JP5639169B2 - 暗視野検査システムおよび暗視野検査システムを構成する方法 - Google Patents
暗視野検査システムおよび暗視野検査システムを構成する方法 Download PDFInfo
- Publication number
- JP5639169B2 JP5639169B2 JP2012521696A JP2012521696A JP5639169B2 JP 5639169 B2 JP5639169 B2 JP 5639169B2 JP 2012521696 A JP2012521696 A JP 2012521696A JP 2012521696 A JP2012521696 A JP 2012521696A JP 5639169 B2 JP5639169 B2 JP 5639169B2
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- JP
- Japan
- Prior art keywords
- cylindrical lens
- inspection system
- dark field
- wafer
- beam shaping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- H10P74/203—
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8822—Dark field detection
Landscapes
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Length Measuring Devices By Optical Means (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US22771309P | 2009-07-22 | 2009-07-22 | |
| US61/227,713 | 2009-07-22 | ||
| PCT/US2010/042354 WO2011011291A1 (en) | 2009-07-22 | 2010-07-16 | Dark field inspection system with ring illumination |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014140065A Division JP6072733B2 (ja) | 2009-07-22 | 2014-07-07 | 暗視野検査システムおよび方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012533756A JP2012533756A (ja) | 2012-12-27 |
| JP2012533756A5 JP2012533756A5 (enExample) | 2013-08-22 |
| JP5639169B2 true JP5639169B2 (ja) | 2014-12-10 |
Family
ID=43499363
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2012521696A Active JP5639169B2 (ja) | 2009-07-22 | 2010-07-16 | 暗視野検査システムおよび暗視野検査システムを構成する方法 |
| JP2014140065A Active JP6072733B2 (ja) | 2009-07-22 | 2014-07-07 | 暗視野検査システムおよび方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2014140065A Active JP6072733B2 (ja) | 2009-07-22 | 2014-07-07 | 暗視野検査システムおよび方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US9176072B2 (enExample) |
| EP (1) | EP2457251A4 (enExample) |
| JP (2) | JP5639169B2 (enExample) |
| KR (1) | KR101803109B1 (enExample) |
| CN (1) | CN102473663B (enExample) |
| IL (1) | IL217178A (enExample) |
| TW (1) | TWI536012B (enExample) |
| WO (1) | WO2011011291A1 (enExample) |
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| WO2012170352A2 (en) * | 2011-06-06 | 2012-12-13 | The Regents Of The University Of California | Multiplex fluorescent particle detection using spatially distributed excitation |
| US8995746B2 (en) * | 2013-03-15 | 2015-03-31 | KLA—Tencor Corporation | Image synchronization of scanning wafer inspection system |
| CN103245671B (zh) * | 2013-05-09 | 2016-04-13 | 深圳先进技术研究院 | 冲压件表面缺陷检测装置及方法 |
| US9747670B2 (en) | 2013-06-26 | 2017-08-29 | Kla-Tencor Corporation | Method and system for improving wafer surface inspection sensitivity |
| US9182351B2 (en) | 2013-11-26 | 2015-11-10 | Nanometrics Incorporated | Optical metrology system for spectral imaging of a sample |
| US9846122B2 (en) | 2013-11-26 | 2017-12-19 | Nanometrics Incorporated | Optical metrology system for spectral imaging of a sample |
| KR102241978B1 (ko) | 2014-09-11 | 2021-04-19 | 삼성전자주식회사 | 피검체의 표면 검사 방법 및 이를 수행하기 위한 광학 시스템 |
| US9891177B2 (en) * | 2014-10-03 | 2018-02-13 | Kla-Tencor Corporation | TDI sensor in a darkfield system |
| US9395309B2 (en) | 2014-10-15 | 2016-07-19 | Exnodes Inc. | Multiple angle computational wafer inspection |
| CN104407453A (zh) * | 2014-12-17 | 2015-03-11 | 中国电子科技集团公司第三十八研究所 | 一种光控型可调太赫兹波衰减器及其使用方法 |
| JP6522384B2 (ja) * | 2015-03-23 | 2019-05-29 | 三菱重工業株式会社 | レーザレーダ装置及び走行体 |
| US9989480B2 (en) * | 2015-04-21 | 2018-06-05 | Camtek Ltd. | Inspection system having an expanded angular coverage |
| US10192716B2 (en) * | 2015-09-21 | 2019-01-29 | Kla-Tencor Corporation | Multi-beam dark field imaging |
| JP2017198612A (ja) * | 2016-04-28 | 2017-11-02 | キヤノン株式会社 | 検査装置、検査システム、および物品製造方法 |
| US10739275B2 (en) * | 2016-09-15 | 2020-08-11 | Kla-Tencor Corporation | Simultaneous multi-directional laser wafer inspection |
| JP7343875B2 (ja) | 2017-02-28 | 2023-09-13 | ザ リージェンツ オブ ザ ユニヴァーシティ オブ カリフォルニア | マルチモード干渉導波路を用いるオプトフルイディックアナライト検出システム |
| EP3593424B1 (en) | 2017-04-12 | 2022-09-28 | Sense Photonics, Inc. | Emitter structures for ultra-small vertical cavity surface emitting lasers (vcsels) and arrays incorporating the same |
| US11237872B2 (en) | 2017-05-23 | 2022-02-01 | Kla-Tencor Corporation | Semiconductor inspection and metrology systems for distributing job among the CPUs or GPUs based on logical image processing boundaries |
| KR102459880B1 (ko) | 2017-09-29 | 2022-10-27 | 에이에스엠엘 네델란즈 비.브이. | 웨이퍼 검사를 위한 고급 전하 컨트롤러에 대한 방법 및 장치 |
| KR101969232B1 (ko) * | 2017-10-31 | 2019-04-17 | 주식회사 이노비즈 | 측면 비전 장치 |
| CN107727668B (zh) * | 2017-11-03 | 2023-11-14 | 浙江科技学院 | 基于偏振消光的透明介质单面选择成像方法及其装置 |
| CN109973858B (zh) * | 2017-12-28 | 2022-03-08 | 中国科学院深圳先进技术研究院 | 一种用于水下暗场成像的照明器 |
| WO2019147730A1 (en) * | 2018-01-24 | 2019-08-01 | Corning Incorporated | Apparatus and methods for inspecting damage intensity |
| US20190355110A1 (en) * | 2018-05-15 | 2019-11-21 | Camtek Ltd. | Cross talk reduction |
| EP3611569A1 (en) * | 2018-08-16 | 2020-02-19 | ASML Netherlands B.V. | Metrology apparatus and photonic crystal fiber |
| US10942135B2 (en) * | 2018-11-14 | 2021-03-09 | Kla Corporation | Radial polarizer for particle detection |
| JP7125576B2 (ja) * | 2019-02-21 | 2022-08-25 | 株式会社 エフケー光学研究所 | 異物検査装置及び異物検査方法 |
| DE102019125127A1 (de) * | 2019-09-18 | 2021-03-18 | Mühlbauer Gmbh & Co. Kg | Bauteilhandhabung, Bauteilinspektion |
| CN112697794A (zh) * | 2019-10-23 | 2021-04-23 | 上海微电子装备(集团)股份有限公司 | 一种掩模版检测装置、光刻设备及掩模版检测方法 |
| US11397153B2 (en) * | 2019-12-03 | 2022-07-26 | Kla Corporation | Apparatus and method for gray field imaging |
| US11733172B2 (en) * | 2020-05-15 | 2023-08-22 | Kla Corporation | Apparatus and method for rotating an optical objective |
| CN112098421B (zh) * | 2020-09-15 | 2022-06-28 | 上海微电子装备(集团)股份有限公司 | 暗场检测装置 |
| CN112179909B (zh) * | 2020-10-19 | 2024-09-20 | 中国工程物理研究院激光聚变研究中心 | 微型大视场超分辨显微成像装置 |
| WO2022176208A1 (ja) | 2021-02-22 | 2022-08-25 | 株式会社 ジャパンセル | 所定光生成方法、所定光利用方法、所定光を利用したサービス提供方法、測定/イメージング方法、光学特性変換素子、光源部、計測部、測定装置、所定光利用装置およびサービス提供システム |
| KR102864165B1 (ko) | 2021-10-20 | 2025-09-24 | 주식회사 엘지에너지솔루션 | 원통형 전지 측면 검사 장치 |
| US20240102938A1 (en) * | 2022-09-23 | 2024-03-28 | Apple Inc. | Artifact-based fault detection for physical components |
| CN117589790B (zh) * | 2023-11-30 | 2024-07-23 | 魅杰光电科技(上海)有限公司 | 暗场照明装置及暗场照明的光学检测系统 |
| CN117538333A (zh) * | 2023-12-26 | 2024-02-09 | 苏州矽行半导体技术有限公司 | 镜头阵列和晶圆检测设备 |
| WO2025187232A1 (ja) * | 2024-03-04 | 2025-09-12 | パナソニックIpマネジメント株式会社 | レンズ、光学システム、撮像装置及び検査装置 |
| KR102874969B1 (ko) * | 2025-06-24 | 2025-10-23 | 주식회사 블루타일랩 | 워피지 검사를 위한 빔 패턴 분석 장치 및 이를 포함하는 웨이퍼 검사 장치 |
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| KR100663365B1 (ko) * | 2005-07-18 | 2007-01-02 | 삼성전자주식회사 | 내부에 적어도 한 쌍의 빔 경로들을 갖는 렌즈 유니트를구비하는 광학적 검사장비들 및 이를 사용하여 기판의 표면결함들을 검출하는 방법들 |
| JP4996856B2 (ja) * | 2006-01-23 | 2012-08-08 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置およびその方法 |
| JP4908925B2 (ja) * | 2006-02-08 | 2012-04-04 | 株式会社日立ハイテクノロジーズ | ウェハ表面欠陥検査装置およびその方法 |
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-
2010
- 2010-07-16 WO PCT/US2010/042354 patent/WO2011011291A1/en not_active Ceased
- 2010-07-16 US US12/919,760 patent/US9176072B2/en active Active
- 2010-07-16 KR KR1020127004139A patent/KR101803109B1/ko active Active
- 2010-07-16 EP EP10802700.4A patent/EP2457251A4/en not_active Withdrawn
- 2010-07-16 JP JP2012521696A patent/JP5639169B2/ja active Active
- 2010-07-16 CN CN201080033782.9A patent/CN102473663B/zh active Active
- 2010-07-22 TW TW099124187A patent/TWI536012B/zh active
-
2011
- 2011-12-25 IL IL217178A patent/IL217178A/en active IP Right Grant
-
2014
- 2014-07-07 JP JP2014140065A patent/JP6072733B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP6072733B2 (ja) | 2017-02-01 |
| JP2014222239A (ja) | 2014-11-27 |
| JP2012533756A (ja) | 2012-12-27 |
| KR20120052994A (ko) | 2012-05-24 |
| EP2457251A1 (en) | 2012-05-30 |
| IL217178A0 (en) | 2012-02-29 |
| CN102473663B (zh) | 2016-11-09 |
| US20110169944A1 (en) | 2011-07-14 |
| WO2011011291A1 (en) | 2011-01-27 |
| US9176072B2 (en) | 2015-11-03 |
| CN102473663A (zh) | 2012-05-23 |
| IL217178A (en) | 2017-04-30 |
| KR101803109B1 (ko) | 2017-11-29 |
| EP2457251A4 (en) | 2017-11-08 |
| TWI536012B (zh) | 2016-06-01 |
| TW201132960A (en) | 2011-10-01 |
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