JP5529835B2 - 導電性パターン形成方法及び導電性パターン形成システム - Google Patents

導電性パターン形成方法及び導電性パターン形成システム Download PDF

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Publication number
JP5529835B2
JP5529835B2 JP2011255279A JP2011255279A JP5529835B2 JP 5529835 B2 JP5529835 B2 JP 5529835B2 JP 2011255279 A JP2011255279 A JP 2011255279A JP 2011255279 A JP2011255279 A JP 2011255279A JP 5529835 B2 JP5529835 B2 JP 5529835B2
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JP
Japan
Prior art keywords
liquid
pattern
conductive polymer
conductive
polymer compound
Prior art date
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Expired - Fee Related
Application number
JP2011255279A
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English (en)
Japanese (ja)
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JP2013110315A (ja
JP2013110315A5 (https=
Inventor
学 勝村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
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Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2011255279A priority Critical patent/JP5529835B2/ja
Priority to US13/682,553 priority patent/US20130129916A1/en
Priority to EP12193796.5A priority patent/EP2597694A3/en
Priority to CN2012104805015A priority patent/CN103137556A/zh
Publication of JP2013110315A publication Critical patent/JP2013110315A/ja
Publication of JP2013110315A5 publication Critical patent/JP2013110315A5/ja
Application granted granted Critical
Publication of JP5529835B2 publication Critical patent/JP5529835B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/60—Forming conductive regions or layers, e.g. electrodes
    • H10K71/611—Forming conductive regions or layers, e.g. electrodes using printing deposition, e.g. ink jet printing
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
    • H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
    • H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/82—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40—Organic transistors
    • H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462—Insulated gate field-effect transistors [IGFETs]
    • H10K10/466—Lateral bottom-gate IGFETs comprising only a single gate
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2011255279A 2011-11-22 2011-11-22 導電性パターン形成方法及び導電性パターン形成システム Expired - Fee Related JP5529835B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2011255279A JP5529835B2 (ja) 2011-11-22 2011-11-22 導電性パターン形成方法及び導電性パターン形成システム
US13/682,553 US20130129916A1 (en) 2011-11-22 2012-11-20 Conductive pattern forming method and conductive pattern forming system
EP12193796.5A EP2597694A3 (en) 2011-11-22 2012-11-22 Conductive pattern forming method and conductive pattern forming system
CN2012104805015A CN103137556A (zh) 2011-11-22 2012-11-22 导电图案形成方法和导电图案形成系统

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2011255279A JP5529835B2 (ja) 2011-11-22 2011-11-22 導電性パターン形成方法及び導電性パターン形成システム

Publications (3)

Publication Number Publication Date
JP2013110315A JP2013110315A (ja) 2013-06-06
JP2013110315A5 JP2013110315A5 (https=) 2013-10-31
JP5529835B2 true JP5529835B2 (ja) 2014-06-25

Family

ID=47290676

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011255279A Expired - Fee Related JP5529835B2 (ja) 2011-11-22 2011-11-22 導電性パターン形成方法及び導電性パターン形成システム

Country Status (4)

Country Link
US (1) US20130129916A1 (https=)
EP (1) EP2597694A3 (https=)
JP (1) JP5529835B2 (https=)
CN (1) CN103137556A (https=)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2745109T3 (es) * 2013-10-15 2020-02-27 1835963 Alberta Ltd Composiciones de elemento de detección y sistema de sensor para detectar y controlar estructura de hidrocarburos
MX2014012688A (es) * 2013-11-29 2015-05-28 Müller Martini Holding AG Un metodo para aplicar una sustancia fluida.
JP6137049B2 (ja) * 2014-05-13 2017-05-31 株式会社村田製作所 セラミック電子部品の製造方法
US10239305B2 (en) * 2015-12-25 2019-03-26 Technology Research Association For Future Additive Manufacturing Three-dimensional laminating and shaping apparatus, control method of three-dimensional laminating and shaping apparatus, and control program of three-dimensional laminating and shaping apparatus
KR101832411B1 (ko) * 2016-04-20 2018-02-26 한국과학기술연구원 비아홀 형성 방법, 다층 연성 인쇄회로기판, 및 그 제조 방법
US11400477B2 (en) * 2018-01-30 2022-08-02 Ford Motor Company Reversible nozzle in ultrasonic atomizer for clog prevention
CN110248465B (zh) * 2019-06-20 2024-03-19 上海铠琪科技有限公司 一种厚膜和覆铜一体陶瓷电路板及其制备方法
JP7428677B2 (ja) * 2021-03-19 2024-02-06 東レエンジニアリング株式会社 膜パターン形成方法及びインクジェット塗布装置
CN117957069A (zh) * 2021-09-24 2024-04-30 富士胶片株式会社 图案形成基板制造方法及液体排出装置
WO2023058612A1 (ja) * 2021-10-07 2023-04-13 富士フイルム株式会社 膜の形成方法及び電子デバイスの製造方法
WO2023058613A1 (ja) * 2021-10-07 2023-04-13 富士フイルム株式会社 膜の形成方法、電子デバイスの製造方法、及び膜形成装置
US20240390985A1 (en) * 2021-10-08 2024-11-28 Fuji Corporation Circuit forming method and information processing device
WO2023058227A1 (ja) * 2021-10-08 2023-04-13 株式会社Fuji 配線形成方法、および情報処理装置
TW202411079A (zh) * 2022-09-02 2024-03-16 美商凱特伊夫公司 多區段邊緣校正

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0693418A (ja) 1992-09-11 1994-04-05 Omron Corp 超微粒子膜パターンの形成方法
GB2379083A (en) * 2001-08-20 2003-02-26 Seiko Epson Corp Inkjet printing on a substrate using two immiscible liquids
JP4269748B2 (ja) 2003-04-01 2009-05-27 セイコーエプソン株式会社 表示装置の製造方法
JP2005028275A (ja) * 2003-07-11 2005-02-03 Seiko Epson Corp 膜形成方法、デバイス製造方法、電気光学装置、並びに電子機器
JP4042737B2 (ja) * 2004-10-27 2008-02-06 セイコーエプソン株式会社 パターン形成システム
US20060158497A1 (en) * 2005-01-14 2006-07-20 Karel Vanheusden Ink-jet printing of compositionally non-uniform features
JP2010539651A (ja) * 2007-09-10 2010-12-16 メドトロニック，インコーポレイテッド 印刷した電極の性質を少なくとも二元的に制御する方法
JP4725577B2 (ja) * 2007-12-28 2011-07-13 カシオ計算機株式会社 表示装置の製造方法

Also Published As

Publication number Publication date
JP2013110315A (ja) 2013-06-06
CN103137556A (zh) 2013-06-05
US20130129916A1 (en) 2013-05-23
EP2597694A3 (en) 2014-10-22
EP2597694A2 (en) 2013-05-29

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