JP5624033B2 - 無機又は無機／有機ハイブリッドバリアフィルムの製造方法 - Google Patents

無機又は無機／有機ハイブリッドバリアフィルムの製造方法 Download PDF

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Publication number
JP5624033B2
JP5624033B2 JP2011516750A JP2011516750A JP5624033B2 JP 5624033 B2 JP5624033 B2 JP 5624033B2 JP 2011516750 A JP2011516750 A JP 2011516750A JP 2011516750 A JP2011516750 A JP 2011516750A JP 5624033 B2 JP5624033 B2 JP 5624033B2
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substrate
coating
layer
titanate
tetra
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Japanese (ja)
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JP2011526833A5 (enExample
JP2011526833A (ja
Inventor
アイ． ブライト，クラーク
アイ． ブライト，クラーク
エス． リオンズ，クリストファー
エス． リオンズ，クリストファー
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3M Innovative Properties Co
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3M Innovative Properties Co
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/60—Deposition of organic layers from vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/20—Metallic material, boron or silicon on organic substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment
    • C23C14/5846—Reactive treatment
    • C23C14/5853—Oxidation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/14—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by electrical means
    • B05D3/141—Plasma treatment
    • B05D3/145—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemical Vapour Deposition (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Chemically Coating (AREA)
JP2011516750A 2008-06-30 2009-06-29 無機又は無機／有機ハイブリッドバリアフィルムの製造方法 Expired - Fee Related JP5624033B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US7700208P 2008-06-30 2008-06-30
US61/077,002 2008-06-30
PCT/US2009/048996 WO2010002755A2 (en) 2008-06-30 2009-06-29 Method of making inorganic or inorganic/organic hybrid barrier films

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2014092608A Division JP2014168959A (ja) 2008-06-30 2014-04-28 無機又は無機／有機ハイブリッドバリアフィルムの製造方法

Publications (3)

Publication Number Publication Date
JP2011526833A JP2011526833A (ja) 2011-10-20
JP2011526833A5 JP2011526833A5 (enExample) 2012-08-02
JP5624033B2 true JP5624033B2 (ja) 2014-11-12

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Family Applications (2)

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JP2011516750A Expired - Fee Related JP5624033B2 (ja) 2008-06-30 2009-06-29 無機又は無機／有機ハイブリッドバリアフィルムの製造方法
JP2014092608A Pending JP2014168959A (ja) 2008-06-30 2014-04-28 無機又は無機／有機ハイブリッドバリアフィルムの製造方法

Family Applications After (1)

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JP2014092608A Pending JP2014168959A (ja) 2008-06-30 2014-04-28 無機又は無機／有機ハイブリッドバリアフィルムの製造方法

Country Status (6)

Country Link
US (1) US9481927B2 (enExample)
EP (1) EP2304069A4 (enExample)
JP (2) JP5624033B2 (enExample)
KR (2) KR20110033210A (enExample)
CN (1) CN102124137B (enExample)
WO (1) WO2010002755A2 (enExample)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9481927B2 (en) 2008-06-30 2016-11-01 3M Innovative Properties Company Method of making inorganic or inorganic/organic hybrid barrier films
JP2011252085A (ja) * 2010-06-02 2011-12-15 Honda Motor Co Ltd プラズマ成膜方法
EP2580371A2 (en) * 2010-06-08 2013-04-17 President and Fellows of Harvard College Low-temperature synthesis of silica
JP6559423B2 (ja) * 2011-08-05 2019-08-14 スリーエム イノベイティブ プロパティズ カンパニー 蒸気を処理するためのシステム及び方法
KR101930849B1 (ko) * 2011-12-28 2018-12-20 삼성디스플레이 주식회사 박막 증착 장치 및 그것을 이용한 박막 증착 방법
CN104798211B (zh) 2012-08-08 2017-04-12 3M创新有限公司 具有封装阻隔膜的光伏器件
KR20150041042A (ko) 2012-08-08 2015-04-15 쓰리엠 이노베이티브 프로퍼티즈 캄파니 우레아 (멀티)-우레탄 (메트)아크릴레이트-실란 조성물 및 이를 포함하는 물품
EP2882587A4 (en) 2012-08-08 2016-04-13 3M Innovative Properties Co SHIELDING CONSTRUCTIONS AND MANUFACTURING METHOD THEREFOR
US9903012B2 (en) * 2012-12-18 2018-02-27 Ulvac, Inc. Film formation method and film formation apparatus
FR3009302B1 (fr) 2013-08-05 2018-01-12 Saint-Gobain Glass France Substrat portant un revetement fonctionnel et une couche de protection temporaire
GB2523859B (en) 2014-08-01 2016-10-19 Dupont Teijin Films U S Ltd Partnership Polyester film assembly
TWI574836B (zh) * 2014-10-29 2017-03-21 財團法人工業技術研究院 阻氣複合膜
WO2017151285A1 (en) 2016-03-04 2017-09-08 3M Innovative Properties Company Magnetic multilayer sheet
CN105709970A (zh) * 2016-04-20 2016-06-29 长葛市汇达感光材料有限公司 具有稳定室的感光材料板涂覆装置
US10468244B2 (en) * 2016-08-30 2019-11-05 Versum Materials Us, Llc Precursors and flowable CVD methods for making low-K films to fill surface features
CN108690954B (zh) * 2017-04-10 2021-03-23 株式会社新柯隆 成膜装置及成膜方法
WO2019166103A1 (en) * 2018-03-02 2019-09-06 Applied Materials, Inc. Method for forming a coating on a substrate in a vacuum processing chamber, vacuum processing chamber and vacuum processing system
CN109402589A (zh) * 2019-01-02 2019-03-01 重庆天齐锂业有限责任公司 一种磁控溅射制备超薄金属锂薄膜的方法及系统
CN115976580B (zh) * 2022-12-27 2023-10-20 青岛理工大学 一种微细3d循环电沉积喷头装置及3d打印机
WO2024233688A1 (en) * 2023-05-11 2024-11-14 Applied Materials, Inc. Spinning disk centripetal coater
WO2025087893A1 (en) * 2023-10-25 2025-05-01 Merck Patent Gmbh Formulation

Family Cites Families (137)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2621193A (en) 1950-06-27 1952-12-09 Du Pont Polymeric titanium compounds
US3529074A (en) 1968-05-07 1970-09-15 Sierracin Corp External busbar system
US4435476A (en) * 1982-08-18 1984-03-06 Foster Grant Corporation Method of making an abrasion resistant coating on a solid substrate and articles produced thereby
JPS59138440A (ja) 1983-01-27 1984-08-08 豊田合成株式会社 セラミツクス被膜層を有する樹脂成形体
US5032461A (en) 1983-12-19 1991-07-16 Spectrum Control, Inc. Method of making a multi-layered article
US4842893A (en) 1983-12-19 1989-06-27 Spectrum Control, Inc. High speed process for coating substrates
US5125138A (en) 1983-12-19 1992-06-30 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making same
US5097800A (en) 1983-12-19 1992-03-24 Spectrum Control, Inc. High speed apparatus for forming capacitors
US5018048A (en) 1983-12-19 1991-05-21 Spectrum Control, Inc. Miniaturized monolithic multi-layer capacitor and apparatus and method for making
US4722515A (en) 1984-11-06 1988-02-02 Spectrum Control, Inc. Atomizing device for vaporization
US4645714A (en) 1984-12-24 1987-02-24 Minnesota Mining And Manufacturing Company Corrosion-resistant silver mirror
EP0242460A1 (en) 1985-01-18 1987-10-28 SPECTRUM CONTROL, INC. (a Pennsylvania corporation) Monomer atomizer for vaporization
US4626448A (en) * 1985-07-18 1986-12-02 The United States Of America As Represented By The United States Department Of Energy Plasma deposition of amorphous metal alloys
US4629756A (en) 1985-11-04 1986-12-16 E. I. Du Pont De Nemours And Company Heat reflective polymer blends
US4732879A (en) 1985-11-08 1988-03-22 Owens-Corning Fiberglas Corporation Method for applying porous, metal oxide coatings to relatively nonporous fibrous substrates
US4954371A (en) 1986-06-23 1990-09-04 Spectrum Control, Inc. Flash evaporation of monomer fluids
US5332888A (en) 1986-08-20 1994-07-26 Libbey-Owens-Ford Co. Sputtered multi-layer color compatible solar control coating
JPH0414440Y2 (enExample) 1987-06-08 1992-03-31
US4786783A (en) 1987-08-11 1988-11-22 Monsanto Company Electrically heatable laminated window
US4782216A (en) 1987-08-11 1988-11-01 Monsanto Company Electrically heatable laminated window
US5104929A (en) 1988-04-11 1992-04-14 Minnesota Mining And Manufacturing Company Abrasion resistant coatings comprising silicon dioxide dispersions
JPH0825244B2 (ja) 1988-05-10 1996-03-13 三菱化学株式会社 ガスバリヤ性の優れた透明プラスチックフィルム
US5324374A (en) 1988-07-27 1994-06-28 Saint Gobain Vitrage Laminated glass with an electroconductive layer
CA2038117A1 (en) 1990-03-29 1991-09-30 Mahfuza B. Ali Controllable radiation curable photoiniferter prepared adhesives for attachment of microelectronic devices and a method of attaching microelectronic devices therewith
US5409683A (en) 1990-08-23 1995-04-25 Regents Of The University Of California Method for producing metal oxide aerogels
US5130166A (en) * 1990-12-14 1992-07-14 E. I. Du Pont De Nemours And Company Method for reducing the pore size of sintered metal filters by application of an alcoholic solution of a metal alkoxide which is converted to an insoluble hydrous metal oxide
US5224441A (en) * 1991-09-27 1993-07-06 The Boc Group, Inc. Apparatus for rapid plasma treatments and method
US5227199A (en) * 1992-01-14 1993-07-13 General Atomics Processes for applying metal oxide coatings from a liquid phase onto multifilament refractory fiber tows
US5260095A (en) 1992-08-21 1993-11-09 Battelle Memorial Institute Vacuum deposition and curing of liquid monomers
JP3287496B2 (ja) 1993-04-30 2002-06-04 新日本製鐵株式会社 耐表面損傷性に優れたベイナイト鋼レールの製造方法
FR2707763B1 (fr) 1993-07-16 1995-08-11 Commissariat Energie Atomique Matériau composite à indice de réfraction élevé, procédé de fabrication de ce matériau composite et matériau optiquement actif comprenant ce matériau composite.
US5440446A (en) 1993-10-04 1995-08-08 Catalina Coatings, Inc. Acrylate coating material
WO1995010117A1 (en) * 1993-10-04 1995-04-13 Catalina Coatings, Inc. Cross-linked acrylate coating material useful for forming capacitor dielectrics and oxygen barriers
US5464667A (en) 1994-08-16 1995-11-07 Minnesota Mining And Manufacturing Company Jet plasma process and apparatus
DE4438359C2 (de) 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
US6083628A (en) 1994-11-04 2000-07-04 Sigma Laboratories Of Arizona, Inc. Hybrid polymer film
US5703436A (en) 1994-12-13 1997-12-30 The Trustees Of Princeton University Transparent contacts for organic devices
US5607789A (en) 1995-01-23 1997-03-04 Duracell Inc. Light transparent multilayer moisture barrier for electrochemical cell tester and cell employing same
US5530581A (en) 1995-05-31 1996-06-25 Eic Laboratories, Inc. Protective overlayer material and electro-optical coating using same
IL122244A0 (en) 1995-06-26 1998-04-05 Minnesota Mining & Mfg Multilayer polymer film with additional coatings or layers
FR2738772B1 (fr) 1995-09-15 1997-10-24 Saint Gobain Vitrage Vitrage feuillete d'isolation acoustique
WO1997016053A1 (de) 1995-10-20 1997-05-01 Robert Bosch Gmbh Elektrolumineszierendes schichtsystem
US5686360A (en) 1995-11-30 1997-11-11 Motorola Passivation of organic devices
US5925438A (en) 1996-06-17 1999-07-20 Dai Nippon Printing Co., Ltd. Antireflection film
US6132882A (en) 1996-12-16 2000-10-17 3M Innovative Properties Company Damped glass and plastic laminates
WO1998033077A2 (en) 1997-01-27 1998-07-30 Haaland Peter D Coatings, methods and apparatus for reducing reflection from optical substrates
US6203898B1 (en) 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
MC2461A1 (fr) 1997-09-26 1998-12-18 Exsymol Sa Dispositifs ophtalmiques et implantables recouverts d'un revêtement et procédés pour la production de ces derniers
US6224948B1 (en) 1997-09-29 2001-05-01 Battelle Memorial Institute Plasma enhanced chemical deposition with low vapor pressure compounds
JP3159148B2 (ja) 1997-10-31 2001-04-23 日本電気株式会社 冷陰極管及びバックライト装置
EP0915105B1 (en) 1997-11-07 2003-04-09 Rohm And Haas Company Plastic substrates for electronic display applications
US6045864A (en) * 1997-12-01 2000-04-04 3M Innovative Properties Company Vapor coating method
US6808658B2 (en) 1998-01-13 2004-10-26 3M Innovative Properties Company Method for making texture multilayer optical films
WO1999036262A2 (en) 1998-01-13 1999-07-22 Minnesota Mining And Manufacturing Company Modified copolyesters and improved multilayer reflective films
US6004660A (en) 1998-03-12 1999-12-21 E.I. Du Pont De Nemours And Company Oxygen barrier composite film structure
US6022812A (en) * 1998-07-07 2000-02-08 Alliedsignal Inc. Vapor deposition routes to nanoporous silica
US6146225A (en) 1998-07-30 2000-11-14 Agilent Technologies, Inc. Transparent, flexible permeability barrier for organic electroluminescent devices
US6335479B1 (en) 1998-10-13 2002-01-01 Dai Nippon Printing Co., Ltd. Protective sheet for solar battery module, method of fabricating the same and solar battery module
AU1339700A (en) 1998-11-02 2000-05-22 Presstek, Inc. Transparent conductive oxides for plastic flat panel displays
US6117498A (en) * 1998-11-13 2000-09-12 International Business Machines Corporation Single source thermal ablation method for depositing organic-inorganic hybrid films
US6268695B1 (en) 1998-12-16 2001-07-31 Battelle Memorial Institute Environmental barrier material for organic light emitting device and method of making
EP1145338B1 (en) 1998-12-16 2012-12-05 Samsung Display Co., Ltd. Environmental barrier material for organic light emitting device and method of making
US6228796B1 (en) * 1998-12-28 2001-05-08 Orient Chemical Industries, Ltd. Organic-inorganic hybrid materials and processes for preparing the same
US6743948B1 (en) 1998-12-28 2004-06-01 Idemitsu Kosan Co., Ltd. Organic electroluminescent device
US6503564B1 (en) * 1999-02-26 2003-01-07 3M Innovative Properties Company Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile
US6358570B1 (en) 1999-03-31 2002-03-19 Battelle Memorial Institute Vacuum deposition and curing of oligomers and resins
EP1186065A1 (en) 1999-04-28 2002-03-13 E.I. Du Pont De Nemours And Company Flexible organic electronic device with improved resistance to oxygen and moisture degradation
CN1368904A (zh) 1999-07-09 2002-09-11 希普雷公司 在绝缘基板上形成薄金属层的方法
AU7346300A (en) 1999-09-02 2001-03-26 Owens Corning Abrasion-resistant water-based sol gel coatings for fibrous substrates
US6660339B1 (en) 1999-09-07 2003-12-09 The Procter & Gamble Company Process for hydrophobic treatment of water vapor permeable substrates
US6413645B1 (en) 2000-04-20 2002-07-02 Battelle Memorial Institute Ultrabarrier substrates
US6573652B1 (en) 1999-10-25 2003-06-03 Battelle Memorial Institute Encapsulated display devices
US6623861B2 (en) 2001-04-16 2003-09-23 Battelle Memorial Institute Multilayer plastic substrates
US6811867B1 (en) 2000-02-10 2004-11-02 3M Innovative Properties Company Color stable pigmented polymeric films
US6288842B1 (en) 2000-02-22 2001-09-11 3M Innovative Properties Sheeting with composite image that floats
ATE279492T1 (de) 2000-03-02 2004-10-15 Merck Patent Gmbh Mehrschichtiger reflektierender film oder pigment mit von blickwinkel abhängigen reflektionseigenschaften
US6492026B1 (en) 2000-04-20 2002-12-10 Battelle Memorial Institute Smoothing and barrier layers on high Tg substrates
US7238401B1 (en) 2000-06-09 2007-07-03 3M Innovative Properties Company Glazing element and laminate for use in the same
US6797396B1 (en) 2000-06-09 2004-09-28 3M Innovative Properties Company Wrinkle resistant infrared reflecting film and non-planar laminate articles made therefrom
US6867539B1 (en) 2000-07-12 2005-03-15 3M Innovative Properties Company Encapsulated organic electronic devices and method for making same
JP4677692B2 (ja) 2000-11-10 2011-04-27 凸版印刷株式会社 透明ガスバリア材およびその製造方法
US20030123967A1 (en) * 2000-11-20 2003-07-03 Bonsall Sandie W. Animal transporting system
US6743488B2 (en) 2001-05-09 2004-06-01 Cpfilms Inc. Transparent conductive stratiform coating of indium tin oxide
KR100421219B1 (ko) 2001-06-14 2004-03-02 삼성전자주식회사 β-디케톤 리간드를 갖는 유기 금속 착물을 이용한 원자층증착방법
JP2003053881A (ja) 2001-08-10 2003-02-26 Sumitomo Bakelite Co Ltd 水蒸気バリア性プラスチックフィルム
KR20040027940A (ko) 2001-08-20 2004-04-01 노바-플라즈마 인크. 기체 및 증기 침투율이 낮은 코팅층
CA2408113C (en) * 2001-10-25 2005-10-04 Hoya Corporation Optical element having antireflection film
US7344786B2 (en) 2001-10-29 2008-03-18 Fujifilm Corporation Magnetic recording medium including a smooth coating layer on one side of the support
US6888305B2 (en) 2001-11-06 2005-05-03 Universal Display Corporation Encapsulation structure that acts as a multilayer mirror
US20030108749A1 (en) 2001-12-06 2003-06-12 Sunder Ram Plastic substrates with polysiloxane coating for TFT fabrication
US6765351B2 (en) 2001-12-20 2004-07-20 The Trustees Of Princeton University Organic optoelectronic device structures
US7189447B2 (en) 2002-01-04 2007-03-13 3M Innovative Properties Company Laminates
US6936131B2 (en) 2002-01-31 2005-08-30 3M Innovative Properties Company Encapsulation of organic electronic devices using adsorbent loaded adhesives
US20030183245A1 (en) * 2002-04-01 2003-10-02 Min-Shyan Sheu Surface silanization
US8808457B2 (en) * 2002-04-15 2014-08-19 Samsung Display Co., Ltd. Apparatus for depositing a multilayer coating on discrete sheets
US6818291B2 (en) 2002-08-17 2004-11-16 3M Innovative Properties Company Durable transparent EMI shielding film
US6929864B2 (en) 2002-08-17 2005-08-16 3M Innovative Properties Company Extensible, visible light-transmissive and infrared-reflective film and methods of making and using the film
US7215473B2 (en) 2002-08-17 2007-05-08 3M Innovative Properties Company Enhanced heat mirror films
US6933051B2 (en) 2002-08-17 2005-08-23 3M Innovative Properties Company Flexible electrically conductive film
US7015640B2 (en) 2002-09-11 2006-03-21 General Electric Company Diffusion barrier coatings having graded compositions and devices incorporating the same
JP3845061B2 (ja) 2002-10-24 2006-11-15 株式会社半導体プロセス研究所 半導体装置及びその製造方法
US20040114101A1 (en) 2002-12-13 2004-06-17 Ocular Sciences, Inc. Contact lenses with color shifting properties
US6975067B2 (en) 2002-12-19 2005-12-13 3M Innovative Properties Company Organic electroluminescent device and encapsulation method
US20040121146A1 (en) 2002-12-20 2004-06-24 Xiao-Ming He Composite barrier films and method
US7163749B2 (en) * 2002-12-20 2007-01-16 General Electric Company Process for depositing finely dispersed organic-inorganic films and articles made therefrom
US6794315B1 (en) * 2003-03-06 2004-09-21 Board Of Trustees Of The University Of Illinois Ultrathin oxide films on semiconductors
US7018713B2 (en) 2003-04-02 2006-03-28 3M Innovative Properties Company Flexible high-temperature ultrabarrier
JP2004351834A (ja) 2003-05-30 2004-12-16 Toppan Printing Co Ltd 高ガスバリア性透明積層体
JP5082242B2 (ja) 2003-07-16 2012-11-28 コニカミノルタホールディングス株式会社 薄膜形成方法
JP2005060817A (ja) 2003-07-31 2005-03-10 Sekisui Chem Co Ltd 無機薄膜成膜方法
JP2005104994A (ja) 2003-09-26 2005-04-21 Sekisui Chem Co Ltd 無機薄膜成膜方法
US7297414B2 (en) * 2003-09-30 2007-11-20 Fujifilm Corporation Gas barrier film and method for producing the same
JP4342895B2 (ja) 2003-10-06 2009-10-14 東京エレクトロン株式会社 熱処理方法及び熱処理装置
TWI299284B (en) * 2003-10-30 2008-08-01 Showa Denko Kk Transparent film-forming composition
US6991826B2 (en) 2004-04-20 2006-01-31 3M Innovative Properties Company Antisoiling coatings for antireflective substrates
JP2006056007A (ja) 2004-08-17 2006-03-02 Dainippon Printing Co Ltd ガスバリア性積層フィルムおよびそれを使用した積層材
US20060087230A1 (en) 2004-10-22 2006-04-27 Eastman Kodak Company Desiccant film in top-emitting OLED
US20070216292A1 (en) * 2004-12-06 2007-09-20 Satoshi Seo Composite Material Including organic Compound And Inorganic Compound Light-Emitting Element And Light-Emitting Device Using The Composite Compound, And Manufacturing Method Of The Light-Emitting Element
JP5596250B2 (ja) 2005-03-02 2014-09-24 スリーエム イノベイティブ プロパティズ カンパニー 湿気反応性組成物及び有機ｅｌ素子
US7410261B2 (en) 2005-05-20 2008-08-12 3M Innovative Properties Company Multicolor illuminator system
US20070020451A1 (en) 2005-07-20 2007-01-25 3M Innovative Properties Company Moisture barrier coatings
JP2007081350A (ja) * 2005-09-16 2007-03-29 Tdk Corp 積層基板及び薄膜デバイスの製造方法
WO2008030262A1 (en) 2005-12-29 2008-03-13 3M Innovative Properties Company Method for atomizing material for coating processes
JP5213303B2 (ja) 2006-01-17 2013-06-19 スリーエム イノベイティブ プロパティズ カンパニー 光硬化性吸湿性組成物及び有機ｅｌ素子
JP2007197517A (ja) 2006-01-24 2007-08-09 Three M Innovative Properties Co 接着性封止組成物、封止フィルム及び有機ｅｌ素子
JP5051494B2 (ja) * 2006-02-09 2012-10-17 大日本印刷株式会社 ガスバリア性積層フィルムおよびその製造方法
JP2007220402A (ja) 2006-02-15 2007-08-30 Konica Minolta Holdings Inc 有機エレクトロルミネッセンス素子の封止方法、有機エレクトロルミネッセンス素子
KR100777736B1 (ko) * 2006-03-28 2007-11-19 삼성에스디아이 주식회사 Ｃｅｆ 필터 및 이를 구비한 플라즈마 디스플레이 장치
US20070281106A1 (en) * 2006-05-30 2007-12-06 Applied Materials, Inc. Process chamber for dielectric gapfill
US20080006819A1 (en) 2006-06-19 2008-01-10 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
JP5801522B2 (ja) 2006-08-31 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 湿気反応性組成物及び有機ｅｌ素子
JP5576125B2 (ja) 2006-12-29 2014-08-20 スリーエム イノベイティブ プロパティズ カンパニー 無機又は無機／有機ハイブリッドフィルムの製造方法
US8227040B2 (en) 2006-12-29 2012-07-24 3M Innovative Properties Company Method of curing metal alkoxide-containing films
US8241713B2 (en) 2007-02-21 2012-08-14 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
US9481927B2 (en) 2008-06-30 2016-11-01 3M Innovative Properties Company Method of making inorganic or inorganic/organic hybrid barrier films
CN102224571A (zh) 2008-11-21 2011-10-19 国立大学法人长冈技术科学大学 基板处理方法以及基板处理装置
EP2588314B1 (en) 2010-07-02 2020-08-19 3M Innovative Properties Company Barrier assembly with encapsulant and photovoltaic cell

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