)
- Light Receiving Elements (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Solid State Image Pick-Up Elements (AREA)
Description
(カレントミラー回路)
L/W=20μm/30μm
第1のトランジスタ:1段
第2のトランジスタ:10000段
電界効果移動度:10cm2/Vs
カットオフ電流:1E−18A
オフ電流:1E−18A
(第3のトランジスタ)
ゲート長:20μm
ゲート幅:0〜3000μm
(電流源)
電流値:100nA(フォトダイオード電流の1000lx相当)
(その他)
電源電圧:2.2V
周囲温度:Ta=25℃
110 第1のトランジスタ
120 第2のトランジスタ
130 第3のトランジスタ
150 フォトダイオード
151 電流源
170 高電位側端子
180 低電位側端子
200 光電変換装置
210 第1のトランジスタ
220 第2のトランジスタ
230 第3のトランジスタ
250 フォトダイオード
251 電流源
270 高電位側端子
280 低電位側端子
300 光電変換装置
310 第1のトランジスタ
320 第2のトランジスタ
330 第3のトランジスタ
350 フォトダイオード
370 高電位側端子
380 低電位側端子
400 光電変換装置
410 第1のトランジスタ
420 第2のトランジスタ
430 第3のトランジスタ
450 フォトダイオード
470 高電位側端子
480 低電位側端子
500 光電変換装置
510 第1のトランジスタ
520 第2のトランジスタ
530 第3のトランジスタ
550 フォトダイオード
570 高電位側端子
580 低電位側端子
710 波形
720 波形
800 リセット電位
810 電位
820 電位
850 電位
860 電位
910 電位
920 電位
1000 ガラス基板
1100 接続電極
1200 接続電極
1300 裏面電極
Claims (5)
- フォトダイオードと、第1のトランジスタと、複数の第2のトランジスタと、第3のトランジスタと、を有し、
前記フォトダイオードのアノードは、前記第1のトランジスタのソース又はドレインの一方と電気的に接続され、
前記フォトダイオードのアノードは、前記第1のトランジスタのゲートと電気的に接続され、
前記フォトダイオードのアノードは、前記複数の第2のトランジスタのゲートと電気的に接続され、
前記フォトダイオードのアノードは、前記第3のトランジスタのソース又はドレインの一方と電気的に接続され、
前記フォトダイオードのアノードは、前記第3のトランジスタのゲートと電気的に接続され、
前記フォトダイオードのカソードは、前記複数の第2のトランジスタのソース又はドレインの一方と電気的に接続され、
前記フォトダイオードのカソードは、前記第3のトランジスタのソース又はドレインの他方と電気的に接続され、
前記第1のトランジスタのソース又はドレインの他方は、前記複数の第2のトランジスタのソース又はドレインの他方と電気的に接続されていることを特徴とする光電変換装置。 - 請求項1において、
前記フォトダイオードのカソードは、第1の電源電位と第2の電源電位とを選択する回路に電気的に接続され、
前記第1のトランジスタのソース又はドレインの他方は、第3の電源電位を伝達する配線に電気的に接続され、
前記第1の電源電位は、前記第2の電源電位よりも高く、
前記第2の電源電位は、接地電位であり、
前記第3の電源電位は、前記第1の電源電位よりも低いことを特徴とする光電変換装置。 - 請求項1または請求項2において、
前記第3のトランジスタは酸化物半導体を有することを特徴とする光電変換装置。 - 請求項1乃至請求項3のいずれか一において、
前記第3のトランジスタのゲート幅は、前記第1のトランジスタのゲート幅よりも大きいことを特徴とする光電変換装置。 - 請求項1乃至請求項4のいずれか一において、
前記第3のトランジスタのゲート長は、前記第1のトランジスタのゲート長よりも小さいことを特徴とする光電変換装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011221733A JP5744693B2 (ja) | 2010-10-08 | 2011-10-06 | 光電変換装置 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010228046 | 2010-10-08 | ||
JP2010228046 | 2010-10-08 | ||
JP2011221733A JP5744693B2 (ja) | 2010-10-08 | 2011-10-06 | 光電変換装置 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2012099801A JP2012099801A (ja) | 2012-05-24 |
JP2012099801A5 JP2012099801A5 (ja) | 2014-08-28 |
JP5744693B2 true JP5744693B2 (ja) | 2015-07-08 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2011221733A Expired - Fee Related JP5744693B2 (ja) | 2010-10-08 | 2011-10-06 | 光電変換装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8716646B2 (ja) |
JP (1) | JP5744693B2 (ja) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9076853B2 (en) * | 2011-03-18 | 2015-07-07 | International Rectifie Corporation | High voltage rectifier and switching circuits |
US9048788B2 (en) | 2011-05-13 | 2015-06-02 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device comprising a photoelectric conversion portion |
KR102418666B1 (ko) * | 2014-05-29 | 2022-07-11 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 촬상 소자, 전자 기기, 촬상 소자의 구동 방법, 및 전자 기기의 구동 방법 |
US9881954B2 (en) * | 2014-06-11 | 2018-01-30 | Semiconductor Energy Laboratory Co., Ltd. | Imaging device |
US20170186782A1 (en) * | 2015-12-24 | 2017-06-29 | Innolux Corporation | Pixel circuit of active-matrix light-emitting diode and display panel having the same |
US10685983B2 (en) | 2016-11-11 | 2020-06-16 | Semiconductor Energy Laboratory Co., Ltd. | Transistor, semiconductor device, and electronic device |
CN108809284B (zh) * | 2017-10-27 | 2022-02-01 | 苏州捷芯威半导体有限公司 | 集成式功率开关器件和电子设备 |
JP7039346B2 (ja) * | 2018-03-20 | 2022-03-22 | 株式会社ジャパンディスプレイ | 光センサー回路、光センサー装置、および、表示装置 |
WO2020033930A2 (en) | 2018-08-10 | 2020-02-13 | Obsidian Sensors, Inc. | Mems sensors and systems |
JP7274284B2 (ja) | 2018-12-21 | 2023-05-16 | 株式会社ジャパンディスプレイ | 検出装置 |
CN113454795A (zh) * | 2019-01-16 | 2021-09-28 | 密歇根大学董事会 | 用于显示器下指纹和手势传感器的具有半导体活性层的光检测器 |
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