JP5699023B2 - 荷電粒子線装置 - Google Patents

荷電粒子線装置 Download PDF

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Publication number
JP5699023B2
JP5699023B2 JP2011086904A JP2011086904A JP5699023B2 JP 5699023 B2 JP5699023 B2 JP 5699023B2 JP 2011086904 A JP2011086904 A JP 2011086904A JP 2011086904 A JP2011086904 A JP 2011086904A JP 5699023 B2 JP5699023 B2 JP 5699023B2
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Japan
Prior art keywords
charged particle
particle beam
sample
housing
beam apparatus
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JP2011086904A
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English (en)
Japanese (ja)
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JP2012221766A (ja
JP2012221766A5 (enExample
Inventor
祐介 大南
祐介 大南
祐博 伊東
祐博 伊東
智久 大瀧
智久 大瀧
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2011086904A priority Critical patent/JP5699023B2/ja
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to DE112012001214.3T priority patent/DE112012001214B4/de
Priority to KR1020147032861A priority patent/KR101688293B1/ko
Priority to KR1020137026494A priority patent/KR101519283B1/ko
Priority to CN201280017689.8A priority patent/CN103477415B/zh
Priority to PCT/JP2012/001431 priority patent/WO2012140822A1/ja
Priority to US14/111,174 priority patent/US8710439B2/en
Priority to KR1020147027512A priority patent/KR101519315B1/ko
Publication of JP2012221766A publication Critical patent/JP2012221766A/ja
Publication of JP2012221766A5 publication Critical patent/JP2012221766A5/ja
Priority to US14/191,769 priority patent/US8921786B2/en
Priority to US14/552,477 priority patent/US9105442B2/en
Application granted granted Critical
Publication of JP5699023B2 publication Critical patent/JP5699023B2/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP2011086904A 2011-04-11 2011-04-11 荷電粒子線装置 Active JP5699023B2 (ja)

Priority Applications (10)

Application Number Priority Date Filing Date Title
JP2011086904A JP5699023B2 (ja) 2011-04-11 2011-04-11 荷電粒子線装置
KR1020147027512A KR101519315B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
KR1020137026494A KR101519283B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
CN201280017689.8A CN103477415B (zh) 2011-04-11 2012-03-02 带电粒子束装置及利用带电粒子束装置进行观察的方法
PCT/JP2012/001431 WO2012140822A1 (ja) 2011-04-11 2012-03-02 荷電粒子線装置
US14/111,174 US8710439B2 (en) 2011-04-11 2012-03-02 Charged particle beam apparatus
DE112012001214.3T DE112012001214B4 (de) 2011-04-11 2012-03-02 Ladungsteilchenstrahlvorrichtung und betrachtungsverfahren mit einem ladungsteilchenstrahl
KR1020147032861A KR101688293B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
US14/191,769 US8921786B2 (en) 2011-04-11 2014-02-27 Charged particle beam apparatus
US14/552,477 US9105442B2 (en) 2011-04-11 2014-11-24 Charged particle beam apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011086904A JP5699023B2 (ja) 2011-04-11 2011-04-11 荷電粒子線装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2015021710A Division JP5923632B2 (ja) 2015-02-06 2015-02-06 荷電粒子線装置

Publications (3)

Publication Number Publication Date
JP2012221766A JP2012221766A (ja) 2012-11-12
JP2012221766A5 JP2012221766A5 (enExample) 2013-10-31
JP5699023B2 true JP5699023B2 (ja) 2015-04-08

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Family Applications (1)

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JP2011086904A Active JP5699023B2 (ja) 2011-04-11 2011-04-11 荷電粒子線装置

Country Status (6)

Country Link
US (3) US8710439B2 (enExample)
JP (1) JP5699023B2 (enExample)
KR (3) KR101519283B1 (enExample)
CN (1) CN103477415B (enExample)
DE (1) DE112012001214B4 (enExample)
WO (1) WO2012140822A1 (enExample)

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5923412B2 (ja) * 2012-08-24 2016-05-24 株式会社日立ハイテクノロジーズ 観察装置および光軸調整方法
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JP5909431B2 (ja) * 2012-09-27 2016-04-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6051014B2 (ja) * 2012-10-29 2016-12-21 株式会社日立ハイテクノロジーズ 試料格納用容器、荷電粒子線装置、及び画像取得方法
JP6035602B2 (ja) * 2012-11-21 2016-11-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料台ユニット、及び試料観察方法
JP6309195B2 (ja) * 2013-02-18 2018-04-11 株式会社ホロン 走査型電子顕微鏡および検査装置
CN105247650A (zh) * 2013-05-30 2016-01-13 株式会社日立高新技术 带电粒子束装置、试样观察方法
JP6169703B2 (ja) 2013-08-23 2017-07-26 株式会社日立ハイテクノロジーズ 隔膜取付部材および荷電粒子線装置
DE112014003352B4 (de) 2013-09-06 2023-02-02 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Probenbilderfassungsverfahren
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JP6126695B2 (ja) * 2013-10-08 2017-05-10 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置の制御方法
KR101524215B1 (ko) * 2013-11-29 2015-05-29 (주)코셈 전자현미경
JP6047508B2 (ja) 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6302702B2 (ja) 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
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JP6383650B2 (ja) * 2014-11-28 2018-08-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6604704B2 (ja) * 2014-12-22 2019-11-13 アプライド マテリアルズ インコーポレイテッド 基板の検査装置、基板の検査方法、大面積基板検査装置、及びその操作方法
JP6407411B2 (ja) * 2015-04-15 2018-10-17 株式会社日立ハイテクノロジーズ 荷電粒子線装置、およびその真空排気方法
US10008361B2 (en) * 2015-04-28 2018-06-26 Hitachi High-Technologies Corporation Charged particle beam device and installation method
CN107710377B (zh) * 2015-06-29 2019-09-06 株式会社日立高新技术 试样高度调整方法及观察系统
DE112015006731B4 (de) 2015-08-21 2022-07-28 Hitachi High-Tech Corporation Betrachtungsunterstützungseinheit für ladungsteilchenmikroskop sowie ladungsteilchenmikroskop und dieses nutzendes probenbetrachtungsverfahren
JP6118870B2 (ja) * 2015-10-07 2017-04-19 株式会社日立ハイテクノロジーズ 試料観察方法
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CN106783493B (zh) 2016-12-01 2018-07-10 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法
JP6928943B2 (ja) * 2017-03-28 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
KR20200002884A (ko) * 2017-04-24 2020-01-08 몰레큘라 비스타 인크. 헬륨 분위기를 가지는 힘 현미경
JP6500143B2 (ja) * 2018-03-23 2019-04-10 株式会社日立ハイテクノロジーズ 試料観察方法
JP6808691B2 (ja) * 2018-08-09 2021-01-06 日本電子株式会社 試料搬送装置及び電子顕微鏡
JP7218381B2 (ja) 2018-10-25 2023-02-06 株式会社日立ハイテク 荷電粒子線装置、荷電粒子線装置のオートフォーカス処理方法、及び検出器
CN114556514B (zh) * 2019-10-10 2025-07-29 株式会社日立高新技术 试样支架、膜间距离调整机构以及带电粒子束装置
JP7430909B2 (ja) * 2020-08-19 2024-02-14 株式会社ブイ・テクノロジー 集束イオンビーム装置
JPWO2022264809A1 (enExample) * 2021-06-14 2022-12-22
CN120637188B (zh) * 2025-08-14 2025-11-04 深圳市中图仪器股份有限公司 扫描电镜

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5707286B2 (ja) * 2011-09-21 2015-04-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。
JP5825964B2 (ja) * 2011-10-05 2015-12-02 株式会社日立ハイテクノロジーズ 検査又は観察装置及び試料の検査又は観察方法

Also Published As

Publication number Publication date
KR20140143462A (ko) 2014-12-16
CN103477415A (zh) 2013-12-25
US8710439B2 (en) 2014-04-29
KR101688293B1 (ko) 2016-12-20
US8921786B2 (en) 2014-12-30
US20140175278A1 (en) 2014-06-26
CN103477415B (zh) 2016-10-12
KR20140130531A (ko) 2014-11-10
KR101519315B1 (ko) 2015-05-11
JP2012221766A (ja) 2012-11-12
US9105442B2 (en) 2015-08-11
KR101519283B1 (ko) 2015-05-11
KR20130135341A (ko) 2013-12-10
DE112012001214B4 (de) 2022-02-10
US20140021347A1 (en) 2014-01-23
DE112012001214T5 (de) 2014-01-30
WO2012140822A1 (ja) 2012-10-18
US20150076347A1 (en) 2015-03-19

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