JP5677115B2 - 半導体装置 - Google Patents

半導体装置 Download PDF

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Publication number
JP5677115B2
JP5677115B2 JP2011024241A JP2011024241A JP5677115B2 JP 5677115 B2 JP5677115 B2 JP 5677115B2 JP 2011024241 A JP2011024241 A JP 2011024241A JP 2011024241 A JP2011024241 A JP 2011024241A JP 5677115 B2 JP5677115 B2 JP 5677115B2
Authority
JP
Japan
Prior art keywords
metal film
film
semiconductor device
modulus
young
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2011024241A
Other languages
English (en)
Japanese (ja)
Other versions
JP2012164825A (ja
JP2012164825A5 (enExample
Inventor
山本　祐広
祐広 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP2011024241A priority Critical patent/JP5677115B2/ja
Priority to US13/362,678 priority patent/US20120199977A1/en
Priority to KR1020120011285A priority patent/KR101903188B1/ko
Priority to TW101103779A priority patent/TW201304011A/zh
Priority to CN201210026493.7A priority patent/CN102629568B/zh
Publication of JP2012164825A publication Critical patent/JP2012164825A/ja
Publication of JP2012164825A5 publication Critical patent/JP2012164825A5/ja
Application granted granted Critical
Publication of JP5677115B2 publication Critical patent/JP5677115B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/59—Bond pads specially adapted therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/921—Structures or relative sizes of bond pads
    • H10W72/923—Bond pads having multiple stacked layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/951—Materials of bond pads
    • H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/981—Auxiliary members, e.g. spacers
    • H10W72/983—Reinforcing structures, e.g. collars

Landscapes

  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Wire Bonding (AREA)
JP2011024241A 2011-02-07 2011-02-07 半導体装置 Expired - Fee Related JP5677115B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2011024241A JP5677115B2 (ja) 2011-02-07 2011-02-07 半導体装置
US13/362,678 US20120199977A1 (en) 2011-02-07 2012-01-31 Semiconductor device
KR1020120011285A KR101903188B1 (ko) 2011-02-07 2012-02-03 반도체 장치
TW101103779A TW201304011A (zh) 2011-02-07 2012-02-06 半導體裝置
CN201210026493.7A CN102629568B (zh) 2011-02-07 2012-02-07 半导体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011024241A JP5677115B2 (ja) 2011-02-07 2011-02-07 半導体装置

Publications (3)

Publication Number Publication Date
JP2012164825A JP2012164825A (ja) 2012-08-30
JP2012164825A5 JP2012164825A5 (enExample) 2014-01-30
JP5677115B2 true JP5677115B2 (ja) 2015-02-25

Family

ID=46587796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011024241A Expired - Fee Related JP5677115B2 (ja) 2011-02-07 2011-02-07 半導体装置

Country Status (5)

Country Link
US (1) US20120199977A1 (enExample)
JP (1) JP5677115B2 (enExample)
KR (1) KR101903188B1 (enExample)
CN (1) CN102629568B (enExample)
TW (1) TW201304011A (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5772926B2 (ja) 2013-01-07 2015-09-02 株式会社デンソー 半導体装置
JP2016143804A (ja) * 2015-02-03 2016-08-08 トヨタ自動車株式会社 半導体装置
JP2017224753A (ja) * 2016-06-16 2017-12-21 セイコーエプソン株式会社 半導体装置及びその製造方法
JP6897141B2 (ja) 2017-02-15 2021-06-30 株式会社デンソー 半導体装置とその製造方法
JP2018186144A (ja) 2017-04-25 2018-11-22 株式会社村田製作所 半導体装置及びパワーアンプモジュール

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09330928A (ja) * 1996-06-13 1997-12-22 Toshiba Corp 配線層の形成方法
JP2005019493A (ja) * 2003-06-24 2005-01-20 Renesas Technology Corp 半導体装置
US6960836B2 (en) * 2003-09-30 2005-11-01 Agere Systems, Inc. Reinforced bond pad
US20050215048A1 (en) 2004-03-23 2005-09-29 Lei Li Structure and method for contact pads having an overcoat-protected bondable metal plug over copper-metallized integrated circuits
US7741714B2 (en) * 2004-11-02 2010-06-22 Taiwan Semiconductor Manufacturing Co., Ltd. Bond pad structure with stress-buffering layer capping interconnection metal layer
US7656045B2 (en) * 2006-02-23 2010-02-02 Freescale Semiconductor, Inc. Cap layer for an aluminum copper bond pad
TWI316295B (en) * 2006-05-17 2009-10-21 Au Optronics Corp Thin film transistor
JP2009016619A (ja) * 2007-07-05 2009-01-22 Denso Corp 半導体装置及びその製造方法
US8178980B2 (en) * 2008-02-05 2012-05-15 Taiwan Semiconductor Manufacturing Company, Ltd. Bond pad structure
US8030780B2 (en) * 2008-10-16 2011-10-04 Micron Technology, Inc. Semiconductor substrates with unitary vias and via terminals, and associated systems and methods
US8202741B2 (en) * 2009-03-04 2012-06-19 Koninklijke Philips Electronics N.V. Method of bonding a semiconductor device using a compliant bonding structure

Also Published As

Publication number Publication date
CN102629568B (zh) 2016-05-04
TW201304011A (zh) 2013-01-16
KR101903188B1 (ko) 2018-10-01
KR20120090827A (ko) 2012-08-17
CN102629568A (zh) 2012-08-08
US20120199977A1 (en) 2012-08-09
JP2012164825A (ja) 2012-08-30

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