CN110917854A - Tail gas treatment device - Google Patents
Tail gas treatment device Download PDFInfo
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- CN110917854A CN110917854A CN201911227159.6A CN201911227159A CN110917854A CN 110917854 A CN110917854 A CN 110917854A CN 201911227159 A CN201911227159 A CN 201911227159A CN 110917854 A CN110917854 A CN 110917854A
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- pressure cavity
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/77—Liquid phase processes
- B01D53/78—Liquid phase processes with gas-liquid contact
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/68—Halogens or halogen compounds
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/55—Compounds of silicon, phosphorus, germanium or arsenic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
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Abstract
The invention relates to the field of semiconductor production, in particular to a tail gas treatment device. The tail gas treatment device comprises: the water tank is divided into a negative pressure cavity and a normal pressure cavity; the negative pressure cavity is provided with an air inlet and a channel; the spray tower is internally provided with a water spray opening and an alkali liquor spray opening, and the bottom of the spray tower is connected with the channel of the negative pressure cavity; the top of the atmospheric cavity is provided with an air outlet, and the bottom of the atmospheric cavity is provided with a water outlet; the atmospheric pressure cavity is connected with the spray tower through a Venturi tube, and the Venturi tube is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet; and the variable frequency fan is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure. The tail gas treatment device has a good tail gas treatment effect, is not easy to cause blockage, has a long maintenance period, and reduces the maintenance cost.
Description
Technical Field
The invention relates to the field of semiconductor production, in particular to a tail gas treatment device.
Background
An epitaxial growth process is a method of depositing a single crystal thin film on the surface of a single crystal substrate. When preparing the epitaxial film of silicon, silicon source materials are used as raw materials and are deposited on a substrate. After epitaxial growth, the generated tail gas contains silicon source gas such as trichlorosilane and the like which do not participate in the reaction, and hydrogen chloride gas.
Silicon source gases such as trichlorosilane and the like and hydrogen chloride gas are high in risk, cannot be directly discharged or exposed in the air, and need to be discharged after being treated by a tail gas treatment device.
During tail gas treatment, trichlorosilane reacts with water to generate hydrolysis reaction, hydrogen, silicon dioxide, hydrogen chloride and a large amount of heat are generated, wherein silicon dioxide is easy to agglomerate to block a tail gas treatment device, and therefore negative pressure of an epitaxial furnace is unstable. When tail gas processing apparatus can not provide stable negative pressure for epitaxial circuit, the risk that tail gas flows backward can appear, causes epitaxial furnace cavity easily and receives metal and particle pollution, seriously influences the output.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: the utility model provides a tail gas processing apparatus, tail gas treatment is effectual, is difficult for causing the jam, and tail gas processing apparatus maintenance cycle is long, reduces the maintenance cost.
The invention provides a tail gas treatment device, which comprises:
the water tank is divided into a negative pressure cavity and a normal pressure cavity, and water is stored in the negative pressure cavity and the normal pressure cavity;
the negative pressure cavity is provided with an air inlet and a channel;
the spray tower is internally provided with a water spray opening and an alkali liquor spray opening, the bottom of the spray tower is connected with a channel of the negative pressure cavity, and the channel is used for inputting the gas treated by the negative pressure cavity into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity;
the top of the atmospheric cavity is provided with an air outlet, and the bottom of the atmospheric cavity is provided with a water outlet;
the atmospheric pressure cavity is connected with the spray tower through a venturi tube, and the venturi tube is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet;
and the variable frequency fan is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure.
Preferably, the device further comprises an alkali liquor supply unit, wherein the alkali liquor supply unit is connected with an alkali liquor spraying port at the top of the spraying tower;
the alkali liquor supply unit comprises an alkali liquor storage unit and a nitrogen supply unit, and the nitrogen supply unit conveys alkali liquor in the alkali liquor storage unit to the alkali liquor spraying port by utilizing pressure.
Preferably, the distance between the alkali liquor spraying opening and the bottom surface of the spraying tower is greater than the distance between the water spraying opening and the bottom surface of the spraying tower.
Preferably, the water spraying device further comprises a circulating water unit, and the circulating water unit is connected with the water spraying nozzle.
Preferably, a nitrogen bubbling unit is arranged at the bottom of the negative pressure cavity and used for conveying nitrogen into the negative pressure cavity.
Preferably, an infrared sensor is arranged in the negative pressure cavity and used for detecting the solid content of the silicon dioxide.
Preferably, a nitrogen bubbling unit is arranged at the bottom of the normal pressure cavity and used for conveying nitrogen into the normal pressure cavity.
Preferably, an infrared sensor is arranged in the normal pressure cavity and used for detecting the solid content of the silicon dioxide.
Preferably, the device further comprises a control unit, wherein the control unit is connected with the infrared sensor and the nitrogen bubbling unit, and the control unit controls the nitrogen bubbling unit to convey nitrogen after the infrared sensor senses that the solid content of the silicon dioxide reaches a threshold value.
Compared with the prior art, the tail gas treatment device comprises:
the water tank is divided into a negative pressure cavity and a normal pressure cavity, and water is stored in the negative pressure cavity and the normal pressure cavity;
the negative pressure cavity is provided with an air inlet and a channel;
the spray tower is internally provided with a water spray opening and an alkali liquor spray opening, the bottom of the spray tower is connected with a channel of the negative pressure cavity, and the channel is used for inputting the gas treated by the negative pressure cavity into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity;
the top of the atmospheric cavity is provided with an air outlet, and the bottom of the atmospheric cavity is provided with a water outlet;
the atmospheric pressure cavity is connected with the spray tower through a venturi tube, and the venturi tube is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet;
and the variable frequency fan is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure.
In the tail gas treatment device, after the tail gas to be treated enters from the gas inlet, the hydrogen chloride gas is dissolved in the water in the negative pressure cavity, and the trichlorosilane enters the spray tower after being partially absorbed. In the spray tower, trichlorosilane reacts with water to generate silicon dioxide, the silicon dioxide reacts with alkali liquor to generate sodium silicate, and the sodium silicate and the silicon dioxide can be discharged to the negative pressure cavity, so that the silicon dioxide is prevented from blocking the spray tower. Gas which does not participate in the reaction and gas generated in the spray tower enter the normal pressure cavity through the venturi tube, gas which is easy to dissolve in water is absorbed, and residual gas which is insoluble in water, such as hydrogen, is discharged from the exhaust hole. Solid impurities in the negative pressure cavity and the normal pressure cavity are discharged from the water outlet along with the wastewater. The tail gas treatment device can effectively remove a large amount of harmful gas which is easy to dissolve in water through the water tank; set up alkali lye in the spray column and spray the mouth, help getting rid of silicon dioxide, avoid the jam of spray column to with the water tank cooperation, can discharge solid impurity, thereby prolonged the device maintenance cycle length, reduced the maintenance cost.
Drawings
FIG. 1 is a schematic view of an exemplary disclosed exhaust treatment device;
FIG. 2 is a schematic view of an exhaust gas treatment device according to another embodiment of the present invention;
FIG. 3 is a view illustrating an apparatus for treating exhaust according to another embodiment of the present invention;
illustration of the drawings:
1 is a water tank, 11 is a negative pressure cavity, 12 is a normal pressure cavity, 13 is an air inlet, 14 is a channel, 15 is an air outlet, and 16 is a water outlet;
2 is a spray tower, 21 is a water spray nozzle, and 22 is an alkali liquor spray nozzle;
3 is a Venturi tube, 4 is a variable frequency fan, 5 is an alkali liquor supply unit, 6 is a nitrogen bubbling unit, and 7 is an infrared sensor.
Detailed Description
For a further understanding of the invention, reference will now be made to the preferred embodiments of the invention in conjunction with the following examples, but it will be understood that the description is intended to illustrate the features and advantages of the invention further, and not to limit the invention.
The embodiment of the invention discloses a tail gas treatment device, which comprises:
the water tank is divided into a negative pressure cavity and a normal pressure cavity, and water is stored in the negative pressure cavity and the normal pressure cavity;
the negative pressure cavity is provided with an air inlet and a channel;
the spray tower is internally provided with a water spray opening and an alkali liquor spray opening, the bottom of the spray tower is connected with a channel of the negative pressure cavity, and the channel is used for inputting the gas treated by the negative pressure cavity into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity;
the top of the atmospheric cavity is provided with an air outlet, and the bottom of the atmospheric cavity is provided with a water outlet;
the atmospheric pressure cavity is connected with the spray tower through a venturi tube, and the venturi tube is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet;
and the variable frequency fan is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure.
In the invention, under the influence of negative pressure, tail gas to be treated sequentially passes through the negative pressure cavity, the spray tower and the venturi tube, enters the normal pressure cavity and is discharged from the gas outlet of the normal pressure cavity.
The solid impurities are discharged from the water outlet of the water tank along with the waste water.
The tail gas treatment device comprises a water tank, wherein the water tank is divided into a negative pressure cavity and a normal pressure cavity. The negative pressure cavity and the normal pressure cavity are two independent cavities in the water tank, so that different air pressures are provided. A water channel is arranged between the negative pressure cavity and the normal pressure cavity, and water and solid impurities in the negative pressure cavity can enter the normal pressure cavity through the water channel and are discharged from the water outlet.
The negative pressure cavity is provided with an air inlet and a channel. Due to the negative pressure in the cavity, the tail gas to be treated can easily enter the negative pressure cavity.
The air inlet is arranged on the top of the negative pressure cavity or the side wall of the cavity and is used for introducing tail gas to be treated.
The channel is used for being connected with the bottom of the spray tower.
The spray tower is used for treating trichlorosilane. And a water spray opening and an alkali liquor spray opening are arranged in the spray tower. In order to make the gas fully contact with the water and the alkali liquor, preferably, the top of the spray tower is provided with a water spray opening and an alkali liquor spray opening, so that the contact time of the water and the alkali liquor with the gas is prolonged, and the water and the alkali liquor sprayed from the top are fully contacted with the gas introduced from the bottom from top to bottom. Preferably, the distance between the alkali liquor spraying opening and the bottom surface of the spraying tower is greater than the distance between the water spraying opening and the bottom surface of the spraying tower. Namely, after trichlorosilane entering the spray tower reacts with water to generate silicon dioxide solid, the silicon dioxide solid reacts with alkali liquor, and the silicon dioxide treatment efficiency is improved. The bottom of the spray tower is connected with a channel of the negative pressure cavity, and the channel is used for inputting gas into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity.
Preferably, the device further comprises an alkali liquor supply unit, wherein the alkali liquor supply unit is connected with an alkali liquor spraying opening at the top of the spraying tower and is used for supplying alkali liquor. The lye is preferably a sodium hydroxide solution.
Preferably, the alkali liquor supply unit comprises an alkali liquor storage unit and a nitrogen supply unit, and the nitrogen supply unit conveys alkali liquor in the alkali liquor storage unit to the alkali liquor spraying opening by using pressure.
Preferably, the water spraying device further comprises a circulating water unit, and the circulating water unit is connected with the water spraying nozzle to realize the recycling of water.
In order to prevent the silica from agglomerating and causing clogging in the negative pressure chamber, it is preferable that a nitrogen bubbling unit is provided at the bottom of the negative pressure chamber for supplying nitrogen into the negative pressure chamber. By conveying nitrogen, the massive silicon dioxide can be scattered, and blockage caused by agglomeration is prevented.
Preferably, an infrared sensor is arranged in the negative pressure cavity and used for detecting the solid content of the silicon dioxide. Preferably, the device further comprises a control unit, wherein the control unit is connected with the infrared sensor and the nitrogen bubbling unit, and the control unit controls the nitrogen bubbling unit to convey nitrogen after the infrared sensor senses that the solid content of the silicon dioxide reaches a threshold value. The linkage of the infrared sensor and the nitrogen bubbling unit is realized.
Preferably, the bottom of the atmospheric pressure cavity is also provided with a nitrogen bubbling unit for conveying nitrogen into the atmospheric pressure cavity.
Preferably, an infrared sensor is arranged in the normal pressure cavity and used for detecting the solid content of the silicon dioxide.
In the normal pressure cavity, the nitrogen bubbling unit is preferably connected to the infrared sensor, and the control unit controls the nitrogen bubbling unit to deliver nitrogen gas when the infrared sensor senses that the solid content of silica reaches a threshold value. And the infrared sensor is linked with the nitrogen bubbling unit.
For further understanding of the present invention, the following detailed description of the tail gas treatment device provided by the present invention is provided with reference to the following examples, and the scope of the present invention is not limited by the following examples.
Example 1
An exhaust gas treatment device, as shown in fig. 1, includes:
the water tank (1) is divided into a negative pressure cavity (11) and a normal pressure cavity (12), and water is stored in both the negative pressure cavity (11) and the normal pressure cavity (12);
the negative pressure cavity (11) is provided with an air inlet (13) and a channel (14);
the top of the spray tower (2) is provided with a water spray opening (21) and an alkali liquor spray opening (22), the bottom of the spray tower (2) is connected with a channel (14) of the negative pressure cavity (11), and the channel is used for inputting gas into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity;
the top of the atmospheric cavity (12) is provided with an air outlet (15), and the bottom of the atmospheric cavity is provided with a water outlet (16);
the atmospheric pressure cavity (12) is connected with the spray tower (2) through a Venturi tube (3), and the Venturi tube (3) is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet;
and the variable frequency fan (4) is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure.
Example 2
An exhaust gas treatment device, as shown in fig. 2, includes:
the water tank (1) is divided into a negative pressure cavity (11) and a normal pressure cavity (12), and water is stored in both the negative pressure cavity (11) and the normal pressure cavity (12);
the negative pressure cavity (11) is provided with an air inlet (13) and a channel (14);
the top of the spray tower (2) is provided with a water spray opening (21) and an alkali liquor spray opening (22), the bottom of the spray tower (2) is connected with a channel (14) of the negative pressure cavity (11), and the channel is used for inputting gas into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity;
the alkali liquor supply unit (5) is connected with an alkali liquor spraying opening (22) at the top of the spraying tower;
the alkali liquor supply unit comprises an alkali liquor storage unit and a nitrogen supply unit, and the nitrogen supply unit utilizes alkali liquor in the pressure drop alkali liquor storage unit to be conveyed to the alkali liquor spraying port.
The top of the atmospheric cavity (12) is provided with an air outlet (15), and the bottom of the atmospheric cavity is provided with a water outlet (16);
the atmospheric pressure cavity (12) is connected with the spray tower (2) through a Venturi tube (3), and the Venturi tube (3) is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet;
and the variable frequency fan (4) is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure.
Example 3
An exhaust gas treatment device, as shown in fig. 3, includes:
the water tank (1) is divided into a negative pressure cavity (11) and a normal pressure cavity (12), and water is stored in both the negative pressure cavity (11) and the normal pressure cavity (12);
the negative pressure cavity (11) is provided with an air inlet (13) and a channel (14);
the top of the spray tower (2) is provided with a water spray opening (21) and an alkali liquor spray opening (22), the bottom of the spray tower (2) is connected with a channel (14) of the negative pressure cavity (11), and the channel is used for inputting gas into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity;
the top of the atmospheric cavity (12) is provided with an air outlet (15), and the bottom of the atmospheric cavity is provided with a water outlet (16);
the atmospheric pressure cavity (12) is connected with the spray tower (2) through a Venturi tube (3), and the Venturi tube (3) is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet;
and the variable frequency fan (4) is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure.
And the bottoms of the negative pressure cavity and the normal pressure cavity are both provided with nitrogen bubbling units (6) for conveying nitrogen into the normal pressure cavity and the negative pressure cavity. By conveying nitrogen, the massive silicon dioxide can be scattered, and blockage caused by agglomeration is prevented.
And infrared sensors (7) are arranged in the negative pressure cavity and the normal pressure cavity and are used for detecting the solid content of the silicon dioxide. The control unit is connected with the infrared sensor and the nitrogen bubbling unit, and controls the nitrogen bubbling unit to convey nitrogen after the infrared sensor senses that the solid content of the silicon dioxide reaches a threshold value. And the infrared sensor is linked with the nitrogen bubbling unit.
The above description of the embodiments is only intended to facilitate the understanding of the method of the invention and its core idea. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention.
The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.
Claims (9)
1. An exhaust gas treatment device, comprising:
the water tank is divided into a negative pressure cavity and a normal pressure cavity, and water is stored in the negative pressure cavity and the normal pressure cavity;
the negative pressure cavity is provided with an air inlet and a channel;
the spray tower is internally provided with a water spray opening and an alkali liquor spray opening, the bottom of the spray tower is connected with a channel of the negative pressure cavity, and the channel is used for inputting the gas treated by the negative pressure cavity into the spray tower and discharging solid impurities in the spray tower into the negative pressure cavity;
the top of the atmospheric cavity is provided with an air outlet, and the bottom of the atmospheric cavity is provided with a water outlet;
the atmospheric pressure cavity is connected with the spray tower through a venturi tube, and the venturi tube is used for conveying gas in the spray tower to the atmospheric pressure cavity and discharging the gas from the gas outlet;
and the variable frequency fan is used for conveying the water in the normal pressure cavity to the venturi tube to form negative pressure.
2. The tail gas treatment device of claim 1, further comprising an alkali liquor supply unit, wherein the alkali liquor supply unit is connected with an alkali liquor spraying port at the top of the spraying tower;
the alkali liquor supply unit comprises an alkali liquor storage unit and a nitrogen supply unit, and the nitrogen supply unit conveys alkali liquor in the alkali liquor storage unit to the alkali liquor spraying port by utilizing pressure.
3. The exhaust gas treatment device according to claim 1, wherein the distance between the alkali liquor spray opening and the bottom surface of the spray tower is greater than the distance between the water spray opening and the bottom surface of the spray tower.
4. The exhaust gas treatment device according to claim 1, further comprising a circulating water unit connected to the water spray nozzle.
5. The tail gas treatment device according to claim 1, wherein a nitrogen bubbling unit is arranged at the bottom of the negative pressure cavity and used for conveying nitrogen into the negative pressure cavity.
6. The exhaust gas treatment device according to claim 5, wherein an infrared sensor is disposed in the negative pressure chamber for detecting the silica solid content.
7. The tail gas treatment device according to claim 5 or 6, wherein a nitrogen bubbling unit is arranged at the bottom of the atmospheric pressure cavity and used for conveying nitrogen into the atmospheric pressure cavity.
8. The exhaust gas treatment device according to claim 7, wherein an infrared sensor is disposed in the atmospheric chamber for detecting the solid content of silica.
9. The tail gas treatment device according to any one of claims 5 to 8, further comprising a control unit, wherein the control unit is connected to the infrared sensor and the nitrogen bubbling unit, and the control unit controls the nitrogen bubbling unit to deliver nitrogen after the infrared sensor senses that the solid content of silica reaches a threshold value.
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|---|---|---|---|
| CN201911227159.6A CN110917854A (en) | 2019-12-04 | 2019-12-04 | Tail gas treatment device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201911227159.6A CN110917854A (en) | 2019-12-04 | 2019-12-04 | Tail gas treatment device |
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| CN110917854A true CN110917854A (en) | 2020-03-27 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111921306A (en) * | 2020-07-31 | 2020-11-13 | 常州多单微电子设备有限公司 | Oil smoke waste gas effluent disposal system |
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| CN111921306A (en) * | 2020-07-31 | 2020-11-13 | 常州多单微电子设备有限公司 | Oil smoke waste gas effluent disposal system |
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Effective date of registration: 20211029 Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Applicant after: Xi'an yisiwei Material Technology Co.,Ltd. Applicant after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: Room 1323, block a, city gate, No.1 Jinye Road, high tech Zone, Xi'an, Shaanxi 710065 Applicant before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
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Application publication date: 20200327 |