JP5726450B2 - 反応炉洗浄装置および反応炉洗浄方法 - Google Patents
反応炉洗浄装置および反応炉洗浄方法 Download PDFInfo
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- JP5726450B2 JP5726450B2 JP2010161788A JP2010161788A JP5726450B2 JP 5726450 B2 JP5726450 B2 JP 5726450B2 JP 2010161788 A JP2010161788 A JP 2010161788A JP 2010161788 A JP2010161788 A JP 2010161788A JP 5726450 B2 JP5726450 B2 JP 5726450B2
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- nozzle
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- cleaning
- rotating member
- vertical axis
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Classifications
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B13/00—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
- B05B13/06—Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00 specially designed for treating the inside of hollow bodies
- B05B13/0627—Arrangements of nozzles or spray heads specially adapted for treating the inside of hollow bodies
- B05B13/0636—Arrangements of nozzles or spray heads specially adapted for treating the inside of hollow bodies by means of rotatable spray heads or nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B3/00—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
- B05B3/02—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements
- B05B3/04—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements driven by the liquid or other fluent material discharged, e.g. the liquid actuating a motor before passing to the outlet
- B05B3/06—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements driven by the liquid or other fluent material discharged, e.g. the liquid actuating a motor before passing to the outlet by jet reaction, i.e. creating a spinning torque due to a tangential component of the jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B3/00—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements
- B05B3/02—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements
- B05B3/04—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements driven by the liquid or other fluent material discharged, e.g. the liquid actuating a motor before passing to the outlet
- B05B3/06—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements driven by the liquid or other fluent material discharged, e.g. the liquid actuating a motor before passing to the outlet by jet reaction, i.e. creating a spinning torque due to a tangential component of the jet
- B05B3/066—Spraying or sprinkling apparatus with moving outlet elements or moving deflecting elements with rotating elements driven by the liquid or other fluent material discharged, e.g. the liquid actuating a motor before passing to the outlet by jet reaction, i.e. creating a spinning torque due to a tangential component of the jet the movement of the outlet elements being a combination of two movements, one being rotational
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
- B08B9/0804—Cleaning containers having tubular shape, e.g. casks, barrels, drums
- B08B9/0813—Cleaning containers having tubular shape, e.g. casks, barrels, drums by the force of jets or sprays
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/035—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition or reduction of gaseous or vaporised silicon compounds in the presence of heated filaments of silicon, carbon or a refractory metal, e.g. tantalum or tungsten, or in the presence of heated silicon rods on which the formed silicon is deposited, a silicon rod being obtained, e.g. Siemens process
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Silicon Compounds (AREA)
Description
11 ベースプレート
12 排水管
13 ゴムパッキン
20 ノズル装置
21 垂直軸
22 回転部材
23 ノズル支持体
24、A、B ノズル
25 噴射口
30 反応炉
31 外壁
32 内壁
33 ノズル先端の軌跡
D、D1、D2、D3 噴射距離
P、Q 軸
Claims (3)
- シーメンス法による多結晶シリコンの気相成長に用いられる反応炉の内壁面を洗浄するための反応炉洗浄装置であって、
鉛直方向に移動可能な垂直軸と、
前記垂直軸の先端に取り付けられた自転可能な回転部材と、
前記回転部材に取り付けられ前記垂直軸の周りを公転可能なノズル支持体と、
前記ノズル支持体の動力を前記回転部材に伝える動力伝達手段と、
前記ノズル支持体に取り付けられた少なくとも2本のノズルとを備え、
前記ノズルの先端から前記反応炉の内壁面までの距離(D)が600〜800mmであり、該距離(D)と前記ノズルの口径(r)は300≦D/r≦400を満足し、
前記ノズル支持体は前記ノズルから高圧噴射される洗浄水の噴射反動力により自転し、
該ノズル支持体の自転は前記動力伝達手段を介して前記回転部材に伝達されて該回転部材を前記垂直軸を軸に自転せしめるとともに前記ノズル支持体を前記垂直軸の周りを公転せしめ、前記ノズルから噴射圧30〜200MPaの洗浄水が三次元方向に高圧噴射されることを特徴とする反応炉洗浄装置。 - 前記ノズル支持体が前記垂直軸の周りを1回転公転する間に該ノズル支持体が自転する回数が、端数を有する非自然数となるように構成されていることを特徴とする請求項1に記載の反応炉洗浄装置。
- 先端が口径rの洗浄水の噴射部であるノズルを用い、シーメンス法による多結晶シリコンの気相成長に用いられる反応炉の内壁面を洗浄するための反応炉洗浄方法であって、
前記ノズルの先端から前記反応炉の内壁面までの距離(D)が600〜800mmであり、前記噴射部の口径(r)が反応炉の内壁面までの距離(D)との関係において300≦D/r≦400を満足する条件で洗浄水を高圧噴射し、
該洗浄水の噴射反動力により前記ノズルの支持体を自転させ、
該ノズルの支持体の自転の動力を、鉛直方向に移動可能な垂直軸の先端に取り付けられた自転可能な回転部材に伝達させ、
該動力伝達により前記回転部材を前記垂直軸を軸に自転せしめるとともに前記ノズルの支持体を前記垂直軸の周りを公転せしめ、前記ノズルから噴射圧30〜200MPaの洗浄水を三次元方向に高圧噴射させ、
前記回転部材の高さを維持した状態で前記反応炉の内壁面を所定時間洗浄した後に前記回転部材の高さを変えて前記内壁面の洗浄を少なくとも1回実行することを特徴とする反応炉洗浄方法。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010161788A JP5726450B2 (ja) | 2010-07-16 | 2010-07-16 | 反応炉洗浄装置および反応炉洗浄方法 |
PCT/JP2011/003802 WO2012008112A1 (ja) | 2010-07-16 | 2011-07-04 | 反応炉洗浄装置および反応炉洗浄方法 |
Applications Claiming Priority (1)
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JP2010161788A JP5726450B2 (ja) | 2010-07-16 | 2010-07-16 | 反応炉洗浄装置および反応炉洗浄方法 |
Publications (3)
Publication Number | Publication Date |
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JP2012020917A JP2012020917A (ja) | 2012-02-02 |
JP2012020917A5 JP2012020917A5 (ja) | 2012-03-15 |
JP5726450B2 true JP5726450B2 (ja) | 2015-06-03 |
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JP2010161788A Active JP5726450B2 (ja) | 2010-07-16 | 2010-07-16 | 反応炉洗浄装置および反応炉洗浄方法 |
Country Status (2)
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JP (1) | JP5726450B2 (ja) |
WO (1) | WO2012008112A1 (ja) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6004531B2 (ja) * | 2012-10-02 | 2016-10-12 | 株式会社大阪チタニウムテクノロジーズ | 還元炉洗浄方法 |
DE102013209076A1 (de) | 2013-05-16 | 2014-11-20 | Wacker Chemie Ag | Reaktor zur Herstellung von polykristallinem Silicium und Verfahren zur Entfernung eines Silicium enthaltenden Belags auf einem Bauteil eines solchen Reaktors |
CN107433275B (zh) * | 2016-05-25 | 2021-02-12 | 上海新昇半导体科技有限公司 | 石英腔体的清洗装置及清洗方法 |
JP7063896B2 (ja) | 2017-06-08 | 2022-05-09 | 株式会社トクヤマ | 洗浄装置、および洗浄方法 |
JP7026308B2 (ja) * | 2018-03-29 | 2022-02-28 | 澁谷工業株式会社 | 洗浄装置およびその動作設定方法 |
IT201800006141A1 (it) * | 2018-06-08 | 2019-12-08 | Apparecchiatura per il lavaggio di contenitori | |
CN113070302B (zh) * | 2021-03-30 | 2022-09-02 | 安徽明泉水设备有限公司 | 一种供水箱用无死角清洗装置 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS56114815A (en) * | 1980-02-08 | 1981-09-09 | Koujiyundo Silicon Kk | Preliminary washing method of reaction furnace for preparing polycrystalline silicon |
JPS6071397U (ja) * | 1983-10-19 | 1985-05-20 | 株式会社 スギノマシン | タンク等の自動洗浄装置 |
US5108512A (en) * | 1991-09-16 | 1992-04-28 | Hemlock Semiconductor Corporation | Cleaning of CVD reactor used in the production of polycrystalline silicon by impacting with carbon dioxide pellets |
JPH0694128B2 (ja) * | 1993-02-01 | 1994-11-24 | 清典 香山 | タンク等の内部洗浄装置 |
JP2002292346A (ja) * | 2001-03-29 | 2002-10-08 | Sharp Corp | 付着膜回収装置および付着膜の回収方法 |
JP4167583B2 (ja) * | 2003-10-31 | 2008-10-15 | 株式会社スギノマシン | 自動回転洗浄装置の回転ノズルユニット |
EP2082814B1 (en) * | 2008-01-25 | 2011-04-27 | Mitsubishi Materials Corporation | Reactor cleaning apparatus |
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2010
- 2010-07-16 JP JP2010161788A patent/JP5726450B2/ja active Active
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2011
- 2011-07-04 WO PCT/JP2011/003802 patent/WO2012008112A1/ja active Application Filing
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Publication number | Publication date |
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JP2012020917A (ja) | 2012-02-02 |
WO2012008112A1 (ja) | 2012-01-19 |
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