JP2010143220A5 - - Google Patents

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Publication number
JP2010143220A5
JP2010143220A5 JP2009283149A JP2009283149A JP2010143220A5 JP 2010143220 A5 JP2010143220 A5 JP 2010143220A5 JP 2009283149 A JP2009283149 A JP 2009283149A JP 2009283149 A JP2009283149 A JP 2009283149A JP 2010143220 A5 JP2010143220 A5 JP 2010143220A5
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JP
Japan
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chemical composition
polymer
mold
hybrid
polymerizable monofunctional
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JP2009283149A
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English (en)
Japanese (ja)
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JP5663162B2 (ja
JP2010143220A (ja
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Priority claimed from EP08172338.9A external-priority patent/EP2199854B1/en
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JP2009283149A 2008-12-19 2009-12-14 ポリマーフィルム表面相互作用を変えるためのプロセス及び方法 Active JP5663162B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US13902308P 2008-12-19 2008-12-19
US61/139,023 2008-12-19
EP08172338.9A EP2199854B1 (en) 2008-12-19 2008-12-19 Hybrid polymer mold for nano-imprinting and method for making the same
EP08172338.9 2008-12-19

Publications (3)

Publication Number Publication Date
JP2010143220A JP2010143220A (ja) 2010-07-01
JP2010143220A5 true JP2010143220A5 (OSRAM) 2012-12-20
JP5663162B2 JP5663162B2 (ja) 2015-02-04

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JP2009283149A Active JP5663162B2 (ja) 2008-12-19 2009-12-14 ポリマーフィルム表面相互作用を変えるためのプロセス及び方法

Country Status (7)

Country Link
US (1) US8426025B2 (OSRAM)
EP (1) EP2199854B1 (OSRAM)
JP (1) JP5663162B2 (OSRAM)
KR (1) KR101621381B1 (OSRAM)
CN (1) CN101799626B (OSRAM)
SG (1) SG162673A1 (OSRAM)
TW (1) TWI443138B (OSRAM)

Families Citing this family (51)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5653750B2 (ja) * 2008-03-12 2015-01-14 富士フイルム株式会社 原版作製方法、凹形アレイモールドの製造方法、針状アレイシートの製造方法、原版
US8877298B2 (en) * 2008-05-27 2014-11-04 The Hong Kong University Of Science And Technology Printing using a structure coated with ultraviolet radiation responsive material
EP2199855B1 (en) * 2008-12-19 2016-07-20 Obducat Methods and processes for modifying polymer material surface interactions
WO2012035985A1 (ja) * 2010-09-16 2012-03-22 日本碍子株式会社 成形型
JP5658001B2 (ja) * 2010-11-11 2015-01-21 旭化成イーマテリアルズ株式会社 樹脂モールド
JP5306404B2 (ja) * 2011-03-25 2013-10-02 株式会社東芝 パターン形成方法
JP5933724B2 (ja) * 2011-09-20 2016-06-15 エーファウ・グループ・エー・タルナー・ゲーエムベーハー 支持ウェハを被覆する装置及び方法
US9278857B2 (en) * 2012-01-31 2016-03-08 Seagate Technology Inc. Method of surface tension control to reduce trapped gas bubbles
EP2821096B1 (en) * 2012-02-29 2019-05-22 Toppan Printing Co., Ltd. Method for manufacturing needle-like material
DE112012006381T5 (de) 2012-05-16 2015-01-29 Otis Elevator Company Seilscheibe für ein Aufzugsystem
CN104487225B (zh) * 2012-06-28 2018-04-27 汉高股份有限及两合公司 复合插入件的制造方法
CN106459326B (zh) 2013-12-06 2019-08-13 株式会社Lg化学 嵌段共聚物
CN105899560B (zh) 2013-12-06 2018-01-12 株式会社Lg化学 嵌段共聚物
WO2015084126A1 (ko) 2013-12-06 2015-06-11 주식회사 엘지화학 블록 공중합체
US10239980B2 (en) 2013-12-06 2019-03-26 Lg Chem, Ltd. Block copolymer
JP6361893B2 (ja) 2013-12-06 2018-07-25 エルジー・ケム・リミテッド ブロック共重合体
CN105934455B (zh) 2013-12-06 2019-01-18 株式会社Lg化学 嵌段共聚物
US10202480B2 (en) 2013-12-06 2019-02-12 Lg Chem, Ltd. Block copolymer
US10227436B2 (en) 2013-12-06 2019-03-12 Lg Chem, Ltd. Block copolymer
US10087276B2 (en) 2013-12-06 2018-10-02 Lg Chem, Ltd. Block copolymer
EP3078654B1 (en) 2013-12-06 2021-07-07 LG Chem, Ltd. Monomer and block copolymer
EP3078692B1 (en) 2013-12-06 2021-01-27 LG Chem, Ltd. Block copolymer
JP6432847B2 (ja) 2013-12-06 2018-12-05 エルジー・ケム・リミテッド ブロック共重合体
JP6419820B2 (ja) 2013-12-06 2018-11-07 エルジー・ケム・リミテッド ブロック共重合体
JP6334706B2 (ja) 2013-12-06 2018-05-30 エルジー・ケム・リミテッド ブロック共重合体
JP6538159B2 (ja) 2014-09-30 2019-07-03 エルジー・ケム・リミテッド ブロック共重合体
JP6394798B2 (ja) 2014-09-30 2018-09-26 エルジー・ケム・リミテッド ブロック共重合体
EP3214102B1 (en) 2014-09-30 2022-01-05 LG Chem, Ltd. Block copolymer
EP3225641B1 (en) 2014-09-30 2021-11-24 LG Chem, Ltd. Block copolymer
EP3202799B1 (en) 2014-09-30 2021-08-25 LG Chem, Ltd. Block copolymer
JP6633062B2 (ja) 2014-09-30 2020-01-22 エルジー・ケム・リミテッド パターン化基板の製造方法
WO2016053005A1 (ko) 2014-09-30 2016-04-07 주식회사 엘지화학 블록 공중합체
EP3202801B1 (en) 2014-09-30 2021-08-18 LG Chem, Ltd. Block copolymer
US10287430B2 (en) 2014-09-30 2019-05-14 Lg Chem, Ltd. Method of manufacturing patterned substrate
US10240035B2 (en) 2014-09-30 2019-03-26 Lg Chem, Ltd. Block copolymer
JP6531898B2 (ja) * 2015-03-12 2019-06-19 ニッタ株式会社 インプリント用モールドおよびその製造方法、並びに微細構造の製造方法
JP6141500B2 (ja) * 2015-09-08 2017-06-07 キヤノン株式会社 ナノインプリントリソグラフィーにおける充填時間を短縮するための基板の前処理
US20170066208A1 (en) 2015-09-08 2017-03-09 Canon Kabushiki Kaisha Substrate pretreatment for reducing fill time in nanoimprint lithography
US10488753B2 (en) 2015-09-08 2019-11-26 Canon Kabushiki Kaisha Substrate pretreatment and etch uniformity in nanoimprint lithography
US10134588B2 (en) 2016-03-31 2018-11-20 Canon Kabushiki Kaisha Imprint resist and substrate pretreatment for reducing fill time in nanoimprint lithography
US10620539B2 (en) 2016-03-31 2020-04-14 Canon Kabushiki Kaisha Curing substrate pretreatment compositions in nanoimprint lithography
US10095106B2 (en) 2016-03-31 2018-10-09 Canon Kabushiki Kaisha Removing substrate pretreatment compositions in nanoimprint lithography
US10509313B2 (en) 2016-06-28 2019-12-17 Canon Kabushiki Kaisha Imprint resist with fluorinated photoinitiator and substrate pretreatment for reducing fill time in nanoimprint lithography
US10317793B2 (en) 2017-03-03 2019-06-11 Canon Kabushiki Kaisha Substrate pretreatment compositions for nanoimprint lithography
KR102086802B1 (ko) * 2017-07-19 2020-03-09 서강대학교산학협력단 원자현미경 프로브 사출용 몰드 및 이의 제조 방법
EP3511292A1 (en) * 2018-01-10 2019-07-17 SABIC Global Technologies B.V. A hydrophobic impact textured surface and a method of making the same
KR102427286B1 (ko) * 2018-11-29 2022-07-29 도레이첨단소재 주식회사 이종기재 접합용 양면 점착필름, 적층필름 및 디스플레이 디바이스
JP7358113B2 (ja) * 2019-08-19 2023-10-10 キヤノン株式会社 モールド、インプリント装置および物品の製造方法
EP4126496A1 (de) * 2020-04-01 2023-02-08 EV Group E. Thallner GmbH Vorrichtung und verfahren zum spritzgiessen
US12428508B2 (en) * 2022-02-11 2025-09-30 Canon Kabushiki Kaisha Photocurable composition including a non-reactive polymer
CN119410239A (zh) * 2023-07-26 2025-02-11 宣伟(广东)新材料有限公司 用于改善液体涂料组合物的储存稳定性的方法

Family Cites Families (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB559072A (en) 1940-08-03 1944-02-02 Budd Edward G Mfg Co A method of making stamping dies
US2305433A (en) 1940-09-11 1942-12-15 Jesse B Hawley Method and apparatus for molding articles of thermoplastic, thermosetting, or resinous materials
NL68070C (OSRAM) 1947-01-17
US2883372A (en) 1957-03-14 1959-04-21 Du Pont Copolymers of ethylene and dihydrodicyclopentadiene
US4211617A (en) 1975-02-24 1980-07-08 Mca Disco-Vision, Inc. Process for producing a stamper for videodisc purposes
DD251847A1 (de) 1986-07-31 1987-11-25 Zeiss Jena Veb Carl Verfahren und anordnung zum bildvergleich
JPH0830106B2 (ja) 1989-06-24 1996-03-27 日本ゼオン株式会社 成形用材料
US5334424A (en) 1991-06-17 1994-08-02 Nippon Zeon Co., Ltd. Thermoplastic norbornene resin formed articles and sustrates for liquid crystal display
US5312794A (en) 1992-12-29 1994-05-17 Shell Oil Company Catalyst system for olefin polymerization
AU6752496A (en) 1995-07-28 1997-03-05 Ely Michael Rabani Pattern formation, replication, fabrication and devices thereby
US20040137734A1 (en) * 1995-11-15 2004-07-15 Princeton University Compositions and processes for nanoimprinting
US5772905A (en) 1995-11-15 1998-06-30 Regents Of The University Of Minnesota Nanoimprint lithography
JPH09330864A (ja) 1996-06-10 1997-12-22 Ge Yokogawa Medical Syst Ltd 複合圧電物質製造方法及び複合圧電物質製造用マスク
JPH10330577A (ja) 1997-03-31 1998-12-15 Mitsui Chem Inc 環状オレフィン系樹脂成形体および該成形体の印字方法
US6334960B1 (en) 1999-03-11 2002-01-01 Board Of Regents, The University Of Texas System Step and flash imprint lithography
DE19920941A1 (de) 1999-05-07 2000-11-16 Krauss Maffei Kunststofftech Verfahren zum Herstellen von Kunststoffteilen mit aufgeprägter Struktur und Vorrichtung zur Durchführung des Verfahrens
SE515607C2 (sv) 1999-12-10 2001-09-10 Obducat Ab Anordning och metod vid tillverkning av strukturer
DE10009246A1 (de) 2000-02-28 2001-08-30 Mitsubishi Polyester Film Gmbh Weiße, biaxial orientierte und UV-stabilisierte Polyesterfolie mit Cycloolefinocopolymer (COC), Verfahren zu ihrer Herstellung und ihre Verwendung
DE10011652A1 (de) 2000-03-10 2001-09-13 Mitsubishi Polyester Film Gmbh Biaxial orientierte Polyesterfolie mit hohem Weißgrad, Verfahren zu ihrer Herstellung und ihre Verwendung
AU2001247380A1 (en) 2000-03-16 2001-10-03 Mitsubishi Polyester Film, Llc White polyester film with cycloolefin copolymer
KR100694036B1 (ko) 2000-06-01 2007-03-12 삼성전자주식회사 그루브와 피트의 깊이가 다른 디스크 및 그 제조방법
US6696220B2 (en) 2000-10-12 2004-02-24 Board Of Regents, The University Of Texas System Template for room temperature, low pressure micro-and nano-imprint lithography
WO2002009894A2 (en) 2000-08-01 2002-02-07 The Deflex Llc Gas-vapor cleaning method and system therefor
JP4192414B2 (ja) 2000-09-14 2008-12-10 凸版印刷株式会社 レンズシートの製造方法
US6705853B1 (en) 2000-10-20 2004-03-16 Durakon Industries, Inc. Six station rotary thermoforming machine
US6953332B1 (en) 2000-11-28 2005-10-11 St. Jude Medical, Inc. Mandrel for use in forming valved prostheses having polymer leaflets by dip coating
US6422528B1 (en) 2001-01-17 2002-07-23 Sandia National Laboratories Sacrificial plastic mold with electroplatable base
WO2002096166A1 (en) 2001-05-18 2002-11-28 Corporation For National Research Initiatives Radio frequency microelectromechanical systems (mems) devices on low-temperature co-fired ceramic (ltcc) substrates
US20030071016A1 (en) 2001-10-11 2003-04-17 Wu-Sheng Shih Patterned structure reproduction using nonsticking mold
TWI258142B (en) 2002-01-08 2006-07-11 Tdk Corp Manufacturing method of stamper for manufacturing data medium, the stamper, and the stamper spacer with template
JP3749520B2 (ja) 2002-01-08 2006-03-01 Ｔｄｋ株式会社 情報媒体製造用スタンパの製造方法、スタンパ、及び原盤付スタンパ中間体
KR100487025B1 (ko) * 2002-02-28 2005-05-11 주식회사 루밴틱스 광도파로용 광경화성 수지 조성물 및 이로부터 제조된광도파로
EP1353229A1 (en) 2002-04-09 2003-10-15 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
DE10217151A1 (de) * 2002-04-17 2003-10-30 Clariant Gmbh Nanoimprint-Resist
US20030230817A1 (en) 2002-06-13 2003-12-18 Agere Systems, Inc. Mold for UV curable adhesive and method of use therefor
JP3892460B2 (ja) 2002-06-20 2007-03-14 オブデュキャット、アクチボラグ 成形工具を製造するための方法およびその成形工具を用いて形成された記憶媒体
WO2004000566A1 (en) 2002-06-20 2003-12-31 Obducat Ab Method and device for transferring a pattern
US20040032063A1 (en) 2002-08-16 2004-02-19 Peter Walther Process for shaping plate-shaped materials and an arrangement for carrying out the process
CN100454141C (zh) 2002-08-27 2009-01-21 奥博杜卡特股份公司 用于将图案转印到物体的设备
US7750059B2 (en) 2002-12-04 2010-07-06 Hewlett-Packard Development Company, L.P. Polymer solution for nanoimprint lithography to reduce imprint temperature and pressure
DE10311855B4 (de) 2003-03-17 2005-04-28 Infineon Technologies Ag Anordnung zum Übertragen von Informationen/Strukturen auf Wafer unter Verwendung eines Stempels
JP4061220B2 (ja) 2003-03-20 2008-03-12 株式会社日立製作所 ナノプリント装置、及び微細構造転写方法
US20040241049A1 (en) 2003-04-04 2004-12-02 Carvalho Bruce L. Elastomeric tools for the fabrication of elastomeric devices and uses thereof
US20050191419A1 (en) 2003-04-11 2005-09-01 Helt James M. Fabrication of nanostructures
KR100568581B1 (ko) * 2003-04-14 2006-04-07 주식회사 미뉴타텍 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드
TW568349U (en) 2003-05-02 2003-12-21 Ind Tech Res Inst Parallelism adjusting device for nano-transferring
US7307118B2 (en) * 2004-11-24 2007-12-11 Molecular Imprints, Inc. Composition to reduce adhesion between a conformable region and a mold
US20050084804A1 (en) 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US7150844B2 (en) 2003-10-16 2006-12-19 Seagate Technology Llc Dry passivation process for stamper/imprinter family making for patterned recording media
US6939664B2 (en) 2003-10-24 2005-09-06 International Business Machines Corporation Low-activation energy silicon-containing resist system
GB0325748D0 (en) 2003-11-05 2003-12-10 Koninkl Philips Electronics Nv A method of forming a patterned layer on a substrate
EP1533657B1 (en) 2003-11-21 2011-03-09 Obducat AB Multilayer nano imprint lithography
EP1538482B1 (en) 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
KR101281775B1 (ko) * 2003-12-19 2013-07-15 더 유니버시티 오브 노쓰 캐롤라이나 엣 채플 힐 소프트 또는 임프린트 리소그래피를 이용하여 분리된마이크로- 및 나노- 구조를 제작하는 방법
DE102004005247A1 (de) 2004-01-28 2005-09-01 Infineon Technologies Ag Imprint-Lithographieverfahren
EP1594001B1 (en) 2004-05-07 2015-12-30 Obducat AB Device and method for imprint lithography
US7717693B2 (en) 2004-05-28 2010-05-18 Obducat Ab Modified metal mold for use in imprinting processes
CN100480906C (zh) 2004-09-24 2009-04-22 3M创新有限公司 闭环控制系统中的频率控制
US7163888B2 (en) 2004-11-22 2007-01-16 Motorola, Inc. Direct imprinting of etch barriers using step and flash imprint lithography
DE602005012068D1 (de) 2005-06-10 2009-02-12 Obducat Ab Kopieren eines Musters mit Hilfe eines Zwischenstempels
US7878791B2 (en) 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US20080000373A1 (en) * 2006-06-30 2008-01-03 Maria Petrucci-Samija Printing form precursor and process for preparing a stamp from the precursor

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