JP5602234B2 - 太陽光発電装置及びその製造方法 - Google Patents
太陽光発電装置及びその製造方法 Download PDFInfo
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- JP5602234B2 JP5602234B2 JP2012532021A JP2012532021A JP5602234B2 JP 5602234 B2 JP5602234 B2 JP 5602234B2 JP 2012532021 A JP2012532021 A JP 2012532021A JP 2012532021 A JP2012532021 A JP 2012532021A JP 5602234 B2 JP5602234 B2 JP 5602234B2
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- 238000010248 power generation Methods 0.000 title claims description 49
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- 239000000758 substrate Substances 0.000 claims description 69
- 230000031700 light absorption Effects 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 43
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 16
- 239000011787 zinc oxide Substances 0.000 claims description 15
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000010297 mechanical methods and process Methods 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 3
- 239000000872 buffer Substances 0.000 description 39
- 239000010408 film Substances 0.000 description 25
- 229910052751 metal Inorganic materials 0.000 description 12
- 239000002184 metal Substances 0.000 description 12
- 229910052733 gallium Inorganic materials 0.000 description 7
- 239000011669 selenium Substances 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 229910052738 indium Inorganic materials 0.000 description 5
- 239000002243 precursor Substances 0.000 description 5
- WUPHOULIZUERAE-UHFFFAOYSA-N 3-(oxolan-2-yl)propanoic acid Chemical compound OC(=O)CCC1CCCO1 WUPHOULIZUERAE-UHFFFAOYSA-N 0.000 description 4
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- KTSFMFGEAAANTF-UHFFFAOYSA-N [Cu].[Se].[Se].[In] Chemical compound [Cu].[Se].[Se].[In] KTSFMFGEAAANTF-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 239000006227 byproduct Substances 0.000 description 4
- 229910052980 cadmium sulfide Inorganic materials 0.000 description 4
- 239000004020 conductor Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000012212 insulator Substances 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- YNLHHZNOLUDEKQ-UHFFFAOYSA-N copper;selanylidenegallium Chemical compound [Cu].[Se]=[Ga] YNLHHZNOLUDEKQ-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229920000307 polymer substrate Polymers 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000005361 soda-lime glass Substances 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- -1 ITO Chemical compound 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010549 co-Evaporation Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 150000003346 selenoethers Chemical class 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
- H01L31/0445—PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
- H01L31/046—PV modules composed of a plurality of thin film solar cells deposited on the same substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/042—PV modules or arrays of single PV cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/022441—Electrode arrangements specially adapted for back-contact solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
- H01L31/022466—Electrodes made of transparent conductive layers, e.g. TCO, ITO layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Description
図6を参照すると、前記溝110の内側に犠牲膜120が形成される。即ち、前記犠牲膜120は前記エッジ領域Bに形成される。前記犠牲膜120は前記支持基板100の上面に形成されてもよい。
Claims (12)
- 基板と、
前記基板上に配置される後面電極層と、
前記後面電極層上に配置される光吸収層と、
前記光吸収層上に配置される前面電極層と、を含み、
前記基板の外郭には溝が形成され、前記溝の内側に配置される絶縁膜を含む太陽光発電装置。 - 前記溝は、前記後面電極層の周囲を囲む請求項1に記載の太陽光発電装置。
- 前記基板は、
中央部分に定義されるセル領域と、
前記セル領域の周囲に定義されるエッジ領域と、を含み、
前記後面電極層は前記セル領域に配置され、
前記溝は前記エッジ領域に形成される請求項1に記載の太陽光発電装置。 - 前記溝の内側に配置される酸化物を含む請求項1に記載の太陽光発電装置。
- 前記溝の内側にチタンオキサイド、シリコンオキサイド又はジンクオキサイドが配置される請求項1に記載の太陽光発電装置。
- 前記溝及び前記基板の側面の間に配置されるダミー構造物を含む請求項1に記載の太陽光発電装置。
- 前記ダミー構造物は、前記後面電極層と同じ物質を含む第1ダミー層を含む請求項6に記載の太陽光発電装置。
- 前記ダミー構造物は、前記後面電極層と互いに離隔される請求項6に記載の太陽光発電装置。
- セル領域及び前記セル領域を囲むエッジ領域を含む基板に犠牲膜を形成する段階と、
前記基板及び前記犠牲膜上に後面電極層を形成する段階と、
前記後面電極層上に光吸収層を形成する段階と、
前記光吸収層上に前面電極層を形成する段階と、
前記犠牲膜の一部又は全部、前記後面電極層の外郭部分、前記光吸収層の外郭部分及び前記前面電極層の外郭部分を除去する段階と、を含み、
前記エッジ領域には溝が形成され、
前記犠牲膜は前記溝の内側に形成される太陽光発電装置の製造方法。 - 前記犠牲膜は、閉ループ形状を有する請求項9に記載の太陽光発電装置の製造方法。
- 前記犠牲膜は酸化物を含む請求項9に記載の太陽光発電装置の製造方法。
- 前記犠牲膜の一部又は全部、前記後面電極層の外郭部分、前記光吸収層の外郭部分及び前記前面電極層の外郭部分は、機械的な方法で同時に除去される請求項9に記載の太陽光発電装置の製造方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090093697A KR101072106B1 (ko) | 2009-10-01 | 2009-10-01 | 태양전지 및 이의 제조방법 |
KR10-2009-0093697 | 2009-10-01 | ||
PCT/KR2010/006712 WO2011040785A2 (ko) | 2009-10-01 | 2010-09-30 | 태양광 발전장치 및 이의 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2013506994A JP2013506994A (ja) | 2013-02-28 |
JP5602234B2 true JP5602234B2 (ja) | 2014-10-08 |
Family
ID=43826809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012532021A Expired - Fee Related JP5602234B2 (ja) | 2009-10-01 | 2010-09-30 | 太陽光発電装置及びその製造方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20120073645A1 (ja) |
EP (1) | EP2426732A4 (ja) |
JP (1) | JP5602234B2 (ja) |
KR (1) | KR101072106B1 (ja) |
CN (1) | CN102576760A (ja) |
WO (1) | WO2011040785A2 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101072089B1 (ko) * | 2009-09-30 | 2011-10-10 | 엘지이노텍 주식회사 | 태양전지 및 이의 제조방법 |
US8809109B2 (en) * | 2012-05-21 | 2014-08-19 | Stion Corporation | Method and structure for eliminating edge peeling in thin-film photovoltaic absorber materials |
KR20150035295A (ko) * | 2013-09-27 | 2015-04-06 | 엘지이노텍 주식회사 | 태양전지 |
EP3308404B1 (en) * | 2015-06-12 | 2020-07-08 | Flisom AG | Method of decreasing crack propagation damage in a solar cell device |
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JPS6135573A (ja) * | 1984-07-27 | 1986-02-20 | Matsushita Electric Ind Co Ltd | 光起電力素子の製造法 |
US4745078A (en) * | 1986-01-30 | 1988-05-17 | Siemens Aktiengesellschaft | Method for integrated series connection of thin film solar cells |
EP0334111A1 (de) * | 1988-03-24 | 1989-09-27 | Siemens Aktiengesellschaft | Verfahren zur integrierten Serienverschaltung von Dickschichtsolarzellen sowie Verwendung dieses Verfahrens bei der Herstellung einer Tandem-Solarzelle |
JP2975751B2 (ja) * | 1991-12-19 | 1999-11-10 | 三洋電機株式会社 | 光起電力装置 |
JP3573865B2 (ja) * | 1996-02-27 | 2004-10-06 | 三洋電機株式会社 | 光起電力装置の製造方法 |
TW387152B (en) * | 1996-07-24 | 2000-04-11 | Tdk Corp | Solar battery and manufacturing method thereof |
JP2001036105A (ja) * | 1999-07-16 | 2001-02-09 | Sanyo Electric Co Ltd | 太陽電池モジュール |
JP2001257369A (ja) * | 2000-03-10 | 2001-09-21 | Sharp Corp | 光電変換素子及びその製造方法 |
JP2003249673A (ja) * | 2001-08-31 | 2003-09-05 | Matsushita Electric Ind Co Ltd | 太陽電池およびその製造方法ならびに太陽電池の製造装置 |
US7125462B2 (en) * | 2002-06-18 | 2006-10-24 | Centre Luxembourgeois De Recherches Pour Le Verre Et Al Ceramique S.A. (C.R.V.C.) | Method of making vehicle windshield using coating mask |
JP4064340B2 (ja) * | 2003-12-25 | 2008-03-19 | 昭和シェル石油株式会社 | 集積型薄膜太陽電池の製造方法 |
KR101030043B1 (ko) * | 2004-10-27 | 2011-04-20 | 삼성에스디아이 주식회사 | 태양전지 및 그 제조방법 |
KR101073016B1 (ko) * | 2004-12-13 | 2011-10-12 | 삼성에스디아이 주식회사 | 태양전지 및 그 제조방법 |
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JPWO2009051122A1 (ja) * | 2007-10-19 | 2011-03-03 | 株式会社カネカ | 薄膜太陽電池モジュール |
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-
2009
- 2009-10-01 KR KR1020090093697A patent/KR101072106B1/ko active IP Right Grant
-
2010
- 2010-09-30 EP EP10820858.8A patent/EP2426732A4/en not_active Withdrawn
- 2010-09-30 WO PCT/KR2010/006712 patent/WO2011040785A2/ko active Application Filing
- 2010-09-30 CN CN2010800444271A patent/CN102576760A/zh active Pending
- 2010-09-30 JP JP2012532021A patent/JP5602234B2/ja not_active Expired - Fee Related
- 2010-09-30 US US13/375,178 patent/US20120073645A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2013506994A (ja) | 2013-02-28 |
KR20110036173A (ko) | 2011-04-07 |
EP2426732A2 (en) | 2012-03-07 |
WO2011040785A2 (ko) | 2011-04-07 |
US20120073645A1 (en) | 2012-03-29 |
EP2426732A4 (en) | 2014-08-13 |
CN102576760A (zh) | 2012-07-11 |
WO2011040785A3 (ko) | 2011-09-15 |
KR101072106B1 (ko) | 2011-10-10 |
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