WO2012140822A1 - 荷電粒子線装置 - Google Patents
荷電粒子線装置 Download PDFInfo
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- WO2012140822A1 WO2012140822A1 PCT/JP2012/001431 JP2012001431W WO2012140822A1 WO 2012140822 A1 WO2012140822 A1 WO 2012140822A1 JP 2012001431 W JP2012001431 W JP 2012001431W WO 2012140822 A1 WO2012140822 A1 WO 2012140822A1
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- charged particle
- particle beam
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- thin film
- casing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/16—Vessels; Containers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
- H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/16—Vessels
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/16—Vessels
- H01J2237/164—Particle-permeable windows
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/182—Obtaining or maintaining desired pressure
- H01J2237/1825—Evacuating means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2007—Holding mechanisms
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2602—Details
- H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
- H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
Definitions
- the present invention relates to a microscope technique capable of observing a sample to be observed in an atmospheric pressure or a predetermined gas atmosphere, and particularly relates to a desktop charged particle microscope.
- a scanning electron microscope (SEM), a transmission electron microscope (TEM), or the like is used.
- the second casing for placing the sample is evacuated, and the sample atmosphere is evacuated to image the sample.
- a sample such as a biochemical sample or a liquid sample that is damaged by a vacuum or whose state changes with an electron microscope.
- an SEM device or a sample holding device that can observe an observation target sample at atmospheric pressure Etc. are being developed.
- these devices provide a thin film or minute through-hole that can transmit an electron beam between the electron optical system and the sample to partition the vacuum state from the atmospheric state. This is common in that a thin film is provided between the two.
- Patent Document 1 an electron source side of an electron optical column is disposed downward and an objective lens side is disposed upward, and an electron beam is placed on an electron beam exit hole at the end of the electron optical column via an O-ring.
- An atmospheric pressure SEM provided with a thin film capable of transmitting is disclosed.
- an observation target sample is placed directly on a thin film, and a primary electron beam is irradiated from the lower surface of the sample to detect reflected electrons or secondary electrons and perform SEM observation.
- the sample is held in a space constituted by an annular member and a thin film installed around the thin film, and the space is filled with a liquid such as water.
- Patent Document 2 an observation sample is stored in a petri dish-like cylindrical container provided with an aperture on the upper surface side through which an electron beam passes, and this cylindrical container is provided in a vacuum sample chamber of an SEM, and further, An invention of an environmental cell is disclosed in which a hose is connected from the outside of the vacuum sample chamber so that the interior of the container can be maintained in a pseudo atmosphere.
- “pseudo” means that, when the vacuum sample chamber is evacuated, gas flows out from the aperture, so strictly speaking, observation is not performed under an atmospheric pressure environment.
- JP 2009-158222 A (US Patent Publication No. 2009/0166536) JP 2009-245944 A (US Patent Publication No. 2009/0242763)
- the atmospheric pressure SEM described in Patent Document 1 is a structurally very special device and cannot perform SEM observation in a normal high vacuum atmosphere.
- the observation object is held inside a thin film filled with liquid, and once the atmospheric pressure observation is performed, the sample gets wet, so it is not possible to observe the sample in the same state in both an air atmosphere and a high vacuum atmosphere. It is very difficult.
- the liquid is always in contact with the thin film, there is also a problem that the possibility that the thin film is damaged is very high.
- Patent Document 2 Although the environmental cell described in Patent Document 2 can be observed in an atmospheric pressure / gas atmosphere, only a sample of a size that can be inserted into the cell can be observed, and in an atmospheric pressure / gas atmosphere of a large sample. There is a problem that it cannot be observed. In the case of an environmental cell, in order to observe a different sample, the environmental cell must be taken out from the vacuum sample chamber of the SEM, the sample must be replaced, and loaded again into the vacuum sample chamber. is there.
- the present invention has been made in view of such problems, and a charged particle beam capable of observing a sample to be observed in an air atmosphere or a gas atmosphere without greatly changing the configuration of a conventional high-vacuum charged particle microscope.
- An object is to provide an apparatus or a charged particle microscope.
- an attachment capable of storing the sample is inserted into the vacuum chamber provided in the charged particle microscope from the opening of the vacuum chamber while maintaining an internal pressure higher than the pressure in the vacuum chamber.
- the opening part of a vacuum chamber is provided in the side surface or bottom face of the said vacuum chamber, for example.
- the above attachment has a function of holding a thin film that allows the primary charged particle beam to pass through or pass through the inside of the attachment, thereby ensuring a pressure difference between the vacuum chamber and the inside of the attachment.
- the vacuum chamber may be called a first casing, and the attachment may be called a second casing for the vacuum chamber.
- the vacuum chamber is maintained at a high vacuum by the thin film, while the interior of the attachment is maintained at an atmospheric pressure / gas atmosphere.
- the observation sample can be carried in and out between the inside and outside of the attachment. That is, according to the present invention, it is possible to realize a charged particle microscope in which observation in an atmospheric pressure / gas atmosphere can be realized more simply than before.
- the attachment of the present invention is inserted from the side of the sample chamber, it can be easily increased in size, so that even a large sample that cannot be enclosed in an environmental cell can be observed.
- FIG. 1 is an overall configuration diagram of a charged particle microscope according to Embodiment 1.
- FIG. FIG. 3 is an overall configuration diagram of a charged particle microscope according to a second embodiment. The figure which shows the charged particle microscope of Example 2 of the state which pulled out the board member. The figure which shows the charged particle microscope of Example 2 of the state used as a high vacuum SEM.
- FIG. 9 is an operation explanatory diagram of the charged particle microscope according to the second embodiment.
- 4 is a configuration example of a charged particle microscope of Example 2.
- FIG. 4 is a configuration example of a charged particle microscope of Example 2.
- FIG. 4 is a configuration example of a charged particle microscope of Example 2.
- FIG. 5 is an overall configuration diagram of a charged particle microscope according to a third embodiment.
- FIG. 6 is an overall configuration diagram of a charged particle microscope according to a fourth embodiment.
- FIG. 6 is an overall configuration diagram of a charged particle microscope of Example 5.
- FIG. 1 shows an overall configuration diagram of the charged particle microscope of the present embodiment.
- the charged particle microscope shown in FIG. 1 mainly includes a charged particle optical column 2, a first casing (vacuum chamber) 7 that supports the charged particle optical column with respect to the apparatus installation surface, and a first casing 7. It is comprised by the 2nd housing
- the charged particle microscope is used, the charged particle optical column 2 and the inside of the first housing are evacuated by the vacuum pump 4.
- the start / stop operation of the vacuum pump 4 is also controlled by the control system. Although only one vacuum pump 4 is shown in the figure, two or more vacuum pumps may be provided.
- the charged particle optical column 2 is an element such as a charged particle source 0 that generates a charged particle beam, an optical lens 1 that focuses the generated charged particle beam and guides it to the lower part of the column and scans the sample 6 as a primary charged particle beam. Consists of.
- the charged particle optical column 2 is installed so as to protrude into the first housing 7, and is fixed to the first housing 7 via a vacuum sealing member 123.
- a detector 3 for detecting secondary charged particles (secondary electrons or reflected electrons) obtained by irradiation with the primary charged particle beam is disposed at the end of the charged particle optical column 2. In the configuration example shown in FIG. 1, the detector 3 is provided in the first housing 7, but may be disposed in the charged particle optical column 2 or in the second housing 121.
- the charged particle microscope of the present embodiment has a control system such as a personal computer 35 used by a user of the apparatus, a host controller 36 connected to the personal computer 35 for communication, and a vacuum exhaust system and a charge according to a command transmitted from the host controller 36.
- a lower control unit 37 that controls the particle optical system and the like is provided.
- the personal computer 35 includes a monitor on which an operation screen (GUI) of the apparatus is displayed, and input means for an operation screen such as a keyboard and a mouse.
- GUI operation screen
- the upper control unit 36, the lower control unit 37, and the personal computer 35 are connected by communication lines 43 and 44, respectively.
- the lower control unit 37 is a part that transmits and receives control signals for controlling the vacuum pump 4, the gas control valve 101, the charged particle source 0, the optical lens 1, and the like, and further outputs the output signal of the detector 3 as a digital image signal. And is transmitted to the upper control unit 36. Although the output signal from the detector 3 is connected to the lower control unit 37 in the figure, an amplifier such as a preamplifier may be interposed.
- the upper control unit 36 and the lower control unit 37 may include a mixture of analog circuits, digital circuits, etc., and the upper control unit 36 and the lower control unit 37 may be unified.
- the configuration of the control system shown in FIG. 1 is merely an example, and modifications of the control unit, valves, vacuum pumps, communication wiring, and the like can be applied to the SEM of this embodiment as long as the functions intended in this embodiment are satisfied. It belongs to the category of charged particle beam equipment.
- a vacuum pipe 16 having one end connected to the vacuum pump 4 is connected to the first casing 7 so that the inside can be maintained in a vacuum state.
- a leak valve 14 for opening the inside of the housing to the atmosphere is provided, and the inside of the first housing 7 can be opened to the atmosphere during maintenance.
- the leak valve 14 may not be provided, and may be two or more.
- the arrangement location on the first housing 7 is not limited to the location shown in FIG. 1, and may be arranged at another position on the first housing 7.
- the first casing 7 has an opening on the side surface, and the second casing 121 is inserted through the opening.
- the second housing 121 includes a rectangular parallelepiped main body 131 and a mating portion 132.
- the main body 131 has a function of storing the sample 6 to be observed, and is inserted into the first housing 7 through the opening.
- the mating portion 132 constitutes a mating surface with the outer wall surface on the side surface provided with the opening of the first housing 7, and is fixed to the outer wall surface on the side surface side via the vacuum sealing member 126.
- the entire second housing 121 is fitted into the first housing 7.
- the opening is most easily manufactured using the opening for loading and unloading the sample originally provided in the vacuum sample chamber of the charged particle microscope. That is, if the second casing 121 is manufactured according to the size of the hole that is originally open and the vacuum sealing member 126 is attached around the hole, the modification of the apparatus is minimized.
- the thin film 10 is provided at a position directly below the charged particle optical column 2 when the entire second casing 121 is fitted into the first casing 7.
- the thin film 10 can transmit or pass the primary charged particle beam emitted from the lower end of the charged particle optical column 2, and the primary charged particle beam finally reaches the sample 6 through the thin film 10. To do.
- the thickness of the thin film 10 needs to be a thickness that can transmit the electron beam, typically about 20 ⁇ m or less.
- an aperture member having a primary charged particle beam passage hole may be used.
- the hole diameter should be about 1 mm 2 or less because of the requirement that a differential vacuum pumping is possible with a realistic vacuum pump. Is desirable.
- an aperture having an area of about 1 mm 2 or less is used.
- a one-dot chain line in the figure indicates the optical axis of the primary charged particle beam, and the charged particle optical column 2, the first casing 7 and the thin film 10 are arranged coaxially with the primary charged particle beam optical axis. .
- the distance between the sample 6 and the thin film 10 is adjusted by placing a sample table 17 having an appropriate height.
- the side surface of the second housing 121 is an open surface, and the sample 6 stored inside the second housing 121 (right side of the dotted line in the figure; hereinafter referred to as a second space). Is placed at atmospheric pressure during observation.
- a vacuum pump 4 is connected to the first housing 7, and a closed space (hereinafter referred to as a first space) constituted by the inner wall surface of the first housing 7, the outer wall surface of the second housing and the thin film 10. Can be evacuated. Therefore, in this embodiment, the charged particle optical column 2 and the detector 3 can be maintained in a vacuum state and the sample 6 can be maintained at atmospheric pressure during the operation of the apparatus.
- the second casing 121 has an open surface, the sample 6 can be freely exchanged during observation.
- FIG. 2 shows an overall configuration diagram of the scanning electron microscope of the present embodiment. Similar to the first embodiment, the scanning electron microscope of the present embodiment also includes an electron optical column 2, a first casing (vacuum chamber) 7 that supports the electron optical column with respect to the apparatus installation surface, and a first casing. A second casing (attachment) 121 used for insertion into the body 7 is configured by a control system. Since the operations and functions of these elements or additional elements added to the elements are substantially the same as those in the first embodiment, detailed description thereof is omitted.
- the thin film 10 is detachably fixed to the upper surface of the main body 131 of the second housing via the thin film holding member 47.
- the thin film 10 is fixed to the thin film holding member 47 so as to be vacuum-sealed, but a vacuum sealing member such as an O-ring may be used, or may be fixed with an organic material such as an adhesive or a tape. May be.
- the thin film holding member 47 is detachably fixed to the lower surface side of the ceiling plate of the second housing 121 via a vacuum sealing member.
- the thin film 10 is very thin with a thickness of about 20 ⁇ m or less because of the requirement for transmission of the electron beam, and therefore there is a possibility that it deteriorates with time or breaks during observation preparation.
- the thin film 10 since the thin film 10 is thin, it is very difficult to handle it directly. Since the thin film 10 can be handled through the thin film holding member 47 instead of directly as in the present embodiment, handling (particularly replacement) of the thin film 10 becomes very easy. That is, when the thin film 10 is damaged, the thin film holding member 47 may be replaced.
- the thin film holding member 47 is taken out of the apparatus and the thin film 10 is replaced. Can be done externally.
- the aperture member having a hole with an area of about 1 mm 2 or less can be used in place of the thin film, as in the first embodiment.
- the thin film holding member 47 of this embodiment includes a limiting member 105 that prevents the thin film and the sample from contacting each other on the side facing the sample 6.
- a limiting member 105 that prevents the thin film and the sample from contacting each other on the side facing the sample 6.
- Any member can be used as the restricting member 105 as long as it can restrict the distance between the sample and the thin film, but for convenience, an adhesive or a tape can be attached to the restricting member 105.
- the limiting member 105 is preferably made of a thin film material whose thickness is accurately known.
- the limiting member 105 is attached to the thin film holding member 47, but it may be attached to the thin film 10 itself, the sample stage 5, or placed on the sample 6.
- the limiting member 105 may be detachable.
- the open surface of the second casing 121 can be covered with the lid member 122, and various functions can be realized. This will be described below.
- the scanning electron microscope of this embodiment has a function of supplying a replacement gas into the second casing.
- the electron beam emitted from the lower end of the electron optical column 2 passes through the first space maintained at a high vacuum, passes through the thin film 10 (or aperture member) shown in FIG. It penetrates into the second space maintained at a low vacuum (rather than the first space).
- the electron beam is scattered by gas molecules in a low vacuum space, the mean free path is shortened. That is, when the distance between the thin film 10 and the sample 6 is large, secondary electrons or reflected electrons generated by electron beam or electron beam irradiation do not reach the sample.
- the scattering probability of electron beams is proportional to the mass number of gas molecules.
- the scattering probability of the electron beam decreases and the electron beam can reach the sample.
- the type of the replacement gas if the gas is lighter than the atmosphere, such as nitrogen or water vapor, the effect of improving the image S / N can be seen, but helium gas or hydrogen gas having a lighter mass has a better image S / N. Great improvement effect.
- the lid member 122 is provided with an attachment portion (gas introduction portion) for the gas supply pipe 100.
- the gas supply pipe 100 is connected to the gas cylinder 103 by the connecting portion 102, whereby the replacement gas is introduced into the second space 12.
- a gas control valve 101 is arranged in the middle of the gas supply pipe 100, and the flow rate of the replacement gas flowing through the pipe can be controlled.
- a signal line extends from the gas control valve 101 to the lower control unit 37, and the apparatus user can control the flow rate of the replacement gas on the operation screen displayed on the monitor of the personal computer 35.
- the replacement gas is a light element gas, it tends to accumulate in the upper part of the second space 12, and the lower side is difficult to replace. Therefore, an opening is provided in the lid member 122 below the attachment position of the gas supply pipe 100 (the attachment position of the pressure regulating valve 104 in FIG. 2). Thereby, since it pushes by the light element gas introduced from the gas introduction part and atmospheric gas is discharged
- the second casing 121 or the lid member 122 may be provided with an evacuation port, and the inside of the second casing 121 may be evacuated once before introducing the replacement gas.
- the vacuum evacuation in this case does not require high vacuum evacuation because the atmospheric gas component remaining in the second housing 121 may be reduced to a certain amount or less, and rough evacuation is sufficient.
- the sample once placed in a vacuum state changes its state due to evaporation of moisture. Therefore, as described above, it is preferable to introduce the replacement gas directly from the air atmosphere.
- the opening can be closed in the second space 12 by closing the opening with a lid member after the introduction of the replacement gas.
- this opening can be used also as a rough exhaust port and an air leak exhaust port. That is, if one of the three-way valves is attached to the lid member 122, one is connected to the rough exhaust vacuum pump, and the leak valve is attached to the other one, the above-described dual exhaust port can be realized.
- a pressure regulating valve 104 may be provided instead of the opening described above.
- the pressure regulating valve 104 has a function of automatically opening the valve when the internal pressure of the second casing 121 becomes 1 atm or more.
- a pressure regulating valve By providing a pressure regulating valve with such a function, when light element gas is introduced, it automatically opens when the internal pressure reaches 1 atm or more and discharges atmospheric gas components such as nitrogen and oxygen to the outside of the device.
- the element gas can be filled in the apparatus.
- the illustrated gas cylinder 103 may be provided in a scanning electron microscope or may be attached later by an apparatus user.
- the scanning electron microscope of the present embodiment includes a sample stage 5 as means for moving the observation field.
- the sample stage 5 includes an XY drive mechanism in the in-plane direction and a Z-axis drive mechanism in the height direction.
- a support plate 107 serving as a bottom plate for supporting the sample stage 5 is attached to the lid member 122, and the sample stage 5 is fixed to the support plate 107.
- the support plate 107 is attached so as to extend toward the inside of the second housing 121 with respect to the surface of the lid member 122 facing the second housing 121.
- Support shafts extend from the Z-axis drive mechanism and the XY drive mechanism, respectively, and are connected to the operation knob 108 and the operation knob 109, respectively.
- the apparatus user adjusts the position of the sample 6 in the second housing 121 by operating these operation knobs 108 and 109.
- the scanning electron microscope of this embodiment includes observation means such as a camera 106. This makes it possible to remotely observe the distance between the thin film 10 and the sample 6 and how the sample 6 is moved in the height direction.
- observation means such as a camera 106.
- an optical microscope with high imaging resolution may be used.
- the distance between the sample and the thin film may be measured using reflection of electromagnetic waves such as infrared rays.
- the attachment position of the observation means is not particularly limited to the arrangement shown in FIG. 2 and may be any position as long as the distance between the sample and the thin film can be clearly measured.
- the scanning electron microscope of the present embodiment includes a plate member support member 19 and a bottom plate 20 on the bottom surface of the first housing 7 and the lower end portion of the lid member 122, respectively.
- the lid member 122 is detachably fixed to the second casing 121 via a vacuum sealing member 125.
- the plate member support member 19 is also detachably fixed to the bottom plate 20, and the entire lid member 122 and plate member support member 19 are removed from the second housing 121 as shown in FIG. 3. Is possible.
- the bottom plate 20 is provided with a support 18 that is used as a guide for removal.
- the support column 18 is stored in a storage unit provided on the bottom plate 20, and is configured to extend in the pull-out direction of the lid member 122 when being removed.
- the column 18 is fixed to the plate member support member 19 so that the lid member 122 and the scanning electron microscope main body are not completely separated when the lid member 122 is removed from the second housing 121. It has become. Thereby, the sample stage 5 or the sample 6 can be prevented from dropping.
- the sample 6 is moved away from the thin film 10 by turning the Z-axis operation knob of the sample stage 5.
- the pressure regulating valve 104 is opened, and the inside of the second housing is opened to the atmosphere.
- the lid member 122 is pulled out to the side opposite to the apparatus main body.
- the sample 6 can be exchanged.
- the lid member 122 is pushed into the second casing 121, and the replacement member is introduced after the lid member 122 is fixed to the mating portion 132 with a fastening member (not shown).
- the above operation can be executed while the operation of the electron optical column 2 is continued. Therefore, the scanning electron microscope of this embodiment can start observation quickly after exchanging the sample.
- FIG. 4 shows an overall configuration diagram of the scanning electron microscope of the present example in a state where it is used as a high vacuum SEM.
- the control system is the same as in FIG. FIG. 4 shows a position where the gas supply pipe 100 and the pressure adjustment valve 104 are attached after the gas supply pipe 100 and the pressure adjustment valve 104 are removed from the cover member 122 with the lid member 122 fixed to the second casing 121.
- 2 shows a scanning electron microscope in a state where is covered with a lid member 130.
- the first space 11 and the second space 12 can be connected, and the inside of the second casing can be connected by the vacuum pump 4. It becomes possible to evacuate. As a result, high vacuum SEM observation is possible with the second housing 121 attached.
- the entire second housing 121 with the thin film holding member 47 attached may be removed and the lid member 122 fixed directly to the mating surface of the first housing 7. Good.
- the first space 11 and the second space 12 can be connected, and the inside of the second housing can be evacuated by the vacuum pump 4.
- This configuration is the same as that of a general SEM apparatus.
- the sample stage 5 and its operation knobs 108 and 109, the gas supply pipe 100, and the pressure adjustment valve 104 are all attached to the lid member 122 in a collective manner. Therefore, the apparatus user can perform the operation of the operation knobs 108 and 109, the sample replacement work, or the detachment work of the gas supply pipe 100 and the pressure regulating valve 104 on the same surface of the first housing. Therefore, the operability is greatly improved as compared with a scanning electron microscope having a configuration in which the above-described components are separately attached to the other surfaces of the sample chamber.
- FIG. 5 shows a flowchart showing the operation flow of the scanning electron microscope of the present embodiment.
- the first space is evacuated. It may be evacuated in advance.
- the sample 6 is placed on the sample stage on the sample stage 5 and mounted on the sample stage 5.
- the lid member 122 is introduced into the second housing and fastened to the apparatus main body (second housing).
- the gas control valve 101 is opened for a certain time and then closed to introduce a replacement gas such as helium gas into the second space.
- the operating condition of the electron optical column is adjusted to emit an electron beam.
- image acquisition is started.
- the lid member 122 is removed.
- the lid member 122 may be removed after the pressure adjustment valve is opened and the replacement gas is discharged.
- the sample is removed. When it is desired to observe another sample, the process returns to the second step 71.
- the second space can be not only introduced with the replacement gas up to the atmospheric pressure state but also in a low vacuum state or a vacuum state in which the replacement gas is introduced a little.
- the fourth step 73 is performed. Then, the flow rate of the replacement gas or vacuum evacuation may be performed.
- the flow shown in FIG. 5 is an example of the operation, and the order may be changed as appropriate.
- FIG. 6 shows an example of an operation screen displayed on the monitor of the personal computer 35.
- the operation screen shown in FIG. 6 for example, the operation window 50, the image display unit 51, the image observation start button 52 for starting the emission of the electron beam and starting the image display, and the emission of the electron beam are stopped and the image is displayed.
- An image observation stop button 53 for stopping display for stopping display, a focus adjustment button 54 for adjusting an optical lens such as a deflection lens and an objective lens, and executing a focus, a brightness adjustment button 55 for adjusting the brightness of an image, and a contrast.
- a button 58 When the evacuation button 57 is clicked on the screen, evacuation is started, and when it is clicked again, evacuation is stopped.
- the operation of the air leak button 58 is the same.
- the processing executed by the above button operation can also be executed manually by operating a mechanical button or knob on the apparatus main body.
- the SEM image display button 114 for displaying the image captured in step S1 on the image display unit 51 and the camera button 115 for displaying the acquired image of the camera 106 are displayed. If the simultaneous display button 116 is clicked, both the SEM image and the camera image can be displayed on the image display unit 51, which is particularly effective when adjusting the height of the sample 6.
- a gas discharge time setting screen 117 for setting a gas discharge duration from when gas discharge is started to when it is stopped may be displayed on the child window 118. Further, the time from when the gas is released to when the gas is stopped is not set by the user of the apparatus, but a time preset in the apparatus may be used.
- the other window 118 shown in FIG. 7 is displayed, and a check mark is put in the check box 119 in advance.
- the gas control valve 101 is automatically opened and the introduction of the replacement gas is started. Thereafter, when the time set on the gas discharge time setting screen 117 has elapsed, the gas control valve 101 is automatically closed. Even when the image observation stop button 53 is clicked during the introduction of the replacement gas, the gas control valve 101 is also automatically closed.
- the image displayed on the image display unit 51 can be switched according to the type of the selected image.
- the opening / closing control of the gas control valve 101 described above is executed by the lower control unit 37 based on the setting information in the personal computer 35 transmitted from the upper control unit.
- FIG. 8 shows an example of an operation screen when a rough exhaust port or a three-way valve is provided in the lid member 122 or the second casing 121.
- the evacuation start / stop buttons for the first space and the second space are displayed separately.
- the vacuum exhaust button 59 for the second space is clicked, the vacuum valve provided in the rough exhaust port is opened, and the vacuum exhaust of the second space is started. If clicked again, the vacuum valve of the rough exhaust port closes and the vacuum exhaust stops.
- the atmospheric leak button 60 for the second space is clicked, the leak valve attached to the three-way valve is opened and the second space is opened to the atmosphere. If clicked again, the leak valve closes and the release of the space 2 into the atmosphere stops.
- a contact monitor that detects the contact state between the second casing 121 and the lid member 122 may be provided to monitor whether the second space is closed or open.
- an X-ray detector and a photodetector may be provided so that EDS analysis and fluorescent light detection can be performed.
- the arrangement of the X-ray detector and the photodetector may be either the first space 11 or the second space 12.
- an absorption current flows through the sample. Therefore, an ammeter may be provided so that the current flowing through the sample 6 or the sample stage can be measured. Thereby, an absorption current image (or an image using absorption electrons) can be acquired. Further, a transmission electron detector may be disposed below the sample stage so that a scanning transmission (STEM) image can be acquired.
- the sample stage itself may be a detector.
- a high voltage may be applied to the sample stage 5.
- the electrons emitted from the sample 6 can have high energy, the signal amount can be increased, and the image S / N is improved.
- the configuration of the present embodiment can be applied to a small electron beam drawing apparatus.
- the detector 3 is not always necessary.
- an atmospheric pressure SEM that can be used as a high vacuum SEM is realized in addition to the effects of the first embodiment.
- the scanning electron microscope of the present embodiment can acquire an image having a better S / N than the charged particle microscope of the first embodiment.
- the present Example demonstrated the structural example which intended the desktop electron microscope
- this Example can also be applied to a large sized scanning electron microscope.
- the entire apparatus or charged particle optical column is supported on the apparatus installation surface by a housing.
- the entire apparatus may be placed on a pedestal. If the first casing 7 is placed on a gantry, the configuration described in this embodiment can be used as it is for a large scanning electron microscope.
- FIG. 9 the whole structure of the charged particle microscope of a present Example is shown. Since the control system is the same as that of the second embodiment, the illustration is omitted, and only the main part of the apparatus is shown.
- the sample stage 5 is directly fixed to the bottom surface of the second casing 121.
- the gas supply pipe 100 may or may not be fixed to the second casing 121. According to this configuration, since the sample is allowed to protrude outside the apparatus, it is possible to observe a sample having a size larger than that of the configuration of the second embodiment including the lid member 122.
- FIG. 10 the whole structure of the charged particle microscope of a present Example is shown.
- FIG. 10 only the main part of the apparatus is shown in FIG. In this configuration, a vacuum sealing member 128 for vacuum-sealing the first space 11 and the second space 12 is necessary.
- the mating portion 132 of the second housing is inside the device, the size of the entire device can be made smaller than the configurations of the first to third embodiments.
- FIG. 11 shows the overall configuration of the charged particle microscope of this example.
- a pan-type attachment (second housing 121) is used to fit the attachment into the first housing 7 from above, and further, the electro-optic lens barrel 2 is fitted from above.
- the second casing 121 is vacuum-sealed with respect to the electron optical column 2 by a vacuum sealing member 123, and the second casing 121 is vacuum-protected against the first casing 7 with a vacuum sealing member 129. Sealed.
- the volume of the second space 11 can be increased as compared with FIG. 2, and a larger sample can be arranged than the configuration of the second embodiment.
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Abstract
Description
1 光学レンズ
2 電子光学(荷電粒子光学)鏡筒
3 検出器
4 真空ポンプ
5 試料ステージ
6 試料
7 第1の筐体
10 薄膜
11 第1の空間
12 第2の空間
14 リークバルブ
16 真空配管
18 支柱
19 板部材用支持部材
20 底板
35 パソコン
36 上位制御部
37 下位制御部
43,44 通信線
47 薄膜保持部材
50 操作用ウィンドウ
51 画像表示部
52 画像観察開始ボタン
53 画像観察停止ボタン
54 焦点調整ボタン
55 明るさ調整ボタン
56 コントラスト調整ボタン
57,59 真空排気ボタン
58,60 大気リークボタン
100 ガス供給管
101 ガス制御用バルブ
102 連結部
103 ガスボンベ
104 圧力調整弁
105 制限部材
106 カメラ
107 支持板
108,109 操作つまみ
112 ガス放出開始ボタン
113 ガス放出停止ボタン
114 SEM画像表示ボタン
115 カメラボタン
116 同時表示ボタン
117 ガス放出時間設定画面
118 子ウィンドウ
119 ガス放出実行チェックボックス
120 OKボタン
121 第2の筐体
122,130 蓋部材
123,124,125,126,128,129 真空封止部材
131 本体部
132 合わせ部
Claims (23)
- 一次荷電粒子線を試料上に走査する荷電粒子光学鏡筒と、前記走査により得られる反射電子あるいは二次電子を検出する検出器と、真空ポンプとを備える荷電粒子線装置において、
前記荷電粒子線装置全体を装置設置面に対して支持され、内部が前記真空ポンプにより真空排気される第1の筐体と、
当該第1の筐体の側面または内壁面あるいは前記荷電粒子光学鏡筒に位置が固定される、前記試料を内部に格納する第2の筐体と、
当該第2の筐体の上面側に設けられる、前記一次荷電粒子線を透過あるいは通過させる薄膜とを備え、
前記第2の筐体内部の圧力を、前記第1の筐体内部の圧力よりも高い状態に維持できることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記第2の筐体内部の雰囲気を置換するための置換ガスを導入するガス導入部を備えたことを特徴とする荷電粒子線装置。 - 請求項2に記載の荷電粒子線装置において、
前記第2の筐体内部の圧力を調整するための圧力調整弁を備え、
前記第2の筐体内部の圧力が所定値よりも高くなった場合に前記圧力調整弁が開くことにより、前記第2の筐体内部が減圧されることを特徴とする荷電粒子線装置。 - 請求項3に記載の荷電粒子線装置において、
前記第2の筐体の形状が一つの側面が開放された直方体形状であり、
前記ガス導入部または前記圧力調整弁が固定される、当該直方体の開放面を蓋う蓋部材を備えたことを特徴とする荷電粒子線装置。 - 請求項2に記載の荷電粒子線装置において、
前記置換ガスがヘリウムガスを含む軽元素ガスであることを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置において、
前記ガス導入部の前記板部材での取り付け位置が、前記圧力調整弁の前記板部材での取り付け位置よりも下に配置されたことを特徴とする荷電粒子線装置。 - 請求項6に記載の荷電粒子線装置において、
前記圧力調整弁に替えて開口部が設けられたことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置において、
前記第2の筐体または前記板部材は、前記第2の筐体の内部圧力を調整するための真空ポンプが接続される粗排気ポートを備えることを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置において、
前記板部材は、前記第2の筐体の側面に対して脱着可能に固定されることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記薄膜が、当該薄膜を保持する薄膜保持部材を介して前記第2の筐体に脱着可能に固定され、
前記薄膜保持部材を前記第2の筐体から取り外すことにより、前記第1の筐体および第2の筐体内部を真空排気可能なことを特徴とする荷電粒子線装置。 - 請求項10に記載の荷電粒子線装置において、
前記薄膜を保持する薄膜保持部材が、前記第2の筐体内部の天井面に固定されることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記第2の筐体の底面に固定された、前記試料を面内方向あるいは高さ方向に移動する試料ステージを備えたことを特徴とする荷電粒子線装置。 - 請求項4に記載の荷電粒子線装置において、
前記板部材に固定された、前記試料を面内方向あるいは高さ方向に移動可能な試料ステージを備えたことを特徴とする荷電粒子線装置。 - 請求項10に記載の荷電粒子線装置において、
前記薄膜保持部が、前記試料が前記薄膜に接近しすぎないように試料と薄膜間の距離を制限する制限部材を備えることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記薄膜と前記試料の間隔を観察可能な観察装置を備えることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記試料への前記荷電粒子線の走査によって放出されるイオン,電子,光子,X線のいずれか一つ以上を検出するための検出器、あるいは前記荷電粒子線の照射によって得られる透過電子を検出する検出器が、前記第1の筐体内または第2の筐体内に配置されることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記第2の筐体内に備えられた、前記試料への前記荷電粒子線の走査によって前記試料に流れ込む電子または電流を検出できる試料台を有することを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記第1の筐体または第2の筐体内部の圧力、雰囲気の少なくとも一方の制御条件を設定する操作画面が表示されるモニタを備えることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記薄膜の厚みが20μm以下であることを特徴とする荷電粒子線装置。 - 請求項1に記載の荷電粒子線装置において、
前記薄膜が、前記一次荷電粒子線が通過するための、面積1mm2以下の貫通孔を備えることを特徴とする荷電粒子線装置。 - 一次荷電粒子線を試料上に走査する荷電粒子光学鏡筒と、前記走査により得られる反射電子あるいは二次電子を検出する検出器と、真空ポンプとを備える荷電粒子線装置において、
前記荷電粒子光学鏡筒を装置設置面に対して支持し、内部が前記真空ポンプにより真空排気される筐体部と、
内部の圧力を前記筐体部の圧力よりも高い状態に維持しつつ前記試料を格納できるアタッチメントとを備え、
前記アタッチメントは、前記一次荷電粒子線をアタッチメント内部に透過あるいは通過させる薄膜を保持し、
更に前記アタッチメントは、前記筐体部の側壁面または内壁面あるいは前記荷電粒子光学鏡筒に真空シールされて固定されることを特徴とする荷電粒子線装置。 - 内部が真空排気された荷電粒子光学鏡筒から放出される荷電粒子線を、薄膜を介して大気圧状態に維持された試料に照射し、得られる二次荷電粒子を検出して前記試料上の荷電粒子線の照射位置の画像を取得する観察方法において、
前記荷電粒子光学鏡筒を装置設置面に対して支持する筐体によって形成される第1の空間内を前記荷電粒子線を通過させ、
前記第1の空間に対し当該第1の空間の側面から挿入され、内部圧力が前記荷電粒子光学鏡筒内の圧力よりも高い状態に維持されたアタッチメント内に前記試料を格納し、
前記薄膜を介して前記アタッチメント内の試料に前記荷電粒子線を照射する観察方法。 - 請求項21に記載の観察方法において、
前記アタッチメント内部をヘリウムガスで置換することを特徴とする観察方法。
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014038287A1 (ja) * | 2012-09-05 | 2014-03-13 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 |
WO2014080987A1 (ja) * | 2012-11-21 | 2014-05-30 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、試料台ユニット、及び試料観察方法 |
WO2014192361A1 (ja) * | 2013-05-30 | 2014-12-04 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置、試料観察方法 |
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Publication number | Priority date | Publication date | Assignee | Title |
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KR101524215B1 (ko) * | 2013-11-29 | 2015-05-29 | (주)코셈 | 전자현미경 |
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WO2015130964A1 (en) | 2014-02-28 | 2015-09-03 | Gilead Sciences, Inc. | Therapeutic compounds |
WO2016035493A1 (ja) * | 2014-09-05 | 2016-03-10 | 株式会社 日立ハイテクノロジーズ | 電子線装置および電子線装置用ガス供給装置 |
JP6383650B2 (ja) | 2014-11-28 | 2018-08-29 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
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WO2016174921A1 (ja) * | 2015-04-28 | 2016-11-03 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、設置方法 |
US10141157B2 (en) | 2015-06-29 | 2018-11-27 | Hitachi High-Technologies Corporation | Method for adjusting height of sample and observation system |
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JP6118870B2 (ja) * | 2015-10-07 | 2017-04-19 | 株式会社日立ハイテクノロジーズ | 試料観察方法 |
EP3171163B1 (en) * | 2015-11-18 | 2022-05-04 | FEI Company | X-ray imaging technique |
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EP3615947A4 (en) * | 2017-04-24 | 2021-01-13 | Molecular Vista Inc. | FORCE MICROSCOPE WITH HELIUM ATMOSPHERE |
JP6500143B2 (ja) * | 2018-03-23 | 2019-04-10 | 株式会社日立ハイテクノロジーズ | 試料観察方法 |
JP6808691B2 (ja) * | 2018-08-09 | 2021-01-06 | 日本電子株式会社 | 試料搬送装置及び電子顕微鏡 |
JP7218381B2 (ja) | 2018-10-25 | 2023-02-06 | 株式会社日立ハイテク | 荷電粒子線装置、荷電粒子線装置のオートフォーカス処理方法、及び検出器 |
WO2022264809A1 (ja) * | 2021-06-14 | 2022-12-22 | NanoSuit株式会社 | イムノクロマトテストストリップの検査装置および検査方法、ならびに検査システム |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004158364A (ja) * | 2002-11-08 | 2004-06-03 | Keyence Corp | 電子顕微鏡、電子顕微鏡の操作方法、電子顕微鏡の操作プログラムおよびコンピュータで読み取り可能な記録媒体 |
JP2005175042A (ja) * | 2003-12-09 | 2005-06-30 | Sony Corp | 異物検査装置および異物検査方法 |
JP2006179751A (ja) * | 2004-12-24 | 2006-07-06 | Nsk Ltd | 駆動装置 |
JP2006318903A (ja) * | 2005-05-09 | 2006-11-24 | Lee Bing Huan | 真空または低圧環境下で気体の操作および観察を可能にする装置 |
JP2008192616A (ja) * | 2007-02-05 | 2008-08-21 | Fei Co | 粒子ビーム及び光を用いる顕微鏡で試料を観察する装置 |
JP2009245944A (ja) * | 2008-03-28 | 2009-10-22 | Fei Co | 粒子光学装置用環境セル |
JP2010509709A (ja) * | 2006-10-24 | 2010-03-25 | ビー・ナノ・リミテッド | インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡 |
WO2010092747A1 (ja) * | 2009-02-16 | 2010-08-19 | 株式会社 日立ハイテクノロジーズ | 電子線装置および電子線装置用試料保持装置 |
JP2011014414A (ja) * | 2009-07-03 | 2011-01-20 | Hitachi High-Technologies Corp | 荷電粒子線装置及び荷電粒子線画像を安定に取得する方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5142461A (ja) * | 1974-10-09 | 1976-04-10 | Ryoji Takahashi | |
KR100885940B1 (ko) * | 2000-06-27 | 2009-02-26 | 가부시키가이샤 에바라 세이사꾸쇼 | 하전입자선에 의한 검사장치 및 그 검사장치를 사용한장치제조방법 |
US7241993B2 (en) * | 2000-06-27 | 2007-07-10 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
EP1339100A1 (en) * | 2000-12-01 | 2003-08-27 | Ebara Corporation | Inspection method and apparatus using electron beam, and device production method using it |
WO2002045125A1 (en) | 2000-12-01 | 2002-06-06 | Yeda Research And Development Co. Ltd. | Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope |
JP2006147430A (ja) | 2004-11-22 | 2006-06-08 | Hokkaido Univ | 電子顕微鏡 |
JP4319636B2 (ja) * | 2005-03-16 | 2009-08-26 | 株式会社日立ハイテクノロジーズ | 低真空走査電子顕微鏡 |
CN101461026B (zh) * | 2006-06-07 | 2012-01-18 | Fei公司 | 与包含真空室的装置一起使用的滑动轴承 |
JP5253800B2 (ja) * | 2007-12-26 | 2013-07-31 | 日本電子株式会社 | 試料保持体及び観察・検査方法並びに観察・検査装置 |
US8334510B2 (en) | 2008-07-03 | 2012-12-18 | B-Nano Ltd. | Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment |
JP2010230417A (ja) | 2009-03-26 | 2010-10-14 | Jeol Ltd | 試料の検査装置及び検査方法 |
JP5699023B2 (ja) * | 2011-04-11 | 2015-04-08 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
JP5707286B2 (ja) * | 2011-09-21 | 2015-04-30 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、荷電粒子線装置の調整方法、および試料の検査若しくは試料の観察方法。 |
JP5825964B2 (ja) * | 2011-10-05 | 2015-12-02 | 株式会社日立ハイテクノロジーズ | 検査又は観察装置及び試料の検査又は観察方法 |
-
2011
- 2011-04-11 JP JP2011086904A patent/JP5699023B2/ja active Active
-
2012
- 2012-03-02 CN CN201280017689.8A patent/CN103477415B/zh active Active
- 2012-03-02 US US14/111,174 patent/US8710439B2/en active Active
- 2012-03-02 KR KR1020147027512A patent/KR101519315B1/ko active IP Right Grant
- 2012-03-02 KR KR1020147032861A patent/KR101688293B1/ko active IP Right Grant
- 2012-03-02 KR KR1020137026494A patent/KR101519283B1/ko active IP Right Grant
- 2012-03-02 WO PCT/JP2012/001431 patent/WO2012140822A1/ja active Application Filing
- 2012-03-02 DE DE112012001214.3T patent/DE112012001214B4/de active Active
-
2014
- 2014-02-27 US US14/191,769 patent/US8921786B2/en active Active
- 2014-11-24 US US14/552,477 patent/US9105442B2/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004158364A (ja) * | 2002-11-08 | 2004-06-03 | Keyence Corp | 電子顕微鏡、電子顕微鏡の操作方法、電子顕微鏡の操作プログラムおよびコンピュータで読み取り可能な記録媒体 |
JP2005175042A (ja) * | 2003-12-09 | 2005-06-30 | Sony Corp | 異物検査装置および異物検査方法 |
JP2006179751A (ja) * | 2004-12-24 | 2006-07-06 | Nsk Ltd | 駆動装置 |
JP2006318903A (ja) * | 2005-05-09 | 2006-11-24 | Lee Bing Huan | 真空または低圧環境下で気体の操作および観察を可能にする装置 |
JP2010509709A (ja) * | 2006-10-24 | 2010-03-25 | ビー・ナノ・リミテッド | インターフェース、非真空環境内で物体を観察する方法、および走査型電子顕微鏡 |
JP2008192616A (ja) * | 2007-02-05 | 2008-08-21 | Fei Co | 粒子ビーム及び光を用いる顕微鏡で試料を観察する装置 |
JP2009245944A (ja) * | 2008-03-28 | 2009-10-22 | Fei Co | 粒子光学装置用環境セル |
WO2010092747A1 (ja) * | 2009-02-16 | 2010-08-19 | 株式会社 日立ハイテクノロジーズ | 電子線装置および電子線装置用試料保持装置 |
JP2011014414A (ja) * | 2009-07-03 | 2011-01-20 | Hitachi High-Technologies Corp | 荷電粒子線装置及び荷電粒子線画像を安定に取得する方法 |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2014038287A1 (ja) * | 2012-09-05 | 2014-03-13 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材 |
WO2014080987A1 (ja) * | 2012-11-21 | 2014-05-30 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、試料台ユニット、及び試料観察方法 |
JP2014103014A (ja) * | 2012-11-21 | 2014-06-05 | Hitachi High-Technologies Corp | 荷電粒子線装置、試料台ユニット、及び試料観察方法 |
US9472375B2 (en) | 2012-11-21 | 2016-10-18 | Hitachi High-Technologies Corporation | Charged particle beam device, sample stage unit, and sample observation method |
WO2014192361A1 (ja) * | 2013-05-30 | 2014-12-04 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置、試料観察方法 |
CN105247650A (zh) * | 2013-05-30 | 2016-01-13 | 株式会社日立高新技术 | 带电粒子束装置、试样观察方法 |
US9466460B2 (en) | 2013-05-30 | 2016-10-11 | Hitachi High-Technologies Corporation | Charged particle-beam device and specimen observation method |
JPWO2014192361A1 (ja) * | 2013-05-30 | 2017-02-23 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置、試料観察方法 |
CN105493224A (zh) * | 2013-08-23 | 2016-04-13 | 株式会社日立高新技术 | 隔膜安装部件及带电粒子线装置 |
CN105493224B (zh) * | 2013-08-23 | 2017-06-06 | 株式会社日立高新技术 | 隔膜安装部件及带电粒子线装置 |
CN105830193A (zh) * | 2013-09-26 | 2016-08-03 | 株式会社日立高新技术 | 电子显微镜 |
Also Published As
Publication number | Publication date |
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DE112012001214T5 (de) | 2014-01-30 |
KR20130135341A (ko) | 2013-12-10 |
KR101519283B1 (ko) | 2015-05-11 |
US9105442B2 (en) | 2015-08-11 |
US8710439B2 (en) | 2014-04-29 |
DE112012001214B4 (de) | 2022-02-10 |
KR20140143462A (ko) | 2014-12-16 |
US20140175278A1 (en) | 2014-06-26 |
JP5699023B2 (ja) | 2015-04-08 |
JP2012221766A (ja) | 2012-11-12 |
US8921786B2 (en) | 2014-12-30 |
US20140021347A1 (en) | 2014-01-23 |
US20150076347A1 (en) | 2015-03-19 |
CN103477415A (zh) | 2013-12-25 |
KR101519315B1 (ko) | 2015-05-11 |
KR20140130531A (ko) | 2014-11-10 |
CN103477415B (zh) | 2016-10-12 |
KR101688293B1 (ko) | 2016-12-20 |
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