JP5562898B2 - 半導体装置およびその製造方法 - Google Patents
半導体装置およびその製造方法 Download PDFInfo
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- JP5562898B2 JP5562898B2 JP2011101271A JP2011101271A JP5562898B2 JP 5562898 B2 JP5562898 B2 JP 5562898B2 JP 2011101271 A JP2011101271 A JP 2011101271A JP 2011101271 A JP2011101271 A JP 2011101271A JP 5562898 B2 JP5562898 B2 JP 5562898B2
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- semiconductor device
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Description
実施の形態に係る半導体装置において、半導体チップと導体ベースプレートとの接合面に用いられる第1接着剤および第2接着剤のキュア処理時間とキュア処理温度との相関を例示するグラフは、図8に示すように表される。
実施の形態の変形例1に係る半導体装置を例示する図であって、半導体チップとしてFET(Field Effect Transistor:電界効果トランジスタ)を適用した場合の模式的平面図は、図3(a)に示すように表され、図3(a)のIII−III線に沿った模式的断面構造は、図3(b)に示すように表される。また、図3(a)のIV−IV線に沿った模式的断面構造は、図4に示すように表される。
図5は、実施の形態の変形例2に係る半導体装置において、第1接着剤および第2接着剤の塗り分けのバリエーション例を示す模式図であって、第2接着剤20(201,202,203,204)が隙間を空けて塗布されている様子を例示する模式図である。
実施の形態に係る半導体装置において、半導体チップ24およびその他の部品として例えば、キャパシタ基板341・342の搭載例の模式的平面パターン構成は、図11に示すように表され、図11のVI−VI線に沿った模式的断面構造は、図12に示すように表される。但し、図11および図12に示す構成例は、あくまで一例であり、これに限定されるものではない。
実施の形態に係る半導体装置に搭載される半導体チップ24のFET140の模式的平面パターン構成の拡大図は、図13(a)に示すように表され、図13(a)のJ部分の拡大図は、図13(b)に示すように表される。また、実施の形態に係る半導体装置に搭載される半導体チップ24のFET140の構成例1〜4であって、図13(b)のIII−III線に沿う模式的断面構成例1〜4は、それぞれ図14〜図17に示すように表される。
実施の形態に係る半導体装置に搭載される半導体チップ24のFETセルの構成例1は、図14に示すように、半絶縁性基板110と、半絶縁性基板110上に配置された窒化物系化合物半導体層112と、窒化物系化合物半導体層112上に配置されたアルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118と、アルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118上に配置されたソースフィンガー電極(S)120、ゲートフィンガー電極(G)124およびドレインフィンガー電極(D)122とを備える。窒化物系化合物半導体層112とアルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118との界面には、2次元電子ガス(2DEG:Two Dimensional Electron Gas)層116が形成されている。図14に示す構成例1では、高電子移動度トランジスタ(HEMT:High Electron Mobility Transistor)が示されている。
実施の形態に係る半導体装置に搭載される半導体チップ24のFETセルの構成例2は、図15に示すように、半絶縁性基板110と、半絶縁性基板110上に配置された窒化物系化合物半導体層112と、窒化物系化合物半導体層112上に配置されたソース領域126およびドレイン領域128と、ソース領域126上に配置されたソースフィンガー電極(S)120、窒化物系化合物半導体層112上に配置されたゲートフィンガー電極(G)124およびドレイン領域128上に配置されたドレインフィンガー電極(D)122とを備える。窒化物系化合物半導体層112とゲートフィンガー電極(G)124との界面には、ショットキーコンタクト(Schottky Contact)が形成されている。図15に示す構成例2では、金属−半導体電界効果トランジスタ(MESFET:Metal Semiconductor Field Effect Transistor)が示されている。
実施の形態に係る半導体装置に搭載される半導体チップ24のFETセルの構成例3は、図16に示すように、半絶縁性基板110と、半絶縁性基板110上に配置された窒化物系化合物半導体層112と、窒化物系化合物半導体層112上に配置されたアルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118と、アルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118上に配置されたソースフィンガー電極(S)120およびドレインフィンガー電極(D)122と、アルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118上のリセス部に配置されたゲートフィンガー電極(G)124とを備える。窒化物系化合物半導体層112とアルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118との界面には、2DEG層116が形成されている。図16に示す構成例3では、HEMTが示されている。
実施の形態に係る半導体装置に搭載される半導体チップ24のFETセルの構成例4は、図17に示すように、半絶縁性基板110と、半絶縁性基板110上に配置された窒化物系化合物半導体層112と、窒化物系化合物半導体層112上に配置されたアルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118と、アルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118上に配置されたソースフィンガー電極(S)120およびドレインフィンガー電極(D)122と、アルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118上の2段リセス部に配置されたゲートフィンガー電極124とを備える。窒化物系化合物半導体層112とアルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)118との界面には、2DEG層116が形成されている。図17に示す構成例4では、HEMTが示されている。
実施の形態に係るMMIC用パッケージを説明したが、この実施の形態は、例として提示したものであり、発明の範囲を限定することは意図していない。この新規な実施の形態は、その他の様々な形態で実施されることが可能であり、発明の要旨を逸脱しない範囲で、種々の省略、置き換え、変更を行うことができる。この実施の形態やその変形は、発明の範囲や要旨に含まれるとともに、特許請求の範囲に記載された発明とその均等の範囲に含まれる。
21a…RF入力端子
21b…RF出力端子
24a…入力端子
24b…出力端子
24…半導体チップ(MMIC若しくはFET)
26,28…整合回路基板
341,342…キャパシタ基板
40…第1接着剤
20(201,202,203,204)…第2接着剤
110…半絶縁性基板
112…窒化物系化合物半導体層(GaNエピタキシャル成長層)
116…2次元電子ガス(2DEG)層
118…アルミニウム窒化ガリウム層(AlxGa1-xN)(0.1≦x≦1)
120…ソースフィンガー電極
122…ドレインフィンガー電極
124…ゲートフィンガー電極
126…ソース領域
128…ドレイン領域
140,150…FET
180…セラミック枠体
200…導体ベースプレート
Pi…RF入力端子
Po…RF出力端子
PD…ドレインバイアス端子
PG…ゲートバイアス端子
D,D1,D2,…,D10…ドレイン端子電極
G,G1,G2,…,G10…ゲート端子電極
Q1,Q2,Q3…トランジスタ
S,S11,S12,…,S101,S102…ソース端子電極
SC11,SC12,…,SC102…VIAホール
Claims (13)
- 導電ベースプレートと、
前記導電ベースプレート上に接合される半導体チップと、
前記半導体チップと前記導電ベースプレートとの接合面の中央部に配置された第1接着剤と、
前記半導体チップと前記導電ベースプレートとの接合面の前記中央部の周辺部に配置された第2接着剤と
を備え、前記第1接着剤は前記第2接着剤よりも相対的に熱伝導率が高く、前記第2接着剤は前記第1接着剤より相対的に接合力が高く、
前記第2接着剤のキュア処理時間より前記第1接着剤のキュア処理時間の方が短くなる温度でキュア処理を行うことにより、前記半導体チップと前記導電ベースプレートとを接合することを特徴とする半導体装置。 - 前記第1接着剤の硬化時間が前記第2接着剤の硬化時間よりも短いことを特徴とする請求項1に記載の半導体装置。
- 前記半導体チップと前記導電ベースプレートとの接合面の内、前記半導体チップ周辺の一部分は、それぞれ前記第2接着剤を塗布しないことを特徴とする請求項1に記載の半導体装置。
- 前記第1接着剤の少なくとも一部の塗布領域と前記第2接着剤の塗布領域の間に所定の隙間が生じるように前記第2接着剤を塗布することを特徴とする請求項1に記載の半導体装置。
- 前記第1接着剤は、エポキシ樹脂系接着剤であり、前記第2接着剤は、ポリエステル系接着剤であることを特徴とする請求項1に記載の半導体装置。
- 前記第1接着剤は、エポキシ樹脂系の有機材料に導電性フィラーとしてAgを含有した接着剤であり、前記第2接着剤は、ポリエステル系の高分子材料に導電性フィラーとしてAgフィラーを含有した接着剤であることを特徴とする請求項1に記載の半導体装置。
- 前記導電ベースプレート上に配置された回路基板をさらに備え、前記回路基板と前記導電ベースプレートとの接合面は、前記第2接着剤で接合されることを特徴とする請求項1に記載の半導体装置。
- 前記回路基板は、整合回路基板もしくはキャパシタ基板であることを特徴とする請求項7に記載の半導体装置。
- 前記半導体チップは、
基板と、
前記基板の第1表面に配置され,それぞれ複数のフィンガーを有するゲートフィンガー電極、ソースフィンガー電極およびドレインフィンガー電極と、
前記基板の第1表面に配置され,前記ゲートフィンガー電極、前記ソースフィンガー電極および前記ドレインフィンガー電極ごとに複数のフィンガーをそれぞれ束ねて形成した複数のゲート端子電極、複数のソース端子電極およびドレイン端子電極と、
前記ソース端子電極の下部に配置されたVIAホールと、
前記基板の第1表面と反対側の第2表面に配置され、前記ソース端子電極に対して前記VIAホールを介して接続された接地電極と
を備えることを特徴とする請求項1〜8のいずれか1項に記載の半導体装置。 - 前記半導体チップは、
基板と、
前記基板上に配置され、それぞれ複数のフィンガーを有するゲートフィンガー電極、ソースフィンガー電極およびドレインフィンガー電極と、
前記基板上に配置され、前記ゲートフィンガー電極、前記ドレインフィンガー電極ごとに複数のフィンガーをそれぞれ束ねて形成したゲート端子電極およびドレイン端子電極と、
前記基板上に配置され、前記ソースフィンガー電極の複数のフィンガーをそれぞれオーバーレイコンタクトにより接続したソース端子電極と
を備えることを特徴とする請求項1〜8のいずれか1項に記載の半導体装置。 - 前記基板は、SiC基板、GaAs基板、GaN基板、SiC基板上にGaNエピタキシャル層を形成した基板、Si基板上にGaNエピタキシャル層を形成した基板、SiC基板上にGaN/AlGaNからなるヘテロ接合エピタキシャル層を形成した基板、サファイア基板上にGaNエピタキシャル層を形成した基板、サファイア基板若しくはダイヤモンド基板、および半絶縁性基板のいずれかであることを特徴とする請求項9または10に記載の半導体装置。
- 半導体チップと導電ベースプレートとの接合面の中央部に第1接着剤を形成する工程と、
前記半導体チップと前記導電ベースプレートとの接合面の前記中央部の周辺部に第2接着剤を形成する工程と、
前記導電ベースプレート上の前記第1接着剤および前記第2接着剤上に前記半導体チップを搭載する工程と、
前記第1接着剤と前記第2接着剤とをキュア処理し硬化させる工程と
を有し、前記第1接着剤は前記第2接着剤よりも相対的に熱伝導率が高く、前記第2接着剤は前記第1接着剤より相対的に接合力が高く、
前記第2接着剤のキュア処理時間より前記第1接着剤のキュア処理時間の方が短くなる温度で前記キュア処理を行うことにより、前記半導体チップと前記導電ベースプレートとを接合することを特徴とする半導体装置の製造方法。 - 前記第1接着剤の硬化時間が前記第2接着剤の硬化時間よりも短いことを特徴とする請求項12に記載の半導体装置の製造方法。
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