JPS56114815A - Preliminary washing method of reaction furnace for preparing polycrystalline silicon - Google Patents

Preliminary washing method of reaction furnace for preparing polycrystalline silicon

Info

Publication number
JPS56114815A
JPS56114815A JP1512380A JP1512380A JPS56114815A JP S56114815 A JPS56114815 A JP S56114815A JP 1512380 A JP1512380 A JP 1512380A JP 1512380 A JP1512380 A JP 1512380A JP S56114815 A JPS56114815 A JP S56114815A
Authority
JP
Japan
Prior art keywords
furnace
wall
polycrystalline silicon
furnace wall
inert gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1512380A
Other languages
Japanese (ja)
Other versions
JPS6327287B2 (en
Inventor
Hideo Ito
Seiichi Kirii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Original Assignee
KOUJIYUNDO SILICON KK
KOUJIYUNDO SILICONE KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KOUJIYUNDO SILICON KK, KOUJIYUNDO SILICONE KK filed Critical KOUJIYUNDO SILICON KK
Priority to JP1512380A priority Critical patent/JPS56114815A/en
Publication of JPS56114815A publication Critical patent/JPS56114815A/en
Publication of JPS6327287B2 publication Critical patent/JPS6327287B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To wash the titled reaction furnace in a short time with certainty, by hydrolyzing a halogenosilane attached to the furnace wall with air containing steam, etc., and jetting a high-speed jet stream of an inert gas on the furnace wall.
CONSTITUTION: In the preliminary washing of a reaction furnace 1 for preparing polycrystalline silicon, steam 7 is fed to heat the inner wall 8, and air or an inert gas 9 in which the moisture is conditioned with steam is introduced into the furnace 1 to hydrolyze a by-product halogenosilane polymer attached to the furnace wall 8. The resultant gas, e.g. HCl or H2, formed by the hydrolysis is expelled to the outside of the furnace 1. A nozzle is inserted from a hand hole 10, and a high-speed jet stream of an inert gas is jetted on the furnace wall 8 to separate and pulverize solids (SiO2) remaining in the hydrolysis product. The solids are then expelled from the furnace wall 8 to the outside of the furnace 1 to wash the interior of the furnace 1 with certainty without using a detergent.
COPYRIGHT: (C)1981,JPO&Japio
JP1512380A 1980-02-08 1980-02-08 Preliminary washing method of reaction furnace for preparing polycrystalline silicon Granted JPS56114815A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1512380A JPS56114815A (en) 1980-02-08 1980-02-08 Preliminary washing method of reaction furnace for preparing polycrystalline silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1512380A JPS56114815A (en) 1980-02-08 1980-02-08 Preliminary washing method of reaction furnace for preparing polycrystalline silicon

Publications (2)

Publication Number Publication Date
JPS56114815A true JPS56114815A (en) 1981-09-09
JPS6327287B2 JPS6327287B2 (en) 1988-06-02

Family

ID=11880038

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1512380A Granted JPS56114815A (en) 1980-02-08 1980-02-08 Preliminary washing method of reaction furnace for preparing polycrystalline silicon

Country Status (1)

Country Link
JP (1) JPS56114815A (en)

Cited By (13)

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EP2082814A1 (en) 2008-01-25 2009-07-29 Mitsubishi Materials Corporation Reactor cleaning apparatus
JP2009179554A (en) * 2009-04-27 2009-08-13 Osaka Titanium Technologies Co Ltd Cleaning method of polycrystal silicon
EP2105409A1 (en) * 2008-03-28 2009-09-30 Mitsubishi Materials Corporation Polymer inactivation method for polycrystalline silicon manufacturing device
WO2010134544A1 (en) * 2009-05-22 2010-11-25 旭硝子株式会社 Device for producing silicon and process for producing silicon
JP2010275183A (en) * 2009-04-28 2010-12-09 Mitsubishi Materials Corp Polycrystalline silicon reactor
WO2011158404A1 (en) * 2010-06-16 2011-12-22 信越化学工業株式会社 Method for cleaning bell jar, method for manufacturing polycrystalline silicon and device for drying bell jar
JP2012020917A (en) * 2010-07-16 2012-02-02 Shin-Etsu Chemical Co Ltd Reactor cleaning apparatus and reactor cleaning method
CN102755975A (en) * 2011-04-25 2012-10-31 中国科学院微电子研究所 Method for avoiding pollution of oxidation furnace pipe
JP2013049611A (en) * 2011-08-31 2013-03-14 Mitsubishi Materials Corp Polycrystalline silicon reaction furnace
CN103619498A (en) * 2011-06-29 2014-03-05 Memc电子材料有限公司 Cleaning tool for polysilicon reactor
WO2014111326A1 (en) * 2013-01-17 2014-07-24 Wacker Chemie Ag Method for depositing polycrystalline silicone
WO2018225497A1 (en) 2017-06-08 2018-12-13 株式会社トクヤマ Cleaning device and cleaning method
US20220105477A1 (en) * 2020-10-07 2022-04-07 Mitsubishi Polycrystalline Silicon America Corporation (MIPSA) Controlled Hydrolysis of Hazardous Silicon Polymer Residue

Cited By (34)

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US7975709B2 (en) 2008-01-25 2011-07-12 Mitsubishi Materials Corporation Reactor cleaning apparatus
KR101477817B1 (en) * 2008-01-25 2014-12-30 미쓰비시 마테리알 가부시키가이샤 Reactor cleaning apparatus
JP2009196882A (en) * 2008-01-25 2009-09-03 Mitsubishi Materials Corp Reacting furnace cleaning unit
US9216444B2 (en) 2008-01-25 2015-12-22 Mitsubishi Materials Corporation Reactor cleaning apparatus
EP2082814A1 (en) 2008-01-25 2009-07-29 Mitsubishi Materials Corporation Reactor cleaning apparatus
US20110232694A1 (en) * 2008-01-25 2011-09-29 Mitsubishi Materials Corporation Reactor cleaning apparatus
JP2009256200A (en) * 2008-03-28 2009-11-05 Mitsubishi Materials Corp Polymer inactivation method for polycrystalline silicon manufacturing device
US7875349B2 (en) 2008-03-28 2011-01-25 Mitsubishi Materials Corporation Polymer inactivation method for polycrystalline silicon manufacturing device
EP2105409A1 (en) * 2008-03-28 2009-09-30 Mitsubishi Materials Corporation Polymer inactivation method for polycrystalline silicon manufacturing device
JP2013166694A (en) * 2008-03-28 2013-08-29 Mitsubishi Materials Corp Polymer inactivation method for polycrystalline silicon manufacturing device
JP2009179554A (en) * 2009-04-27 2009-08-13 Osaka Titanium Technologies Co Ltd Cleaning method of polycrystal silicon
JP2010275183A (en) * 2009-04-28 2010-12-09 Mitsubishi Materials Corp Polycrystalline silicon reactor
US8540818B2 (en) 2009-04-28 2013-09-24 Mitsubishi Materials Corporation Polycrystalline silicon reactor
WO2010134544A1 (en) * 2009-05-22 2010-11-25 旭硝子株式会社 Device for producing silicon and process for producing silicon
CN102438946A (en) * 2009-05-22 2012-05-02 旭硝子株式会社 Device for producing silicon and process for producing silicon
JPWO2010134544A1 (en) * 2009-05-22 2012-11-12 旭硝子株式会社 Silicon manufacturing apparatus and silicon manufacturing method
CN102985364A (en) * 2010-06-16 2013-03-20 信越化学工业株式会社 Method for cleaning bell jar, method for manufacturing polycrystalline silicon and device for drying bell jar
JP5699145B2 (en) * 2010-06-16 2015-04-08 信越化学工業株式会社 Belger cleaning method, method for producing polycrystalline silicon, and drying apparatus for bell jar
JPWO2011158404A1 (en) * 2010-06-16 2013-08-15 信越化学工業株式会社 Belger cleaning method, method for producing polycrystalline silicon, and drying apparatus for bell jar
WO2011158404A1 (en) * 2010-06-16 2011-12-22 信越化学工業株式会社 Method for cleaning bell jar, method for manufacturing polycrystalline silicon and device for drying bell jar
AU2011266575B2 (en) * 2010-06-16 2013-08-01 Shin-Etsu Chemical Co., Ltd. Method for cleaning bell jar, method for manufacturing polycrystalline silicon and device for drying bell jar
US9126242B2 (en) 2010-06-16 2015-09-08 Shin-Etsu Chemical Co., Ltd. Method for cleaning bell jar, method for producing polycrystalline silicon, and apparatus for drying bell jar
JP2012020917A (en) * 2010-07-16 2012-02-02 Shin-Etsu Chemical Co Ltd Reactor cleaning apparatus and reactor cleaning method
CN102755975A (en) * 2011-04-25 2012-10-31 中国科学院微电子研究所 Method for avoiding pollution of oxidation furnace pipe
CN103619498A (en) * 2011-06-29 2014-03-05 Memc电子材料有限公司 Cleaning tool for polysilicon reactor
JP2013049611A (en) * 2011-08-31 2013-03-14 Mitsubishi Materials Corp Polycrystalline silicon reaction furnace
WO2014111326A1 (en) * 2013-01-17 2014-07-24 Wacker Chemie Ag Method for depositing polycrystalline silicone
CN104918883A (en) * 2013-01-17 2015-09-16 瓦克化学股份公司 Method for depositing polycrystalline silicone
JP2016506357A (en) * 2013-01-17 2016-03-03 ワッカー ケミー アクチエンゲゼルシャフトＷａｃｋｅｒ Ｃｈｅｍｉｅ ＡＧ Method for depositing polycrystalline silicon
US9620359B2 (en) 2013-01-17 2017-04-11 Wacker Chemie Ag Reactive depletion of reactor deposits in harvesting polycrystalline silicon rods
WO2018225497A1 (en) 2017-06-08 2018-12-13 株式会社トクヤマ Cleaning device and cleaning method
KR20200016271A (en) 2017-06-08 2020-02-14 가부시끼가이샤 도꾸야마 Cleaning apparatus and cleaning method
US20220105477A1 (en) * 2020-10-07 2022-04-07 Mitsubishi Polycrystalline Silicon America Corporation (MIPSA) Controlled Hydrolysis of Hazardous Silicon Polymer Residue
US11958022B2 (en) * 2020-10-07 2024-04-16 Mitsubishi Polycrystalline Silicon America Corporation (MIPSA) Controlled hydrolysis of hazardous silicon polymer residue

Also Published As

Publication number Publication date
JPS6327287B2 (en) 1988-06-02

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