CN203545710U - Chlorosilane waste liquid treatment device - Google Patents
Chlorosilane waste liquid treatment device Download PDFInfo
- Publication number
- CN203545710U CN203545710U CN201320700157.6U CN201320700157U CN203545710U CN 203545710 U CN203545710 U CN 203545710U CN 201320700157 U CN201320700157 U CN 201320700157U CN 203545710 U CN203545710 U CN 203545710U
- Authority
- CN
- China
- Prior art keywords
- waste liquid
- tail gas
- chlorosilane
- diluted acid
- waste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 98
- 239000002699 waste material Substances 0.000 title claims abstract description 91
- 239000005046 Chlorosilane Substances 0.000 title claims abstract description 47
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 title claims abstract description 47
- 239000007789 gas Substances 0.000 claims abstract description 54
- 239000002253 acid Substances 0.000 claims abstract description 43
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 34
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 24
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims abstract description 16
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims abstract description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 14
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 8
- 239000006096 absorbing agent Substances 0.000 claims description 31
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 239000010808 liquid waste Substances 0.000 claims description 12
- 239000000377 silicon dioxide Substances 0.000 claims description 11
- 239000000945 filler Substances 0.000 claims description 10
- 238000012546 transfer Methods 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims description 9
- 238000012856 packing Methods 0.000 claims description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 5
- 230000008676 import Effects 0.000 claims description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 11
- 238000010521 absorption reaction Methods 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 6
- 238000003912 environmental pollution Methods 0.000 abstract description 5
- 238000007865 diluting Methods 0.000 abstract 3
- 230000002378 acidificating effect Effects 0.000 abstract 1
- 238000005507 spraying Methods 0.000 abstract 1
- HEMHJVSKTPXQMS-UHFFFAOYSA-M sodium hydroxide Inorganic materials [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 21
- 229920005591 polysilicon Polymers 0.000 description 8
- 235000011121 sodium hydroxide Nutrition 0.000 description 8
- 238000005406 washing Methods 0.000 description 8
- 238000012545 processing Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 4
- 239000005052 trichlorosilane Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 238000004065 wastewater treatment Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 230000003301 hydrolyzing effect Effects 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 229960001866 silicon dioxide Drugs 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- DPDMMXDBJGCCQC-UHFFFAOYSA-N [Na].[Cl] Chemical compound [Na].[Cl] DPDMMXDBJGCCQC-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 239000007792 gaseous phase Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000003020 moisturizing effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000007670 refining Methods 0.000 description 1
- 229910021487 silica fume Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/30—Wastewater or sewage treatment systems using renewable energies
- Y02W10/37—Wastewater or sewage treatment systems using renewable energies using solar energy
Landscapes
- Treating Waste Gases (AREA)
Abstract
The utility model provides a chlorosilane waste liquid treatment device. The chlorosilane waste liquid treatment device comprises a waste liquid reaction tank for carrying out a hydrolysis reaction on chlorosilane waste liquid and water, a waste liquid conveying pump for conveying acidic waste liquid to a transferring tank, a tail gas absorption tower for eluting and absorbing hydrogen chloride tail gas, an acid diluting tank for storing diluted acid and a diluted acid circulating pump for conveying spraying liquid, wherein the lower part of the waste liquid reaction tank is connected with the input opening of the waste liquid conveying pump through a liquid conveying pipeline; a branch pipe of the output opening of the waste liquid conveying pump is connected into the transferring tank and the other branch pipe is used for returning waste liquid to the waste liquid reaction tank; a hydrogen chloride gas conveying pipeline is arranged on the upper part of the waste liquid reaction tank and is communicated with the lower part of the tail gas absorption tower; the output opening of the diluted acid circulating pump is communicated with the tail gas absorption tower by a pipeline; the bottom of the tail gas absorption tower is communicated with the acid diluting tank by a pipeline; the acid diluting tank is connected with the input opening of the diluted acid circulating pump by a pipeline. According to the device, the production cost of polycrystalline silicon is reduced; equipment is not easy to block; the environmental pollution is reduced and available hydrochloric acid is generated.
Description
Technical field
The utility model relates to a kind of chlorosilane liquid waste treating apparatus, belongs to field of polysilicon production.
Background technology
Improved Siemens is produced the process of polysilicon, it is mainly at high temperature synthesizing trichlorosilane of hydrogenchloride and industrial silica fume (thick silicon), then trichlorosilane is carried out to chemical refining purification, through multistage rectification, purify, the trichlorosilane after purification rectifying carries out CVD (chemical gaseous phase deposition method) reaction and produces high purity polycrystalline silicon in hydrogen reduction furnace again.Most this methods that adopt of domestic and international existing polysilicon factory are produced solar level and electronic-grade polycrystalline silicon, in polysilicon production process, the synthetic rough chlorosilane of producing of trichlorosilane is after multistage rectification is purified, and tower bottom of rectifying tower can be discharged the high chlorosilane waste liquid of a part of foreign matter content.
This part chlorosilane waste liquid is difficult to process, directly discharge can cause serious environmental pollution, at present, the most alkali lye that adopts of polysilicon enterprise carries out harmless treatment to chlorosilane waste liquid, mainly to adopt alkali lye to react with chlorosilane, produce the innoxious substances such as water glass, sodium-chlor and silicon-dioxide, reacted liquid is carried out to acid-base neutralisation processing, finally discharge.For example patent 202226742U, has introduced one chlorosilane raffinate is sent in washing tower and carried out removal of impurities, reclaims a part of chlorosilane, and irretrievable chlorosilane waste liquid is sent into tail gas washing tower, adopts liquid caustic soda drip washing processing.This kind processed the scheme of chlorosilane waste liquid, has following shortcoming:
(1) need to consume liquid caustic soda and process chlorosilane waste liquid, cause liquid caustic soda consumption to increase, increase production of polysilicon cost.
(2) use alkali lye drip washing processing, can produce a large amount of block silicon-dioxide and hydrogen chloride gas, if column plate or filler are not installed in tail gas eluting column, drip washing deleterious, tail gas absorbs insufficient, thereby causes environmental pollution.If column plate or filler are installed in tower, silica solid is easy to stop up column plate or filler, affects the operating performance of eluting column.In addition, cleaning work amount is large, and has certain potential safety hazard.
Utility model content
For the defect of existing chlorosilane waste liquid technology, the purpose of this utility model is to provide a kind of chlorosilane liquid waste treating apparatus.This device, without liquid caustic soda, has reduced production of polysilicon cost; Be not easy to make equipment to stop up, reduce environmental pollution, and can produce a certain amount of available hydrochloric acid, eliminated certain potential safety hazard.
The technical scheme that the utility model adopts is: a kind of chlorosilane liquid waste treating apparatus, comprises waste liquid retort, waste liquid transferpump, tail gas absorber, diluted acid tank, diluted acid recycle pump;
Wherein, waste liquid retort bottom, by liquid-transport pipe-line, is connected with the input aperture of waste liquid transferpump; The delivery port of waste liquid transferpump, has an arm access transfer pond, also has a take-off pipe, and residual waste solution is returned to waste liquid retort; The top of described waste liquid retort has monochlor(in)ate hydrogen gas pipe line to be communicated with tail gas absorber bottom; The delivery port of diluted acid recycle pump is connected tail gas absorber by pipeline; Diluted acid tank is connected by pipeline in tail gas absorber bottom; Diluted acid tank is connected with the input aperture of diluted acid recycle pump by pipeline.
Further, described waste liquid retort, is provided with the import of chlorosilane waste liquid, and top has into water shower nozzle, and water sprays from shower nozzle, increases the contact area that chlorosilane reacts with water; There is an agitator at its middle part, guarantees chlorosilane waste liquid and the abundant hybrid reaction of water.
Further, described waste liquid transferpump, the acid waste liquid containing silica solid that hydrolysis reaction in waste liquid retort can be produced is delivered to transfer pond.
Further, have three layers of sieve plate in described tail gas absorber, in the middle of sieve plate, having two-layer filler, filler type is Pall ring, and shower nozzle is arranged at tail gas absorber top, and hydrogen chloride gas fully contacts with water at packing layer, carries out mass-and heat-transfer; Shower nozzle is arranged at tail gas absorber top, guarantees that water evenly sprays packing layer.
According to the character of chlorosilane facile hydrolysis, chlorosilane waste liquid is passed into the reaction that is hydrolyzed in a waste liquid retort, because waste liquid retort space is large, except drip washing shower nozzle, without other internals, the solid silica that therefore reaction produces is not easy occluding device.The hydrogen chloride gas that reaction produces enters tail gas absorber, in absorption tower, there is two-layer filler, by spray, can effectively absorb the hydrogen chloride gas in tail gas, produce dilute hydrochloric acid, by diluted acid recycle pump, diluted acid is squeezed into tail gas eluting column internal recycle absorbing hydrogen chloride gas, promote concentration of hydrochloric acid, the standard of selling outside concentration of hydrochloric acid reaches is sent into hydrochloric acid tank.The solid silica producing in waste liquid retort and acid waste water are sent into Waste Water Treatment processing.
Therefore this device, without liquid caustic soda, has reduced production of polysilicon cost; Be not easy to make equipment to stop up, reduce environmental pollution, and produce a certain amount of available hydrochloric acid, eliminated certain potential safety hazard.
Accompanying drawing explanation
Accompanying drawing is used for further understanding of the present utility model, and supports, and forms a part for specification sheets, is used from explanation the utility model with embodiment mono-, does not form restriction of the present utility model.In the accompanying drawings:
Fig. 1 is a kind of chlorosilane liquid waste treating apparatus of the utility model schematic diagram;
In figure: 1-waste liquid retort 2-waste liquid transferpump 3-tail gas absorber 4-diluted acid tank 5-diluted acid recycle pump.
Embodiment
Below in conjunction with accompanying drawing, the utility model is described in further detail.Fig. 1 is a kind of chlorosilane liquid waste treating apparatus of the utility model schematic diagram.
As shown in Figure 1, a kind of chlorosilane liquid waste treating apparatus, comprise, for chlorosilane waste liquid and water retort be hydrolyzed the waste liquid retort 1 of reacting, for the acid waste liquid containing silica solid that waste liquid retort 1 hydrolysis reaction is produced be delivered to the waste liquid transferpump 2 in transfer pond, the tail gas absorber 3 that absorbs for the drip washing of hydrolyzing chlorosilane reaction post chlorization hydrogen tail gas, for storing the diluted acid tank 4 of the diluted acid that tail gas absorber 3 produces and the diluted acid recycle pump 5 for the conveying of tail gas absorber 3 spray liquids;
Wherein, waste liquid retort 1 bottom, by liquid-transport pipe-line, is connected with the input aperture of waste liquid transferpump 2; The delivery port of waste liquid transferpump 2, has an arm access transfer pond (not drawing in figure), also has a take-off pipe, and residual waste solution is returned to waste liquid retort 1; The top of described waste liquid retort 1 has monochlor(in)ate hydrogen gas pipe line to be communicated with tail gas absorber 3 bottoms; The delivery port of diluted acid recycle pump 5 is connected tail gas absorber 3 by pipeline; Diluted acid tank 4 is connected by pipeline in tail gas absorber 3 bottoms; Diluted acid tank 4 is connected with the input aperture of diluted acid recycle pump 5 by pipeline.
Further, described waste liquid retort 1, is provided with the import of chlorosilane waste liquid, and top has into water shower nozzle, and water sprays from shower nozzle, increases the contact area that chlorosilane reacts with water; There is an agitator at its middle part, guarantees chlorosilane waste liquid and the abundant hybrid reaction of water.
Further, described waste liquid transferpump 2, the acid waste liquid containing silica solid that hydrolysis reaction in waste liquid retort 1 can be produced is delivered to transfer pond.
Further, have three layers of sieve plate in described tail gas absorber 3, in the middle of sieve plate, having two-layer filler, filler type is Pall ring, and shower nozzle is arranged at tail gas absorber 3 tops, and hydrogen chloride gas fully contacts with water at packing layer, carries out mass-and heat-transfer; Shower nozzle is arranged at tail gas absorber 3 tops, guarantees that water evenly sprays packing layer.
Described chlorosilane liquid waste disposal process is, chlorosilane waste liquid is passed in waste liquid retort 1, react with the water in waste liquid retort 1, the tail gas of the containing hydrogen chloride that reaction produces enters tail gas absorber 3 by pipeline, diluted acid recycle pump 5 is squeezed into tail gas absorber 3 by the diluted acid in diluted acid tank 4, contact with hydrogen chloride tail gas, by hydrogen chloride absorption, circulation simultaneously improves concentration of hydrochloric acid in diluted acid tank 4.The waste liquid that contains silica solid producing after chlorosilane waste liquid hydrolysis reaction in waste liquid retort 1 is sent into Waste Water Treatment processing.Its step comprises:
1. waste liquid retort height is 2000mm, first to the interior moisturizing of waste liquid retort 1, guarantees waste liquid retort liquid level 800-1300mm.Then chlorosilane waste liquid being entered in waste liquid retort 1, the water generation hydrolysis reaction in chlorosilane waste liquid and waste liquid retort 1.
2. agitator of the interior installation of waste liquid retort 1, opens agitator, guarantees that the chlorosilane waste liquid in waste liquid retort 1 fully reacts with water, and waste liquid retort pressure should be lower than 0-50kpa, and temperature is lower than 30-80 ℃.
3. hydrolyzing chlorosilane reacts a hydrogen chloride gas part of emitting and is absorbed by the water in waste liquid retort, and a part enters in tail gas absorber 3 by exhaust pipe.
4. diluted acid recycle pump 5 is squeezed into tail gas absorber 3 by the diluted acid in diluted acid tank 4, by the shower nozzle at tail gas absorber 3 tops, to washing tower bottom, sprays, and contacts with hydrogen chloride tail gas is reverse, and by hydrogen chloride absorption, circulation simultaneously improves concentration of hydrochloric acid in diluted acid tank 4.
5. the dilute hydrochloric acid that tail gas absorber 3 produces, by continuous cycling elution, can be sold processing after raising concentration in addition.
6. chlorosilane waste liquid is hydrolyzed after reaction in waste liquid retort 1, and the waste water containing silica solid of generation is sent into Waste Water Treatment processing.
The utility model is not limited to above-mentioned preferred forms, and anyone can draw other various forms of technical schemes under enlightenment of the present utility model.For a person skilled in the art, its technical scheme that still can record aforementioned each embodiment is modified, or part technical characterictic is wherein equal to replacement.All within spirit of the present utility model and principle, any modification of doing, be equal to replacement, improvement etc., within all should being included in protection domain of the present utility model.
Claims (4)
1. a chlorosilane liquid waste treating apparatus, comprises, waste liquid retort, waste liquid transferpump, tail gas absorber, diluted acid tank, diluted acid recycle pump;
It is characterized in that, described waste liquid retort bottom, by liquid-transport pipe-line, is connected with the input aperture of waste liquid transferpump; The delivery port of waste liquid transferpump, has an arm access transfer pond, also has a take-off pipe, and residual waste solution is returned to waste liquid retort; The top of described waste liquid retort has monochlor(in)ate hydrogen gas pipe line to be communicated with tail gas absorber bottom; The delivery port of diluted acid recycle pump is connected tail gas absorber by pipeline; Diluted acid tank is connected by pipeline in tail gas absorber bottom; Diluted acid tank is connected with the input aperture of diluted acid recycle pump by pipeline.
2. according to a kind of chlorosilane liquid waste treating apparatus claimed in claim 1, it is characterized in that, described waste liquid retort, is provided with the import of chlorosilane waste liquid, and top has into water shower nozzle, and water sprays from shower nozzle, increases the contact area that chlorosilane reacts with water; There is an agitator at its middle part, guarantees chlorosilane waste liquid and the abundant hybrid reaction of water.
3. according to a kind of chlorosilane liquid waste treating apparatus claimed in claim 2, it is characterized in that, described waste liquid transferpump, the acid waste liquid containing silica solid that hydrolysis reaction in waste liquid retort can be produced is delivered to transfer pond.
4. according to a kind of chlorosilane liquid waste treating apparatus claimed in claim 3, it is characterized in that, in described tail gas absorber, there are three layers of sieve plate, in the middle of sieve plate, there is two-layer filler, filler type is Pall ring, shower nozzle is arranged at tail gas absorber top, and hydrogen chloride gas fully contacts with water at packing layer, carries out mass-and heat-transfer; Shower nozzle is arranged at tail gas absorber top, guarantees that water evenly sprays packing layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320700157.6U CN203545710U (en) | 2013-11-08 | 2013-11-08 | Chlorosilane waste liquid treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201320700157.6U CN203545710U (en) | 2013-11-08 | 2013-11-08 | Chlorosilane waste liquid treatment device |
Publications (1)
Publication Number | Publication Date |
---|---|
CN203545710U true CN203545710U (en) | 2014-04-16 |
Family
ID=50463856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201320700157.6U Expired - Lifetime CN203545710U (en) | 2013-11-08 | 2013-11-08 | Chlorosilane waste liquid treatment device |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN203545710U (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105233633A (en) * | 2015-11-20 | 2016-01-13 | 苏州韵蓝环保科技有限公司 | Hydrogen chloride exhaust purifying device |
CN105879634A (en) * | 2014-12-31 | 2016-08-24 | 曾舟华 | Method and device for recovering diamonds through metronidazole nitration waste gas |
CN106006557A (en) * | 2016-05-18 | 2016-10-12 | 昆明理工大学 | Method for producing hydrogen chloride from chlorosilane raffinate |
CN106276924A (en) * | 2016-08-22 | 2017-01-04 | 昆明理工大学 | A kind of process chlorosilane residual liquid and the method for waste gas simultaneously |
CN108585083A (en) * | 2018-07-03 | 2018-09-28 | 天津辰创环境工程科技有限责任公司 | A kind of device of processing thionyl chloride waste liquid |
CN108636323A (en) * | 2018-06-06 | 2018-10-12 | 南京曙光精细化工有限公司 | Polysulfide silanes coupling agent process units |
CN110917854A (en) * | 2019-12-04 | 2020-03-27 | 西安奕斯伟硅片技术有限公司 | Tail gas treatment device |
-
2013
- 2013-11-08 CN CN201320700157.6U patent/CN203545710U/en not_active Expired - Lifetime
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105879634A (en) * | 2014-12-31 | 2016-08-24 | 曾舟华 | Method and device for recovering diamonds through metronidazole nitration waste gas |
CN105879634B (en) * | 2014-12-31 | 2018-11-02 | 黄冈银河阿迪药业有限公司 | Metronidazole nitrifies the method and device of waste gas recovery diamond |
CN105233633A (en) * | 2015-11-20 | 2016-01-13 | 苏州韵蓝环保科技有限公司 | Hydrogen chloride exhaust purifying device |
CN106006557A (en) * | 2016-05-18 | 2016-10-12 | 昆明理工大学 | Method for producing hydrogen chloride from chlorosilane raffinate |
CN106276924A (en) * | 2016-08-22 | 2017-01-04 | 昆明理工大学 | A kind of process chlorosilane residual liquid and the method for waste gas simultaneously |
CN108636323A (en) * | 2018-06-06 | 2018-10-12 | 南京曙光精细化工有限公司 | Polysulfide silanes coupling agent process units |
CN108636323B (en) * | 2018-06-06 | 2024-02-20 | 南京曙光新材料有限公司 | Polysulfide silane coupling agent production device |
CN108585083A (en) * | 2018-07-03 | 2018-09-28 | 天津辰创环境工程科技有限责任公司 | A kind of device of processing thionyl chloride waste liquid |
CN110917854A (en) * | 2019-12-04 | 2020-03-27 | 西安奕斯伟硅片技术有限公司 | Tail gas treatment device |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN203545710U (en) | Chlorosilane waste liquid treatment device | |
CN105036081B (en) | A kind of method that chlorosilane raffinate produces HCl gases | |
CN101628710B (en) | Method for producing high-purity concentrated hydrochloric acid by adopting hydrogen chloride gas containing chlorosilane | |
CN105036141A (en) | Method for producing nanosilicon dioxide and by-product hydrochloric acid through chlorosilane waste gas | |
CN105129807B (en) | A kind of method that utilization chlorosilane raffinate prepares superfine silicon dioxide | |
CN203990292U (en) | Viscose waste gas treatment device | |
CN203264540U (en) | Destruction device containing phosgene tail gas | |
CN204865499U (en) | Methyl nitrite's waste gas treatment system | |
CN203494384U (en) | Device for water washing of waste gas in polysilicon industry | |
CN203222476U (en) | System for removing chloro-silane in HCl tail gas | |
CN103505996B (en) | Waste gas washing treatment method and device in polycrystalline silicon industry | |
CN205387476U (en) | System for hydrogen effectively utilizes in realizing chlor -alkali by -product | |
CN214634110U (en) | Hydrochloric acid desorption device using sulfuric acid as extractant | |
CN206783568U (en) | Alcoholysis method handles the reaction and rectification device of tail gas containing chlorsilane | |
CN214020023U (en) | Preparation facilities of hydrogen chloride methanol solution | |
CN204981169U (en) | Utilize device of chlorosilane waste gas production nanometer silica and by -product hydrochloric acid | |
CN201704059U (en) | Hydrogen chloride purifying device | |
CN202808348U (en) | Device for removing chlorosilane of hydrogen chloride | |
CN204275769U (en) | A kind for the treatment of apparatus of tower titanium tetrachloride production tail gas recycle hydrochloric acid | |
CN209663033U (en) | It is a kind of to clean device for trichlorosilane tail gas processing | |
CN102009952A (en) | Decompression acid making process of polysilicon 10barg HCl (hydrogen chloride) tail gas | |
CN202113767U (en) | Falling film absorbing device | |
CN204803016U (en) | Device of silane tail gas is handled in reaction rectification | |
CN111039745A (en) | System and method for reducing waste alkali in methane chloride production process | |
CN207608318U (en) | A kind of device that can handle impurity in recycling industry byproduct hydrogen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CX01 | Expiry of patent term |
Granted publication date: 20140416 |
|
CX01 | Expiry of patent term |