JP5663162B2 - ポリマーフィルム表面相互作用を変えるためのプロセス及び方法 - Google Patents

ポリマーフィルム表面相互作用を変えるためのプロセス及び方法 Download PDF

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Publication number
JP5663162B2
JP5663162B2 JP2009283149A JP2009283149A JP5663162B2 JP 5663162 B2 JP5663162 B2 JP 5663162B2 JP 2009283149 A JP2009283149 A JP 2009283149A JP 2009283149 A JP2009283149 A JP 2009283149A JP 5663162 B2 JP5663162 B2 JP 5663162B2
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Prior art keywords
resist
ips
polymer
chemical composition
template
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JP2009283149A
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English (en)
Japanese (ja)
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JP2010143220A (ja
JP2010143220A5 (OSRAM
Inventor
マティアス・カイル
ヤコブ・ニルソン
ヨハン・リング
ババク・ハイダリ
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オブダカット・アーベー
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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/022—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing characterised by the disposition or the configuration, e.g. dimensions, of the embossments or the shaping tools therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP2009283149A 2008-12-19 2009-12-14 ポリマーフィルム表面相互作用を変えるためのプロセス及び方法 Active JP5663162B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US13902308P 2008-12-19 2008-12-19
US61/139,023 2008-12-19
EP08172338.9A EP2199854B1 (en) 2008-12-19 2008-12-19 Hybrid polymer mold for nano-imprinting and method for making the same
EP08172338.9 2008-12-19

Publications (3)

Publication Number Publication Date
JP2010143220A JP2010143220A (ja) 2010-07-01
JP2010143220A5 JP2010143220A5 (OSRAM) 2012-12-20
JP5663162B2 true JP5663162B2 (ja) 2015-02-04

Family

ID=40481697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009283149A Active JP5663162B2 (ja) 2008-12-19 2009-12-14 ポリマーフィルム表面相互作用を変えるためのプロセス及び方法

Country Status (7)

Country Link
US (1) US8426025B2 (OSRAM)
EP (1) EP2199854B1 (OSRAM)
JP (1) JP5663162B2 (OSRAM)
KR (1) KR101621381B1 (OSRAM)
CN (1) CN101799626B (OSRAM)
SG (1) SG162673A1 (OSRAM)
TW (1) TWI443138B (OSRAM)

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Also Published As

Publication number Publication date
US8426025B2 (en) 2013-04-23
TW201030076A (en) 2010-08-16
TWI443138B (zh) 2014-07-01
JP2010143220A (ja) 2010-07-01
KR101621381B1 (ko) 2016-05-31
EP2199854B1 (en) 2015-12-16
CN101799626A (zh) 2010-08-11
CN101799626B (zh) 2015-08-12
SG162673A1 (en) 2010-07-29
US20100155988A1 (en) 2010-06-24
EP2199854A1 (en) 2010-06-23
KR20100071926A (ko) 2010-06-29

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