JP5572981B2 - フッ素ガス生成装置 - Google Patents

フッ素ガス生成装置 Download PDF

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Publication number
JP5572981B2
JP5572981B2 JP2009089444A JP2009089444A JP5572981B2 JP 5572981 B2 JP5572981 B2 JP 5572981B2 JP 2009089444 A JP2009089444 A JP 2009089444A JP 2009089444 A JP2009089444 A JP 2009089444A JP 5572981 B2 JP5572981 B2 JP 5572981B2
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JP
Japan
Prior art keywords
gas
fluorine gas
hydrogen fluoride
fluorine
inner tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2009089444A
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English (en)
Japanese (ja)
Other versions
JP2010242127A (ja
Inventor
勇 毛利
章史 八尾
達夫 宮崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP2009089444A priority Critical patent/JP5572981B2/ja
Priority to EP10758387A priority patent/EP2415906A4/de
Priority to CN2010800147025A priority patent/CN102369311A/zh
Priority to KR1020117022150A priority patent/KR20110129914A/ko
Priority to PCT/JP2010/054061 priority patent/WO2010113611A1/ja
Publication of JP2010242127A publication Critical patent/JP2010242127A/ja
Application granted granted Critical
Publication of JP5572981B2 publication Critical patent/JP5572981B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/24—Halogens or compounds thereof
    • C25B1/245—Fluorine; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/02—Process control or regulation
    • C25B15/021—Process control or regulation of heating or cooling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B15/00—Operating or servicing cells
    • C25B15/08—Supplying or removing reactants or electrolytes; Regeneration of electrolytes
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
JP2009089444A 2009-04-01 2009-04-01 フッ素ガス生成装置 Active JP5572981B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2009089444A JP5572981B2 (ja) 2009-04-01 2009-04-01 フッ素ガス生成装置
EP10758387A EP2415906A4 (de) 2009-04-01 2010-03-04 Vorrichtung zur erzeugung von fluorgas
CN2010800147025A CN102369311A (zh) 2009-04-01 2010-03-04 氟气生成装置
KR1020117022150A KR20110129914A (ko) 2009-04-01 2010-03-04 불소 가스 생성 장치
PCT/JP2010/054061 WO2010113611A1 (ja) 2009-04-01 2010-03-04 フッ素ガス生成装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009089444A JP5572981B2 (ja) 2009-04-01 2009-04-01 フッ素ガス生成装置

Publications (2)

Publication Number Publication Date
JP2010242127A JP2010242127A (ja) 2010-10-28
JP5572981B2 true JP5572981B2 (ja) 2014-08-20

Family

ID=42827911

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009089444A Active JP5572981B2 (ja) 2009-04-01 2009-04-01 フッ素ガス生成装置

Country Status (5)

Country Link
EP (1) EP2415906A4 (de)
JP (1) JP5572981B2 (de)
KR (1) KR20110129914A (de)
CN (1) CN102369311A (de)
WO (1) WO2010113611A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101198350B1 (ko) 2011-04-05 2012-11-08 (주)원익머트리얼즈 고순도 헥사플루오르프로필렌 정제용기
JP5757168B2 (ja) * 2011-06-10 2015-07-29 セントラル硝子株式会社 フッ素ガス生成装置
CN117160179B (zh) * 2023-10-26 2024-02-13 福建德尔科技股份有限公司 一种电子级三氟化氯制备用原材料纯化设备

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2986885B2 (ja) * 1990-10-03 1999-12-06 財団法人川村理化学研究所 電解フッ素化方法およびその装置
US6843258B2 (en) * 2000-12-19 2005-01-18 Applied Materials, Inc. On-site cleaning gas generation for process chamber cleaning
US20040151656A1 (en) * 2001-11-26 2004-08-05 Siegele Stephen H. Modular molecular halogen gas generation system
US20030121796A1 (en) * 2001-11-26 2003-07-03 Siegele Stephen H Generation and distribution of molecular fluorine within a fabrication facility
JP3855081B2 (ja) 2002-07-01 2006-12-06 株式会社日立国際電気 フッ素ガスによるクリーニング機構を備えたｃｖｄ装置およびｃｖｄ装置のフッ素ガスによるクリーニング方法
JP3905433B2 (ja) 2002-07-11 2007-04-18 レール・リキード−ソシエテ・アノニム・ア・ディレクトワール・エ・コンセイユ・ドゥ・スールベイランス・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード フッ素ガス生成装置
KR100533411B1 (ko) * 2002-11-08 2005-12-02 도요탄소 가부시키가이샤 불소가스 발생장치와 그 전해욕 액면 제어방법
JP4624699B2 (ja) * 2004-03-18 2011-02-02 レール・リキード−ソシエテ・アノニム・プール・レテュード・エ・レクスプロワタシオン・デ・プロセデ・ジョルジュ・クロード フッ素ガス生成装置
JP5055484B2 (ja) 2009-01-28 2012-10-24 株式会社メガチップス 撮像システム

Also Published As

Publication number Publication date
EP2415906A4 (de) 2012-08-29
EP2415906A1 (de) 2012-02-08
WO2010113611A1 (ja) 2010-10-07
KR20110129914A (ko) 2011-12-02
CN102369311A (zh) 2012-03-07
JP2010242127A (ja) 2010-10-28

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