DE112012001214B4 - Ladungsteilchenstrahlvorrichtung und betrachtungsverfahren mit einem ladungsteilchenstrahl - Google Patents

Ladungsteilchenstrahlvorrichtung und betrachtungsverfahren mit einem ladungsteilchenstrahl Download PDF

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Publication number
DE112012001214B4
DE112012001214B4 DE112012001214.3T DE112012001214T DE112012001214B4 DE 112012001214 B4 DE112012001214 B4 DE 112012001214B4 DE 112012001214 T DE112012001214 T DE 112012001214T DE 112012001214 B4 DE112012001214 B4 DE 112012001214B4
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Prior art keywords
charged particle
housing
particle beam
sample
beam device
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DE112012001214.3T
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German (de)
English (en)
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DE112012001214T5 (de
Inventor
Tomohisa Ohtaki
Sukehiro Ito
Yusuke Ominami
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Hitachi High Tech Corp
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Hitachi High Tech Corp
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H01J37/185—Means for transferring objects between different enclosures of different pressure or atmosphere
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/182—Obtaining or maintaining desired pressure
    • H01J2237/1825—Evacuating means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE112012001214.3T 2011-04-11 2012-03-02 Ladungsteilchenstrahlvorrichtung und betrachtungsverfahren mit einem ladungsteilchenstrahl Active DE112012001214B4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011-086904 2011-04-11
JP2011086904A JP5699023B2 (ja) 2011-04-11 2011-04-11 荷電粒子線装置
PCT/JP2012/001431 WO2012140822A1 (ja) 2011-04-11 2012-03-02 荷電粒子線装置

Publications (2)

Publication Number Publication Date
DE112012001214T5 DE112012001214T5 (de) 2014-01-30
DE112012001214B4 true DE112012001214B4 (de) 2022-02-10

Family

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DE112012001214.3T Active DE112012001214B4 (de) 2011-04-11 2012-03-02 Ladungsteilchenstrahlvorrichtung und betrachtungsverfahren mit einem ladungsteilchenstrahl

Country Status (6)

Country Link
US (3) US8710439B2 (enExample)
JP (1) JP5699023B2 (enExample)
KR (3) KR101519315B1 (enExample)
CN (1) CN103477415B (enExample)
DE (1) DE112012001214B4 (enExample)
WO (1) WO2012140822A1 (enExample)

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JP5699023B2 (ja) * 2011-04-11 2015-04-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5923412B2 (ja) * 2012-08-24 2016-05-24 株式会社日立ハイテクノロジーズ 観察装置および光軸調整方法
GB2505517B (en) * 2012-09-04 2017-08-09 Restranaut Ltd System for monitoring evacuation of a facility
JP2014053073A (ja) * 2012-09-05 2014-03-20 Hitachi High-Technologies Corp 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
JP5909431B2 (ja) * 2012-09-27 2016-04-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6051014B2 (ja) * 2012-10-29 2016-12-21 株式会社日立ハイテクノロジーズ 試料格納用容器、荷電粒子線装置、及び画像取得方法
JP6035602B2 (ja) * 2012-11-21 2016-11-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料台ユニット、及び試料観察方法
JP6309195B2 (ja) * 2013-02-18 2018-04-11 株式会社ホロン 走査型電子顕微鏡および検査装置
US9466460B2 (en) 2013-05-30 2016-10-11 Hitachi High-Technologies Corporation Charged particle-beam device and specimen observation method
CN105493224B (zh) * 2013-08-23 2017-06-06 株式会社日立高新技术 隔膜安装部件及带电粒子线装置
KR101752164B1 (ko) 2013-09-06 2017-06-29 가부시키가이샤 히다치 하이테크놀로지즈 하전 입자선 장치 및 시료 화상 취득 방법
JP6117070B2 (ja) * 2013-09-26 2017-04-19 株式会社日立ハイテクノロジーズ 電子顕微鏡
US9881769B2 (en) * 2013-10-08 2018-01-30 Hitachi High-Technologies Corporation Charged particle beam device and charged particle beam device control method
KR101524215B1 (ko) * 2013-11-29 2015-05-29 (주)코셈 전자현미경
JP6047508B2 (ja) * 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6302702B2 (ja) 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
US10202353B2 (en) 2014-02-28 2019-02-12 Gilead Sciences, Inc. Therapeutic compounds
JP6307622B2 (ja) * 2014-09-05 2018-04-04 株式会社日立ハイテクノロジーズ 電子線装置および電子線装置用ガス供給装置
JP6383650B2 (ja) * 2014-11-28 2018-08-29 株式会社日立ハイテクノロジーズ 荷電粒子線装置
CN107110799A (zh) * 2014-12-22 2017-08-29 应用材料公司 用于检查基板的设备、用于检查基板的方法、大面积基板检查设备及其操作方法
JP6407411B2 (ja) * 2015-04-15 2018-10-17 株式会社日立ハイテクノロジーズ 荷電粒子線装置、およびその真空排気方法
CN106537552B (zh) * 2015-04-28 2018-11-06 株式会社日立高新技术 带电粒子射线装置、设置方法
JP6419965B2 (ja) * 2015-06-29 2018-11-07 株式会社日立ハイテクノロジーズ 試料高さ調整方法及び観察システム
US10431416B2 (en) 2015-08-21 2019-10-01 Hitachi High-Technologies Corporation Observation support unit for charged particle microscope and sample observation method using same
JP6118870B2 (ja) * 2015-10-07 2017-04-19 株式会社日立ハイテクノロジーズ 試料観察方法
EP3171163B1 (en) * 2015-11-18 2022-05-04 FEI Company X-ray imaging technique
CN106783493B (zh) * 2016-12-01 2018-07-10 聚束科技（北京）有限公司 一种真空气氛处理装置、样品观测系统及方法
JP6928943B2 (ja) * 2017-03-28 2021-09-01 株式会社日立ハイテクサイエンス 荷電粒子ビーム装置
US10942199B2 (en) * 2017-04-24 2021-03-09 Molecular Vista, Inc. Force microscope with helium atmosphere
JP6500143B2 (ja) * 2018-03-23 2019-04-10 株式会社日立ハイテクノロジーズ 試料観察方法
JP6808691B2 (ja) * 2018-08-09 2021-01-06 日本電子株式会社 試料搬送装置及び電子顕微鏡
WO2020084729A1 (ja) 2018-10-25 2020-04-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置、荷電粒子線装置のオートフォーカス処理方法、及び検出器
JP7210761B2 (ja) * 2019-10-10 2023-01-23 株式会社日立ハイテク 試料ホルダ、膜間距離調整機構、および荷電粒子線装置
JP7430909B2 (ja) * 2020-08-19 2024-02-14 株式会社ブイ・テクノロジー 集束イオンビーム装置
JPWO2022264809A1 (enExample) * 2021-06-14 2022-12-22
CN120637188B (zh) * 2025-08-14 2025-11-04 深圳市中图仪器股份有限公司 扫描电镜

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US20090166536A1 (en) 2007-12-26 2009-07-02 Jeol Ltd. Sample Holder, Method for Observation and Inspection, and Apparatus for Observation and Inspection
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WO2010001399A1 (en) 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
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US20040046120A1 (en) 2000-12-01 2004-03-11 Yeda Research And Development Co., Ltd. Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope
US20090166536A1 (en) 2007-12-26 2009-07-02 Jeol Ltd. Sample Holder, Method for Observation and Inspection, and Apparatus for Observation and Inspection
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US20100243888A1 (en) 2009-03-26 2010-09-30 Jeol Ltd. Apparatus and Method for Inspecting Samples

Also Published As

Publication number Publication date
KR20130135341A (ko) 2013-12-10
WO2012140822A1 (ja) 2012-10-18
KR20140143462A (ko) 2014-12-16
CN103477415A (zh) 2013-12-25
US20140175278A1 (en) 2014-06-26
JP2012221766A (ja) 2012-11-12
US8710439B2 (en) 2014-04-29
DE112012001214T5 (de) 2014-01-30
KR101519315B1 (ko) 2015-05-11
KR101688293B1 (ko) 2016-12-20
US8921786B2 (en) 2014-12-30
US20150076347A1 (en) 2015-03-19
CN103477415B (zh) 2016-10-12
US9105442B2 (en) 2015-08-11
KR101519283B1 (ko) 2015-05-11
US20140021347A1 (en) 2014-01-23
KR20140130531A (ko) 2014-11-10
JP5699023B2 (ja) 2015-04-08

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