JP5537789B2 - レーザー加工用粘着シート及びレーザー加工方法 - Google Patents

レーザー加工用粘着シート及びレーザー加工方法 Download PDF

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Publication number
JP5537789B2
JP5537789B2 JP2008255896A JP2008255896A JP5537789B2 JP 5537789 B2 JP5537789 B2 JP 5537789B2 JP 2008255896 A JP2008255896 A JP 2008255896A JP 2008255896 A JP2008255896 A JP 2008255896A JP 5537789 B2 JP5537789 B2 JP 5537789B2
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JP
Japan
Prior art keywords
pressure
sensitive adhesive
laser processing
meth
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008255896A
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English (en)
Japanese (ja)
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JP2010084047A (ja
Inventor
文輝 浅井
智一 高橋
佳子 前川
和宏 青柳
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
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Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP2008255896A priority Critical patent/JP5537789B2/ja
Priority to CN2009101741560A priority patent/CN101712852B/zh
Priority to AT09171810T priority patent/ATE532836T1/de
Priority to EP09171810A priority patent/EP2172526B1/de
Priority to TW098133427A priority patent/TWI448344B/zh
Priority to KR1020090093975A priority patent/KR101259224B1/ko
Priority to US12/571,618 priority patent/US20100080989A1/en
Publication of JP2010084047A publication Critical patent/JP2010084047A/ja
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Publication of JP5537789B2 publication Critical patent/JP5537789B2/ja
Expired - Fee Related legal-status Critical Current
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/18—Working by laser beam, e.g. welding, cutting or boring using absorbing layers on the workpiece, e.g. for marking or protecting purposes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/0222—Scoring using a focussed radiation beam, e.g. laser
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/09—Severing cooled glass by thermal shock
    • C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/20—Adhesives in the form of films or foils characterised by their carriers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • C09J7/381—Pressure-sensitive adhesives [PSA] based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
    • C09J7/385—Acrylic polymers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/07—Aldehydes; Ketones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397—Phosphine oxides
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
    • C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J2301/00—Additional features of adhesives in the form of films or foils
    • C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
    • C09J2301/408—Additional features of adhesives in the form of films or foils characterized by the presence of essential components additives as essential feature of the adhesive layer
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
    • H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
    • H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
    • H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/28—Web or sheet containing structurally defined element or component and having an adhesive outermost layer
    • Y10T428/2809—Web or sheet containing structurally defined element or component and having an adhesive outermost layer including irradiated or wave energy treated component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Materials Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Mechanical Engineering (AREA)
  • Thermal Sciences (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Adhesive Tapes (AREA)
  • Dicing (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Laser Beam Processing (AREA)
JP2008255896A 2008-10-01 2008-10-01 レーザー加工用粘着シート及びレーザー加工方法 Expired - Fee Related JP5537789B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2008255896A JP5537789B2 (ja) 2008-10-01 2008-10-01 レーザー加工用粘着シート及びレーザー加工方法
AT09171810T ATE532836T1 (de) 2008-10-01 2009-09-30 Druckempfindliche haftklebefolie für die laserverarbeitung und verfahren zur laserverarbeitung
EP09171810A EP2172526B1 (de) 2008-10-01 2009-09-30 Druckempfindliche Haftklebefolie für die Laserverarbeitung und Verfahren zur Laserverarbeitung
CN2009101741560A CN101712852B (zh) 2008-10-01 2009-09-30 激光加工用压敏粘合片和用于激光加工的方法
TW098133427A TWI448344B (zh) 2008-10-01 2009-10-01 雷射處理用壓感黏著片及雷射處理方法
KR1020090093975A KR101259224B1 (ko) 2008-10-01 2009-10-01 레이저 처리를 위한 감압 접착 시트 및 레이저 처리 방법
US12/571,618 US20100080989A1 (en) 2008-10-01 2009-10-01 Pressure-sensitive adhesive sheet for laser processing and method for laser processing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008255896A JP5537789B2 (ja) 2008-10-01 2008-10-01 レーザー加工用粘着シート及びレーザー加工方法

Publications (2)

Publication Number Publication Date
JP2010084047A JP2010084047A (ja) 2010-04-15
JP5537789B2 true JP5537789B2 (ja) 2014-07-02

Family

ID=41491556

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008255896A Expired - Fee Related JP5537789B2 (ja) 2008-10-01 2008-10-01 レーザー加工用粘着シート及びレーザー加工方法

Country Status (7)

Country Link
US (1) US20100080989A1 (de)
EP (1) EP2172526B1 (de)
JP (1) JP5537789B2 (de)
KR (1) KR101259224B1 (de)
CN (1) CN101712852B (de)
AT (1) ATE532836T1 (de)
TW (1) TWI448344B (de)

Cited By (1)

* Cited by examiner, † Cited by third party
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WO2021153636A1 (ja) * 2020-01-30 2021-08-05 日東電工株式会社 粘着剤組成物、粘着剤層、及び粘着シート

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JP4107417B2 (ja) * 2002-10-15 2008-06-25 日東電工株式会社 チップ状ワークの固定方法
JP2011146552A (ja) * 2010-01-15 2011-07-28 Toshiba Corp 半導体装置の製造方法及び半導体装置
USD804435S1 (en) 2010-10-15 2017-12-05 Hitachi Chemical Company, Ltd. Flap in an adhesive tape for semiconductor manufacturing
WO2012077471A1 (ja) * 2010-12-06 2012-06-14 株式会社きもと レーザーダイシング用補助シート
JP5990910B2 (ja) * 2012-01-11 2016-09-14 住友ベークライト株式会社 半導体ウエハ等加工用粘着テープ
JP5761596B2 (ja) * 2011-03-30 2015-08-12 住友ベークライト株式会社 半導体ウエハ加工用粘着テープ
JP2013021105A (ja) * 2011-07-11 2013-01-31 Nitto Denko Corp ダイシング用粘着シート、及び、ダイシング用粘着シートを用いた半導体装置の製造方法
CN104247579B (zh) * 2012-02-03 2017-10-24 艾利丹尼森公司 光伏背板的激光图案化
CN108671267B (zh) * 2012-11-30 2022-02-18 H·戴维·迪恩 用于高精度医学植入物的吸收剂和反射性生物相容性染料
KR101600654B1 (ko) * 2012-12-28 2016-03-07 제일모직주식회사 편광판용 점착 필름, 이를 위한 점착제 조성물, 이를 포함하는 편광판 및 이를 포함하는 광학표시장치
KR102176802B1 (ko) * 2013-03-11 2020-11-10 린텍 가부시키가이샤 점착 시트 및 가공된 디바이스 관련 부재의 제조 방법
CN103170751A (zh) * 2013-04-18 2013-06-26 苏州光韵达光电科技有限公司 一种光纤激光切割陶瓷的方法
JP6331312B2 (ja) * 2013-09-30 2018-05-30 大日本印刷株式会社 蒸着マスクの製造方法、及び蒸着マスク準備体
US9919945B2 (en) * 2013-11-14 2018-03-20 Mitsubishi Electric Corporation Laser processing method and laser processing apparatus
US20150143849A1 (en) * 2013-11-26 2015-05-28 Corning Incorporated Method and system of laser cutting a sheet material
TW201605750A (zh) * 2014-07-09 2016-02-16 康寧公司 用於分離玻璃板的方法
CN105489472B (zh) * 2014-09-16 2019-03-15 长春石油化学股份有限公司 前切割保护液及使用此保护液的晶片加工方法
EP3397490A1 (de) * 2015-12-30 2018-11-07 3M Innovative Properties Company Infrarot-absorbierende klebefolien und zugehörige verfahren
JP6088701B1 (ja) * 2016-10-06 2017-03-01 株式会社きもと レーザーダイシング用補助シート
CN108235574A (zh) * 2016-12-15 2018-06-29 吴勇杰 电路板及其制作方法
JP6718174B2 (ja) * 2017-07-03 2020-07-08 日化精工株式会社 レーザー加工用保護膜剤
WO2019151434A1 (ja) * 2018-02-01 2019-08-08 日立化成株式会社 部材接続方法及び接着テープ
USD962882S1 (en) * 2019-11-14 2022-09-06 Showa Denko Materials Co., Ltd. Temporary protective film for manufacturing semiconductor devices
JP2021175776A (ja) * 2020-05-01 2021-11-04 日東電工株式会社 粘着シート
CN115485347A (zh) * 2020-05-01 2022-12-16 日东电工株式会社 粘合片
JP1685752S (de) * 2020-11-02 2021-05-24
USD962883S1 (en) 2020-11-02 2022-09-06 Showa Denko Materials Co., Ltd. Temporary protective film for manufacturing semiconductor devices
WO2022097471A1 (ja) * 2020-11-09 2022-05-12 デンカ株式会社 粘着テープ及び加工方法
KR20230114922A (ko) * 2022-01-26 2023-08-02 주식회사 엘지화학 반도체 공정용 점착 조성물, 이를 포함하는 반도체 공정용 필름 및 이를 이용한 반도체 패키지 제조 방법

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US6602599B1 (en) 1999-06-10 2003-08-05 Nitto Denko Corporation Low-staining adhesive sheets and method for removing resist material
JP4354066B2 (ja) 2000-01-28 2009-10-28 リンテック株式会社 剥離シート及びその製造方法
JP2001240842A (ja) * 2000-02-28 2001-09-04 Nitto Denko Corp 紫外線硬化型粘着剤組成物とその粘着シ―ト類
JP4886937B2 (ja) 2001-05-17 2012-02-29 リンテック株式会社 ダイシングシート及びダイシング方法
US7005031B2 (en) * 2002-01-16 2006-02-28 3M Innovative Properties Company Pressure sensitive adhesives having quaternary ammonium functionality, articles, and methods
JP4676711B2 (ja) * 2004-03-29 2011-04-27 日東電工株式会社 レーザー加工品の製造方法、およびそれに用いるレーザー加工用粘着シート
US20060246279A1 (en) * 2003-04-25 2006-11-02 Masakatsu Urairi Method of producing laser-processed product and adhesive sheet, for laser processing used therefor
JP4767144B2 (ja) * 2006-10-04 2011-09-07 日東電工株式会社 レーザ加工用粘着シート
JP4493643B2 (ja) * 2006-12-06 2010-06-30 日東電工株式会社 再剥離型粘着剤組成物、及び粘着テープ又はシート
JP2008163276A (ja) 2007-01-05 2008-07-17 Nitto Denko Corp 半導体基板加工用粘着シート
JP2009297734A (ja) 2008-06-11 2009-12-24 Nitto Denko Corp レーザー加工用粘着シート及びレーザー加工方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2021153636A1 (ja) * 2020-01-30 2021-08-05 日東電工株式会社 粘着剤組成物、粘着剤層、及び粘着シート

Also Published As

Publication number Publication date
EP2172526A1 (de) 2010-04-07
CN101712852A (zh) 2010-05-26
ATE532836T1 (de) 2011-11-15
TW201021953A (en) 2010-06-16
US20100080989A1 (en) 2010-04-01
KR101259224B1 (ko) 2013-04-29
EP2172526B1 (de) 2011-11-09
TWI448344B (zh) 2014-08-11
KR20100037570A (ko) 2010-04-09
JP2010084047A (ja) 2010-04-15
CN101712852B (zh) 2013-11-06

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