KR101519283B1 - 하전 입자선 장치 - Google Patents

하전 입자선 장치 Download PDF

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Publication number
KR101519283B1
KR101519283B1 KR1020137026494A KR20137026494A KR101519283B1 KR 101519283 B1 KR101519283 B1 KR 101519283B1 KR 1020137026494 A KR1020137026494 A KR 1020137026494A KR 20137026494 A KR20137026494 A KR 20137026494A KR 101519283 B1 KR101519283 B1 KR 101519283B1
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South Korea
Prior art keywords
case
charged particle
sample
thin film
vacuum
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Korean (ko)
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KR20130135341A (ko
Inventor
유스께 오미나미
스께히로 이또
도모히사 오따끼
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가부시키가이샤 히다치 하이테크놀로지즈
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Publication of KR20130135341A publication Critical patent/KR20130135341A/ko
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020137026494A 2011-04-11 2012-03-02 하전 입자선 장치 Active KR101519283B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2011-086904 2011-04-11
JP2011086904A JP5699023B2 (ja) 2011-04-11 2011-04-11 荷電粒子線装置
PCT/JP2012/001431 WO2012140822A1 (ja) 2011-04-11 2012-03-02 荷電粒子線装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147027512A Division KR101519315B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치

Publications (2)

Publication Number Publication Date
KR20130135341A KR20130135341A (ko) 2013-12-10
KR101519283B1 true KR101519283B1 (ko) 2015-05-11

Family

ID=47009019

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020137026494A Active KR101519283B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
KR1020147032861A Active KR101688293B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
KR1020147027512A Active KR101519315B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020147032861A Active KR101688293B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치
KR1020147027512A Active KR101519315B1 (ko) 2011-04-11 2012-03-02 하전 입자선 장치

Country Status (6)

Country Link
US (3) US8710439B2 (enExample)
JP (1) JP5699023B2 (enExample)
KR (3) KR101519283B1 (enExample)
CN (1) CN103477415B (enExample)
DE (1) DE112012001214B4 (enExample)
WO (1) WO2012140822A1 (enExample)

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5923412B2 (ja) * 2012-08-24 2016-05-24 株式会社日立ハイテクノロジーズ 観察装置および光軸調整方法
GB2505517B (en) * 2012-09-04 2017-08-09 Restranaut Ltd System for monitoring evacuation of a facility
JP2014053073A (ja) * 2012-09-05 2014-03-20 Hitachi High-Technologies Corp 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
JP5909431B2 (ja) * 2012-09-27 2016-04-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6051014B2 (ja) * 2012-10-29 2016-12-21 株式会社日立ハイテクノロジーズ 試料格納用容器、荷電粒子線装置、及び画像取得方法
JP6035602B2 (ja) * 2012-11-21 2016-11-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料台ユニット、及び試料観察方法
JP6309195B2 (ja) * 2013-02-18 2018-04-11 株式会社ホロン 走査型電子顕微鏡および検査装置
CN105247650A (zh) * 2013-05-30 2016-01-13 株式会社日立高新技术 带电粒子束装置、试样观察方法
JP6169703B2 (ja) 2013-08-23 2017-07-26 株式会社日立ハイテクノロジーズ 隔膜取付部材および荷電粒子線装置
DE112014003352B4 (de) 2013-09-06 2023-02-02 Hitachi High-Tech Corporation Mit einem Strahl geladener Teilchen arbeitende Vorrichtung und Probenbilderfassungsverfahren
JP6117070B2 (ja) 2013-09-26 2017-04-19 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP6126695B2 (ja) * 2013-10-08 2017-05-10 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置の制御方法
KR101524215B1 (ko) * 2013-11-29 2015-05-29 (주)코셈 전자현미경
JP6047508B2 (ja) 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6302702B2 (ja) 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
US10202353B2 (en) 2014-02-28 2019-02-12 Gilead Sciences, Inc. Therapeutic compounds
WO2016035493A1 (ja) * 2014-09-05 2016-03-10 株式会社 日立ハイテクノロジーズ 電子線装置および電子線装置用ガス供給装置
JP6383650B2 (ja) * 2014-11-28 2018-08-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6604704B2 (ja) * 2014-12-22 2019-11-13 アプライド マテリアルズ インコーポレイテッド 基板の検査装置、基板の検査方法、大面積基板検査装置、及びその操作方法
JP6407411B2 (ja) * 2015-04-15 2018-10-17 株式会社日立ハイテクノロジーズ 荷電粒子線装置、およびその真空排気方法
US10008361B2 (en) * 2015-04-28 2018-06-26 Hitachi High-Technologies Corporation Charged particle beam device and installation method
CN107710377B (zh) * 2015-06-29 2019-09-06 株式会社日立高新技术 试样高度调整方法及观察系统
DE112015006731B4 (de) 2015-08-21 2022-07-28 Hitachi High-Tech Corporation Betrachtungsunterstützungseinheit für ladungsteilchenmikroskop sowie ladungsteilchenmikroskop und dieses nutzendes probenbetrachtungsverfahren
JP6118870B2 (ja) * 2015-10-07 2017-04-19 株式会社日立ハイテクノロジーズ 試料観察方法
EP3171163B1 (en) * 2015-11-18 2022-05-04 FEI Company X-ray imaging technique
CN106783493B (zh) 2016-12-01 2018-07-10 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法
JP6928943B2 (ja) * 2017-03-28 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
KR20200002884A (ko) * 2017-04-24 2020-01-08 몰레큘라 비스타 인크. 헬륨 분위기를 가지는 힘 현미경
JP6500143B2 (ja) * 2018-03-23 2019-04-10 株式会社日立ハイテクノロジーズ 試料観察方法
JP6808691B2 (ja) * 2018-08-09 2021-01-06 日本電子株式会社 試料搬送装置及び電子顕微鏡
JP7218381B2 (ja) 2018-10-25 2023-02-06 株式会社日立ハイテク 荷電粒子線装置、荷電粒子線装置のオートフォーカス処理方法、及び検出器
CN114556514B (zh) * 2019-10-10 2025-07-29 株式会社日立高新技术 试样支架、膜间距离调整机构以及带电粒子束装置
JP7430909B2 (ja) * 2020-08-19 2024-02-14 株式会社ブイ・テクノロジー 集束イオンビーム装置
JPWO2022264809A1 (enExample) * 2021-06-14 2022-12-22
CN120637188B (zh) * 2025-08-14 2025-11-04 深圳市中图仪器股份有限公司 扫描电镜

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Also Published As

Publication number Publication date
KR20140143462A (ko) 2014-12-16
CN103477415A (zh) 2013-12-25
US8710439B2 (en) 2014-04-29
JP5699023B2 (ja) 2015-04-08
KR101688293B1 (ko) 2016-12-20
US8921786B2 (en) 2014-12-30
US20140175278A1 (en) 2014-06-26
CN103477415B (zh) 2016-10-12
KR20140130531A (ko) 2014-11-10
KR101519315B1 (ko) 2015-05-11
JP2012221766A (ja) 2012-11-12
US9105442B2 (en) 2015-08-11
KR20130135341A (ko) 2013-12-10
DE112012001214B4 (de) 2022-02-10
US20140021347A1 (en) 2014-01-23
DE112012001214T5 (de) 2014-01-30
WO2012140822A1 (ja) 2012-10-18
US20150076347A1 (en) 2015-03-19

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