JP5660034B2 - 立方晶窒化硼素焼結体および被覆立方晶窒化硼素焼結体 - Google Patents
立方晶窒化硼素焼結体および被覆立方晶窒化硼素焼結体 Download PDFInfo
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- JP5660034B2 JP5660034B2 JP2011509370A JP2011509370A JP5660034B2 JP 5660034 B2 JP5660034 B2 JP 5660034B2 JP 2011509370 A JP2011509370 A JP 2011509370A JP 2011509370 A JP2011509370 A JP 2011509370A JP 5660034 B2 JP5660034 B2 JP 5660034B2
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- cubic boron
- boron nitride
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- 229910052582 BN Inorganic materials 0.000 title claims description 119
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 title claims description 119
- 239000010936 titanium Substances 0.000 claims description 98
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims description 80
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 73
- 229910052719 titanium Inorganic materials 0.000 claims description 73
- 239000011230 binding agent Substances 0.000 claims description 28
- 238000002441 X-ray diffraction Methods 0.000 claims description 19
- 239000012535 impurity Substances 0.000 claims description 13
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 10
- JXOOCQBAIRXOGG-UHFFFAOYSA-N [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] Chemical compound [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] JXOOCQBAIRXOGG-UHFFFAOYSA-N 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 7
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 2
- 239000000843 powder Substances 0.000 description 65
- 238000005520 cutting process Methods 0.000 description 30
- 239000002994 raw material Substances 0.000 description 20
- 229910052751 metal Inorganic materials 0.000 description 18
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 16
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 15
- 229910052799 carbon Inorganic materials 0.000 description 15
- 239000002184 metal Substances 0.000 description 14
- 238000002156 mixing Methods 0.000 description 14
- 239000002245 particle Substances 0.000 description 13
- 230000007423 decrease Effects 0.000 description 11
- 239000000203 mixture Substances 0.000 description 9
- 229910052757 nitrogen Inorganic materials 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000000047 product Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- 239000011812 mixed powder Substances 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000011088 calibration curve Methods 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- 238000005121 nitriding Methods 0.000 description 4
- 229910052755 nonmetal Inorganic materials 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012188 paraffin wax Substances 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 description 2
- 101700004678 SLIT3 Proteins 0.000 description 2
- 102100027340 Slit homolog 2 protein Human genes 0.000 description 2
- 101710133576 Slit homolog 2 protein Proteins 0.000 description 2
- 102100027339 Slit homolog 3 protein Human genes 0.000 description 2
- 229910010037 TiAlN Inorganic materials 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000002775 capsule Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 238000005070 sampling Methods 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910008482 TiSiN Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- -1 aluminum carbides Chemical class 0.000 description 1
- 239000011805 ball Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- QRXWMOHMRWLFEY-UHFFFAOYSA-N isoniazide Chemical compound NNC(=O)C1=CC=NC=C1 QRXWMOHMRWLFEY-UHFFFAOYSA-N 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910021332 silicide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
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Description
平均粒径2μmの立方晶窒化硼素(cBN)粉末、表1に示す平均粒径のTi(C0.5N0.5)粉末、Ti(C0.8N0.2)粉末、Ti(C0.2N0.8)粉末およびTiN粉末(いずれも金属元素と非金属元素の比率が原子比で1:1の化学量論組成であるTi化合物)、平均粒径2μmのAl粉末を用いて表1に示す配合組成に配合した。配合した原料粉末を超硬合金製ボールとヘキサン溶媒とパラフィンとともにボールミル用のシリンダーに入れてボールミル混合を48時間行った。ボールミルで混合粉砕して得られた混合粉末を圧粉成型した後、1X10-5Torr、850℃の条件で脱パラフィン処理をした。脱パラフィン処理をした圧粉成型体を金属カプセルに封入し、金属カプセルを超高圧高温発生装置に入れて、圧力5.5GPa、温度1500℃、保持時間30分の条件で焼結して、発明品および比較品の立方晶窒化硼素焼結体を得た。
外周連続乾式切削(旋削)、
被削材:SCM415H(HRC60.9〜61.7)、
被削材形状:円柱φ63mm×L200mm、
切削速度:250m/min、
切込み:0.25mm、
送り:0.1mm/rev、
切削インサート形状:ISO規格CNGA120408、
評価:VBc=0.15mmに達するまでの切削時間あるいは欠損までの切削時間。
外周弱断続乾式切削(旋削)、
被削材:SCM435H(HRC60.9〜61.7)、
被削材形状:90°V溝2本入り円柱φ48mm×L200mm、
切削速度:200m/min、
切込み:0.25mm、
送り:0.1mm/rev、
切削インサート形状:ISO規格CNGA120408、
評価:VBc=0.15mmに達するまでの切削時間あるいは欠損までの切削時間。
実施例1の発明品3の表面にPVD装置を用いて被覆処理を行った。平均膜厚3μmのTiNを被覆したものを発明品6、平均膜厚3μmのTiAlNを被覆したものを発明品7とした。発明品6、7について実施例1と同じ切削試験(1)(2)を行った。その結果を表6に示す。
2 ピーク分離した後の炭窒化チタンの(200)面回折線
3 ピーク分離した後の窒化チタンの(200)面回折線
4 ピーク分離した後の立方晶窒化硼素の(111)面回折線
Claims (3)
- 窒化チタンおよび炭窒化チタンを含有する結合相と立方晶窒化硼素と不可避的不純物とからなり、Cu−Kα線を用いたX線回折測定における、炭窒化チタンの(200)面回折線のブラッグ角2θと窒化チタンの(200)面回折線のブラッグ角2θとの間隔が0.30°以上0.60°以下であり、炭窒化チタンの(200)面回折線の半価幅が0.30°以上0.50°以下であり、
酸化アルミニウム:立方晶窒化硼素焼結体全体に対して3〜30体積%と、
窒化チタンと炭窒化チタンの合計:立方晶窒化硼素焼結体全体に対して10〜60体積%と、
硼化チタン:立方晶窒化硼素焼結体全体に対して1〜30体積%と、
窒化アルミニウムおよび硼化アルミニウムの1種または2種:立方晶窒化硼素焼結体全体に対して10体積%以下とからなる
合計して立方晶窒化硼素焼結体全体に対して20〜80体積%の結合相と、
立方晶窒化硼素焼結体全体に対して80〜20体積%の立方晶窒化硼素および不可避的不純物とから構成され、
Cu−Kα線を用いたX線回折測定における、炭窒化チタンの(200)面回折線のピーク強度I TiCN に対する窒化チタンの(200)面回折線のピーク強度I TiN のピーク強度比(I TiN /I TiCN )が0.1〜0.5である、立方晶窒化硼素焼結体。 - 窒化チタンの(200)面回折線の半価幅が0.25°以上0.45°以下である請求項1に記載の立方晶窒化硼素焼結体。
- 請求項1または請求項2に記載の立方晶窒化硼素焼結体の表面に被膜を被覆した被覆立方晶窒化硼素焼結体。
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GB201108975D0 (en) * | 2011-05-27 | 2011-07-13 | Element Six Ltd | Superhard structure, tool element and method of making same |
JP6082650B2 (ja) * | 2013-04-26 | 2017-02-15 | 株式会社タンガロイ | 立方晶窒化硼素焼結体および被覆立方晶窒化硼素焼結体 |
CN103741002B (zh) * | 2013-06-28 | 2016-07-06 | 长春阿尔玛斯科技有限公司 | 一种超硬复合材料的制备方法 |
JP6637664B2 (ja) * | 2014-03-28 | 2020-01-29 | 三菱マテリアル株式会社 | 立方晶窒化硼素焼結体切削工具 |
JP5834329B2 (ja) * | 2014-04-25 | 2015-12-16 | 住友電工ハードメタル株式会社 | 複合焼結体および表面被覆窒化硼素焼結体工具 |
CN104525935B (zh) * | 2014-12-12 | 2016-09-28 | 郑州博特硬质材料有限公司 | 一种高韧性立方氮化硼烧结材料及其制备方法 |
JP2017014084A (ja) * | 2015-07-03 | 2017-01-19 | 昭和電工株式会社 | 立方晶窒化硼素焼結体、立方晶窒化硼素焼結体の製造方法、工具、および切削工具 |
GB201609672D0 (en) * | 2016-06-02 | 2016-07-20 | Element Six Uk Ltd | Sintered polycrystalline cubic boron nitride material |
KR102064172B1 (ko) * | 2017-09-01 | 2020-01-09 | 한국야금 주식회사 | 내마모성과 인성이 우수한 경질피막 |
CN115279715A (zh) * | 2020-03-13 | 2022-11-01 | 三菱综合材料株式会社 | 硬质复合材料 |
WO2022210760A1 (ja) * | 2021-03-31 | 2022-10-06 | 三菱マテリアル株式会社 | 掘削チップおよび掘削工具 |
WO2022210771A1 (ja) * | 2021-03-31 | 2022-10-06 | 三菱マテリアル株式会社 | 掘削チップおよび掘削工具 |
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