JP5743480B2 - 鋼材の脱スケール酸洗剤及び脱スケール酸洗方法 - Google Patents
鋼材の脱スケール酸洗剤及び脱スケール酸洗方法 Download PDFInfo
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- JP5743480B2 JP5743480B2 JP2010230590A JP2010230590A JP5743480B2 JP 5743480 B2 JP5743480 B2 JP 5743480B2 JP 2010230590 A JP2010230590 A JP 2010230590A JP 2010230590 A JP2010230590 A JP 2010230590A JP 5743480 B2 JP5743480 B2 JP 5743480B2
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- Prior art keywords
- acid
- descaling
- detergent
- thiourea
- sulfuric acid
- Prior art date
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- 229910000831 Steel Inorganic materials 0.000 title claims description 19
- 239000010959 steel Substances 0.000 title claims description 19
- 238000005554 pickling Methods 0.000 title claims description 16
- 238000000034 method Methods 0.000 title claims description 12
- 239000003599 detergent Substances 0.000 title description 11
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 71
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 36
- OBMBUODDCOAJQP-UHFFFAOYSA-N 2-chloro-4-phenylquinoline Chemical compound C=12C=CC=CC2=NC(Cl)=CC=1C1=CC=CC=C1 OBMBUODDCOAJQP-UHFFFAOYSA-N 0.000 claims description 30
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 22
- 239000002253 acid Substances 0.000 claims description 19
- 150000002898 organic sulfur compounds Chemical class 0.000 claims description 14
- 239000002736 nonionic surfactant Substances 0.000 claims description 9
- 150000003585 thioureas Chemical class 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 150000003839 salts Chemical class 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 229910052717 sulfur Inorganic materials 0.000 claims description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 3
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 3
- 239000011593 sulfur Substances 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 23
- 230000000694 effects Effects 0.000 description 11
- 238000007654 immersion Methods 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- -1 mercaptohypoxatin Chemical compound 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000004094 surface-active agent Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 239000003112 inhibitor Substances 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- 230000001737 promoting effect Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 3
- 150000005215 alkyl ethers Chemical class 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000002738 chelating agent Substances 0.000 description 3
- 230000003628 erosive effect Effects 0.000 description 3
- 150000003566 thiocarboxylic acids Chemical class 0.000 description 3
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 229920001400 block copolymer Polymers 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 150000001735 carboxylic acids Chemical class 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- OKGXJRGLYVRVNE-UHFFFAOYSA-N diaminomethylidenethiourea Chemical compound NC(N)=NC(N)=S OKGXJRGLYVRVNE-UHFFFAOYSA-N 0.000 description 2
- 150000001991 dicarboxylic acids Chemical class 0.000 description 2
- 238000007865 diluting Methods 0.000 description 2
- 150000002023 dithiocarboxylic acids Chemical class 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000003595 mist Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 238000004904 shortening Methods 0.000 description 2
- 150000003464 sulfur compounds Chemical class 0.000 description 2
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N thiocyanic acid Chemical compound SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 2
- CWERGRDVMFNCDR-UHFFFAOYSA-N thioglycolic acid Chemical compound OC(=O)CS CWERGRDVMFNCDR-UHFFFAOYSA-N 0.000 description 2
- YXIWHUQXZSMYRE-UHFFFAOYSA-N 1,3-benzothiazole-2-thiol Chemical compound C1=CC=C2SC(S)=NC2=C1 YXIWHUQXZSMYRE-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- RAIPHJJURHTUIC-UHFFFAOYSA-N 1,3-thiazol-2-amine Chemical compound NC1=NC=CS1 RAIPHJJURHTUIC-UHFFFAOYSA-N 0.000 description 1
- LXOFYPKXCSULTL-UHFFFAOYSA-N 2,4,7,9-tetramethyldec-5-yne-4,7-diol Chemical compound CC(C)CC(C)(O)C#CC(C)(O)CC(C)C LXOFYPKXCSULTL-UHFFFAOYSA-N 0.000 description 1
- DLLMHEDYJQACRM-UHFFFAOYSA-N 2-(carboxymethyldisulfanyl)acetic acid Chemical compound OC(=O)CSSCC(O)=O DLLMHEDYJQACRM-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000012317 TBTU Substances 0.000 description 1
- CLZISMQKJZCZDN-UHFFFAOYSA-N [benzotriazol-1-yloxy(dimethylamino)methylidene]-dimethylazanium Chemical compound C1=CC=C2N(OC(N(C)C)=[N+](C)C)N=NC2=C1 CLZISMQKJZCZDN-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229950003476 aminothiazole Drugs 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- DKVNPHBNOWQYFE-UHFFFAOYSA-N carbamodithioic acid Chemical compound NC(S)=S DKVNPHBNOWQYFE-UHFFFAOYSA-N 0.000 description 1
- 239000003245 coal Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- KMQLRJZDWLHQMD-UHFFFAOYSA-L disodium;2-(2-oxido-2-sulfanylideneethoxy)ethanethioate Chemical compound [Na+].[Na+].[O-]C(=S)COCC([O-])=S KMQLRJZDWLHQMD-UHFFFAOYSA-L 0.000 description 1
- 125000002228 disulfide group Chemical group 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- ZEUUVJSRINKECZ-UHFFFAOYSA-N ethanedithioic acid Chemical compound CC(S)=S ZEUUVJSRINKECZ-UHFFFAOYSA-N 0.000 description 1
- DNJIEGIFACGWOD-UHFFFAOYSA-N ethyl mercaptane Natural products CCS DNJIEGIFACGWOD-UHFFFAOYSA-N 0.000 description 1
- 238000005187 foaming Methods 0.000 description 1
- 150000002334 glycols Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 1
- WREDNSAXDZCLCP-UHFFFAOYSA-N methanedithioic acid Chemical compound SC=S WREDNSAXDZCLCP-UHFFFAOYSA-N 0.000 description 1
- AWIJRPNMLHPLNC-UHFFFAOYSA-N methanethioic s-acid Chemical compound SC=O AWIJRPNMLHPLNC-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- DEQZTKGFXNUBJL-UHFFFAOYSA-N n-(1,3-benzothiazol-2-ylsulfanyl)cyclohexanamine Chemical compound C1CCCCC1NSC1=NC2=CC=CC=C2S1 DEQZTKGFXNUBJL-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- KOUKXHPPRFNWPP-UHFFFAOYSA-N pyrazine-2,5-dicarboxylic acid;hydrate Chemical compound O.OC(=O)C1=CN=C(C(O)=O)C=N1 KOUKXHPPRFNWPP-UHFFFAOYSA-N 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- UVZICZIVKIMRNE-UHFFFAOYSA-N thiodiacetic acid Chemical compound OC(=O)CSCC(O)=O UVZICZIVKIMRNE-UHFFFAOYSA-N 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- NJRXVEJTAYWCQJ-UHFFFAOYSA-N thiomalic acid Chemical compound OC(=O)CC(S)C(O)=O NJRXVEJTAYWCQJ-UHFFFAOYSA-N 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- DGVVWUTYPXICAM-UHFFFAOYSA-N β‐Mercaptoethanol Chemical compound OCCS DGVVWUTYPXICAM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/08—Iron or steel
- C23G1/081—Iron or steel solutions containing H2SO4
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/08—Iron or steel
- C23G1/086—Iron or steel solutions containing HF
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
- C23G1/08—Iron or steel
- C23G1/088—Iron or steel solutions containing organic acids
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Detergent Compositions (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
硫酸濃度が10重量%から20重量%であって本発明のチオ尿素、有機硫黄化合物としてジチオジグリコール酸ジナトリウム、ノニオン系界面活性剤としてポリオキシアルキレンアルキルエーテルに属するエマルゲンLS−114(花王株式会社製)を加えた表1記載の組成の酸洗液を500ccのビーカーに用意し、これを60℃に設定した中に、熱処理された焼鈍スケールの付いた鋼線材を浸漬し、脱スケール時間、脱スケール時のスマットの生成状況、素材の素地荒れ状況を観察した。その結果を比較例とともに示す。この試験において発明の効果はスマット生成や素地荒れ等がなく外観が良い程、また、脱スケール時間が短い程良い。また、実施例8、比較例2、3は他の実施例・比較例と比べて脱スケール処理中にミストの発生が多いことを目視にて確認した。○△×評価については脱スケール時間については、○:脱スケール完了、△:スケールが若干残る、×:スケールが大量に残る、スマット生成については、○:スマット生成なし、△:スマットが若干生成、×:スマットが大量に生成、素地荒れについては、○:肉眼では素地荒れなし、△:肉眼で若干の素地荒れが確認できる、×:素地荒れがひどい状態、といった基準で評価した。
界面活性剤の種類を変化させて試験を行った。界面活性剤の種類以外の条件は実施例3と同様であり、10分間浸漬後の脱スケールレベルを評価した。
特許文献2の実施例には脂肪族カルボン酸として蟻酸、硫黄化合物としてグアニルチオ尿素、白色度向上成分としてポリエチレングリコール、硫化水素捕捉成分として尿素を用いた塩酸主体の酸洗剤が提示されている。そこで、硫酸15%の硫酸酸洗剤に特許文献2の実施例に相当する濃度で添加して試験を行った。
Claims (7)
- 脱スケール促進剤としてチオ尿素と、チオ尿素ならびにチオ尿素誘導体以外の有機硫黄化合物を含有し、該有機硫黄化合物対該チオ尿素の重量比が0.05〜20:1であることを特徴とする硫酸又は硫酸主体の酸からなる鋼材の脱スケール酸洗剤。
- 脱スケール促進剤としてチオ尿素と、ノニオン系界面活性剤を含有することを特徴とする硫酸又は硫酸主体の酸からなる鋼材の脱スケール酸洗剤。
- 脱スケール促進剤としてチオ尿素、チオ尿素ならびにチオ尿素誘導体以外の有機硫黄化合物、ノニオン系界面活性剤を全て含有することを特徴とする硫酸又は硫酸主体の酸からなる鋼材の脱スケール酸洗剤。
- 前記有機硫黄化合物が硫黄を含有するカルボン酸、多価カルボン酸またはそれらの塩である請求項1、3のいずれか1項記載の脱スケール酸洗剤。
- 請求項1〜4のいずれか1項に記載の脱スケール酸洗剤の濃厚液。
- 請求項1〜4のいずれか1項に記載の脱スケール酸洗剤製造キット。
- 請求項1〜4のいずれか1項に記載の酸洗剤を用いる鋼材の脱スケール酸洗方法。
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Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10110300A (ja) * | 1996-10-03 | 1998-04-28 | Hitachi Metals Ltd | 鋼材の表面清浄化方法および鋼材 |
JPH10152792A (ja) * | 1996-11-21 | 1998-06-09 | Kawasaki Steel Corp | 外観の優れた電気亜鉛めっき鋼板の製造方法 |
JP2001207281A (ja) * | 2000-01-26 | 2001-07-31 | Asahi Kagaku Kogyo Co Ltd | 酸洗浄用腐食抑制剤、それを含んだ洗浄液組成物および金属表面の洗浄方法 |
JP3974838B2 (ja) * | 2001-09-26 | 2007-09-12 | 中外写真薬品株式会社 | ヒドロキシルアミン系共重合体、ヒドロキシルアミン系共重合体の製造方法、ハロゲン化銀カラー写真感光材料の発色現像液濃縮組成物、ハロゲン化銀カラー写真感光材料の発色現像液、ハロゲン化銀カラー写真感光材料の処理方法、重合防止剤、金属用酸洗浄剤、電解亜鉛メッキ、脱酸素剤、ゴム劣化防止剤及び衣類の変褪色防止剤 |
JP2003166089A (ja) * | 2001-11-30 | 2003-06-13 | Asahi Kagaku Kogyo Co Ltd | 金属の酸洗浄用腐食抑制剤、それを含んだ洗浄組成物およびこれを用いる金属の洗浄方法 |
JP4596909B2 (ja) * | 2004-12-28 | 2010-12-15 | 朝日化学工業株式会社 | 酸洗促進剤、酸洗液組成物および酸洗方法 |
JP4869782B2 (ja) * | 2006-05-15 | 2012-02-08 | 朝日化学工業株式会社 | 腐食抑制剤、金属酸洗浄液組成物および金属の酸洗浄方法 |
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