JP5534613B2 - 気体放電プラズマからｅｕｖ光を発生させる方法と装置 - Google Patents

気体放電プラズマからｅｕｖ光を発生させる方法と装置 Download PDF

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Publication number
JP5534613B2
JP5534613B2 JP2011210468A JP2011210468A JP5534613B2 JP 5534613 B2 JP5534613 B2 JP 5534613B2 JP 2011210468 A JP2011210468 A JP 2011210468A JP 2011210468 A JP2011210468 A JP 2011210468A JP 5534613 B2 JP5534613 B2 JP 5534613B2
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electrodes
discharge
channel
partial
pulse
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JP2011210468A
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Japanese (ja)
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JP2012079693A5 (https=
JP2012079693A (ja
Inventor
クラインシュミット ユルゲン
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Ushio Denki KK
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Ushio Denki KK
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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/002—Supply of the plasma generating material

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2011210468A 2010-10-01 2011-09-27 気体放電プラズマからｅｕｖ光を発生させる方法と装置 Expired - Fee Related JP5534613B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102010047419.3 2010-10-01
DE102010047419A DE102010047419B4 (de) 2010-10-01 2010-10-01 Verfahren und Vorrichtung zur Erzeugung von EUV-Strahlung aus einem Gasentladungsplasma

Publications (3)

Publication Number Publication Date
JP2012079693A JP2012079693A (ja) 2012-04-19
JP2012079693A5 JP2012079693A5 (https=) 2014-01-16
JP5534613B2 true JP5534613B2 (ja) 2014-07-02

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JP2011210468A Expired - Fee Related JP5534613B2 (ja) 2010-10-01 2011-09-27 気体放電プラズマからｅｕｖ光を発生させる方法と装置

Country Status (4)

Country Link
US (1) US8426834B2 (https=)
JP (1) JP5534613B2 (https=)
DE (1) DE102010047419B4 (https=)
NL (1) NL2007473C2 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8881526B2 (en) 2009-03-10 2014-11-11 Bastian Family Holdings, Inc. Laser for steam turbine system
WO2014127151A1 (en) 2013-02-14 2014-08-21 Kla-Tencor Corporation System and method for producing an exclusionary buffer gas flow in an euv light source
CN115119373B (zh) * 2022-05-31 2025-12-05 广东省智能机器人研究院 极紫外光产生方法及装置

Family Cites Families (27)

* Cited by examiner, † Cited by third party
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US4504964A (en) * 1982-09-20 1985-03-12 Eaton Corporation Laser beam plasma pinch X-ray system
JPH08213192A (ja) * 1995-02-02 1996-08-20 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置およびその発生方法
US6815700B2 (en) * 1997-05-12 2004-11-09 Cymer, Inc. Plasma focus light source with improved pulse power system
JP3698677B2 (ja) * 2002-03-15 2005-09-21 川崎重工業株式会社 レーザパルス制御方法と装置およびｘ線発生方法と装置
US6787788B2 (en) * 2003-01-21 2004-09-07 Melissa Shell Electrode insulator materials for use in extreme ultraviolet electric discharge sources
FR2859545B1 (fr) * 2003-09-05 2005-11-11 Commissariat Energie Atomique Procede et dispositif de lithographie par rayonnement dans l'extreme utraviolet
DE10359464A1 (de) * 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
FR2871622B1 (fr) * 2004-06-14 2008-09-12 Commissariat Energie Atomique Dispositif de generation de lumiere dans l'extreme ultraviolet et application a une source de lithographie par rayonnement dans l'extreme ultraviolet
US7605385B2 (en) * 2004-07-28 2009-10-20 Board of Regents of the University and Community College System of Nevada, on behlaf of the University of Nevada Electro-less discharge extreme ultraviolet light source
DE102005007884A1 (de) * 2005-02-15 2006-08-24 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter (EUV-) Strahlung
DE102005020521B4 (de) * 2005-04-29 2013-05-02 Xtreme Technologies Gmbh Verfahren und Anordnung zur Unterdrückung von Debris bei der Erzeugung kurzwelliger Strahlung auf Basis eines Plasmas
DE102005039849B4 (de) 2005-08-19 2011-01-27 Xtreme Technologies Gmbh Vorrichtung zur Strahlungserzeugung mittels einer Gasentladung
US7501642B2 (en) * 2005-12-29 2009-03-10 Asml Netherlands B.V. Radiation source
DE102006003683B3 (de) * 2006-01-24 2007-09-13 Xtreme Technologies Gmbh Anordnung und Verfahren zur Erzeugung von EUV-Strahlung hoher Durchschnittsleistung
DE102006027856B3 (de) * 2006-06-13 2007-11-22 Xtreme Technologies Gmbh Anordnung zur Erzeugung von extrem ultravioletter Strahlung mittels elektrischer Entladung an regenerierbaren Elektroden
JP5358060B2 (ja) * 2007-02-20 2013-12-04 ギガフォトン株式会社 極端紫外光源装置
JP5179776B2 (ja) * 2007-04-20 2013-04-10 ギガフォトン株式会社 極端紫外光源用ドライバレーザ
US7615767B2 (en) * 2007-05-09 2009-11-10 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
JP2009099390A (ja) * 2007-10-17 2009-05-07 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
JP4952513B2 (ja) * 2007-10-31 2012-06-13 ウシオ電機株式会社 極端紫外光光源装置
WO2009105247A1 (en) * 2008-02-21 2009-08-27 Plex Llc Laser heated discharge plasma euv source with plasma assisted lithium reflux
JP4623192B2 (ja) * 2008-09-29 2011-02-02 ウシオ電機株式会社 極端紫外光光源装置および極端紫外光発生方法
CN102257883B (zh) * 2008-12-16 2014-06-25 皇家飞利浦电子股份有限公司 用于以提高的效率生成euv辐射或软x射线的方法和装置
US8436328B2 (en) * 2008-12-16 2013-05-07 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP4893730B2 (ja) 2008-12-25 2012-03-07 ウシオ電機株式会社 極端紫外光光源装置
WO2011013779A1 (ja) * 2009-07-29 2011-02-03 株式会社小松製作所 極端紫外光源装置、極端紫外光源装置の制御方法、およびそのプログラムを記録した記録媒体

Also Published As

Publication number Publication date
NL2007473A (en) 2012-04-03
DE102010047419B4 (de) 2013-09-05
DE102010047419A1 (de) 2012-04-05
JP2012079693A (ja) 2012-04-19
US20120080619A1 (en) 2012-04-05
US8426834B2 (en) 2013-04-23
NL2007473C2 (en) 2013-07-30

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